US20020045302A1 - Manufacturing method of semiconductor integrated circuit - Google Patents
Manufacturing method of semiconductor integrated circuit Download PDFInfo
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- US20020045302A1 US20020045302A1 US09/257,049 US25704999A US2002045302A1 US 20020045302 A1 US20020045302 A1 US 20020045302A1 US 25704999 A US25704999 A US 25704999A US 2002045302 A1 US2002045302 A1 US 2002045302A1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 239000004065 semiconductor Substances 0.000 title claims description 69
- 229910052796 boron Inorganic materials 0.000 claims abstract description 62
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 59
- 239000011574 phosphorus Substances 0.000 claims abstract description 59
- -1 boron ions Chemical class 0.000 claims abstract description 22
- 150000002500 ions Chemical class 0.000 claims description 157
- 238000000034 method Methods 0.000 claims description 84
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 60
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 55
- 239000000758 substrate Substances 0.000 claims description 34
- 238000005530 etching Methods 0.000 claims description 14
- 230000000295 complement effect Effects 0.000 claims description 4
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims description 2
- 238000000059 patterning Methods 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 120
- 239000010409 thin film Substances 0.000 abstract description 4
- 230000005669 field effect Effects 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 33
- 229910052814 silicon oxide Inorganic materials 0.000 description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 27
- 229910052710 silicon Inorganic materials 0.000 description 27
- 239000010703 silicon Substances 0.000 description 27
- 239000012535 impurity Substances 0.000 description 26
- 239000010407 anodic oxide Substances 0.000 description 20
- 230000001133 acceleration Effects 0.000 description 18
- 229910021417 amorphous silicon Inorganic materials 0.000 description 15
- 239000010410 layer Substances 0.000 description 15
- 230000003647 oxidation Effects 0.000 description 14
- 238000007254 oxidation reaction Methods 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 10
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 7
- 238000000137 annealing Methods 0.000 description 6
- 229910052785 arsenic Inorganic materials 0.000 description 6
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 6
- 238000004380 ashing Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 5
- 239000000969 carrier Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000005224 laser annealing Methods 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 238000001039 wet etching Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 2
- 229910021342 tungsten silicide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000001017 electron-beam sputter deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910021341 titanium silicide Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
- H01L21/2652—Through-implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2658—Bombardment with radiation with high-energy radiation producing ion implantation of a molecular ion, e.g. decaborane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
- H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
- H01L21/28061—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a metal or metal silicide formed by deposition, e.g. sputter deposition, i.e. without a silicidation reaction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
Definitions
- the present invention relates to a manufacturing method of semiconductor devices. More specifically, the present invention relates to an improvement for introducing impurity ions into a semiconductor layer. Further, the present invention also relates to a method for manufacturing a semiconductor integrated circuit in which N-channel and P-channel thin-film transistors (hereinafter called “TFTs”) are formed on an insulating surface of a single substrate.
- TFTs N-channel and P-channel thin-film transistors
- the invention also relates to a manufacturing method of integrated circuits having TFTs such as a liquid crystal display device and a three-dimensional integrated circuit and, in particular, integrated circuits (CMOS circuits) having complementary MOS (metal-oxide-semiconductor) or MIS (metal-insulator-semiconductor) field-effect devices.
- CMOS circuits complementary MOS (metal-oxide-semiconductor) or MIS (metal-insulator-semiconductor) field-effect devices.
- insulated-gate semiconductor devices in which a thin-film active layer (or active region) is formed on an insulating substrate have been investigated.
- thin-film insulated-gate transistors have been investigated eagerly.
- the TFTs are intended to be used for control of individual pixels in display devices having a matrix structure such as a liquid crystal display device, and classified into amorphous silicon TFTs, polycrystalline silicon TFTs, etc. in terms of a semiconductor material used and its crystal structure.
- Polycrystalline TFTs are also used in a single crystal silicon integrated circuit (SOI technique), as load transistors in a highly integrated SRAM, for instance.
- SOI technique single crystal silicon integrated circuit
- Amorphous silicon TFTs are hardly used in this application.
- a semiconductor circuit formed on an insulating substrate can operate at very high speed, because it is free of capacitive coupling between the substrate and the wiring.
- Techniques have been developed which are intended to use such a semiconductor circuit as an ultrahigh-speed microprocessor or memory.
- amorphous semiconductors since amorphous semiconductors generally have a small electric field mobility, they cannot be used for a TFT that is required to operate at high speed. Further, amorphous silicon of P-type has a very small electric field mobility, to disable manufacture of a P-channel TFT (PMOS TFT). Therefore, a complementary MOS (CMOS) circuit cannot be formed by combining PMOS TFTs with N-channel TFTs (NMOS TFTs) in the case of using amorphous silicon.
- CMOS complementary MOS
- polycrystalline semiconductors have a larger electric field mobility than amorphous semiconductors and, therefore, can operate at high speed.
- TFT which uses a silicon film re-crystallized by laser annealing and has an electric field mobility as large as 300 cm 2 /Vs. This is a very large value in view of the fact that a MOS transistor formed on an ordinary single crystal silicon substrate has an electric field mobility of about 500 cm 2 /Vs.
- a TFT circuit which is formed on an insulating substrate, is free of such a limitation, to assure a very-high-speed operation.
- polycrystalline silicon can provide both NMOS TFTs and PMOS TFTs in a similar manner, to enable manufacture of a CMOS circuit.
- CMOS polycrystalline TFTs in an active matrix type liquid crystal display device, a device having a monolithic structure is known in which not only an active matrix portion but also peripheral circuits (drivers etc.) are composed of CMOS polycrystalline TFTs.
- the thickness of an active layer of a TFT should be 100-2,000 ⁇ and, preferably, 200-1.000 ⁇ .
- doping impurities need to be implanted into a layer of the above thickness at an optimum concentration.
- a gate insulating film formed on the active layer of a TFT should be 500-3.000 ⁇ , which is thicker than that of a VLSI. Therefore, the direct application of a doping technique in the conventional semiconductor integrated circuit technologies, particularly through-doping, causes some difficulties.
- the through-doping is a technique in which an active layer (semiconductor surface) is doped with a gate insulating film formed thereon.
- a substrate having an insulating surface is irradiated with ions having such a high energy
- device characteristics are likely deteriorated by, for instance, charge-up of the substrate.
- an organic material such as a resist
- it may be carbonized to make its peeling difficult.
- an object of the present invention is to provide a most suitable doping technique. More specifically, although not exclusively, it is an object of the present invention to form a CMOS device with a high efficiency.
- impurities are implanted into an active layer through a gate insulating film.
- a heavy element such as phosphorus or arsenic into an active layer
- doping is performed after at least a portion of the gate insulating film in a region for implantation is removed or made thinner to allow a sufficient amount of the heavy element to reach the active layer.
- the acceleration voltage of ions including heavy ions of phosphorus, arsenic or the like can be reduced to as low a voltage as 10-30 kV. Since an amount of ions which are conventionally absorbed by a gate insulting film now effectively reach a source and a drain, the necessary dose can be reduced. Further, as a result of these advantages, the invention can solve the charge-up problem and the difficulty of peeling off a mask material.
- FIGS. 1 (A)- 1 (E) show manufacturing steps according to a first embodiment of the present invention
- FIGS. 2 (A)- 2 (E) show manufacturing steps according to a second embodiment of the invention
- FIGS. 3 (A)- 3 (F) show manufacturing steps according to a third embodiment of the invention.
- FIGS. 4 (A) and 4 (B) show liquid crystal display devices to which the manufacturing steps of FIGS. 2 (A)- 2 (E) are to be applied;
- FIGS. 5 (A)- 5 (E) show manufacturing steps according to a fourth embodiment of the invention.
- FIGS. 6 (A)- 6 (D) show manufacturing steps according to a fifth embodiment of the invention.
- FIGS. 1 (A)- 1 (E) show steps for producing NMOS devices and PMOS devices according to a first embodiment of the invention.
- TFTs were produced by a high-temperature process.
- a 2,000 ⁇ thick silicon oxide film 102 was formed, as an undercoat, on a quartz substrate 101 (105 mm (width) ⁇ 105 mm (length) ⁇ 1.1 mm (thickness)).
- An impurity non-doped amorphous silicon film of 100-2,000 ⁇ , preferably 500-1.500 ⁇ in thickness was formed by reduced-pressure CVD using disilane as a material.
- the substrate temperature in forming the amorphous silicon film was set at 150-550° C.
- the amorphous silicon film was patterned into island-like silicon regions 103 and 104 , which were then crystallized by thermal annealing at 500-750° C. Then, the crystallized silicon regions 103 and 104 were oxidized in an oxygen atmosphere, to form on their surfaces silicon oxide films 105 and 106 of 500-1,500 ⁇ , preferably 500-700 ⁇ in thickness.
- the temperature was set at 850-1,100° C. The range of 950-1.050° C. was particularly preferable.
- the crystallization may be effected by laser light or high-intensity light equivalent to it.
- the crystallizing temperature could be lowered and a silicon film superior in crystallinity was obtained by adding a very small quantity of an element which facilitates the crystallization of amorphous silicon, such as nickel, cobalt and copper.
- concentration of such a catalyst element be less than 1 ⁇ 10 20 atoms/cm 3 and typically, in the range of 1 ⁇ 10 15 to 1 ⁇ 10 19 cm ⁇ 3 .
- a silicon film which is doped with phosphorous at 1 ⁇ 10 18 to 2 ⁇ 10 20 cm ⁇ 3 , for instance 8 ⁇ 10 19 cm ⁇ 3 is formed to a thickness of 2,000-5,000 ⁇ , preferably 3,500-4,000 ⁇ , and is patterned into a gate 107 of an N-channel TFT (NMOS) and a gate 108 of a P-channel TFT (PMOS). Then, a photoresist mask 109 was formed so as to cover the NMOS region (FIG. 1(A)).
- NMOS N-channel TFT
- PMOS P-channel TFT
- ions including boron were implanted by plasma doping.
- a gas containing a doping impurity element is subjected to discharging to render it in a plasma state, and then guided out and accelerated by means of a high voltage so as to be implanted into an object.
- This doping method is characterized in that various kinds of ions are implanted because mass separation of ions is not effected, which is in contrast to the cases of other known ion implantation methods.
- diborane is used as a gas. In this case, however, not only B (boron) ions, but also other ions of BH, BH 2 , and H are implanted.
- the plasma doping is a simple and convenient doping method and can be used for purposes where high accuracy is not required.
- P-type impurity regions 110 and 111 were formed by a doping operation in which the acceleration voltage was 30-70 kV, preferably 50-65 kV and the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , preferably 5 ⁇ 10 14 to 2 ⁇ 10 15 cm ⁇ 2 . These regions serve as a source and a drain of the PMOS TFT (FIG. 1(B)).
- the silicon oxide film 105 was etched using the mask 112 , to thereby expose the silicon region 103 (FIG. 1(C)).
- N-type impurity regions 113 and 114 were formed by a doping operation in which phosphine was used as a gas, and the acceleration voltage was 10-30 kV, preferably 10-20 kV and the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , preferably 5 ⁇ 10 14 to 2 ⁇ 10 15 cm ⁇ 2 . These regions serve as a source and a drain of the NMOS TFT (FIG. 1(D)).
- ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist mask 112 , and the resist mask 112 was removed by being immersed in a peeling liquid. Since ions including phosphorus were implanted at a low acceleration voltage, the resist mask 112 was removed in a short time. Then, thermal annealing was performed at 650-1,050° C., for instance 750° C. to restore crystallinity of the impurity regions 113 and 114 which was damaged by the doping step.
- an interlayer insulating material (phosphorus-boron glass) 115 was deposited, and flattened by reflowing. Contact holes were formed in the interlayer insulating material 115 , and metal wirings 116 - 119 were formed therein. As a result of the above steps, the NMOS TFT 120 and the PMOS TFT 121 were formed (FIG. 1(E)).
- FIGS. 2 (A)- 2 (E) a description will be made of a manufacturing process of a liquid crystal display having a CMOS circuit according to a second embodiment of the invention.
- a liquid crystal display device was formed on a substrate 201 which device has a display circuit section (active matrix) 23 and its drive circuits (peripheral circuits, i.e., a data driver 21 and a gate driver 22 ).
- the drive circuits are constituted with CMOS circuits. More specifically, the drive circuits 21 and 22 are formed in the peripheral region of the substrate, and the active matrix 23 is formed in the central portion with PMOS TFTs.
- the driver circuits 21 and 22 are connected with the active matrix 23 through gate lines 25 and data lines 25 .
- peripheral circuits i.e., data drivers 21 and 21 ′ and gate drivers 22 and 22 ′ may be formed on all four sides of an active matrix 23 .
- the active matrix 23 is constituted with pixel cells 24 each having a PMOS TFT.
- the reason why PMOS TFTs are used in the active matrix 23 is that they have a small source-drain leak current in a non-selected state and, therefore, are superior in the ability of retaining charge in the pixels.
- a manufacturing process of the device of FIG. 4(A) or 4 (B) will be described with reference to FIGS. 2 (A)- 2 (E).
- a Corning 7059 glass was used as the substrate 201 .
- the ideal substrate is a synthesized quartz substrate having a small alkali concentration.
- low-alkali glass or non-alkali glass each being on the market, may be used.
- a silicon oxide film 202 was formed on the substrate 201 at a thickness of 200-10,000 ⁇ , for instance 2,000 ⁇ .
- the thickness of the coating 202 is designed in accordance with the degree of entrance of movable ions or their influences on an active layer.
- an amorphous silicon film of 200-2,000 ⁇ , for instance 1,000 ⁇ in thickness was formed by plasma CVD by using monosilane as a starting material.
- the substrate temperature was set at 160-400° C., for instance 250° C.
- a silicon oxide film of 200-1,000 ⁇ in thickness was formed thereon as a protection film.
- the amorphous silicon film thus formed was crystallized by performing thermal annealing at 600° C. for 24 hours.
- the concentration of each of carbon, nitrogen and oxygen that are contained in the silicon film to facilitate its crystallization be less than 7 ⁇ 10 19 cm ⁇ 3 .
- the concentration was less than 1 ⁇ 10 17 cm ⁇ 3 .
- the crystalline silicon film was etched into an appropriate pattern to form an island-like semiconductor region 203 for a peripheral CMOS circuit and an island-like semiconductor region 204 for a pixel TFT.
- a gate insulating film (silicon oxide) 205 was formed at a thickness of 500-3,000 ⁇ , for instance 1,200 ⁇ by sputtering in an oxygen atmosphere using silicon oxide as a target.
- the thickness of the gate insulating film 205 is determined based on the operating conditions of the TFTs and the like.
- an aluminum oxide coating was formed on the surface of the aluminum wiring by anodic oxidation.
- the anodic oxidation was performed by a method invented by the present inventors and disclosed in U.S. Pat. No. 5,308,998 issued May 3, 1994. Details of the anodic oxidation may be modified according to the intended characteristics of the device, process conditions, investment scale, etc.
- an aluminum oxide coating 207 of 1,000-3,000 ⁇ for instance 2,000 ⁇ in thickness was formed around the wiring 206 by the anodic oxidation.
- a gate electrode/wiring 208 for the NMOS TFT, a gate electrode/wiring 209 for the PMOS TFT, and a gate electrode/wiring 210 for the pixel TFT were formed (FIG. 2(A)).
- ions including boron were implanted into the entire substrate by plasma doping.
- the acceleration voltage was 30-70 kV, for instance 65 kV
- the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 1 ⁇ 10 15 cm ⁇ 2 .
- P-type impurity regions 211 - 215 were formed in the island-like silicon regions 203 and 204 (FIG. 2(B)).
- the silicon oxide film 205 was etched out with a buffered hydrofluoric acid solution, and a photoresist mask 216 was formed.
- a photoresist mask 216 was formed in an opening that includes regions into which phosphorus is to be implanted (i.e., regions to become a source and a drain of the NMOS TFT).
- ions including phosphorus were implanted by plasma doping.
- the acceleration voltage was 10-30 kV, for instance 10 kV
- the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for example, 2 ⁇ 10 15 cm ⁇ 2 .
- regions 211 and 212 of the island-like silicon region 203 became regions 217 and 218 (regions to become a source and a drain of the NMOS TFT) with their conductivity type changed from P to N.
- the other parts of the island -type silicon region 203 i.e., regions 219 and 220 (regions to become a source and drain of the PMOS TFT) kept their conductivity type P.
- a peripheral portion 211 ′ of the NMOS TFT also kept its conductivity type P.
- the regions 214 and 215 of the island-like silicon region 204 remains P-type (FIG. 2(C)).
- ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist mask 216 , and the resist mask 216 was removed by being immersed in a peeling liquid.
- the source and drain regions were re-crystallized by laser annealing with the gate portions used as a mask (FIG. 2(D)).
- the laser annealing was performed under conditions disclosed in, for instance. U.S. Pat. No. 5,308.998.
- this embodiment during the laser annealing, there exists no silicon oxide film or the like on the surface of the silicon film to be annealed, which means a reduced loss of laser light due to absorption. Sufficient annealing was observed even with a laser light energy density that is as low as 50-80% of that disclosed in the above publications, resulting in an improved laser processing ability.
- a silicon oxide film 221 was formed, as an interlayer insulating film, by RF plasma CVD at a thickness of 3,000 ⁇ to 3 ⁇ m, for instance 5,000 ⁇ . Further, an ITO (indium tin oxide) film was formed by sputtering at a thickness of 500-1,000 ⁇ , for instance 800 ⁇ , and patterned by etching, to form a pixel electrode 222 of the active matrix.
- ITO indium tin oxide
- This embodiment is different from the first embodiment in that selective doping was not performed in the boron doping. Therefore, this embodiment eliminated one photolithography step and one mask material removing step. Further, since the silicon oxide film (gate insulating film) 205 was removed completely in the phosphorus doping, the contact holes that were formed in the later step had the same depth for the NMOS TFT and the PMOS TFT.
- the gate electrode is offset from the source and drain because of the anodic oxide film formed on the side faces of the gate electrode. As a result, the breakdown voltage was increased and the source-drain leak current was reduced.
- FIGS. 3 (A)- 3 (F) show a third embodiment.
- a silicon oxide film of 1,000-3,000 ⁇ in thickness was formed as an undercoat oxide film 302 on a substrate 301 (Corning 7059, 300 mm ⁇ 400 mm or 100 mm ⁇ 100 mm).
- An amorphous silicon film of 100-3,000 ⁇ , preferably 500-1,000 ⁇ in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C. This step may be performed by laser beam illumination.
- the crystallized silicon film was patterned to form an island-like region 303 for an NMOS TFT and an island-like region 304 for a PMOS TFT.
- a silicon oxide film 305 was formed thereon by sputtering at a thickness of 700-1,500 ⁇ , for instance 1,200 ⁇ .
- an aluminum film containing Si of 1 wt % or Sc of 0.1-0.3 wt % was formed at a thickness of 1,000 ⁇ to 3 ⁇ m by electron beam evaporation or sputtering.
- a photoresist film (for instance, OFPR 800/30 cp produced by Tokyo Ohka Kogyo Co., Ltd.) was formed thereon by spin coating.
- a porous anodic oxide film 310 of 3,000-6,000 ⁇ , for instance 5,000 ⁇ in thickness was formed on the side faces of only the gate electrode 306 of the NMOS TFT by allowing a current to flow therethrough in an electrolytic solution (FIG. 3(A)). It is desired that a circuit be established which allows a current to flow through only the NMOS TFT.
- the anodic oxidation may be performed in an acid aqueous solution of citric acid (3-20%), nitric acid, phosphoric acid, chromic acid, sulfuric acid, or the like by applying a constant current with a voltage of 10-30 V to the gate electrode. In this embodiment, the anodic oxidation was performed for 20-40 minutes in an oxalic acid solution at 30° C. by applying 10 V. The thickness of the anodic oxide film was controlled by the anodic oxidation time.
- a current was caused to flow through the gate electrodes 306 and 307 in an electrolytic solution.
- an ethylene glycol solution containing a tartaric acid solution (3-10%), boric acid and nitric acid was used, and a current was caused to flow through both NMOS and PMOS TFTs.
- Better oxide films were obtained when the temperature of the solution was lower than a room temperature that was about 10° C.
- barrier type anodic oxide films 311 and 312 were formed on the top and side faces of the gate electrodes 306 and 307 .
- the thickness of the barrier type anodic oxide films 311 and 312 was proportional to the application voltage. The thickness was 2,000 ⁇ when the application voltage was 150 V (FIG. 3(B)).
- the barrier type anodic oxide film 311 was formed between the porous anodic oxide film 310 and the gate electrode 306 rather than outside the porous anodic oxide film 310 .
- Accelerated ions including boron were implanted into the active layer over the entire surface of the above structure.
- the acceleration voltage was 30-70 kV, for instance 65 kV
- the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 5 ⁇ 10 14 cm ⁇ 2 .
- P-type impurity regions 313 - 316 were formed in the island-like silicon regions 303 and 304 (FIG. 3(C)).
- the insulating film 305 was etched by dry etching, wet etching, or some other method.
- this etching- step the portions of the insulating film 305 covered with the anodic oxide films 310 - 312 and the gate electrodes 306 and 307 are substantially not etched.
- the gate electrodes 306 and 307 are mainly made of aluminum, tantalum and titanium and the insulating film 305 is mainly made of silicon oxide
- dry etching is employed using a fluoride type etching gas (for instance, NF 3 or SF 6 )
- the insulating film 305 silicon oxide
- the insulating film 305 silicon oxide
- a hydrofluoric acid type etchant such as a ⁇ fraction (1/100) ⁇ hydrofluoric acid may be used.
- the insulating film 305 can be selectively etched, because the insulating film 305 (silicon oxide) is etched fast but the etching rates of aluminum oxide, tantalum oxide and titanium oxide are sufficiently small.
- the anodic oxide films 310 were etched by a mixed acid of phosphoric acid, acetic acid and nitric acid.
- the etching rate of the porous anodic oxide was more than 10 times higher than that of the barrier type anodic oxide. Therefore, the barrier type anodic oxide films 311 and 312 were substantially not etched, and the gate electrodes 306 and 307 , which were located inside the respective anodic oxide films 311 and 312 , were protected from the etching.
- the etching rate of the porous anodic oxide films 310 was about 600 ⁇ /min.
- the portions of the gate insulating film (silicon oxide) 305 under the porous anodic oxide films 310 and the barrier type anodic oxide films 311 and 312 were left as they were.
- a photoresist mask 317 was formed so as to cover the PMOS TFT region. Ions including arsenic were implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 1 ⁇ 10 15 cm ⁇ 2 . As a result, the P-type regions 313 and 314 of the island-like silicon region 303 were changed to N-type regions 318 and 319 (regions to become a source and a drain of the NMOS TFT). The P-type conductivity of the regions 315 and 316 in the island-like silicon region 304 was not changed, because those regions were completely covered with the resist mask 317 (FIG. 3(D)).
- ions including phosphorus were implanted by plasma doping in which the ion source, acceleration voltage and dose were changed.
- the acceleration voltage was increased to 80-110 kV, for instance 90 kV
- the dose was reduced to 1 ⁇ 10 13 to 1 ⁇ 10 14 cm ⁇ 2 , for instance 5 ⁇ 10 13 .
- phosphorus ions passed through the insulating film 305 ′ and reached the active layer, so that N-type regions 320 and 321 were formed. Since the dose was low in the regions 320 and 321 , the conductivity type of the resulting impurity regions was weak N, i.e., N ⁇ (FIG. 3 (E)).
- impurity ions introduced in the active region were activated by illumination with KrF excimer laser light (wavelength: 248 nm; pulse width: 20 nsec).
- the concentration of arsenic in the regions 318 and 319 was 1 ⁇ 10 20 to 2 ⁇ 10 21 cm ⁇ 3
- the concentration of phosphorus in the regions 320 and 321 was 1 ⁇ 10 17 to 2 ⁇ 10 18 cm ⁇ 3 .
- the above concentrations correspond to doses of 5 ⁇ 10 14 to 5 ⁇ 10 15 cm ⁇ 2 and 1 ⁇ 10 13 to 1 ⁇ 10 14 cm ⁇ 2 , respectively.
- a silicon oxide film 322 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 ⁇ to 3 ⁇ m, for instance 5,000 ⁇ . Electrode formation openings were formed in the silicon oxide film 322 , and aluminum wiring lines 323 - 326 were formed.
- the NMOS TFT had a structure that is close to the lightly doped drain structure (hereinafter the regions 320 and 321 are called high-resistivity regions). This effective in reducing influences of deteriorations due to hot carriers, which deteriorations likely occur in the NMOS TFT.
- the PMOS TFT it might be considered that it is preferable for the PMOS TFT to have high-resistivity regions similar to those of the NMOS TFT. This is not impossible and the invention does not deny its effectiveness. However, in practice, it is not preferable, because an actual drain current unduly decreases if the high-resistivity regions (serving as a resistor connected in series between the source and drain) are provided in spite of the fact that the electric field effect mobility of the PMOS TFT is usually about a half of that of the NMOS TFT.
- FIGS. 5 (A)- 5 (E) show a fourth embodiment.
- a silicon oxide film of 1,000-3,000 ⁇ in thickness was formed as an undercoat oxide film 502 on a substrate 501 (Corning 7059, 300 mm ⁇ 400 mm or 100 mm ⁇ 100 mm).
- An amorphous silicon film of 100-3,000 ⁇ , preferably 500-1,000 ⁇ in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C.
- the crystallized silicon film was patterned to form an island-like region 503 (for an NMOS TFT) and an island-like region 504 (for a PMOS TFT).
- a silicon oxide film 505 was formed thereon by plasma CVD at a thickness of 700-1,500 ⁇ , for instance 1,200 ⁇ .
- an aluminum film (containing Si of 1 wt % or Sc of 0.1-0.3 wt %) was formed at a thickness of 1,000 ⁇ to 3 ⁇ m by sputtering.
- the aluminum film was patterned to form a gate electrode/wiring 506 (for the NMOS TFT) and a gate electrode/wiring 509 (for the PMOS TFT).
- barrier type anodic oxide films 507 and 509 were formed by anodic oxidation.
- the thickness of the anodic oxidation film 507 on the gate electrode/wiring 506 of the NMOS TFT was made 2,000-3,000 ⁇ and the thickness of the anodic oxidation film 509 on the gate electrode/wiring 508 of the PMOS TFT was made 500-1,000 ⁇ (FIG. 5(A)).
- Accelerated ions including boron were implanted into the active layer by plasma doping over the entire surface of the above structure.
- the acceleration voltage was 30-70 kV, for instance 65 kV
- the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 5 ⁇ 10 14 cm ⁇ 2 .
- P-type impurity regions 510 - 513 were formed in the island-like silicon regions 503 and 504 (FIG. 5(B)).
- the insulating film 505 was etched by dry etching, wet etching, or some other method. Then, as in the case of the first embodiment, a photoresist mask 514 was formed so as to cover the PMOS TFT region. Ions including phosphorus were then implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 5 ⁇ 10 14 to 5 ⁇ 10 15 cm ⁇ 2 , for instance 1 ⁇ 10 15 cm ⁇ 2 .
- ions including phosphorus were implanted by plasma doping in which the acceleration voltage and the dose were changed.
- the acceleration voltage was increased to 65-110 kV, for instance 80 kV
- the dose was reduced to 1 ⁇ 10 13 to 5 ⁇ 10 14 cm ⁇ 2 , for instance 5 ⁇ 10 13 , which dose was more than one order lower than in the case of forming the source and drain.
- phosphorus ions passed through the active layer and reached the deep portion of the undercoat film 502 . Ions spread in the horizontal direction as well as in the vertical direction, because the ion directivity is not good in ion doping methods.
- the conductivity type of the resulting impurity regions was weak N, i.e., N ⁇ (FIG. 5(D)).
- low-speed ions were implanted first and high-speed ions were then implanted, the order may apparently be reversed.
- Low-speed ions and high-speed ions may be implanted even at the same time.
- the kinds of doping impurities that are implanted as high-speed ions and low-speed ions may be changed from those in this embodiment.
- high-speed ions and low-speed ions may be highly diffusive phosphorus ions and arsenic ions that are relatively less likely to diffuse, respectively.
- the impurity concentration was 1 ⁇ 10 20 to 2 ⁇ 10 21 cm ⁇ 3 in the regions 515 and 516 , and 1 ⁇ 10 17 to 2 ⁇ 10 18 cm ⁇ 3 in the regions 517 and 518 .
- the above concentrations correspond to doses of 5 ⁇ 10 14 to 5 ⁇ 10 15 cm ⁇ 2 and 2 ⁇ 10 13 to 5 ⁇ 10 14 cm ⁇ 2 , respectively.
- a silicon oxide film 519 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 ⁇ to 3 ⁇ m, for instance 5,000 ⁇ . Electrode formation openings were formed in the silicon oxide film 519 , and aluminum wiring lines 520 - 523 were formed.
- the NMOS and PMOS TFTs have different offsets.
- the two-step doping was performed in forming the NMOS TFT, it was possible to form the regions 517 and 518 which are lower in impurity concentration than the adjacent source and drain.
- the regions 517 and 518 have the same effect as the corresponding regions in the lightly doped drain structure of the third embodiment; that is, they are effective in reducing influences of deteriorations due to hot carriers.
- this embodiment can provide the structure equivalent to the lightly doped drain structure more easily.
- FIGS. 6 (A)- 6 (D) show a fifth embodiment.
- a silicon oxide film of 1,000-3,000 ⁇ in thickness was formed as an undercoat oxide film 602 on a substrate 601 (NA 35 produced by NH Technoglass Corp., 300 mm ⁇ 400 mm or 100 mm ⁇ 100 mm).
- An amorphous silicon film of 100-3,000 ⁇ , preferably 500-1,000 ⁇ in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C.
- the crystallized silicon film was patterned to form an island-like region 603 for an NMOS TFT and an island-like rejoin 604 for a PMOS TFT.
- a silicon oxide film 605 was formed thereon by plasma CVD at a thickness of 700-1,500 ⁇ , for instance 1,200 ⁇ .
- an N-type polycrystalline silicon film was deposited by a reduced pressure CVD at a thickness of 500-2,000 ⁇ , and a tungsten silicide film, a molybdenum silicide film, or titanium silicide film was formed thereon by sputtering at a thickness of 2,000 ⁇ to 3 ⁇ m. These films were patterned to form gate electrode/wirings comprising silicon films 606 and 607 and coatings 608 and 609 of tungsten silicide or the like. (FIG. 6(A))
- Accelerated ions including boron were implanted into the active layer over the entire surface of the above structure.
- the acceleration voltage was 30-70 kV, for instance 65 kV
- the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 5 ⁇ 10 14 cm ⁇ 2 .
- P-type impurity regions 610 - 613 were formed in the island-like silicon regions 603 and 604 (FIG. 6(B)).
- the insulating film 605 was etched by dry etching, wet etching, or some other method. Then, as in the case of the first embodiment, a photoresist mask 614 was formed so as to cover the PMOS TFT region. Ions including phosphorus were then implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 1 ⁇ 10 14 to 6 ⁇ 10 15 cm ⁇ 2 , for instance 1 ⁇ 10 15 cm ⁇ 2 .
- ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist mask 614 , and the resist mask 614 was removed by being immersed in a peeling liquid.
- impurity ions introduced in the active region were activated by illumination with KrF excimer laser light (wavelength: 248 nm; pulse width: 20 nsec).
- a silicon oxide film 617 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 ⁇ to 3 ⁇ m, for instance 5,000 ⁇ . Openings were formed in the silicon oxide film 617 , and aluminum wiring lines 618 - 621 were formed therein.
- the invention can be applied to not only MIS circuits but also manufacture of bipolar transistors.
- an NPN bipolar transistor can be produced such that a base is formed by selectively implanting boron ions into an N-type semiconductor coating through a silicon oxide film and adding phosphorus after removing or thinning the silicon oxide film.
- This type of bipolar transistors can be formed on the same substrate as a MIS device, to produce a Bi-CMOS circuit.
Abstract
In a source/drain doping step in manufacturing a field effect transistor, particularly a thin-film transistor (TFT), high-speed boron ions are implanted in a state that an active layer in which to form the source and drain is covered with an insulating film, whereas phosphorus ions are implanted in a state that the surface of the active layer is exposed.
Description
- The present invention relates to a manufacturing method of semiconductor devices. More specifically, the present invention relates to an improvement for introducing impurity ions into a semiconductor layer. Further, the present invention also relates to a method for manufacturing a semiconductor integrated circuit in which N-channel and P-channel thin-film transistors (hereinafter called “TFTs”) are formed on an insulating surface of a single substrate. The invention also relates to a manufacturing method of integrated circuits having TFTs such as a liquid crystal display device and a three-dimensional integrated circuit and, in particular, integrated circuits (CMOS circuits) having complementary MOS (metal-oxide-semiconductor) or MIS (metal-insulator-semiconductor) field-effect devices.
- In recent years, insulated-gate semiconductor devices in which a thin-film active layer (or active region) is formed on an insulating substrate have been investigated. In particular, thin-film insulated-gate transistors have been investigated eagerly. The TFTs are intended to be used for control of individual pixels in display devices having a matrix structure such as a liquid crystal display device, and classified into amorphous silicon TFTs, polycrystalline silicon TFTs, etc. in terms of a semiconductor material used and its crystal structure.
- Polycrystalline TFTs are also used in a single crystal silicon integrated circuit (SOI technique), as load transistors in a highly integrated SRAM, for instance. Amorphous silicon TFTs are hardly used in this application.
- A semiconductor circuit formed on an insulating substrate can operate at very high speed, because it is free of capacitive coupling between the substrate and the wiring. Techniques have been developed which are intended to use such a semiconductor circuit as an ultrahigh-speed microprocessor or memory.
- Since amorphous semiconductors generally have a small electric field mobility, they cannot be used for a TFT that is required to operate at high speed. Further, amorphous silicon of P-type has a very small electric field mobility, to disable manufacture of a P-channel TFT (PMOS TFT). Therefore, a complementary MOS (CMOS) circuit cannot be formed by combining PMOS TFTs with N-channel TFTs (NMOS TFTs) in the case of using amorphous silicon.
- In contrast, polycrystalline semiconductors have a larger electric field mobility than amorphous semiconductors and, therefore, can operate at high speed. For example, there has been reported a TFT which uses a silicon film re-crystallized by laser annealing and has an electric field mobility as large as 300 cm2/Vs. This is a very large value in view of the fact that a MOS transistor formed on an ordinary single crystal silicon substrate has an electric field mobility of about 500 cm2/Vs. In contrast to the fact that a MOS circuit formed on a single crystal silicon has a limited operating speed due to parasitic capacitances between the substrate and the wiring, a TFT circuit, which is formed on an insulating substrate, is free of such a limitation, to assure a very-high-speed operation.
- Further, polycrystalline silicon can provide both NMOS TFTs and PMOS TFTs in a similar manner, to enable manufacture of a CMOS circuit. For example, in an active matrix type liquid crystal display device, a device having a monolithic structure is known in which not only an active matrix portion but also peripheral circuits (drivers etc.) are composed of CMOS polycrystalline TFTs.
- These features of the TFT are considered also in the above-mentioned TFTs used in a SRAM, in which PMOS TFTs are used as load transistors.
- The thickness of an active layer of a TFT should be 100-2,000 Å and, preferably, 200-1.000 Å. For example, in a doping step of TFTs, doping impurities need to be implanted into a layer of the above thickness at an optimum concentration. Further, in general, a gate insulating film formed on the active layer of a TFT should be 500-3.000 Å, which is thicker than that of a VLSI. Therefore, the direct application of a doping technique in the conventional semiconductor integrated circuit technologies, particularly through-doping, causes some difficulties. The through-doping, is a technique in which an active layer (semiconductor surface) is doped with a gate insulating film formed thereon.
- For example, in the case of implanting boron (mass number11) as P-type impurities, through-doping with ions of boron and hydrogen bromide can be performed at a relatively low acceleration voltage of less than 70 kV, for instance 40-65 kV, because they are light. However, in the case of implanting phosphorus (mass number 31) or arsenic (75) as N-type impurities, ions of phosphorus and hydrogen phosphide need to be accelerated at a high voltage of more than 80 kV, for instance 85-110 kV, because they are heavy. Where a substrate having an insulating surface is irradiated with ions having such a high energy, device characteristics are likely deteriorated by, for instance, charge-up of the substrate. In addition, where an organic material such as a resist is applied as a mask to a substrate to effect selective ion implantation, it may be carbonized to make its peeling difficult.
- In view of the above circumstances in the art, an object of the present invention is to provide a most suitable doping technique. More specifically, although not exclusively, it is an object of the present invention to form a CMOS device with a high efficiency.
- According to the invention, in the case of implanting a light element, for instance, boron, impurities are implanted into an active layer through a gate insulating film. On the other hand, in the case of implanting a heavy element such as phosphorus or arsenic into an active layer, doping is performed after at least a portion of the gate insulating film in a region for implantation is removed or made thinner to allow a sufficient amount of the heavy element to reach the active layer.
- With the above technique, the acceleration voltage of ions including heavy ions of phosphorus, arsenic or the like can be reduced to as low a voltage as 10-30 kV. Since an amount of ions which are conventionally absorbed by a gate insulting film now effectively reach a source and a drain, the necessary dose can be reduced. Further, as a result of these advantages, the invention can solve the charge-up problem and the difficulty of peeling off a mask material.
- FIGS.1(A)-1(E) show manufacturing steps according to a first embodiment of the present invention;
- FIGS.2(A)-2(E) show manufacturing steps according to a second embodiment of the invention;
- FIGS.3(A)-3(F) show manufacturing steps according to a third embodiment of the invention;
- FIGS.4(A) and 4(B) show liquid crystal display devices to which the manufacturing steps of FIGS. 2(A)-2(E) are to be applied;
- FIGS.5(A)-5(E) show manufacturing steps according to a fourth embodiment of the invention; and
- FIGS.6(A)-6(D) show manufacturing steps according to a fifth embodiment of the invention.
- The present invention will be hereinafter described in detail by way of several embodiments.
- Embodiment 1
- FIGS.1(A)-1(E) show steps for producing NMOS devices and PMOS devices according to a first embodiment of the invention. In this embodiment, TFTs were produced by a high-temperature process. First, a 2,000 Å thick
silicon oxide film 102 was formed, as an undercoat, on a quartz substrate 101 (105 mm (width)×105 mm (length)×1.1 mm (thickness)). An impurity non-doped amorphous silicon film of 100-2,000 Å, preferably 500-1.500 Å in thickness was formed by reduced-pressure CVD using disilane as a material. The substrate temperature in forming the amorphous silicon film was set at 150-550° C. - The amorphous silicon film was patterned into island-
like silicon regions silicon regions silicon oxide films - In the step of crystallizing the amorphous silicon film by thermal annealing, the crystallizing temperature could be lowered and a silicon film superior in crystallinity was obtained by adding a very small quantity of an element which facilitates the crystallization of amorphous silicon, such as nickel, cobalt and copper. In this case, it is preferred that the concentration of such a catalyst element be less than 1×1020 atoms/cm3 and typically, in the range of 1×1015 to 1×1019 cm−3.
- Subsequently, a silicon film which is doped with phosphorous at 1×1018 to 2×1020 cm−3, for instance 8×1019 cm−3 is formed to a thickness of 2,000-5,000 Å, preferably 3,500-4,000 Å, and is patterned into a
gate 107 of an N-channel TFT (NMOS) and agate 108 of a P-channel TFT (PMOS). Then, aphotoresist mask 109 was formed so as to cover the NMOS region (FIG. 1(A)). - Then, ions including boron were implanted by plasma doping. In the plasma doping, which is also called ion doping, a gas containing a doping impurity element is subjected to discharging to render it in a plasma state, and then guided out and accelerated by means of a high voltage so as to be implanted into an object. This doping method is characterized in that various kinds of ions are implanted because mass separation of ions is not effected, which is in contrast to the cases of other known ion implantation methods. For example, to implant boron, diborane is used as a gas. In this case, however, not only B (boron) ions, but also other ions of BH, BH2, and H are implanted.
- The plasma doping is a simple and convenient doping method and can be used for purposes where high accuracy is not required. In this embodiment. P-
type impurity regions 110 and 111 were formed by a doping operation in which the acceleration voltage was 30-70 kV, preferably 50-65 kV and the dose was 1×1014 to 6×1015 cm−2, preferably 5×1014 to 2×1015 cm−2. These regions serve as a source and a drain of the PMOS TFT (FIG. 1(B)). - After the boron doping, ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist
mask 109, and the resistmask 109 was removed by immersing it in a peeling liquid. Then, anew photoresist mask 112 was formed by a known photolithography method so that the island-like silicon region 103 of the NMOS TFT was exposed except its peripheral portion. The reason why the peripheral portion of thesilicon region 103 was covered with themask 112 is to prevent theundercoat film 102 from being etched in the following step of removing thesilicon oxide film 105. - Then, the
silicon oxide film 105 was etched using themask 112, to thereby expose the silicon region 103 (FIG. 1(C)). - Then, ions including phosphorus were implanted into the island-
like silicon region 103 by plasma doping. N-type impurity regions - After the formation of the
impurity regions mask 112, and the resistmask 112 was removed by being immersed in a peeling liquid. Since ions including phosphorus were implanted at a low acceleration voltage, the resistmask 112 was removed in a short time. Then, thermal annealing was performed at 650-1,050° C., for instance 750° C. to restore crystallinity of theimpurity regions interlayer insulating material 115, and metal wirings 116-119 were formed therein. As a result of the above steps, theNMOS TFT 120 and thePMOS TFT 121 were formed (FIG. 1(E)). - Embodiment 2
- Referring to FIGS.2(A)-2(E), a description will be made of a manufacturing process of a liquid crystal display having a CMOS circuit according to a second embodiment of the invention. In this embodiment, as show n in FIG. 4(A), a liquid crystal display device was formed on a
substrate 201 which device has a display circuit section (active matrix) 23 and its drive circuits (peripheral circuits, i.e., adata driver 21 and a gate driver 22). The drive circuits are constituted with CMOS circuits. More specifically, thedrive circuits active matrix 23 is formed in the central portion with PMOS TFTs. Thedriver circuits active matrix 23 throughgate lines 25 and data lines 25. - Alternatively, as shown in FIG. 4(B), peripheral circuits, i.e.,
data drivers gate drivers active matrix 23. - The
active matrix 23 is constituted withpixel cells 24 each having a PMOS TFT. The reason why PMOS TFTs are used in theactive matrix 23 is that they have a small source-drain leak current in a non-selected state and, therefore, are superior in the ability of retaining charge in the pixels. A manufacturing process of the device of FIG. 4(A) or 4(B) will be described with reference to FIGS. 2(A)-2(E). - A Corning 7059 glass was used as the
substrate 201. Although other various kinds of substrates can be used, a proper measure should be taken for each substrate to prevent movable ions such as sodium from entering a semiconductor film. The ideal substrate is a synthesized quartz substrate having a small alkali concentration. However, where it cannot be used in terms of the cost, low-alkali glass or non-alkali glass, each being on the market, may be used. In this embodiment, to prevent movable ions from entering from thesubstrate 201, asilicon oxide film 202 was formed on thesubstrate 201 at a thickness of 200-10,000 Å, for instance 2,000 Å. The thickness of thecoating 202 is designed in accordance with the degree of entrance of movable ions or their influences on an active layer. - Thereafter, an amorphous silicon film of 200-2,000 Å, for instance 1,000 Å in thickness was formed by plasma CVD by using monosilane as a starting material. The substrate temperature was set at 160-400° C., for instance 250° C. Further, a silicon oxide film of 200-1,000 Å in thickness was formed thereon as a protection film. The amorphous silicon film thus formed was crystallized by performing thermal annealing at 600° C. for 24 hours.
- To facilitate the crystallization of a top portion of the silicon film, it is desired that the concentration of each of carbon, nitrogen and oxygen that are contained in the silicon film to facilitate its crystallization be less than 7×1019 cm−3. In this embodiment, it was confirmed by a SIMS analysis that the concentration was less than 1×1017 cm−3.
- After the amorphous silicon film was converted to a crystalline structure by thermal annealing, the crystalline silicon film was etched into an appropriate pattern to form an island-
like semiconductor region 203 for a peripheral CMOS circuit and an island-like semiconductor region 204 for a pixel TFT. - Then, a gate insulating film (silicon oxide)205 was formed at a thickness of 500-3,000 Å, for instance 1,200 Å by sputtering in an oxygen atmosphere using silicon oxide as a target. The thickness of the
gate insulating film 205 is determined based on the operating conditions of the TFTs and the like. - Then, an aluminum film (including scandium by 0.05-0.5 wt %, preferably 0.1-0.3 wt %) was formed by sputtering at a thickness of 3,000 Å to 5 μm, for instance 5,000 Å, and patterned with a mixed acid (a phosphoric acid solution added with a 5% nitric acid), to form gate electrodes and wiring. The etching rate was 225 nm/min when the etching temperature was set at 40° C. Thus, the outer shapes of the TFTs were provided.
- Further, an aluminum oxide coating was formed on the surface of the aluminum wiring by anodic oxidation. The anodic oxidation was performed by a method invented by the present inventors and disclosed in U.S. Pat. No. 5,308,998 issued May 3, 1994. Details of the anodic oxidation may be modified according to the intended characteristics of the device, process conditions, investment scale, etc. In this embodiment, an
aluminum oxide coating 207 of 1,000-3,000 Åfor instance 2,000 Å in thickness was formed around thewiring 206 by the anodic oxidation. Thus, a gate electrode/wiring 208 for the NMOS TFT, a gate electrode/wiring 209 for the PMOS TFT, and a gate electrode/wiring 210 for the pixel TFT were formed (FIG. 2(A)). - Thereafter, ions including boron were implanted into the entire substrate by plasma doping. As for the doping conditions, the acceleration voltage was 30-70 kV, for instance 65 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 1×1015 cm−2. As a result, P-type impurity regions 211-215 were formed in the island-
like silicon regions 203 and 204 (FIG. 2(B)). - Then, the
silicon oxide film 205 was etched out with a buffered hydrofluoric acid solution, and aphotoresist mask 216 was formed. As in the case of the first embodiment, an opening was formed in thephotoresist 216 in an area that includes regions into which phosphorus is to be implanted (i.e., regions to become a source and a drain of the NMOS TFT). Then, ions including phosphorus were implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 1×1014 to 6×1015 cm−2, for example, 2×1015 cm−2. As a result, parts of theregions like silicon region 203 becameregions 217 and 218 (regions to become a source and a drain of the NMOS TFT) with their conductivity type changed from P to N. The other parts of the island -type silicon region 203, i.e.,regions 219 and 220 (regions to become a source and drain of the PMOS TFT) kept their conductivity type P. Aperipheral portion 211′ of the NMOS TFT also kept its conductivity type P. Entirely covered with the resist, theregions - After the formation of the impurity regions, ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist
mask 216, and the resistmask 216 was removed by being immersed in a peeling liquid. - Thereafter, the source and drain regions were re-crystallized by laser annealing with the gate portions used as a mask (FIG. 2(D)). The laser annealing was performed under conditions disclosed in, for instance. U.S. Pat. No. 5,308.998. In this embodiment, during the laser annealing, there exists no silicon oxide film or the like on the surface of the silicon film to be annealed, which means a reduced loss of laser light due to absorption. Sufficient annealing was observed even with a laser light energy density that is as low as 50-80% of that disclosed in the above publications, resulting in an improved laser processing ability.
- Thereafter, a
silicon oxide film 221 was formed, as an interlayer insulating film, by RF plasma CVD at a thickness of 3,000 Å to 3 μm, for instance 5,000 Å. Further, an ITO (indium tin oxide) film was formed by sputtering at a thickness of 500-1,000 Å, for instance 800 Å, and patterned by etching, to form apixel electrode 222 of the active matrix. - Then, openings were then formed in the
silicon oxide film 221 and aluminum wiring lines 223-227 were formed. Thus, the peripheral CMOS circuit and the pixel TFT were completed (FIG. 2(E)). - This embodiment is different from the first embodiment in that selective doping was not performed in the boron doping. Therefore, this embodiment eliminated one photolithography step and one mask material removing step. Further, since the silicon oxide film (gate insulating film)205 was removed completely in the phosphorus doping, the contact holes that were formed in the later step had the same depth for the NMOS TFT and the PMOS TFT.
- In this embodiment, the gate electrode is offset from the source and drain because of the anodic oxide film formed on the side faces of the gate electrode. As a result, the breakdown voltage was increased and the source-drain leak current was reduced.
- Embodiment 3
- FIGS.3(A)-3(F) show a third embodiment. First, a silicon oxide film of 1,000-3,000 Å in thickness was formed as an
undercoat oxide film 302 on a substrate 301 (Corning 7059, 300 mm×400 mm or 100 mm×100 mm). An amorphous silicon film of 100-3,000 Å, preferably 500-1,000 Å in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C. This step may be performed by laser beam illumination. The crystallized silicon film was patterned to form an island-like region 303 for an NMOS TFT and an island-like region 304 for a PMOS TFT. Further, asilicon oxide film 305 was formed thereon by sputtering at a thickness of 700-1,500 Å, for instance 1,200 Å. - Then, an aluminum film containing Si of 1 wt % or Sc of 0.1-0.3 wt % was formed at a thickness of 1,000 Å to 3 μm by electron beam evaporation or sputtering. A photoresist film (for instance, OFPR 800/30 cp produced by Tokyo Ohka Kogyo Co., Ltd.) was formed thereon by spin coating. If an aluminum oxide film of 100-1,000 Å in thickness was formed on the aluminum film by anodic oxidation before forming the photoresist film, good adhesiveness was provided between the aluminum film and the photoresist film and a porous anodic oxide film was effectively formed on the side faces of a gate electrode in a later anodic oxidation step due to a suppressed leak current through the photoresist film. Then, the photoresist film was patterned and the aluminum film was etched, to form
gate electrodes like regions Mask films mask films - Then, a porous
anodic oxide film 310 of 3,000-6,000 Å, for instance 5,000 Å in thickness was formed on the side faces of only thegate electrode 306 of the NMOS TFT by allowing a current to flow therethrough in an electrolytic solution (FIG. 3(A)). It is desired that a circuit be established which allows a current to flow through only the NMOS TFT. The anodic oxidation may be performed in an acid aqueous solution of citric acid (3-20%), nitric acid, phosphoric acid, chromic acid, sulfuric acid, or the like by applying a constant current with a voltage of 10-30 V to the gate electrode. In this embodiment, the anodic oxidation was performed for 20-40 minutes in an oxalic acid solution at 30° C. by applying 10 V. The thickness of the anodic oxide film was controlled by the anodic oxidation time. - After the
masks gate electrodes anodic oxide films gate electrodes anodic oxide films - It should be noted that although the barrier type anodic oxidation was performed in the later step, the barrier type
anodic oxide film 311 was formed between the porousanodic oxide film 310 and thegate electrode 306 rather than outside the porousanodic oxide film 310. - Accelerated ions including boron were implanted into the active layer over the entire surface of the above structure. As for the doping conditions, the acceleration voltage was 30-70 kV, for instance 65 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 5×1014 cm−2.
- As a result, P-type impurity regions313-316 were formed in the island-
like silicon regions 303 and 304 (FIG. 3(C)). - Then, the insulating
film 305 was etched by dry etching, wet etching, or some other method. In this etching- step, the portions of the insulatingfilm 305 covered with the anodic oxide films 310-312 and thegate electrodes gate electrodes film 305 is mainly made of silicon oxide, and dry etching is employed using a fluoride type etching gas (for instance, NF3 or SF6), the insulating film 305 (silicon oxide) is etched fast but the etching rates of aluminum oxide, tantalum oxide and titanium oxide are sufficiently small. Therefore, the insulatingfilm 305 can be etched selectively. - In the case of employing wet etching, a hydrofluoric acid type etchant such as a {fraction (1/100)} hydrofluoric acid may be used. Also in this case, the insulating
film 305 can be selectively etched, because the insulating film 305 (silicon oxide) is etched fast but the etching rates of aluminum oxide, tantalum oxide and titanium oxide are sufficiently small. - Then, the
anodic oxide films 310 were etched by a mixed acid of phosphoric acid, acetic acid and nitric acid. With this phosphoric acid type etchant, the etching rate of the porous anodic oxide was more than 10 times higher than that of the barrier type anodic oxide. Therefore, the barrier typeanodic oxide films gate electrodes anodic oxide films anodic oxide films 310 was about 600 Å/min. The portions of the gate insulating film (silicon oxide) 305 under the porousanodic oxide films 310 and the barrier typeanodic oxide films - Then, as in the case of the first embodiment, a
photoresist mask 317 was formed so as to cover the PMOS TFT region. Ions including arsenic were implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 1×1015 cm−2. As a result, the P-type regions like silicon region 303 were changed to N-type regions 318 and 319 (regions to become a source and a drain of the NMOS TFT). The P-type conductivity of theregions like silicon region 304 was not changed, because those regions were completely covered with the resist mask 317 (FIG. 3(D)). - Subsequently, ions including phosphorus were implanted by plasma doping in which the ion source, acceleration voltage and dose were changed. As for the doping conditions, the acceleration voltage was increased to 80-110 kV, for instance 90 kV, whereas the dose was reduced to 1×1013 to 1×1014 cm−2, for instance 5×1013. In this doping step, phosphorus ions passed through the insulating
film 305′ and reached the active layer, so that N-type regions regions - Thereafter, ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist
mask 317, and the resistmask 317 was removed by being immersed in a peeling liquid. In this embodiment, there might be a concern that the high acceleration energy of the high-speed ion implantation step causes carbonization of the resist, to make it difficult to peel off the resistmask 317. However, since the dose of high-speed ions was less than {fraction (1/10)} of that of low-speed ions, their influences on the resistmask 317 were sufficiently small and caused almost no problem in the actual process. - Then, as in the case of the second embodiment, impurity ions introduced in the active region were activated by illumination with KrF excimer laser light (wavelength: 248 nm; pulse width: 20 nsec).
- According to a SIMS (secondary ion mass spectrometry) method, the concentration of arsenic in the
regions regions - Then, a
silicon oxide film 322 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 Å to 3 μm, for instance 5,000 Å. Electrode formation openings were formed in thesilicon oxide film 322, and aluminum wiring lines 323-326 were formed. - In this embodiment, while the PMOS TFT had the same structure as that of the second embodiment, the NMOS TFT had a structure that is close to the lightly doped drain structure (hereinafter the
regions - It might be considered that it is preferable for the PMOS TFT to have high-resistivity regions similar to those of the NMOS TFT. This is not impossible and the invention does not deny its effectiveness. However, in practice, it is not preferable, because an actual drain current unduly decreases if the high-resistivity regions (serving as a resistor connected in series between the source and drain) are provided in spite of the fact that the electric field effect mobility of the PMOS TFT is usually about a half of that of the NMOS TFT.
- On the contrary, it is preferable to employ the ordinary structure in the PMOS TFT that is less likely to be deteriorated by hot carriers and form the high-resistivity regions only in the NMOS TFT that has a large mobility but is likely deteriorated by hot carriers, in which case actual drain currents of the NMOS TFT and the PMOS TFT are balanced properly. But this is not necessarily applied to TFTs that are produced according to less-than-submicron design rules, in which case deteriorations due to hot carriers are not negligible even in PMOS TFTs.
- Embodiment 4
- FIGS.5(A)-5(E) show a fourth embodiment. First, a silicon oxide film of 1,000-3,000 Å in thickness was formed as an
undercoat oxide film 502 on a substrate 501 (Corning 7059, 300 mm×400 mm or 100 mm×100 mm). An amorphous silicon film of 100-3,000 Å, preferably 500-1,000 Å in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C. The crystallized silicon film was patterned to form an island-like region 503 (for an NMOS TFT) and an island-like region 504 (for a PMOS TFT). Further, asilicon oxide film 505 was formed thereon by plasma CVD at a thickness of 700-1,500 Å, for instance 1,200 Å. - Then, an aluminum film (containing Si of 1 wt % or Sc of 0.1-0.3 wt %) was formed at a thickness of 1,000 Å to 3 μm by sputtering. The aluminum film was patterned to form a gate electrode/wiring506 (for the NMOS TFT) and a gate electrode/wiring 509 (for the PMOS TFT). Then, as in the case of the second embodiment, barrier type
anodic oxide films anodic oxidation film 507 on the gate electrode/wiring 506 of the NMOS TFT was made 2,000-3,000 Å and the thickness of theanodic oxidation film 509 on the gate electrode/wiring 508 of the PMOS TFT was made 500-1,000 Å (FIG. 5(A)). - Accelerated ions including boron were implanted into the active layer by plasma doping over the entire surface of the above structure. As for the doping conditions, the acceleration voltage was 30-70 kV, for instance 65 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 5×1014 cm−2. As a result, P-type impurity regions 510-513 were formed in the island-
like silicon regions 503 and 504 (FIG. 5(B)). - Thereafter, the insulating
film 505 was etched by dry etching, wet etching, or some other method. Then, as in the case of the first embodiment, aphotoresist mask 514 was formed so as to cover the PMOS TFT region. Ions including phosphorus were then implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 5×1014 to 5×1015 cm−2, for instance 1×1015 cm−2. As a result, the P-type regions like silicon region 503 were changed to N-type regions 515 and 516 (regions to become a source and a drain of the NMOS TFT). (FIG. 5(C) - Subsequently, ions including phosphorus were implanted by plasma doping in which the acceleration voltage and the dose were changed. As for the doping conditions, the acceleration voltage was increased to 65-110 kV, for instance 80 kV, whereas the dose was reduced to 1×1013 to 5×1014 cm−2, for instance 5×1013, which dose was more than one order lower than in the case of forming the source and drain. In this doping step, as indicated by dashed lines in FIG. 5(D), phosphorus ions passed through the active layer and reached the deep portion of the
undercoat film 502. Ions spread in the horizontal direction as well as in the vertical direction, because the ion directivity is not good in ion doping methods. However, since the dose was low in this doping step, the conductivity type of the resulting impurity regions was weak N, i.e., N− (FIG. 5(D)). - Although in this embodiment low-speed ions were implanted first and high-speed ions were then implanted, the order may apparently be reversed. Low-speed ions and high-speed ions may be implanted even at the same time. Further, the kinds of doping impurities that are implanted as high-speed ions and low-speed ions may be changed from those in this embodiment. For example, high-speed ions and low-speed ions may be highly diffusive phosphorus ions and arsenic ions that are relatively less likely to diffuse, respectively.
- Thereafter, ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist
mask 514, and the resistmask 514 was removed by being immersed in a peeling liquid. Then, as in the case of the second embodiment, impurity ions introduced in the active region were activated by illumination with KrF excimer laser light (wavelength: 248 nm; pulse width: 20 nsec). As a result, lower concentration N-type impurity regions type impurity regions regions regions - According to a SIMS (secondary ion mass spectrometry) analysis, the impurity concentration was 1×1020 to 2×1021 cm−3 in the
regions regions - The above concentrations correspond to doses of 5×1014 to 5×1015 cm−2 and 2×1013 to 5×1014 cm−2, respectively.
- Then, a
silicon oxide film 519 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 Å to 3 μm, for instance 5,000 Å. Electrode formation openings were formed in thesilicon oxide film 519, and aluminum wiring lines 520-523 were formed. - In this embodiment, due to different thicknesses of the
anodic oxide films regions regions - Embodiment 5
- FIGS.6(A)-6(D) show a fifth embodiment. First, a silicon oxide film of 1,000-3,000 Å in thickness was formed as an
undercoat oxide film 602 on a substrate 601 (NA35 produced by NH Technoglass Corp., 300 mm×400 mm or 100 mm×100 mm). An amorphous silicon film of 100-3,000 Å, preferably 500-1,000 Å in thickness was deposited thereon by plasma CVD or LPCVD, and was crystallized by being left for 24 hours in a reducing atmosphere of 550-600° C. The crystallized silicon film was patterned to form an island-like region 603 for an NMOS TFT and an island-like rejoin 604 for a PMOS TFT. Further, asilicon oxide film 605 was formed thereon by plasma CVD at a thickness of 700-1,500 Å, for instance 1,200Å. - Then, an N-type polycrystalline silicon film was deposited by a reduced pressure CVD at a thickness of 500-2,000 Å, and a tungsten silicide film, a molybdenum silicide film, or titanium silicide film was formed thereon by sputtering at a thickness of 2,000 Å to 3 μm. These films were patterned to form gate electrode/wirings comprising
silicon films coatings - Accelerated ions including boron were implanted into the active layer over the entire surface of the above structure. As for the doping conditions, the acceleration voltage was 30-70 kV, for instance 65 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 5×1014 cm−2. As a result, P-type impurity regions 610-613 were formed in the island-
like silicon regions 603 and 604 (FIG. 6(B)). - Thereafter, the insulating
film 605 was etched by dry etching, wet etching, or some other method. Then, as in the case of the first embodiment, aphotoresist mask 614 was formed so as to cover the PMOS TFT region. Ions including phosphorus were then implanted by plasma doping. As for the doping conditions, the acceleration voltage was 10-30 kV, for instance 10 kV, and the dose was 1×1014 to 6×1015 cm−2, for instance 1×1015 cm−2. As a result, the P-type regions like silicon region 603 were changed to N-type regions 615 and 616 (regions to become a source and a drain of the NMOS TFT). (FIG. 6(C)) - Thereafter, ashing was performed in oxygen plasma to lightly oxidize and then remove a surface layer of the resist
mask 614, and the resistmask 614 was removed by being immersed in a peeling liquid. Then, as in the case of the second embodiment, impurity ions introduced in the active region were activated by illumination with KrF excimer laser light (wavelength: 248 nm; pulse width: 20 nsec). Then, asilicon oxide film 617 was formed as an interlayer insulating film by RF plasma CVD at a thickness of 3,000 Å to 3 μm, for instance 5,000 Å. Openings were formed in thesilicon oxide film 617, and aluminum wiring lines 618-621 were formed therein. - Although the above embodiments are directed to only the case of forming TFTs on a glass substrate or the like, it is apparent that the invention can also be applied to a three-dimensional integrated circuit in which an integrated circuit is formed, via an insulating film, on another integrated circuit that is formed in a surface portion of a single crystal semiconductor.
- In addition, the invention can be applied to not only MIS circuits but also manufacture of bipolar transistors. For example, an NPN bipolar transistor can be produced such that a base is formed by selectively implanting boron ions into an N-type semiconductor coating through a silicon oxide film and adding phosphorus after removing or thinning the silicon oxide film. This type of bipolar transistors can be formed on the same substrate as a MIS device, to produce a Bi-CMOS circuit.
- While various embodiments have been described it is to be understood that the scope of the present invention A ill be limited only by the appended claims and that many modifications may be made within the concept of the invention.
Claims (64)
1. A method of forming a semiconductor device comprising the steps of:
forming a semiconductor island over a substrate having an insulating surface, said semiconductor island having at least one region for a channel region;
forming an insulating film on said semiconductor island;
forming at least one gate electrode adjacent to said region for the channel region;
introducing ions including boron into said semiconductor island in a self-alignment manner with respect to said gate electrode through said insulating film;
etching a portion of said insulating film uncovered by at least said gate electrode to expose a selected portion of said semiconductor island, said selected portion excluding the channel region; and
introducing ions including phosphorus into said selected portion of said semiconductor island.
2. A method according to claim 1 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
3. A method according to claim 1 wherein said ions including boron are originated from B2H6 gas.
4. A method according to claim 1 wherein said ions including phosphorus are originated from PH3 gas.
5. A method according to claim 1 wherein the step of introducing said ions including boron is performed with a larger accelerating voltage than the step of introducing the ions including phosphorus.
6. A method according to claim 5 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 30-70 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-30 kV.
7. A method according to claim 5 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 50-65 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-20 kV.
8. A method according to claim 1 wherein the step of introducing the ions including boron is performed with a smaller dose than the step of introducing the ions including phosphorus.
9. A method according to claim 8 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
10. A method according to claim 1 wherein said semiconductor device is a top-gate type MOS transistor.
11. A method for manufacturing a semiconductor device comprising the steps of:
forming a semiconductor layer over a substrate having an insulating surface, said semiconductor layer comprising at least channel, source, and drain regions;
forming an insulating film on said semiconductor layer;
forming a gate electrode adjacent to said channel region;
introducing ions including boron into said semiconductor layer through said insulating film;
removing at least one portion of said insulating film to expose at least one selected portion of said semiconductor layer, said selected portion excluding said channel region;
introducing ions including phosphorus into said selected portion,
wherein an accelerating voltage for the step of introducing the ions including boron is higher than that for the step of introducing the ions including phosphorus.
12. A method according to claim 11 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
13. A method according to claim 11 wherein said ions including boron are originated from B2H6 gas.
14. A method according to claim 11 wherein said ions including phosphorus are originated from PH3 gas.
15. A method according to claim 11 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 30-70 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-30 kV.
16. A method according to claim 11 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 50-65 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-20 kV.
17. A method according to claim 11 wherein the step of introducing the ions including boron is performed with a smaller dose than the step of introducing the ions including phosphorus.
18. A method according to claim 17 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
19. A method according to claim 11 wherein said semiconductor device is a top-gate type MOS transistor.
20. A method of forming a semiconductor device comprising the steps of:
forming at least one semiconductor island over a substrate having an insulating surface;
forming an insulating film on said semiconductor island;
introducing ions including boron into said semiconductor island in a self-alignment manner with respect to a gate electrode through said insulating film at a first accelerating voltage;
etching a portion of said insulating film to expose a selected portion of said semiconductor island; and
introducing ions including phosphorus into said selected portion of said semiconductor island at a second accelerating voltage,
wherein said second accelerating voltage is lower that said first accelerating voltage.
21. A method according to claim 20 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
22. A method according to claim 20 wherein said ions including boron are originated from B2H6 gas.
23. A method according to claim 20 wherein said ions including phosphorus are originated from PH3 gas.
24. A method according to claim 20 wherein said first accelerating voltage is 30-70 kV and said second accelerating voltage is 10-30 kV.
25. A method according to claim 20 wherein said first accelerating voltage is 50-65 kV and said second accelerating voltage is 10-20 kV.
26. A method according to claim 20 wherein the step of introducing the ions including boron is performed with a smaller dose than the step of introducing the ions including phosphorus.
27. A method according to claim 26 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
28. A method according to claim 20 wherein said semiconductor device is a top-gate type MOS transistor.
29. A method of manufacturing a semiconductor device having at least one CMOS transistor comprising a P-channel transistor and N-channel transistor, said method comprising the steps of:
forming a pair of semiconductor islands over a substrate having an insulating surface, each of said semiconductor islands comprising at least one channel region;
forming an insulating film over an entire surface of said semiconductor islands;
forming at least one gate electrode adjacent to said channel region in each of the semiconductor islands;
introducing ions including boron into each of said semiconductor islands through said insulating film using said gate electrode as a first mask;
removing said insulating film using said first mask to expose at least one portion of the semiconductor islands;
introducing ions including phosphorus into the exposed portion of one of said semiconductor islands while the other one of the semiconductor islands is covered with a second mask.
30. A method according to claim 29 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
31. A method according to claim 29 wherein said ions including boron are originated from B2H6 gas.
32. A method according to claim 29 wherein said ions including phosphorus are originated from PH3 gas.
33. A method according to claim 29 wherein the step of introducing said ions including boron is performed with a larger accelerating voltage than the step of introducing the ions including phosphorus.
34. A method according to claim 33 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 30-70 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-30 kV.
35. A method according to claim 33 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 50-65 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-20 kV.
36. A method according to claim 29 wherein the step of introducing the ions including boron is performed with a smaller dose than the step of introducing the ions including phosphorus.
37. A method according to claim 36 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
38. A method according to claim 29 wherein said CMOS transistor is top-gate type.
39. A method of manufacturing CMOS transistors comprising a P-channel transistor and an N-channel transistor, said method comprising the steps of:
forming a pair of semiconductor islands over an insulating surface;
forming at least one gate electrode adjacent to said semiconductor islands with an insulating film interposed therebetween;
performing a first ion doping of ions including boron into each of said semiconductor islands through said insulating film at a first dose amount;
etching portions of said insulating film after said first ion doping;
performing a second ion doping of ions including phosphorous into one of said semiconductor islands after said etching,
wherein a second dose amount is larger than said first dose amount.
40. A method according to claim 39 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
41. A method according to claim 39 wherein said ions including boron are originated from B2H6 gas.
42. A method according to claim 39 wherein said ions including phosphorus are originated from PH3 gas.
43. A method according to claim 39 wherein the first ion doping is performed with a larger accelerating voltage than the second ion doping.
44. A method according to claim 43 wherein the first ion doping is performed with an accelerating voltage of 30-70 kV and the second ion doping is performed with an accelerating voltage of 10-30 kV.
45. A method according to claim 43 wherein the first ion doping is performed with an accelerating voltage of 50-65 kV and the second ion doping is performed with an accelerating voltage of 10-20 kV.
46. A method according to claim 39 wherein said first dose amount is 1×1014-1×1015 cm−2 and said second dose amount is 1×1014-1×1015 cm−2.
47. A method according to claim 39 wherein said CMOS transistor is top-gate type.
48. A method of manufacturing a complementary semiconductor device having at least an N-MOS TFT and a P-MOS TFT, said method comprising the steps of:
patterning a semiconductor film formed over a substrate having an insulating surface into at least first and second semiconductor islands, each of said semiconductor islands including a channel region;
forming an insulating film on said first and second semiconductor islands;
forming a gate electrode adjacent to the channel region of each of said semiconductor islands;
introducing ions including boron into both of said semiconductor islands using at least one first mask;
removing potions of said insulating film; and
introducing ions into phosphorus into regions of one of said semiconductor islands using at least one second mask,
wherein an accelerating voltage of said step of introducing ions including boron is larger than that of said step of introducing ions including phosphorus.
49. A method according to claim 48 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
50. A method according to claim 48 wherein said ions including boron are originated from B2H6 gas.
51. A method according to claim 48 wherein said ions including phosphorus are originated from PH3 gas.
52. A method according to claim 48 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 30-70 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-30 kV.
53. A method according to claim 48 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 50-65 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-20 kV.
54. A method according to claim 48 wherein the step of introducing the ions including boron is performed with a smaller dose than the step of introducing the ions including phosphorus.
55. A method according to claim 54 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
56. A method according to claim 48 wherein both said N-MOS TFT and said P-MOS TFT are top-gate type.
57. A method of manufacturing a complementary semiconductor device having at least an N-MOS TFT and a P-MOS TFT, said method comprising the steps of:
forming at least first and second semiconductor islands over a substrate having an insulating surface, each of said semiconductor islands including a channel region;
forming an insulating film on said first and second semiconductor islands;
introducing ions including boron into both of said semiconductor islands through said insulating film using at least one first mask;
removing at least one portion of said insulating film; and
introducing ions including phosphorus into at least one exposed region of one of said semiconductor islands using at least one second mask,
wherein an accelerating voltage of said step of introducing ions including boron is larger than that of said step of introducing ions including phosphorus, and
wherein a dose of said step of introducing ions including boron is smaller than that of said step of introducing ions including phosphorus.
58. A method according to claim 57 wherein said ions including boron contain B ions, BH ions, and BH2 ions.
59. A method according to claim 57 wherein said ions including boron are originated from B2H6 gas.
60. A method according to claim 57 wherein said ions including phosphorus are originated from PH3 gas.
61. A method according to claim 57 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 30-70 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-30 kV.
62. A method according to claim 57 wherein the step of introducing said ions including boron is performed with an accelerating voltage of 50-65 kV and the step of introducing the ions including phosphorus is performed with an accelerating voltage of 10-20 kV.
63. A method according to claim 57 wherein the step of introducing said ions including boron is performed with a dose of 1×1014-1×1015 cm−2 and the step of introducing the ions including phosphorus is performed with a dose of 1×1014-1×1015 cm−2.
64. A method according to claim 57 wherein both said N-MOS TFT and said P-MOS TFT are top-gate type.
Applications Claiming Priority (4)
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JP6-12150 | 1994-01-08 | ||
JP6012150A JP2873660B2 (en) | 1994-01-08 | 1994-01-08 | Manufacturing method of semiconductor integrated circuit |
GBGB9702857.5 | 1997-02-12 | ||
GB9702857 | 1997-02-12 |
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US08/367,427 Division US5904509A (en) | 1994-01-08 | 1994-12-30 | Method of manufacturing a thin film transistor using anodic oxidation |
PCT/GB1998/000311 Division WO1998036128A1 (en) | 1997-02-12 | 1998-02-12 | Porous web material |
US09/367,427 Division US6548433B1 (en) | 1997-02-12 | 1998-02-12 | Porous web material |
Publications (2)
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US20020045302A1 true US20020045302A1 (en) | 2002-04-18 |
US6391694B1 US6391694B1 (en) | 2002-05-21 |
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US08/367,427 Expired - Fee Related US5904509A (en) | 1994-01-08 | 1994-12-30 | Method of manufacturing a thin film transistor using anodic oxidation |
US09/257,049 Expired - Lifetime US6391694B1 (en) | 1994-01-08 | 1999-02-25 | Manufacturing method of semiconductor integrated circuit |
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Also Published As
Publication number | Publication date |
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JPH07202213A (en) | 1995-08-04 |
JP2873660B2 (en) | 1999-03-24 |
US6391694B1 (en) | 2002-05-21 |
US5904509A (en) | 1999-05-18 |
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