|Publication number||US20050274693 A1|
|Application number||US 11/123,087|
|Publication date||Dec 15, 2005|
|Filing date||May 6, 2005|
|Priority date||May 7, 2004|
|Also published as||CN1700100A, CN101073034A, CN101073034B, EP1594001A1, EP1743217A2, EP1743217B1, US7972553, US7997890, US20070164487, US20080030700, WO2005109095A2, WO2005109095A3|
|Publication number||11123087, 123087, US 2005/0274693 A1, US 2005/274693 A1, US 20050274693 A1, US 20050274693A1, US 2005274693 A1, US 2005274693A1, US-A1-20050274693, US-A1-2005274693, US2005/0274693A1, US2005/274693A1, US20050274693 A1, US20050274693A1, US2005274693 A1, US2005274693A1|
|Inventors||Babak Heidari, Marc Beck|
|Original Assignee||Babak Heidari, Marc Beck|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (26), Referenced by (44), Classifications (31), Legal Events (1)|
|External Links: USPTO, USPTO Assignment, Espacenet|
The invention relates to a device in connection with the lithography of structures on a micro or nanometre scale. In particular, the invention relates to imprint lithography on substrates or objects.
The trend in microelectronics, as well as in micromechanics, is towards ever smaller dimensions. Some of the most interesting techniques for fabrication of micro and submicro structures include different types of lithography.
Photolithography typically involves the steps of coating a substrate with a photoresist material to form a resist layer on a surface of the substrate. The resist layer is then exposed to radiation at selective portions, preferably by using a mask. Subsequent developing steps remove portions of the resist, thereby forming a pattern in the resist corresponding to the mask. The removal of resist portions exposes the substrate surface, which may be processed by e.g. etching, doping, or metallisation. For fine scale replication, photolithography is limited by diffraction, which is dependent on the wavelength of the radiation used. For fabrication of structures on a scale of less than 50 nm, such a short wavelength is needed that the material requirements on the optical systems will be major.
An alternative technique is imprint technology. In an imprint lithography process, a substrate to be patterned is covered by a mouldable layer. A pattern to be transferred to the substrate is predefined in three dimensions on a stamp or template. The stamp is brought into contact with the mouldable layer, and the layer is softened, preferably by heating. The stamp is then pressed into the softened layer, thereby making an imprint of the stamp pattern in the mouldable layer. The layer is cooled down until it hardens to a satisfactory degree followed by detachment and removal of the stamp. Subsequent etching may be employed to replicate the stamp pattern in the substrate. The steps of heating and cooling the combined stamp and substrate can bring about movement in the engaging surfaces due to heat expansion. The larger the area to be imprinted, the larger the actual expansion and contraction, which can make the imprint process more difficult for larger surface areas.
A different form of imprint technology, generally known as step and flash imprint lithography has been proposed by Willson et al. in U.S. Pat. No. 6,334,960, and also by Mancini et al in U.S. Pat. No. 6,387,787. Similar to the imprint technique briefly described above, this technique involves a template having a structured surface defining a pattern to be transferred to a substrate. The substrate is covered by a layer of polymerisable fluid, into which layer the template is pressed such that the fluid fills recesses in the pattern structure. The template is made from a material which is transparent to a radiation wavelength range which is usable for polymerising the polymerisable fluid, typically UV light. By applying radiation to the fluid through the template, the fluid is solidified. The template is subsequently removed, after which the pattern thereof is replicated in the solid polymer material layer made from the polymerised fluid. Further processing transfers the structure in the solid polymer material layer to the substrate.
WO 02/067055 to Board of Regents, the University of Texas System, discloses a system for applying step and flash imprint lithography. Among other things, this document relates to production-scale implementation of a step and flash apparatus, also called a stepper. The template used in such an apparatus has a rigid body of transparent material, typically quartz. The template is supported in the stepper by flexure members, which allow the template to pivot about both X and Y axes, which are mutually perpendicular in a plane parallel to the substrate surface to be imprinted. This mechanism also involves a piezo actuator for controlling parallelism and the gap between the template and the substrate. Such a system is, however, not capable of handling large area substrate surfaces in a single imprint step. A step and flash system offered on the market is the IMPRIO 100, provided by Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, Tex. 78758, U.S.A. This system has a template image area of 25×25 mm, and a street width of 0.1 mm. Although this system is capable of handling substrate wafers of up to 8 inches, the imprint process has to be repeated by lifting the template, moving it sideways, and lowering it to the substrate again, by means of an X-Y translation stage. Furthermore, for each such step, renewed alignment as well as new deposition of polymerisable fluid has to be performed. This technique is therefore very time-consuming, and less than optimum for large scale production. Furthermore, besides problems of repeated alignment errors, and high accuracy demands on the translation stage, this technique suffers from the drawback that continuous structures which are larger than said template size cannot be produced. All in all, this means the productions costs may be too high to make this technique interesting for large scale production of fine structure devices.
Accordingly, an object of the present invention is to provide methods and means for improving fabrication of structures comprising three-dimensional features on a micro or nanometre scale. In particular, it is an object to provide improved methods and means for transferring a pattern of such structures to substrates having widths of more than one inch, and even for 8 inch diameters, 12 inch diameters, and larger. An aspect of this object is to provide an apparatus and an associated process which is more cost effective and more versatile.
According to a first aspect, this object is fulfilled by an apparatus for transferring a pattern from a template having a structured surface to a substrate carrying a surface layer of a radiation polymerisable fluid, said apparatus comprising a first main part and a second main part having opposing surfaces, means for adjusting a spacing between said main parts, support means for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source devised to emit radiation into said spacing, a cavity having a first wall comprising a flexible membrane devised to engage said template or substrate, means for applying an adjustable overpressure to a medium present in said cavity, and a heater device having a surface facing said spacing. Due to the flexible membrane, an absolutely even distribution of force is obtained over the whole of the contact surface between the substrate and the template, whereby patterning of large area substrates in a single imprint step is made possible.
Preferably, said radiation source is positioned in said first main part, devised to emit radiation into said spacing from a first direction, and said heater device is positioned in said second main part, having said surface of the heater device facing said spacing from a second direction, opposite said first direction.
In one embodiment, said heater device comprises a heating element, connected to an energy source.
In one embodiment, said heater device comprises a cooling element, connected to a cooling source.
Preferably, said medium comprises a gas or a liquid.
In one embodiment, said medium comprises air.
In one embodiment, said means for applying an adjustable overpressure is arranged to adjust the pressure to 1-500 bar.
Preferably, said cavity is defined by a part of the surface of said first main part, a flexible seal member arranged in and protruding from said first main part surface, and said membrane which engages said seal member.
In a preferred embodiment, said membrane is disconnectable from said seal member, and devised to engage said seal member by application of pressure from said second main part.
Preferably, said membrane is transparent to a wavelength range of said radiation, said radiation source being positioned behind said membrane.
In one embodiment, said membrane and at least a portion of said surface of said first main part is transparent to a wavelength range of said radiation, said radiation source being positioned behind said portion of said surface of said first main part.
In a preferred embodiment, said portion of said surface of said first main part is made from quartz, calcium fluoride or any other pressure stable material being transparent to said radiation.
Preferably, said radiation source is devised to emit radiation at least in a wavelength range of 100-500 nm.
In a preferred embodiment, said radiation source is air-cooled and devised to emit pulsating radiation with a pulse duration of 0.5-10 μs and a pulse rate of 1-10 pulses per second.
In one embodiment, said membrane consists of a polymer material.
In a preferred embodiment, said membrane has a diameter or width of 50-1000 mm.
In one embodiment, said substrate acts as said membrane.
According to a second aspect, the object of the present invention is fulfilled by a method for transferring a pattern from a template having a structured surface to a substrate carrying a surface layer of a radiation polymerisable fluid, comprising the steps of:
In a preferred embodiment, the method further comprises the step of:
Preferably, said medium comprises a gas or a liquid.
In one embodiment, said medium comprises air.
Preferably, the method comprises the step of:
In a preferred embodiment, the method comprises the step of:
Preferably, the method comprises the steps of:
Alternatively, the method may comprise the steps of:
In a preferred embodiment, the method comprises the step of:
Preferably, the method comprises the step of:
In one embodiment, the step of exposing said layer comprises the step of:
In a preferred embodiment, the method comprises the steps of:
In one embodiment, the method comprises the step of:
In another embodiment, the method comprises the step of:
In yet another embodiment, the method comprises the step of:
According to a third aspect, the object of the present invention is fulfilled by a method for transferring a pattern from a template having a structured surface to a substrate carrying a surface layer of a radiation polymerisable fluid, wherein said template includes protrusions defining a pattern, which protrusions have non-transparent layers at outer ends, comprising the steps of:
In a preferred embodiment, the method further comprises the step of:
The invention will be described in greater detail below with reference to the accompanying drawings, on which:
The present invention relates, in general, to a method of transferring a pattern from a template to a substrate, by creating a relief image of a structure on a surface of the template on a surface of the substrate. The surface of the template and the surface of the substrate are in this process arranged generally parallel to each other, and the transfer of the pattern is obtained by pressing the structured template surface into a formable layer disposed on the substrate surface. The formable layer is treated to solidify, such that its shape is forced to resemble the template surface. The template can thereafter be removed from the substrate and its layer, said layer now being an inverted topographical replica of the template. In order to permanent the transferred pattern in the substrate, further processing may be required. Typically, wet or dry etching is performed to selectively etch the surface of the substrate under the solidified layer, whereby the pattern in the solidified layer is transferred to the substrate surface. This much is state of the art, and is well described in prior art documents, such as the aforementioned U.S. Pat. No. 6,334,960.
Substrate 12 is positioned on a heater device 20. Heater device 20 preferably comprises a heater body 21 of metal, e.g. aluminium. A heater element 22 is connected to or included in heater body 21, for transferring thermal energy to heater body 21. In one embodiment, heater element 22 is an electrical immersion heater inserted in a socket in heater body 21. In another embodiment, an electrical heating coil is provided inside heater body 21, or attached to a lower surface of heater body 21. In yet another embodiment, heating element 22 is a formed channel in heater body 21, for passing a heating fluid through said channel. Heater element 22 is further provided with connectors 23 for connection to an external energy source (not shown). In the case of electrical heating, connectors 23 are preferably galvanic contacts for connection to a current source. For an embodiment with formed channels for passing a heating fluid, said connectors 23 are preferably conduits for attachment to a heated fluid source. The heating fluid may e.g. be water, or an oil.
Heater body 21 is preferably a piece of cast metal, such as aluminium, stainless steel, or other metal. Furthermore, a body 21 of a certain mass and thickness is preferably used such that an even distribution of heat at an upper side of heater device 20 is achieved, which upper side is connected to substrate 12 for transferring heat from body 21 through substrate 12 to heat layer 14. For an imprint process used to imprint 2.5″ substrates, a heater body 21 of at least 2.5″ diameter, and preferably 3″ or more, is used, with a thickness of at least 1 cm, preferably at least 2 or 3 cm. For an imprint process used to imprint 6″ substrates, a heater body 21 of at least 6″ diameter, and preferably 7″ or more, is used, with a thickness of at least 2 cm, preferably at least 3 or 4 cm. Heater device 20 is preferably capable of heating heater body 21 to a temperature of 200-300° C., though lower temperatures will be sufficient for most processes.
For the purpose of providing controlled cooling of layer 14, heater device 20 is further provided with a cooling element 24 connected to or included in heater body 21, for transferring thermal energy from heater body 21. In a preferred embodiment, cooling element 24 comprises a formed channel or channels in heater body 21, for passing a cooling fluid through said channel or channels. Cooling element 24 is further provided with connectors 25 for connection to an external cooling source (not shown). Preferably, said connectors 25 are conduits for attachment to a cooling fluid source. Said cooling fluid is preferably water, but may alternatively be an oil, e.g. an insulating oil, or any other suitable coolant.
Examples of available and usable polymerisable or curable fluids for layer 14 comprise NIP-K17 and NIP-K22 from ZEN Photonics, 104-11 Moonj i-Dong, Yusong-Gu, Daejeon 305-308, South Korea. NIP-K17 has a main component of acrylate, and has a viscosity at 25° C. of about 9.63 cps. NIP-K22 also has a main component of acrylate, and a viscosity at 25° C. of about 5.85 cps. Both substances are devised to cure under exposure to ultraviolet radiation above 12 mW/cm2 for 2 minutes.
Another example of an available and usable polymerisable fluid for layer 14 is Ormocore from Micro Resist Technology GmbH, Koepenicker Strasse 325, Haus 211, D-12555 Berlin, Germany. This substance has a composition of inorganic-organic hybrid polymer, unsaturated, with a 1-3% photopolymerisation initiator. Viscosity is 3-8 mPas at 25° C., and the fluid may be cured under exposure of radiation with 500 mJ/cm2 at a wavelength of 365 nm. Other examples of polymerisable materials are mentioned in U.S. Pat. No. 6,334,960.
The thickness of layer 14 when deposited on the substrate surface is typically 10 nm-10 μm, depending on application area. The polymerisable fluid may be applied by spin coating, roller coating, dip coating or similar. A typical advantage with the present invention, compared to the prior art step and flash method, is that the polymer fluid may be spin coated on the entire substrate, which is an advantageous and fast process. The step and flash method, on the other hand, has to use repeated dispensation by dripping on repeated surface portions, since that method is incapable of handling large surfaces in single steps.
The arrows of
The template 10 is thereafter removed, e.g. by a peeling and pulling process. The formed and solidified polymer layer 14′ remains on the substrate 12. The various different ways of further processing of the substrate and its layer 14′ will not be dealt with here in any detail, since the invention as such is neither related to such further processing, nor is it dependent on how such further processing is achieved.
The apparatus 100 comprises a first main part 101 and a second main part 102. In the illustrated preferred embodiment these main parts are arranged with the first main part 101 on top of second main part, with an adjustable spacing 103 between said main parts. When making a surface imprint by a process as illustrated in
The first, upper, main part 101 has a downwards facing surface 104, and the second, lower, main part 102 has an upwards facing surface 105. Upwards facing surface 105 is, or has a portion that is, substantially flat, and which is placed on or forms part of a plate 106 which acts as a support structure for a template or a substrate to be used in an imprint process, as will be more thoroughly described in conjunction with
Means for adjusting spacing 103 are, in the illustrated embodiment, provided by a piston member 107 attached at its outer end to plate 106. Piston member 107 is displaceably linked to a cylinder member 108, which preferably is held in fixed relation to first main part 101. As is indicated by the arrow in the drawing, the means for adjusting spacing 103 are devised to displace second main part 102 closer to or farther from first main part 101, by means of a movement substantially perpendicular to the substantially flat surface 105, i.e. in the Z direction. Displacement may be achieved manually, but is preferably assisted by employing either a hydraulic or pneumatic arrangement. The illustrated embodiment may be varied in a number of ways in this respect, for instance by instead attaching plate 106 to a cylinder member about a fixed piston member. It should further be noted that the displacement of second main part 102 is mainly employed for loading and unloading the apparatus 100 with a template and a substrate, and for arranging the apparatus in an initial operation position. The movement of second main part 102 is, however, preferably not included in the actual imprint process as such in the illustrated embodiment, as will be described.
First main part 101 comprises a peripheral seal member 108, which encircles surface 104. Preferably, seal member 108 is an endless seal such as an o-ring, but may alternatively be composed of several interconnected seal members which together form a continuous seal 108. Seal member 108 is disposed in a recess 109 outwardly of surface 104, and is preferably detachable from said recess. The apparatus further comprises a radiation source 110, in the illustrated embodiment disposed in the first main part 101 behind surface 104. Radiation source 110 is connectable to a radiation source driver 111, which preferably comprises or is connected to a power source (not shown). Radiation source driver 111 may be included in the apparatus 100, or be an external connectable member. A surface portion 112 of surface 104, disposed adjacent to radiation source 110, is formed in a material which is transparent to radiation of a certain wavelength or wavelength range of radiation source 110. This way, radiation emitted from radiation source 110 is transmitted towards spacing 103 between first main part 101 and second main part 102, through said surface portion 112. Surface portion 112, acting as a window, may be formed in available fused silica, quartz, or glass used for CD/DVD mastering.
In operation, apparatus 100 is further provided with a flexible membrane 113, which is substantially flat and engages seal member 108. In a preferred embodiment, seal member 113 is a separate member from seal member 108, and is only engaged with seal member 108 by applying a counter pressure from surface 105 of plate 106, as will be explained. However, in an alternative embodiment, membrane 113 is attached to seal member 108, e.g. by means of a cement, or by being an integral part of seal member 108. Furthermore, in such an alternative embodiment, membrane 113 may be firmly attached to main part 101, whereas seal 108 is disposed outwardly of membrane 113. For an embodiment such as the one illustrated, also membrane 113 is formed in a material which is transparent to radiation of a certain wavelength or wavelength range of radiation source 110. This way, radiation emitted from radiation source 110 is transmitted into spacing 103 through said cavity 115 and its boundary walls 104 and 113. Examples of usable materials for membrane 113, for the embodiment of
A conduit 114 is formed in first main part 101 for allowing a fluid medium to pass to a space defined by surface 104, seal member 108 and membrane 113, which space acts as a cavity 115 for said fluid medium. Conduit 114 is connectable to a pressure source 116, such as a pump, which may be an external or a built in part of apparatus 100. Pressure source 116 is devised to apply an adjustable pressure, in particular an overpressure, to a fluid medium contained in said cavity 115. An embodiment such as the one illustrated is suitable for use with a gaseous pressure medium. Preferably, said medium is selected from the group containing air, nitrogen, and argon. If instead a liquid medium is used, it is preferred to have the membrane attached to seal member 108. Such a liquid may be a hydraulic oil.
Once main parts 101 and 102 are engaged to clamp membrane 113, cavity 115 is sealed. Pressure source 116 is then devised to apply an overpressure to a fluid medium in cavity 115. The pressure in cavity 115 is transferred by membrane 113 to template 10, which is pressed towards substrate 12 for imprinting the template pattern in the polymerisable fluid layer 14, cf.
When template 10 and substrate 12 have been brought together by means of the applied fluid medium pressure, radiation source is triggered to emit radiation 19. The radiation is transmitted through surface portion 112, which acts as a window, through cavity 115, membrane 113, and template 10. The radiation is partly or completely absorbed in the layer 14 of polymerisable fluid, which thereby is solidified in the perfectly parallel arrangement between template 10 and substrate 12, provided by the pressure and membrane assisted compression. Radiation exposure time is dependent on the type and amount of fluid in layer 14, the radiation wavelength combined with the type of fluid, and of the radiation power. The feature of solidifying such a polymerisable fluid is well known as such, and the relevant combinations of the mentioned parameters are likewise known to the skilled person. Once the fluid has solidified to form a layer 14′, further exposure has no major effect. However, dependent on the type of polymerisable fluid, post-baking at an elevated temperature of 150-160° C. may be necessitated for a time period of 0.5-1 hour. With the apparatus 100 according to the present invention, post-baking may be performed in the imprint machine 100, which means that it is not necessary to bring the substrate out of the apparatus and into a separate oven. This saves one process step, which makes both time and cost savings possible in the imprint process. For the example of MRL 6000, post-baking is typically performed at 100-120° C. for about 10 minutes. By performing the post-baking step while the template 10 is still held with the selected pressure towards substrate 10, higher accuracy in the resulting structure pattern in layer 14 may also be achieved, which makes it possible to produce finer structures. Following an exposure time and possibly post-baking under compression, depending on the choice of material and radiation, and dimensions of the polymerisable layer, the pressure in cavity 115 is reduced and the two main parts 101 and 102 are separated from one another. In one embodiment, cooling element 24 of heater device 20 may first be used to cool down the substrate 12 and template 10 before separation. Substrate 12 and template 10 are thereafter separated from one another. After this, the substrate is subjected to further treatment according to what is previously known for imprint lithography.
In the step illustrated in
One embodiment of the system according to the invention further comprises mechanical clamping means, for clamping together substrate 12 and template 10. This is particularly preferred in an embodiment with an external alignment system for aligning substrate and template prior to pattern transfer, where the aligned stack comprising the template and the substrate has to be transferred into the imprint apparatus. The system may also contain means for applying a vacuum between template and substrate in order to extract air inclusions from the polymerisable layer of the stacked sandwich prior to hardening of the polymerisable fluid through UV irradiation.
In a preferred embodiment, the template surface 11 is preferably treated with an anti-adhesion layer to prevent the cured polymer layer 14′ from sticking to it after the imprint process. An example of such an anti-adhesion layer comprises a fluorine-containing group, as presented in WO 03/005124 and invented by one of the inventors of the instant invention. The contents of WO 03/005124 are also hereby incorporated by reference.
A first mode of the invention, with a transparent template, which has been successfully tested by the inventors, involves a substrate 12 of silicon covered by a layer 14 of NIP-K17 with a thickness of 1 μm. A template of glass or fused silica/quartz, with a thickness of 600 μm, has been used.
A second mode of the invention, with a transparent substrate, which has been successfully tested by the inventors, involves a substrate 12 of glass or fused silica/quartz covered by a layer 14 of NIP-K17 with a thickness of 1 μm. A template of e.g. nickel or silicon has been used, with a thickness of about 600 μm, though any other suitable non-transparent material can be used.
After compression by means of membrane 113 with a pressure of 5-100 bar for about 30 seconds, radiation source 110 is turned on. Radiation source 110 is typically devised to emit at least in the ultraviolet region below 400 nm. In a preferred embodiment, an air-cooled xenon lamp with an emission spectrum ranging from 200-1000 nm is employed as the radiation source 110. The preferred xenon type radiation source 110 provides a radiation of 1-10 W/cm2, and is devised to flash 1-5 μs pulses, with a pulse rate of 1-5 pulses per second. In an alternative embodiment, a continuous mode UV source is used. A window 112 of quartz is formed in surface 104 for passing through radiation. Exposure time is preferably between 1-30 seconds, for polymerising fluid layer 14 into a solid layer 14′. After successful exposure, second main part 102 is lowered to a position similar to that of
The disclosed apparatus and method is particularly advantageous for large area imprint in a single step, and has as such huge benefits over the previously known step and flash method. Thanks to the membrane-transferred fluid pressure, the present invention can be used for one step imprint of substrates of 8 inch, 12 inch, and even larger discs. Even full flat panel displays with sizes of about 400×600 mm and larger can be patterned with a single imprint and exposure step with the present invention. The present invention therefore provides a technique which may for the first time make radiation-assisted polymerisation imprint attractive to large scale production. The invention is usable for forming patterns in a substrate for production of e.g. printed wire boards or circuit boards, electronic circuits, miniaturised mechanical or electromechanical structures, magnetic and optical storage media etc. The apparatus according to the invention may of course also be used only with the radiation source, or instead only with the heater device.
The invention is defined by the appended claims.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US4054383 *||Feb 2, 1976||Oct 18, 1977||International Business Machines Corporation||Jig and process for contact printing|
|US4360266 *||Aug 19, 1980||Nov 23, 1982||Dai Nippon Insatsu Kabushiki Kaisha||Contact printing method and apparatus|
|US4844947 *||May 5, 1988||Jul 4, 1989||Westinghouse Electric Corp.||Technique for the application and cure of photosensitive paints|
|US5804017 *||Jul 27, 1995||Sep 8, 1998||Imation Corp.||Method and apparatus for making an optical information record|
|US5866281 *||Nov 27, 1996||Feb 2, 1999||Wisconsin Alumni Research Foundation||Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts|
|US5947027 *||Sep 8, 1998||Sep 7, 1999||Motorola, Inc.||Printing apparatus with inflatable means for advancing a substrate towards the stamping surface|
|US6027630 *||Apr 3, 1998||Feb 22, 2000||University Of Southern California||Method for electrochemical fabrication|
|US6190929 *||Jul 23, 1999||Feb 20, 2001||Micron Technology, Inc.||Methods of forming semiconductor devices and methods of forming field emission displays|
|US6284345 *||Dec 8, 1997||Sep 4, 2001||Washington University||Designer particles of micron and submicron dimension|
|US6334960 *||Mar 11, 1999||Jan 1, 2002||Board Of Regents, The University Of Texas System||Step and flash imprint lithography|
|US6387778 *||Aug 28, 2000||May 14, 2002||Seagate Technology Llc||Breakable tethers for microelectromechanical system devices utilizing reactive ion etching lag|
|US6387787 *||Mar 2, 2001||May 14, 2002||Motorola, Inc.||Lithographic template and method of formation and use|
|US6482742 *||Jul 18, 2000||Nov 19, 2002||Stephen Y. Chou||Fluid pressure imprint lithography|
|US6743740 *||Oct 18, 2002||Jun 1, 2004||Intel Corporation||Using sonic energy in connection with laser-assisted direct imprinting|
|US6949199 *||Mar 5, 2002||Sep 27, 2005||Seagate Technology Llc||Heat-transfer-stamp process for thermal imprint lithography|
|US7144539 *||Apr 4, 2002||Dec 5, 2006||Obducat Ab||Imprint method and device|
|US7374864 *||Feb 13, 2004||May 20, 2008||The Regents Of The University Of Michigan||Combined nanoimprinting and photolithography for micro and nano devices fabrication|
|US20030071016 *||Oct 8, 2002||Apr 17, 2003||Wu-Sheng Shih||Patterned structure reproduction using nonsticking mold|
|US20030159608 *||Dec 4, 2000||Aug 28, 2003||Babak Heidari||Device and method in connection with the production of structures|
|US20030189273 *||Apr 4, 2002||Oct 9, 2003||Lennart Olsson||Imprint method and device|
|US20040021254 *||Aug 1, 2002||Feb 5, 2004||Sreenivasan Sidlgata V.||Alignment methods for imprint lithography|
|US20040079730 *||Jun 28, 2002||Apr 29, 2004||Gisel Ahrens||Plastic male mold for fabricating microstructures and nanostructures using imprint lithography|
|US20040110856 *||Dec 4, 2002||Jun 10, 2004||Young Jung Gun||Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure|
|US20040131718 *||Aug 8, 2003||Jul 8, 2004||Princeton University||Lithographic apparatus for fluid pressure imprint lithography|
|US20050158419 *||Jan 15, 2004||Jul 21, 2005||Watts Michael P.||Thermal processing system for imprint lithography|
|US20050202350 *||Mar 13, 2004||Sep 15, 2005||Colburn Matthew E.||Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US7632088 *||Oct 19, 2007||Dec 15, 2009||Provost Fellows And Scholars Of The College Of The Holy And Undivided Trinity Of Queen Elizabeth Near Dublin||Cyclic loading system and methods for forming nanostructures|
|US7641467||May 2, 2007||Jan 5, 2010||Asml Netherlands B.V.||Imprint lithography|
|US7641840 *||May 17, 2007||Jan 5, 2010||Molecular Imprints, Inc.||Method for expelling gas positioned between a substrate and a mold|
|US7682546||Jun 10, 2005||Mar 23, 2010||Wd Media, Inc.||Disk alignment apparatus and method for patterned media production|
|US7691313 *||Nov 30, 2006||Apr 6, 2010||Molecular Imprints, Inc.||Method for expelling gas positioned between a substrate and a mold|
|US7833389||Aug 24, 2006||Nov 16, 2010||Microcontinuum, Inc.||Replication tools and related fabrication methods and apparatus|
|US7854877||Aug 14, 2007||Dec 21, 2010||Asml Netherlands B.V.||Lithography meandering order|
|US7946837||Oct 6, 2006||May 24, 2011||Asml Netherlands B.V.||Imprint lithography|
|US8043085||May 19, 2009||Oct 25, 2011||Asml Netherlands B.V.||Imprint lithography|
|US8062495||Jan 20, 2006||Nov 22, 2011||Microcontinuum, Inc.||Replication tools and related fabrication methods and apparatus|
|US8144309||Sep 5, 2007||Mar 27, 2012||Asml Netherlands B.V.||Imprint lithography|
|US8248608||Feb 2, 2010||Aug 21, 2012||Asml Netherlands B.V.||Imprint lithography|
|US8293455 *||Oct 14, 2008||Oct 23, 2012||Hewlett-Packard Development Company, L.P.||Mandrel|
|US8319968||Sep 10, 2009||Nov 27, 2012||Asml Netherlands B.V.||Imprint lithography|
|US8323541||Feb 22, 2012||Dec 4, 2012||Asml Netherlands B.V.||Imprint lithography|
|US8357536||Nov 29, 2010||Jan 22, 2013||Asml Netherlands B.V.||Inspection method and apparatus|
|US8404170 *||Aug 12, 2010||Mar 26, 2013||Asml Netherlands B.V.||Imprint lithography apparatus and method|
|US8435373||Jun 20, 2006||May 7, 2013||Microcontinumm, Inc.||Systems and methods for roll-to-roll patterning|
|US8454849||Mar 18, 2011||Jun 4, 2013||Asml Netherlands B.V.||Imprint lithography|
|US8529823||Sep 27, 2010||Sep 10, 2013||Asml Netherlands B.V.||Imprint lithography|
|US8579625||Oct 10, 2008||Nov 12, 2013||Asml Netherlands B.V.||Imprint lithography|
|US8597014||Apr 26, 2010||Dec 3, 2013||Asml Netherlands B.V.||Actuator|
|US8685295||Jun 23, 2010||Apr 1, 2014||Asml Netherlands B.V.||Imprint lithography apparatus|
|US8691124||Sep 30, 2010||Apr 8, 2014||Asml Netherlands B.V.||Alignment and imprint lithography|
|US8743361||May 2, 2011||Jun 3, 2014||Asml Netherlands B.V.||Imprint lithography method and apparatus|
|US8830455||Aug 19, 2010||Sep 9, 2014||Asml Netherlands B.V.||Inspection method and apparatus|
|US8845320||May 17, 2010||Sep 30, 2014||Asml Netherlands B.V.||Imprint lithography apparatus|
|US8961801||Aug 26, 2010||Feb 24, 2015||Asml Netherlands B.V.||Imprint lithography method and apparatus|
|US8967991||Jul 26, 2010||Mar 3, 2015||Asml Netherlands B.V.||Imprint lithography template|
|US8968630||Oct 26, 2010||Mar 3, 2015||Asml Netherlands B.V.||Imprint lithography|
|US20050236738 *||Jun 10, 2005||Oct 27, 2005||Harper Bruce M||Disk alignment apparatus and method for patterned media production|
|US20100092889 *||Oct 14, 2008||Apr 15, 2010||Arthur Alan R||Mandrel|
|US20110037201 *||Aug 12, 2010||Feb 17, 2011||Asml Netherlands B.V.||Imprint lithography apparatus and method|
|EP1854617A1 *||Feb 21, 2006||Nov 14, 2007||SUMITOMO ELECTRIC INDUSTRIES Ltd||Machining method of microstructure and machining system of microstructure|
|EP2026131A2||Aug 8, 2008||Feb 18, 2009||ASML Netherlands BV||Lithography meandering order|
|WO2009094572A1 *||Jan 23, 2009||Jul 30, 2009||Microcontinuum Inc||Roll-to-roll patterning of transparent and metallic layers|
|WO2011064020A1||Sep 30, 2010||Jun 3, 2011||Asml Netherlands B.V.||Alignment and imprint lithography|
|WO2011064021A1||Oct 1, 2010||Jun 3, 2011||Asml Netherlands B.V.||Imprint lithography apparatus and method|
|WO2011072897A1||Oct 1, 2010||Jun 23, 2011||Asml Netherlands B.V.||Imprint lithography|
|WO2011107302A2||Jan 11, 2011||Sep 9, 2011||Asml Netherlands B.V.||Imprint lithography|
|WO2012016744A1||Jun 14, 2011||Feb 9, 2012||Asml Netherlands B.V.||Imprint lithography|
|WO2012019874A1||Jul 18, 2011||Feb 16, 2012||Asml Netherlands B.V.||Lithography method and apparatus|
|WO2012022561A1||Jul 18, 2011||Feb 23, 2012||Asml Netherlands B.V.||Inspection method for imprint lithography and apparatus therefor|
|WO2012025316A1||Jul 21, 2011||Mar 1, 2012||Asml Netherlands B.V.||Imprint lithography method and imprintable medium|
|U.S. Classification||216/52, 438/586, 156/230, 438/20, 156/345.1|
|International Classification||B29C43/02, G03F7/20, B29C43/10, B81C99/00, G03F1/00, H01L21/00, G03F7/00|
|Cooperative Classification||B29C43/10, G03F7/0002, B29C43/021, B29C59/022, B29C2059/023, B82Y40/00, B82Y10/00, B29C2043/3647, B29C35/0888, B29C43/003, B29C2035/0827, B29C2043/025|
|European Classification||B82Y10/00, B29C43/00B, B82Y40/00, B29C43/02B, B29C59/02C, B29C43/10, G03F7/00A|
|Aug 22, 2005||AS||Assignment|
Owner name: OBDUCAT AB, SWEDEN
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HEIDARI, BABAK;BECK, MARC;REEL/FRAME:016909/0089
Effective date: 20050815