US20070138472A1 - Method for fabricating TFT array substrate - Google Patents
Method for fabricating TFT array substrate Download PDFInfo
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- US20070138472A1 US20070138472A1 US11/642,042 US64204206A US2007138472A1 US 20070138472 A1 US20070138472 A1 US 20070138472A1 US 64204206 A US64204206 A US 64204206A US 2007138472 A1 US2007138472 A1 US 2007138472A1
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- 239000000758 substrate Substances 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 32
- 239000002184 metal Substances 0.000 claims abstract description 32
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 24
- 238000002161 passivation Methods 0.000 claims abstract description 18
- 239000010409 thin film Substances 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- 238000002310 reflectometry Methods 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 238000003860 storage Methods 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- 238000005530 etching Methods 0.000 description 2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
Definitions
- the present invention relates to methods of fabricating thin film transistor (TFT) array substrates used in liquid crystal displays (LCDs).
- TFT thin film transistor
- a typical liquid crystal display is capable of displaying a clear and sharp image through thousands or even millions of pixels that make up the complete image.
- the liquid crystal display has thus been applied to various electronic equipment in which messages or pictures need to be displayed, such as mobile phones and notebook computers.
- a liquid crystal panel is a major component of the LCD.
- the liquid crystal panel generally includes a thin film transistor (TFT) array substrate, a color filter substrate opposite to the TFT array substrate, and a liquid crystal layer sandwiched between the two substrates.
- TFT thin film transistor
- the TFT array substrate 100 includes a plurality of parallel gate lines 110 , and a plurality of parallel data lines 120 perpendicular to the plurality of gate lines 110 .
- the plurality of gate lines 110 and data lines 120 cross each other to define a plurality of pixel units.
- Each pixel unit has a thin film transistor (TFT) 130 , a pixel electrode 140 , and a storage capacitance electrode line 150 .
- the TFT 130 is disposed at an intersection of a corresponding one of the gate lines 110 and a corresponding one of the data lines 120 .
- the TFT 130 has a gate electrode 131 connected to the gate line 110 , a source electrode 132 connected to the data line 120 , and a drain electrode 133 connected to the pixel electrode 140 .
- the storage capacitance electrode line 150 is parallel to the gate lines 110 , and forms a storage capacitance with the pixel electrode 140 .
- the TFT array substrate 100 further includes: a substrate 101 , the gate lines 110 and the storage capacitance electrode line 150 being formed on the substrate 101 ; a gate insulating layer 102 formed on the substrate 101 having the gate lines 110 and the storage capacitance electrode line 150 ; a semiconductor layer 103 formed on the gate insulating layer 102 , the source electrode 132 and the drain electrode 133 being formed on the gate insulating layer 102 and the semiconductor layer 103 ; and a passivation layer 104 formed on the gate insulating layer 102 , the source electrode 132 and the drain electrode 133 .
- the pixel electrode 140 is formed on the passivation layer 104 , and electrically connects with the drain electrode 133 through a through hole 105 defined in the passivation layer 104 .
- the pixel electrode 140 is made from Indium Tin Oxide (ITO).
- ITO Indium Tin Oxide
- the gate lines 110 electrically connect with an external driving circuit.
- the gate lines 110 and the storage electrode lines 150 are made from molybdenum (Mo), which can help avoid chemical reaction occurring between the gate lines 110 and the storage electrode lines 150 .
- a method of manufacturing the TFT substrate 100 includes the following steps (described in relation to a part of the TFT array substrate 100 only): forming a gate metal layer; forming a gate electrode; forming a gate insulating layer and an amorphous silicon (a-Si) and doped a-Si layer; forming a semiconductor layer on the gate insulating layer; forming a source/drain metal layer; forming source/drain electrodes; forming a passivation material layer; forming a passivation layer; forming a transparent conductive layer; and forming a pixel electrode.
- the method includes five photo-mask processes, each of which is rather complicated and costly.
- the method for fabricating the TFT array substrate 100 is correspondingly complicated and costly.
- An exemplary method for fabricating a thin film transistor (TFT) array substrate includes: providing an insulating substrate; forming a plurality of gate electrodes and a plurality of reflective patterns on the insulating substrate using a first photo-mask process; forming a gate insulating layer, an amorphous silicon layer, a doped amorphous silicon layer, and a source/drain metal layer on the insulating substrate having the gate electrodes and the reflective patterns; forming a plurality of source electrodes and a plurality of drain electrodes on the doped amorphous silicon layer; depositing a passivation layer on the source electrodes, the drain electrodes and the gate insulating layer; and forming a pixel electrode on the passivation layer.
- FIGS. 1 through 15 relate to a method for manufacturing a TFT array substrate according to an exemplary embodiment of the present invention.
- FIGS. 16 and 17 relate to structure of a conventional TFT array substrate. In the drawings, all the views are schematic.
- FIG. 1 is a side cross-sectional view relating to a step of providing a substrate and forming a first metal layer, and a second metal layer, and a first photo-resist layer on the substrate.
- FIG. 2 is a side cross-sectional view relating to a first photo-mask process.
- FIG. 3 is an isometric view of a photo mask used in the first photo-mask process of FIG. 2 .
- FIG. 4 is a side cross-sectional view relating to a step of forming a photo-resist layer having different heights.
- FIG. 5 is a side cross-sectional view of the substrate after the first and second metal layers have been etched.
- FIG. 6 is a side cross-sectional view of the substrate after the photo-resist layer having different heights has been etched.
- FIG. 7 is a side cross-sectional view relating to a next step of forming a gate electrode and a reflective pattern.
- FIG. 8 is a side cross-sectional view relating to a next step of forming a gate insulating layer, and an amorphous silicon (a-Si) and doped a-Si layer, on the substrate.
- a-Si amorphous silicon
- FIG. 9 is a side cross-sectional view relating to a next step of forming a semiconductor pattern.
- FIG. 10 is a side cross-sectional view relating to a next step of forming a source/drain metal layer.
- FIG. 11 is a side cross-sectional view relating to a next step of forming a source/drain pattern.
- FIG. 12 is a side cross-sectional view relating to a next step of depositing a passivation layer.
- FIG. 13 is a side cross-sectional view relating to a next step of forming a passivation pattern.
- FIG. 14 is a side cross-sectional view relating to a next step of forming a transparent conductive layer.
- FIG. 15 is a side cross-sectional view relating to a next step of forming a pixel electrode.
- FIG. 16 is essentially a top plan view of a pixel unit of a conventional TFT array substrate.
- FIG. 17 is a side cross-sectional view of part of the pixel unit of the TFT array substrate of FIG. 16 , corresponding to line XVII-XVII thereof.
- a method for manufacturing a thin film transistor (TFT) array substrate includes the following processes. For the sake of simplicity, unless the context indicates otherwise, only formation of a part of the TFT array substrate as shown in FIGS. 1 through 15 is described.
- an insulating substrate 301 is provided.
- the substrate 301 may be made from glass or quartz.
- a first metal layer 311 , a second metal layer 312 , and a first photo-resist layer 341 are sequentially formed on the substrate 301 .
- the first metal layer 311 may be made from material having high reflectivity, such as aluminum (Al) or an alloy of aluminum and neodymium (Nd).
- the second metal layer 312 may be made from material including any one or more items selected from the group consisting of molybdenum (Mo), chromium (Cr), and titanium (Ti).
- a light source (not shown) and a first photo-mask 320 are used to expose the first photo-resist layer 341 .
- the photo-mask 320 is a slit mask, which has a slit region 322 and a shielding region 321 (as shown in FIG. 3 ).
- the slit region 322 of the photo-mask 320 has a higher light transmittance ratio than the shielding region 321 . Thus, light energy exiting from the slit region 322 is higher than that exiting from the shielding region 321 .
- the exposed first photo-resist layer 341 is developed, thereby forming a first photo-resist sub-patternfirst photo-resist sub-pattern.
- the first photo-resist sub-patternfirst photo-resist sub-pattern has a first photo-resist sub-patternfirst photo-resist sub-pattern 351 corresponding to the slit region 322 , and a second photo-resist sub-patternsecond photo-resist sub-pattern 361 corresponding to the shielding region 321 , as shown in FIG. 4 .
- the first photo-resist sub-patternfirst photo-resist sub-pattern 351 is thinner than the second photo-resist sub-patternsecond photo-resist sub-pattern 361 .
- the second metal layer 312 and the first metal layer 311 are etched, thereby forming a first metal layer pattern and a second metal layer pattern, as shown in FIG. 5 .
- a second etching process is performed in order to etch the first photo-resist sub-patternfirst photo-resist sub-pattern 351 and the second photo-resist sub-patternsecond photo-resist sub-pattern 361 .
- the first photo-resist sub-patternfirst photo-resist sub-pattern 351 is completely etched away, and the second photo-resist sub-patternsecond photo-resist sub-pattern 361 has a reduced thickness (as shown in FIG. 6 ).
- the exposed second metal layer 312 is etched a predetermined time.
- a reflective pattern 350 corresponding to the first photo-resist sub-patternfirst photo-resist sub-pattern 351 is formed, as shown in FIG. 7 .
- the residual second photo-resist sub-patternsecond photo-resist sub-pattern 361 is then removed by an acetone solution, thereby forming a gate electrode 310 , as shown in FIG. 7 .
- the substrate 301 is then cleaned and dried.
- a gate insulating layer 302 is formed on the substrate 301 having the gate electrode 310 and the reflective pattern 350 by a chemical vapor deposition (CVD) process.
- silane (SiH 4 ) reacts with alkaline air (NH 4 + ) to obtain silicon nitride (SiN x ), a material of the gate insulating layer 302 .
- An amorphous silicon (a-Si) material layer is deposited on the gate insulating layer 302 by a CVD process.
- the a-Si layer is doped, thereby respectively forming an a-Si and doped a-Si layer 303 .
- a second photo-resist layer 342 is deposited on the a-Si and doped a-Si layer 303 .
- a light source and a photo-mask are used to expose the second photo-resist layer 342 .
- the exposed second photo-resist layer 342 is developed, thereby forming a second photo-resist sub-patternsecond photo-resist sub-pattern (not shown).
- the second photo-resist sub-patternsecond photo-resist sub-pattern as a mask, the a-Si and doped a-Si layer 303 is etched, thereby forming a semiconductor pattern 313 .
- a source/drain metal layer 314 and a third photo-resist layer 343 are sequentially formed on the semiconductor pattern 313 and the gate insulating layer 302 .
- the source/drain metal layer 314 may be made from material including any one or more items selected from the group consisting of molybdenum alloy and molybdenum.
- the third photo-resist layer 343 is exposed by a third photo-mask, and then is developed, thereby forming a third photo-resist pattern (not shown).
- the source/drain metal layer 314 is etched according to the third photo-resist pattern, thereby forming a pattern of the source electrode 332 and the drain electrode 333 .
- the third photo-resist layer is then removed by an acetone solution. Thereby, the layered and patterned substrate 301 as shown in FIG. 11 is attained.
- a passivation layer 304 and a fourth photo-resist layer 344 are sequentially formed on the combination of the source electrode 332 , the drain electrode 333 , the semiconductor pattern 313 , and the gate insulating layer 302 .
- the fourth photo-resist layer 344 is exposed by a fourth photo-mask, and then is developed, thereby forming a fourth photo-resist pattern (not shown).
- the passivation layer 304 is etched according to the fourth photo-resist pattern, thereby forming a connecting hole 305 in the passivation layer 304 .
- the fourth photo-resist pattern is then removed by an acetone solution. Thereby, the layered and patterned substrate 301 as shown in FIG. 13 is attained.
- a transparent conductive layer 306 and a fifth photo-resist layer 345 are sequentially formed on the passivation layer 304 including the connecting hole 305 .
- the fifth photo-resist layer 345 is exposed by a fifth photo-mask, and then is developed, thereby forming a fifth photo-resist pattern (not shown).
- the transparent conductive layer 306 is etched according to the fifth photo-resist pattern, thereby forming a pattern of the pixel electrode 308 .
- the fifth photo-resist pattern is then removed by an acetone solution. Thereby, the layered and patterned substrate 301 as shown in FIG. 15 is attained.
- the layered and patterned substrate 301 constitutes the TFT array substrate 300 .
Abstract
Description
- The present invention relates to methods of fabricating thin film transistor (TFT) array substrates used in liquid crystal displays (LCDs).
- A typical liquid crystal display (LCD) is capable of displaying a clear and sharp image through thousands or even millions of pixels that make up the complete image. The liquid crystal display has thus been applied to various electronic equipment in which messages or pictures need to be displayed, such as mobile phones and notebook computers. A liquid crystal panel is a major component of the LCD. The liquid crystal panel generally includes a thin film transistor (TFT) array substrate, a color filter substrate opposite to the TFT array substrate, and a liquid crystal layer sandwiched between the two substrates.
- Referring to
FIG. 16 , part of a typical TFT array substrate is shown. TheTFT array substrate 100 includes a plurality ofparallel gate lines 110, and a plurality ofparallel data lines 120 perpendicular to the plurality ofgate lines 110. The plurality ofgate lines 110 anddata lines 120 cross each other to define a plurality of pixel units. Each pixel unit has a thin film transistor (TFT) 130, apixel electrode 140, and a storagecapacitance electrode line 150. The TFT 130 is disposed at an intersection of a corresponding one of thegate lines 110 and a corresponding one of thedata lines 120. The TFT 130 has agate electrode 131 connected to thegate line 110, asource electrode 132 connected to thedata line 120, and adrain electrode 133 connected to thepixel electrode 140. The storagecapacitance electrode line 150 is parallel to thegate lines 110, and forms a storage capacitance with thepixel electrode 140. - Referring also to
FIG. 17 , theTFT array substrate 100 further includes: asubstrate 101, thegate lines 110 and the storagecapacitance electrode line 150 being formed on thesubstrate 101; agate insulating layer 102 formed on thesubstrate 101 having thegate lines 110 and the storagecapacitance electrode line 150; asemiconductor layer 103 formed on thegate insulating layer 102, thesource electrode 132 and thedrain electrode 133 being formed on thegate insulating layer 102 and thesemiconductor layer 103; and apassivation layer 104 formed on thegate insulating layer 102, thesource electrode 132 and thedrain electrode 133. Thepixel electrode 140 is formed on thepassivation layer 104, and electrically connects with thedrain electrode 133 through a throughhole 105 defined in thepassivation layer 104. - The
pixel electrode 140 is made from Indium Tin Oxide (ITO). Thegate lines 110 electrically connect with an external driving circuit. Thegate lines 110 and thestorage electrode lines 150 are made from molybdenum (Mo), which can help avoid chemical reaction occurring between thegate lines 110 and thestorage electrode lines 150. - A method of manufacturing the
TFT substrate 100 includes the following steps (described in relation to a part of theTFT array substrate 100 only): forming a gate metal layer; forming a gate electrode; forming a gate insulating layer and an amorphous silicon (a-Si) and doped a-Si layer; forming a semiconductor layer on the gate insulating layer; forming a source/drain metal layer; forming source/drain electrodes; forming a passivation material layer; forming a passivation layer; forming a transparent conductive layer; and forming a pixel electrode. However, the method includes five photo-mask processes, each of which is rather complicated and costly. Thus, the method for fabricating theTFT array substrate 100 is correspondingly complicated and costly. - What is needed, therefore, is a method for fabricating a TFT array substrate that can overcome the above-described problems.
- An exemplary method for fabricating a thin film transistor (TFT) array substrate includes: providing an insulating substrate; forming a plurality of gate electrodes and a plurality of reflective patterns on the insulating substrate using a first photo-mask process; forming a gate insulating layer, an amorphous silicon layer, a doped amorphous silicon layer, and a source/drain metal layer on the insulating substrate having the gate electrodes and the reflective patterns; forming a plurality of source electrodes and a plurality of drain electrodes on the doped amorphous silicon layer; depositing a passivation layer on the source electrodes, the drain electrodes and the gate insulating layer; and forming a pixel electrode on the passivation layer.
- Other advantages and novel features will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings.
-
FIGS. 1 through 15 relate to a method for manufacturing a TFT array substrate according to an exemplary embodiment of the present invention.FIGS. 16 and 17 relate to structure of a conventional TFT array substrate. In the drawings, all the views are schematic. -
FIG. 1 is a side cross-sectional view relating to a step of providing a substrate and forming a first metal layer, and a second metal layer, and a first photo-resist layer on the substrate. -
FIG. 2 is a side cross-sectional view relating to a first photo-mask process. -
FIG. 3 is an isometric view of a photo mask used in the first photo-mask process ofFIG. 2 . -
FIG. 4 is a side cross-sectional view relating to a step of forming a photo-resist layer having different heights. -
FIG. 5 is a side cross-sectional view of the substrate after the first and second metal layers have been etched. -
FIG. 6 is a side cross-sectional view of the substrate after the photo-resist layer having different heights has been etched. -
FIG. 7 is a side cross-sectional view relating to a next step of forming a gate electrode and a reflective pattern. -
FIG. 8 is a side cross-sectional view relating to a next step of forming a gate insulating layer, and an amorphous silicon (a-Si) and doped a-Si layer, on the substrate. -
FIG. 9 is a side cross-sectional view relating to a next step of forming a semiconductor pattern. -
FIG. 10 is a side cross-sectional view relating to a next step of forming a source/drain metal layer. -
FIG. 11 is a side cross-sectional view relating to a next step of forming a source/drain pattern. -
FIG. 12 is a side cross-sectional view relating to a next step of depositing a passivation layer. -
FIG. 13 is a side cross-sectional view relating to a next step of forming a passivation pattern. -
FIG. 14 is a side cross-sectional view relating to a next step of forming a transparent conductive layer. -
FIG. 15 is a side cross-sectional view relating to a next step of forming a pixel electrode. -
FIG. 16 is essentially a top plan view of a pixel unit of a conventional TFT array substrate. -
FIG. 17 is a side cross-sectional view of part of the pixel unit of the TFT array substrate ofFIG. 16 , corresponding to line XVII-XVII thereof. - A method for manufacturing a thin film transistor (TFT) array substrate according to an exemplary embodiment of the present invention includes the following processes. For the sake of simplicity, unless the context indicates otherwise, only formation of a part of the TFT array substrate as shown in
FIGS. 1 through 15 is described. - In a first step, referring to
FIG. 1 , aninsulating substrate 301 is provided. Thesubstrate 301 may be made from glass or quartz. Afirst metal layer 311, asecond metal layer 312, and a first photo-resist layer 341 are sequentially formed on thesubstrate 301. Thefirst metal layer 311 may be made from material having high reflectivity, such as aluminum (Al) or an alloy of aluminum and neodymium (Nd). Thesecond metal layer 312 may be made from material including any one or more items selected from the group consisting of molybdenum (Mo), chromium (Cr), and titanium (Ti). - In a second step, referring to
FIG. 2 , a light source (not shown) and a first photo-mask 320 are used to expose the first photo-resist layer 341. The photo-mask 320 is a slit mask, which has aslit region 322 and a shielding region 321 (as shown inFIG. 3 ). Theslit region 322 of the photo-mask 320 has a higher light transmittance ratio than theshielding region 321. Thus, light energy exiting from theslit region 322 is higher than that exiting from theshielding region 321. Then the exposed first photo-resist layer 341 is developed, thereby forming a first photo-resist sub-patternfirst photo-resist sub-pattern. The first photo-resist sub-patternfirst photo-resist sub-pattern has a first photo-resist sub-patternfirst photo-resist sub-pattern 351 corresponding to theslit region 322, and a second photo-resist sub-patternsecond photo-resist sub-pattern 361 corresponding to theshielding region 321, as shown inFIG. 4 . The first photo-resist sub-patternfirst photo-resist sub-pattern 351 is thinner than the second photo-resist sub-patternsecond photo-resist sub-pattern 361. Using the first photo-resist sub-patternfirst photo-resist sub-pattern 351 as a mask, thesecond metal layer 312 and thefirst metal layer 311 are etched, thereby forming a first metal layer pattern and a second metal layer pattern, as shown inFIG. 5 . After that, a second etching process is performed in order to etch the first photo-resist sub-patternfirst photo-resist sub-pattern 351 and the second photo-resist sub-patternsecond photo-resist sub-pattern 361. By controlling the etching time, the first photo-resist sub-patternfirst photo-resist sub-pattern 351 is completely etched away, and the second photo-resist sub-patternsecond photo-resist sub-pattern 361 has a reduced thickness (as shown inFIG. 6 ). In addition, using the residual second photo-resist sub-patternsecond photo-resist sub-pattern 361 as a mask, the exposed second metal layer 312 (corresponding to where the first photo-resist sub-patternfirst photo-resist sub-pattern 351 was) is etched a predetermined time. Thereby, areflective pattern 350 corresponding to the first photo-resist sub-patternfirst photo-resist sub-pattern 351 is formed, as shown inFIG. 7 . The residual second photo-resist sub-patternsecond photo-resist sub-pattern 361 is then removed by an acetone solution, thereby forming agate electrode 310, as shown inFIG. 7 . Thesubstrate 301 is then cleaned and dried. - In a third step, referring to
FIG. 8 , agate insulating layer 302 is formed on thesubstrate 301 having thegate electrode 310 and thereflective pattern 350 by a chemical vapor deposition (CVD) process. In this process, silane (SiH4) reacts with alkaline air (NH4 +) to obtain silicon nitride (SiNx), a material of thegate insulating layer 302. An amorphous silicon (a-Si) material layer is deposited on thegate insulating layer 302 by a CVD process. The a-Si layer is doped, thereby respectively forming an a-Si and dopeda-Si layer 303. A second photo-resistlayer 342 is deposited on the a-Si and dopeda-Si layer 303. - In a fourth step, referring to
FIG. 9 , a light source and a photo-mask (not shown) are used to expose the second photo-resistlayer 342. Then the exposed second photo-resistlayer 342 is developed, thereby forming a second photo-resist sub-patternsecond photo-resist sub-pattern (not shown). Using the second photo-resist sub-patternsecond photo-resist sub-pattern as a mask, the a-Si and dopeda-Si layer 303 is etched, thereby forming asemiconductor pattern 313. - In a fifth step, referring to
FIG. 10 , a source/drain metal layer 314 and a third photo-resistlayer 343 are sequentially formed on thesemiconductor pattern 313 and thegate insulating layer 302. The source/drain metal layer 314 may be made from material including any one or more items selected from the group consisting of molybdenum alloy and molybdenum. The third photo-resistlayer 343 is exposed by a third photo-mask, and then is developed, thereby forming a third photo-resist pattern (not shown). The source/drain metal layer 314 is etched according to the third photo-resist pattern, thereby forming a pattern of thesource electrode 332 and thedrain electrode 333. The third photo-resist layer is then removed by an acetone solution. Thereby, the layered and patternedsubstrate 301 as shown inFIG. 11 is attained. - In a sixth step, referring to
FIG. 12 , apassivation layer 304 and a fourth photo-resistlayer 344 are sequentially formed on the combination of thesource electrode 332, thedrain electrode 333, thesemiconductor pattern 313, and thegate insulating layer 302. The fourth photo-resistlayer 344 is exposed by a fourth photo-mask, and then is developed, thereby forming a fourth photo-resist pattern (not shown). Thepassivation layer 304 is etched according to the fourth photo-resist pattern, thereby forming a connectinghole 305 in thepassivation layer 304. The fourth photo-resist pattern is then removed by an acetone solution. Thereby, the layered and patternedsubstrate 301 as shown inFIG. 13 is attained. - In a seventh step, referring to
FIG. 14 , a transparentconductive layer 306 and a fifth photo-resist layer 345 are sequentially formed on thepassivation layer 304 including the connectinghole 305. The fifth photo-resist layer 345 is exposed by a fifth photo-mask, and then is developed, thereby forming a fifth photo-resist pattern (not shown). The transparentconductive layer 306 is etched according to the fifth photo-resist pattern, thereby forming a pattern of the pixel electrode 308. The fifth photo-resist pattern is then removed by an acetone solution. Thereby, the layered and patternedsubstrate 301 as shown inFIG. 15 is attained. The layered and patternedsubstrate 301 constitutes theTFT array substrate 300. - In summary, compared to the above-described conventional method, in the above-described exemplary method for fabricating the
TFT array substrate 300, only one photo-mask process is used to form thegate electrode 310 and thereflective pattern 350, thus saving one photo-mask process. Therefore, a simplified method at a reduced cost is attained. - It is believed that the present embodiments and their advantages will be understood from the foregoing description, and it will be apparent that various changes may be made thereto without departing from the spirit and scope of the invention or sacrificing all of its material advantages, the examples hereinbefore described merely being preferred or exemplary embodiments of the invention.
Claims (9)
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TW094144818A TWI285433B (en) | 2005-12-16 | 2005-12-16 | Method of manufacturing thin film transistor substrate |
TW94144818 | 2005-12-16 |
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US20070138472A1 true US20070138472A1 (en) | 2007-06-21 |
US7611929B2 US7611929B2 (en) | 2009-11-03 |
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Cited By (1)
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US20160315199A1 (en) * | 2013-12-26 | 2016-10-27 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Photo mask, thin film transistor and method for manufacturing thin film transistor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5926702A (en) * | 1996-04-16 | 1999-07-20 | Lg Electronics, Inc. | Method of fabricating TFT array substrate |
US6960484B2 (en) * | 2002-12-30 | 2005-11-01 | Lg.Philips Lcd Co., Ltd. | Method of manufacturing liquid crystal display device |
US7468527B2 (en) * | 2004-05-27 | 2008-12-23 | Lg Display Co., Ltd. | Liquid crystal display device and fabricating method thereof |
-
2005
- 2005-12-16 TW TW094144818A patent/TWI285433B/en not_active IP Right Cessation
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2006
- 2006-12-18 US US11/642,042 patent/US7611929B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5926702A (en) * | 1996-04-16 | 1999-07-20 | Lg Electronics, Inc. | Method of fabricating TFT array substrate |
US6960484B2 (en) * | 2002-12-30 | 2005-11-01 | Lg.Philips Lcd Co., Ltd. | Method of manufacturing liquid crystal display device |
US7468527B2 (en) * | 2004-05-27 | 2008-12-23 | Lg Display Co., Ltd. | Liquid crystal display device and fabricating method thereof |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160315199A1 (en) * | 2013-12-26 | 2016-10-27 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Photo mask, thin film transistor and method for manufacturing thin film transistor |
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TWI285433B (en) | 2007-08-11 |
US7611929B2 (en) | 2009-11-03 |
TW200725891A (en) | 2007-07-01 |
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