|Publication number||US20070245552 A1|
|Application number||US 11/400,583|
|Publication date||Oct 25, 2007|
|Filing date||Apr 7, 2006|
|Priority date||Apr 7, 2006|
|Also published as||US7459923, US20070236233|
|Publication number||11400583, 400583, US 2007/0245552 A1, US 2007/245552 A1, US 20070245552 A1, US 20070245552A1, US 2007245552 A1, US 2007245552A1, US-A1-20070245552, US-A1-2007245552, US2007/0245552A1, US2007/245552A1, US20070245552 A1, US20070245552A1, US2007245552 A1, US2007245552A1|
|Inventors||John Caldwell, Jerry McBride, Brett Crump, Phil Byrd|
|Original Assignee||John Caldwell, Mcbride Jerry, Brett Crump, Phil Byrd|
|Export Citation||BiBTeX, EndNote, RefMan|
|Referenced by (3), Classifications (18), Legal Events (1)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This invention relates to probe cards and to probe interposers, and to methods of fabricating probe cards and probe interposers.
Electric circuits upon fabrication are typically subjected to testing to verify operability. Some circuits are subjected to electrical and environmental stress prior to being packaged and shipped to an end user. Such testing and/or stress might occur relative to a wafer or other substrate containing a plurality of fabricated integrated circuits or die prior to singulation. Alternately by way of example only, such testing and/or stress might occur after singulation into individual die and/or in connection with such die mounted to or a part of another substrate.
Such testing and/or stress is typically conducted with a probing device, and is commonly referred to as “probe”. The circuit under test is typically provided with a series of exposed electrical contacts or bond pads. These are mechanically and electrically contacted with needle-like probe tips whereupon the testing and/or stressing of the integrated circuit occurs. At the conclusion of the testing and/or stress, the integrated circuit substrate and probe tips are physically separated from one another, and the probe device is utilized to test or stress another circuit substrate.
The needle-like probe tips are typically provided on what is synonymously commonly referred to as any of a probe card, probe interposer, or probe transposer. Such physically mounts to a larger system which is capable of providing electrical stimulus through the probe card to an integrated or other electric circuit under test/stress. The probe card/interposer/transposer might alternately mount to another structure or cassette which directly mounts to the larger system which provides the desired electrical stimulus. Regardless, the probe interposer typically can be used multiple times, yet can be replaced upon damage or wear.
Existing technology, of course, relies upon very precise x, y and z-axis positioning of the substrate under test/stress relative to the probing equipment. Accordingly, the probe interposer needs to be precisely and accurately mounted relative to the system providing electrical stimulus as well as be precisely positionable relative to the integrated circuit undergoing test/stress. The probe tips must therefore be precisely aligned in x and y-axes such that they engage desired contact/bond pads on the circuit under test/stress. Further, the electric circuit substrate undergoing test/stress and the probe card must be precisely positionable along the z-axis direction (toward and away from one another) to make desired physical contact of the probe tips with the contact pads in a manner which is effective yet not damaging of either the electric circuit substrate or the probe tips. Such is, in part, presently accommodated for by making the probe tips yieldable in a spring-like manner in the z-axis direction.
Further and regardless, optical equipment might be utilized for precisely positioning the probe card and electric circuit substrate relative to one another in any of the x, y and/or z-axes. Additionally, the relative probe contacting is typically along a plane requiring that the electric circuit substrate and probe card be leveled relative to one another such that the presentation of one to the other is very close to, if not perfectly, parallel. Any degree of leveling that does not achieve essentially parallel interfacing can over-stress or damage some of the probe tips and/or contact pads of the electric circuit substrate undergoing test or stress.
While the invention was motivated in addressing the above identified issues, it is in no way so limited. The invention is only limited by the accompanying claims as literally worded, without interpretative or other limiting reference to the specification, and in accordance with the doctrine of equivalents.
Preferred embodiments of the invention are described below with reference to the following accompanying drawings.
This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws “to promote the progress of science and useful arts” (Article 1, Section 8).
Aspects of the invention relate to methods of fabricating a probe interposer, and to probe interposers independent of the method of fabrication. In the context of this document, a “probe interposer” is an interconnect device to be temporarily received between and to electrically interconnect a) an electric circuit substrate being mechanically contacted and electrically probed by the probe interposer, and b) a system which is configured to provide electrical stimulus to the electric circuit substrate being electrically probed through the probe interposer. Accordingly, such a “probe interposer” is capable of repeated use with the same electric circuit substrate or with different electric circuit substrates. Further in some aspects, implementations of the invention might be considered as employing micro-electro-mechanical system structures and manufacturing techniques (MEMS). Such include the integration of micro-scale mechanical elements, sensors, actuators, and electronics on a silicon or a non-silicon-comprising substrate by micro-fabrication technology. Accordingly, MEMS is typically considered as involving micro-fabrication technology including a combination of fabrication of mechanical components and electronic components into or part of an electro-mechanical device or system.
Referring initially to
In certain implementations, probe tips are lithographically patterned on substrate frontside 14. Such lithographic patterning, by way of example only, might include patterned deposition of material onto bulk substrate 12 and/or subtractive etching of material of bulk substrate 12 and/or material deposited upon bulk substrate 12. In one preferred implementation, the lithographic patterning of the probe tips comprises subtractively etching substrate 10 on substrate frontside 14, and which may or may not include the subtractive etching of a material deposited on substrate frontside 14 to a thickness of at least 50 Angstroms. In the context of this document, lithography is defined as a process used to transfer some pattern from a mask/reticle to a layer of imagable material (for example resist) provided on a substrate. Examples include photolithography or optical lithography, ultra-violet lithography, X-ray lithography, e-beam lithography and ion beam lithography. Additional forms of radiation exposure might also be utilized and are contemplated in the context of lithographic patterning, whether existing or yet-to-be developed.
The lithographically patterned probe tips might be of any existing or yet-to-be developed construction. By way of example only,
Probe tips 20 have been lithographically patterned to have their conductive outer end tips 21 received within a common plane 26, as would likely be typical and preferred where the contact surfaces of the circuit substrate being probed are also received within some common plane on the circuit substrate. Mechanical hard stop outer surfaces 25 are also typically, preferably, and depicted to be received within a common plane 28, also as would be typical where the surface or surfaces of the circuit substrate to be mechanically engaged thereby are received in some common plane which may or may not be exactly in the common plane within which the contact surfaces of a circuit substrate might be received. Further in the depicted preferred embodiment, outer ends 21 of probe tips 20 are received elevationally outward on substrate frontside 14 at or to a greater extent than are outer surfaces 25 of mechanical hard stops 22. An exemplary preferred difference between such elevational outer extents of the probe tip outer ends 21 and outer surfaces 25 of mechanical hard stops 22 (i.e., the distance between planes 26 and 28) is from 6 microns to 500 microns.
Probe tips 20 and mechanical hard stops 22 might be lithographically patterned utilizing one or more masking steps which are common to the fabrication of both the probe tips and the mechanical hard stops, using one or more lithographic masking steps which are not common to the fabrication of both of the probe tips on the mechanical hard stops, and perhaps including no masking steps common to the fabrication of both the probe tips and mechanical stops.
An aspect of the invention also contemplates a method of fabricating a probe interposer which includes lithographically patterning probe tips on the substrate frontside and lithographically patterning of a fiducial alignment feature on the substrate frontside, where such alignment feature comprises some structure other than any of the probe tips, and independent of whether the fiducial alignment feature is received within a recess of a mechanical hard stop, and, further, independent of whether any mechanical hard stop is fabricated relative to the substrate frontside. Such method of fabricating a probe interposer might include at least one lithographic masking step which is common to the fabrication of both of the probe tips and the fiducial alignment feature, and/or might comprise at least one lithographic masking step which is not common to the fabrication of both of the probe tips and the fiducial alignment feature. In one preferred implementation, the lithographically patterning of the fiducial alignment feature might comprise subtractively etching of the substrate, including by way of example deposition of a material over some base substrate to a thickness of at least 50 Angstroms, and subtractively etching of the deposited material.
An aspect of a method of fabricating a probe interposer in accordance with one implementation includes lithographically patterning probe tips on the substrate frontside and lithographically patterning at least one circuit component on the substrate, wherein the circuit component comprises at least one of a transistor, capacitor, resistor, or diode, and independent of the fabrication of a fiducial alignment feature and/or independent of fabricating a mechanical hard stop on the substrate frontside. Circuit components other than transistors, capacitors, resistors or diodes might, of course, be fabricated in any of the above embodiments.
In one implementation, a method of fabricating a probe interposer comprises lithographically patterning probe tips on the substrate frontside and lithographically patterning a z-axis detection mechanism on the substrate frontside. The z-axis detection mechanism extends elevationally outward on the substrate frontside a greater distance than the probe tips extend elevationally outward on the substrate frontside.
A method of fabricating a probe interposer including a combination of lithographically patterning probe tips on the substrate frontside and a z-axis detection mechanism on the substrate frontside can be conducted independent of or in combination with any of the above exemplary described lithographical patterning of mechanical hard stops and/or fiducial alignment features, and/or at least one circuit component on the substrate. Further and regardless, the lithographic patternings might include at least one lithographic masking step which is common to the fabrication of both of the probe tips and the z-axis detection mechanism, and/or at least one lithographic masking step which is not common to the fabrication of both of the probe tips and the z-axis detection mechanism. Further and by way of example only, the lithographic patterning of the z-axis detection mechanism might comprise subtractive etching of the substrate, including for example subtractive etching of material deposited to a thickness of at least 50 Angstroms on the substrate. A z-axis detection mechanism might be utilized to detect when the probe interposer is displaced from the circuit substrate under test/stress, and/or relative z-axis positioning of the probe interposer as such comes into proximity with a circuit substrate to be tested/stressed.
In one implementation or aspect, a method of fabricating a probe interposer comprises lithographically patterning probe tips on the substrate frontside and lithographically patterning a probe interposer mechanical mount feature on the substrate backside. In the context of this document, a probe interposer mechanical mount feature is some feature on the probe interposer which provides some form of a male/female-like mechanical interconnection relative to at least one of x, y and/or z-axes of the probe interposer relative to a system which is configured to provide electrical stimulus to the electric circuit substrate, or some support component for the probe interposer which mounts to such a system. Accordingly, such will include some sort of projection and/or indentation relative to a probe interposer. Such may be on one or some combination of the frontside, backside, or side edges of the probe interposer, and most likely will at least be on the backside.
Aspects of the invention also contemplate probe interposers independent of manufacture. Further, methodical and non-methodical interposer aspects of the invention encompass and contemplate any one or more combinations of the various above-stated features and/or methods.
In compliance with the statute, the invention has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the invention is not limited to the specific features shown and described, since the means herein disclosed comprise preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the appended claims appropriately interpreted in accordance with the doctrine of equivalents.
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US7355422 *||Mar 6, 2006||Apr 8, 2008||Touchdown Technologies, Inc.||Optically enhanced probe alignment|
|US8089294||Jan 3, 2012||WinMENS Technologies Co., Ltd.||MEMS probe fabrication on a reusable substrate for probe card application|
|US20070063716 *||Mar 6, 2006||Mar 22, 2007||Touchdown Technologies, Inc.||Optically enhanced probe alignment|
|U.S. Classification||29/830, 29/825, 438/753, 29/846, 29/884, 438/719, 29/874, 324/754.18|
|International Classification||H01L21/302, H05K3/36|
|Cooperative Classification||Y10T29/49222, Y10T29/49117, Y10T29/49126, G01R3/00, Y10T29/49155, Y10T29/49204, G01R1/07307|
|Apr 7, 2006||AS||Assignment|
Owner name: MICRON TECHNOLOGY, INC., IDAHO
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CALDWELL, JOHN;MCBRIDE, JERRY;CRUMP, BRETT;AND OTHERS;REEL/FRAME:017780/0901
Effective date: 20060403