US20090029185A1 - Magnetic device and manufacturing method thereof - Google Patents

Magnetic device and manufacturing method thereof Download PDF

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Publication number
US20090029185A1
US20090029185A1 US12/022,040 US2204008A US2009029185A1 US 20090029185 A1 US20090029185 A1 US 20090029185A1 US 2204008 A US2204008 A US 2204008A US 2009029185 A1 US2009029185 A1 US 2009029185A1
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United States
Prior art keywords
magnetic
recess
recited
manufacturing
substrate
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US12/022,040
Inventor
Cheng-Chang Lee
Ming-Hsien Lin
Yu-Ru Chang
Zong-Ting Yuan
Heng-Chung Chang
Huang-kun Chen
Tai-Kang Shing
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Delta Electronics Inc
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Delta Electronics Inc
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Assigned to DELTA ELECTRONICS, INC. reassignment DELTA ELECTRONICS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHANG, HENG-CHUNG, CHANG, YU-RU, CHEN, HUANG-KUN, LEE, CHENG-CHANG, LIN, MING-HSIEN, SHING, TAI-KANG, YUAN, Zong-ting
Publication of US20090029185A1 publication Critical patent/US20090029185A1/en
Abandoned legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/0006Printed inductances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041Printed circuit coils
    • H01F41/046Printed circuit coils structurally combined with ferromagnetic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/20Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder
    • H01F1/22Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together
    • H01F1/24Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together the particles being insulated
    • H01F1/26Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together the particles being insulated by macromolecular organic substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/34Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials non-metallic substances, e.g. ferrites
    • H01F1/36Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials non-metallic substances, e.g. ferrites in the form of particles
    • H01F1/37Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials non-metallic substances, e.g. ferrites in the form of particles in a bonding agent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/04Fixed inductances of the signal type  with magnetic core
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/0006Printed inductances
    • H01F2017/0066Printed inductances with a magnetic layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00Coils
    • H01F5/003Printed circuit coils
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12201Width or thickness variation or marginal cuts repeating longitudinally

Definitions

  • the invention relates to a magnetic device and a manufacturing method thereof.
  • Magnetic devices have been widely applied to inductors or noise filters of electronic products.
  • the conventional magnetic devices are made by winding enameled copper wires around magnetic cores.
  • the miniaturization of the conventional magnetic devices is restricted by the conventional manufacturing apparatuses, the width of the copper wires and the size of the magnetic cores.
  • the micro-fabrication technology can bring smaller inductors and filters, such as the common-mode noise filters.
  • a ferrite that can fit to high frequency operation is often used as a substrate. Then a coil is formed on the ferrite by the micro-fabrication technology. As show in FIG. 1 , a coil 13 and two non-magnetic materials 14 and 15 are disposed between two ferrite substrates 11 and 12 so as to form a magnetic device 1 . Because the magnetic device 1 must be surface-planarized, the non-magnetic materials 14 and 15 are indispensable and the thicknesses thereof must be greater than a certain value. Hence the whole thickness of the magnetic device 1 is larger than that desired. Furthermore, the coil 13 is surrounded by the non-magnetic materials 14 and 15 , so the inductance of the magnetic device 1 is reduced.
  • a first ferrite 22 , a coil 23 , a second ferrite 24 and two external electrodes 25 are formed on a substrate 21 in sequence by screen printing, and then sintered to form a magnetic device 2 .
  • the coil 23 of the magnetic device 2 is directly surrounded by the ferrites 22 , 24 , the magnetic device 2 can be thinner and higher inductance.
  • the sintering temperature is up to 1000° C. to 1200° C., the usable material of the coil 23 is limited. For example, aluminum can not be adopted as the material of the coil 23 .
  • a first ferrite 32 , a seed layer 35 , a coil 33 , a second ferrite 34 and a protection layer 36 are formed in sequence on a substrate 31 by electroplating to form a magnetic device 3 .
  • the coil 33 of the magnetic device 3 is directly surrounded by the ferrites 32 , 34 , the magnetic device 3 can become thinner and higher inductance.
  • the magnetic properties of the ferrites 32 and 34 made by a ferrite plating method are poorer than that of the ferrites made by sintering.
  • the magnetic device 3 has worse inductance and quality factor (Q) than that of the magnetic device 2 .
  • the invention is to provide a magnetic device and a manufacturing method thereof that can become thinner and higher inductance and has no limitation on the material of the coil.
  • the invention discloses a manufacturing method of a magnetic device including the steps of: forming a magnetic substrate having at least one recess, and forming at least one coil at the recess.
  • a magnetic device includes a magnetic substrate and at least one coil.
  • the magnetic substrate has at least one recess, and the coil is disposed in the recess.
  • the magnetic substrate of the invention is formed in advance, and the magnetic substrate has the recess for accommodating the coil.
  • the magnetic device has a thinner thickness and higher inductance.
  • the coil is formed after the magnetic substrate is made, so the magnetic substrate can be made by sintering if the material of the substrate is ferrite. Therefore, the magnetic substrate can have pretty good magnetic properties, and the material of the coil is not limited because of the high temperature process.
  • FIG. 1 is a schematic view of a first conventional magnetic device
  • FIG. 2 is a schematic view of a second conventional magnetic device
  • FIG. 3 is a schematic view of a third conventional magnetic device
  • FIGS. 4A to 4F are schematic diagrams of magnetic devices according to various embodiments of the invention.
  • FIGS. 5A to 5D are schematic diagrams showing the manufacturing steps of two of the magnetic devices according to the embodiments of the invention.
  • FIGS. 6A to 6C are schematic diagrams showing a first manufacturing method of the recess of the magnetic device according to the embodiments of the invention.
  • FIGS. 7A to 7C are schematic diagrams showing a second manufacturing method of the recess of the magnetic device according to the embodiments of the invention.
  • FIGS. 8A to 8C are schematic diagrams showing a third manufacturing method of the recess of the magnetic device according to the embodiments of the invention.
  • a magnetic device 4 includes a magnetic substrate 41 and at least one coil 42 .
  • the magnetic substrate 41 can be formed by sintering or curing.
  • the magnetic substrate 41 has at least one recess 43 disposed on one side of the magnetic substrate 41 for accommodating the coil 42 .
  • the material of the magnetic substrate 41 can be ferrite mixed with a binder.
  • the ferrite can be, for example, NiZn ferrite or MnZn ferrite.
  • the material of the magnetic substrate 41 can be a metal soft magnetic powder mixed with a polymer material as the isolation among magnetic particles.
  • the material of the coil 42 can be alloy or metal such as copper or aluminum.
  • the magnetic device 4 can have several variations, for example as shown in FIGS. 4B to 4F .
  • the magnetic substrate 41 A of the magnetic device 4 a is a cylindrical magnetic core, and the recess 43 A is disposed on the outer surface of the magnetic core.
  • the coil 42 A is disposed in the recess 43 A.
  • the recesses 43 and 43 B are disposed on the opposite sides of the magnetic substrate 41 B.
  • the coils 42 and 42 B are disposed in the recesses 43 and 43 B, respectively, so that the magnetic device 4 b has the coils 42 and 42 B disposed at its opposite sides.
  • the magnetic device 4 c further includes a non-magnetic material 44 formed on the coil 42 and the magnetic substrate 41 with recesses 43 accommodating the coil 42 . Therefore, the coil 42 is disposed between the non-magnetic material 44 and the magnetic substrate 41 . Moreover, the magnetic device 4 c further includes another magnetic substrate 45 which is connected to the non-magnetic material 44 .
  • the non-magnetic material 44 can be oxide, nitride, spin-on glass (SOG), polymer material, epoxy resin or any other material with adhesion or insulation function.
  • the magnetic substrate 45 can adhere to the magnetic substrate 41 through the non-magnetic material 44 , and the short circuit of the coil 42 due to the material of the magnetic substrate 45 can be prevented. Furthermore, the additional magnetic substrate 45 can increase the inductance of the magnetic device 4 c and decrease the inductor loss.
  • two magnetic devices 4 are connected oppositely to form the magnetic device 4 d .
  • the magnetic devices 4 can be adhered to each other and separated by the non-magnetic material 44 .
  • two magnetic substrates 45 are adhered to the top and bottom sides of the magnetic device 4 b , respectively, to form the magnetic device 4 e .
  • the magnetic substrates 45 can be adhered to the magnetic device 4 b through the non-magnetic materials 44 .
  • the magnetic devices 4 , 4 a , 4 c with one-sided coil can be applied to the inductors or some electronic devices with one-sided coil.
  • the magnetic devices 4 b , 4 d and 4 e with two-sided coils can be applied to the filters, transformers, double-layer inductors or some electronic devices with two-sided coils.
  • the manufacturing method of the magnetic devices 4 , 4 c of the invention is illustrated as follows.
  • a magnetic substrate 41 having at least one recess 43 is formed by sintering or curing a magnetic base.
  • a metal layer 46 is formed in the recesses 43 .
  • a portion of the metal layer 46 is removed for forming the coil 42 .
  • the magnetic device 4 can be manufactured.
  • the metal layer 46 can be formed by electroplating, electroless plating or deposition.
  • the metal layer 46 can be made by screen printing a copper paste or a silver paste on the recesses 43 , and then is cured.
  • the portion of the metal layer 46 can be removed by a semiconductor process, a MEMS process or a grinding process.
  • the manufacturing method further includes a step of forming a non-magnetic material 44 at one side of the coil 42 , so that the coil 42 can be disposed between the non-magnetic material 44 and the magnetic substrate 41 .
  • another magnetic substrate 45 is provided to connect to the non-magnetic material 44 , thereby forming the magnetic device 4 c .
  • the non-magnetic material 44 can be formed by deposition or coating.
  • the magnetic substrate 45 can connect to the non-magnetic material 44 by adhesion or wedging.
  • the magnetic devices 4 a , 4 b , 4 d , 4 e can also be made by the above-mentioned manufacturing method.
  • the magnetic substrate 41 a is cylindrical so that it can be rotated to make the metal layer uniformly formed thereon.
  • the magnetic device 4 b because the recesses are disposed in two sides of the magnetic device 4 b , two metal layers are needed.
  • the magnetic device 4 d two magnetic devices 4 can be manufactured in advance and then adhered to each other through the non-magnetic material 44 .
  • it can be formed by the manufacturing processes of the magnetic device 4 b and the magnetic device 4 c.
  • the recesses of the magnetic substrate can be formed by many methods.
  • the first method for forming the recesses is illustrated below with reference to FIGS. 6A to 6C .
  • a magnetic powder is disposed into a mold 5 , which has the structure corresponding to the recess 43 . Then, the magnetic powder in the mold 5 is pressurized to form a magnetic base 47 .
  • the structure of the mold 5 corresponding to the recess 43 can be made by ordinary machining, etching, electrical discharge machining (EDM) or micro electroforming with UVLIGA technology.
  • the magnetic powder can include ferrite and polymer material as binder; otherwise, it can include metal soft magnetic powder and polymer material.
  • the mold 5 is then removed.
  • the magnetic base 47 is processed to form the magnetic substrate 41 with the recess 43 .
  • the magnetic base 47 containing ferrite powder can be sintered to form the magnetic substrate 41 , and the magnetic base 47 containing metal soft magnetic powder can be cured to form the magnetic substrate 41 .
  • the recess 43 is formed before the magnetic base 47 is sintered or cured.
  • the second method for forming the recess 43 is illustrated below with reference to FIGS. 7A to 7C .
  • a magnetic base 47 A which has not been sintered or cured, is provided.
  • the recess 43 is formed on the magnetic base 47 A.
  • the recess 43 can be formed by a turning process, a MEMS process, a semiconductor process, an impression process or a grinding process.
  • the MEMS or semiconductor process can include the steps of coating a photoresist layer on the magnetic base 47 A, disposing a mask having the pattern corresponding to the recess 43 over the photoresist layer, exposing and developing the photoresist through the mask etching the magnetic base 47 A, and removing the residual photoresist to obtain the recess 43 .
  • the magnetic base 47 A is sintered or cured to form the magnetic substrate 41 with the recess 43 .
  • the recess 43 is also formed before the magnetic base 47 A is sintered or cured.
  • the third method for forming the recess 43 is illustrated below with reference to FIGS. 8A to 8C .
  • a magnetic base is sintered or cured to form a magnetic substrate 41 .
  • the recess 43 is formed on the magnetic substrate 41 .
  • the recess 43 can be formed by a milling process, a semiconductor process or a MEMS process.
  • the MEMS or semiconductor process can include the steps of: coating a photoresist layer PR on the magnetic substrate 41 , disposing a mask having the pattern corresponding to the recess 43 over the photoresist layer PR, exposing and developing the photoresist layer PR through the mask, etching the magnetic base 47 A (as shown in FIG. 8B ), and removing the photoresist remaining to obtain the recess 43 (as shown in FIG. 8C ).
  • the recess 43 of this embodiment is formed after the magnetic base 47 is sintered or cured.
  • the magnetic substrate of the invention is formed in advance, and the magnetic substrate has the recess for accommodating the coil.
  • the coil of the invention is directly surrounded by the magnetic substrate, so the magnetic device has a thinner thickness and higher inductance.
  • the coil is formed after sintering or curing the magnetic substrate, so the magnetic substrate can have good magnetic properties.
  • the material of the coil is not limited due to the high temperature process.

Abstract

A manufacturing method of a magnetic device includes the steps of forming a magnetic substrate having a plurality of recesses, and forming at least one coil in the recess. In addition, a magnetic device is also disclosed. The magnetic device includes a magnetic substrate and at least one coil. The magnetic substrate has a plurality of recesses and the coil is disposed in the recess.

Description

    CROSS REFERENCE TO RELATED APPLICATIONS
  • This Non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No(s). 096127440 filed in Taiwan, Republic of China on Jul. 27, 2007, the entire contents of which are hereby incorporated by reference.
  • BACKGROUND OF THE INVENTION
  • 1. Field of Invention
  • The invention relates to a magnetic device and a manufacturing method thereof.
  • 2. Related Art
  • Magnetic devices have been widely applied to inductors or noise filters of electronic products. The conventional magnetic devices are made by winding enameled copper wires around magnetic cores. However, the miniaturization of the conventional magnetic devices is restricted by the conventional manufacturing apparatuses, the width of the copper wires and the size of the magnetic cores. Compared with the conventional manufacturing method of winding, the micro-fabrication technology can bring smaller inductors and filters, such as the common-mode noise filters.
  • In order to manufacture a magnetic device such as an inductor, a ferrite that can fit to high frequency operation is often used as a substrate. Then a coil is formed on the ferrite by the micro-fabrication technology. As show in FIG. 1, a coil 13 and two non-magnetic materials 14 and 15 are disposed between two ferrite substrates 11 and 12 so as to form a magnetic device 1. Because the magnetic device 1 must be surface-planarized, the non-magnetic materials 14 and 15 are indispensable and the thicknesses thereof must be greater than a certain value. Hence the whole thickness of the magnetic device 1 is larger than that desired. Furthermore, the coil 13 is surrounded by the non-magnetic materials 14 and 15, so the inductance of the magnetic device 1 is reduced.
  • As shown in FIG. 2, a first ferrite 22, a coil 23, a second ferrite 24 and two external electrodes 25 are formed on a substrate 21 in sequence by screen printing, and then sintered to form a magnetic device 2. Because the coil 23 of the magnetic device 2 is directly surrounded by the ferrites 22, 24, the magnetic device 2 can be thinner and higher inductance. However, since the sintering temperature is up to 1000° C. to 1200° C., the usable material of the coil 23 is limited. For example, aluminum can not be adopted as the material of the coil 23.
  • As shown in FIG. 3, a first ferrite 32, a seed layer 35, a coil 33, a second ferrite 34 and a protection layer 36 are formed in sequence on a substrate 31 by electroplating to form a magnetic device 3. Because the coil 33 of the magnetic device 3 is directly surrounded by the ferrites 32, 34, the magnetic device 3 can become thinner and higher inductance. However, the magnetic properties of the ferrites 32 and 34 made by a ferrite plating method are poorer than that of the ferrites made by sintering. Thus, the magnetic device 3 has worse inductance and quality factor (Q) than that of the magnetic device 2.
  • Therefore, there is a need to provide a magnetic device and a manufacturing method thereof that can become thinner and higher inductance and have no limitation on the material of the coil.
  • SUMMARY OF TEE INVENTION
  • In view of the foregoing, the invention is to provide a magnetic device and a manufacturing method thereof that can become thinner and higher inductance and has no limitation on the material of the coil.
  • To achieve the above, the invention discloses a manufacturing method of a magnetic device including the steps of: forming a magnetic substrate having at least one recess, and forming at least one coil at the recess.
  • To achieve the above, the invention also discloses a magnetic device includes a magnetic substrate and at least one coil. The magnetic substrate has at least one recess, and the coil is disposed in the recess.
  • As mentioned above, the magnetic substrate of the invention is formed in advance, and the magnetic substrate has the recess for accommodating the coil. Compared with the prior art, because the coil is directly surrounded by the magnetic substrate in the invention, the magnetic device has a thinner thickness and higher inductance. Furthermore, in the invention the coil is formed after the magnetic substrate is made, so the magnetic substrate can be made by sintering if the material of the substrate is ferrite. Therefore, the magnetic substrate can have pretty good magnetic properties, and the material of the coil is not limited because of the high temperature process.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • The invention will become more fully understood from the detailed description and accompanying drawings, which are given for illustration only, and thus are not limitative of the present invention, and wherein:
  • FIG. 1 is a schematic view of a first conventional magnetic device;
  • FIG. 2 is a schematic view of a second conventional magnetic device;
  • FIG. 3 is a schematic view of a third conventional magnetic device;
  • FIGS. 4A to 4F are schematic diagrams of magnetic devices according to various embodiments of the invention;
  • FIGS. 5A to 5D are schematic diagrams showing the manufacturing steps of two of the magnetic devices according to the embodiments of the invention;
  • FIGS. 6A to 6C are schematic diagrams showing a first manufacturing method of the recess of the magnetic device according to the embodiments of the invention;
  • FIGS. 7A to 7C are schematic diagrams showing a second manufacturing method of the recess of the magnetic device according to the embodiments of the invention; and
  • FIGS. 8A to 8C are schematic diagrams showing a third manufacturing method of the recess of the magnetic device according to the embodiments of the invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • The present invention will be apparent from the following detailed description, which proceeds with reference to the accompanying drawings, wherein the same references relate to the same elements.
  • As shown in FIG. 4A, a magnetic device 4 according to an embodiment of the invention includes a magnetic substrate 41 and at least one coil 42. The magnetic substrate 41 can be formed by sintering or curing. The magnetic substrate 41 has at least one recess 43 disposed on one side of the magnetic substrate 41 for accommodating the coil 42. If the magnetic substrate 41 is formed by sintering, the material of the magnetic substrate 41 can be ferrite mixed with a binder. The ferrite can be, for example, NiZn ferrite or MnZn ferrite. If the magnetic substrate 41 is formed by curing, the material of the magnetic substrate 41 can be a metal soft magnetic powder mixed with a polymer material as the isolation among magnetic particles. In addition, the material of the coil 42 can be alloy or metal such as copper or aluminum.
  • In the embodiment, the magnetic device 4 can have several variations, for example as shown in FIGS. 4B to 4F.
  • As shown in FIG. 4B, the magnetic substrate 41A of the magnetic device 4 a is a cylindrical magnetic core, and the recess 43A is disposed on the outer surface of the magnetic core. The coil 42A is disposed in the recess 43A.
  • As shown in FIG. 4C, in the magnetic device 4 b, the recesses 43 and 43B are disposed on the opposite sides of the magnetic substrate 41B. The coils 42 and 42B are disposed in the recesses 43 and 43B, respectively, so that the magnetic device 4 b has the coils 42 and 42B disposed at its opposite sides.
  • As shown in FIG. 4D, the magnetic device 4 c further includes a non-magnetic material 44 formed on the coil 42 and the magnetic substrate 41 with recesses 43 accommodating the coil 42. Therefore, the coil 42 is disposed between the non-magnetic material 44 and the magnetic substrate 41. Moreover, the magnetic device 4 c further includes another magnetic substrate 45 which is connected to the non-magnetic material 44. In the embodiment, the non-magnetic material 44 can be oxide, nitride, spin-on glass (SOG), polymer material, epoxy resin or any other material with adhesion or insulation function. Therefore, the magnetic substrate 45 can adhere to the magnetic substrate 41 through the non-magnetic material 44, and the short circuit of the coil 42 due to the material of the magnetic substrate 45 can be prevented. Furthermore, the additional magnetic substrate 45 can increase the inductance of the magnetic device 4 c and decrease the inductor loss.
  • As shown in FIG. 4E, two magnetic devices 4 are connected oppositely to form the magnetic device 4 d. In the embodiment, the magnetic devices 4 can be adhered to each other and separated by the non-magnetic material 44.
  • As shown in FIG. 4F, two magnetic substrates 45 are adhered to the top and bottom sides of the magnetic device 4 b, respectively, to form the magnetic device 4 e. In the embodiment, the magnetic substrates 45 can be adhered to the magnetic device 4 b through the non-magnetic materials 44.
  • The magnetic devices 4, 4 a, 4 c with one-sided coil can be applied to the inductors or some electronic devices with one-sided coil. The magnetic devices 4 b, 4 d and 4 e with two-sided coils can be applied to the filters, transformers, double-layer inductors or some electronic devices with two-sided coils.
  • With reference to FIGS. 5A to 5D, the manufacturing method of the magnetic devices 4, 4 c of the invention is illustrated as follows.
  • At first, as shown in FIG. 5A, a magnetic substrate 41 having at least one recess 43 is formed by sintering or curing a magnetic base. Next, as shown in FIG. 5B, a metal layer 46 is formed in the recesses 43. Then, as shown in FIG. 5C, a portion of the metal layer 46 is removed for forming the coil 42. Through the above-mentioned steps, the magnetic device 4 can be manufactured. In the embodiment, the metal layer 46 can be formed by electroplating, electroless plating or deposition. Alternatively, the metal layer 46 can be made by screen printing a copper paste or a silver paste on the recesses 43, and then is cured. The portion of the metal layer 46 can be removed by a semiconductor process, a MEMS process or a grinding process.
  • In addition, as shown in FIG. 5D, the manufacturing method further includes a step of forming a non-magnetic material 44 at one side of the coil 42, so that the coil 42 can be disposed between the non-magnetic material 44 and the magnetic substrate 41. Then, another magnetic substrate 45 is provided to connect to the non-magnetic material 44, thereby forming the magnetic device 4 c. In the embodiment, the non-magnetic material 44 can be formed by deposition or coating. The magnetic substrate 45 can connect to the non-magnetic material 44 by adhesion or wedging.
  • To be noted that the magnetic devices 4 a, 4 b, 4 d, 4 e can also be made by the above-mentioned manufacturing method. For the magnetic device 4 a, the magnetic substrate 41 a is cylindrical so that it can be rotated to make the metal layer uniformly formed thereon. For the magnetic device 4 b, because the recesses are disposed in two sides of the magnetic device 4 b, two metal layers are needed. For the magnetic device 4 d, two magnetic devices 4 can be manufactured in advance and then adhered to each other through the non-magnetic material 44. For the magnetic device 4 e, it can be formed by the manufacturing processes of the magnetic device 4 b and the magnetic device 4 c.
  • In the above embodiments, the recesses of the magnetic substrate can be formed by many methods. The first method for forming the recesses is illustrated below with reference to FIGS. 6A to 6C.
  • As shown in FIG. 6A, a magnetic powder is disposed into a mold 5, which has the structure corresponding to the recess 43. Then, the magnetic powder in the mold 5 is pressurized to form a magnetic base 47. In the embodiment, the structure of the mold 5 corresponding to the recess 43 can be made by ordinary machining, etching, electrical discharge machining (EDM) or micro electroforming with UVLIGA technology. The magnetic powder can include ferrite and polymer material as binder; otherwise, it can include metal soft magnetic powder and polymer material. As shown in FIG. 6B, the mold 5 is then removed. As shown in FIG. 6C, the magnetic base 47 is processed to form the magnetic substrate 41 with the recess 43. Herein, the magnetic base 47 containing ferrite powder can be sintered to form the magnetic substrate 41, and the magnetic base 47 containing metal soft magnetic powder can be cured to form the magnetic substrate 41. To be noted, the recess 43 is formed before the magnetic base 47 is sintered or cured.
  • The second method for forming the recess 43 is illustrated below with reference to FIGS. 7A to 7C.
  • As shown in FIG. 7A, a magnetic base 47A, which has not been sintered or cured, is provided. As shown in FIG. 7B, the recess 43 is formed on the magnetic base 47A. In the embodiment, the recess 43 can be formed by a turning process, a MEMS process, a semiconductor process, an impression process or a grinding process. The MEMS or semiconductor process can include the steps of coating a photoresist layer on the magnetic base 47A, disposing a mask having the pattern corresponding to the recess 43 over the photoresist layer, exposing and developing the photoresist through the mask etching the magnetic base 47A, and removing the residual photoresist to obtain the recess 43. As shown in FIG. 7C, the magnetic base 47A is sintered or cured to form the magnetic substrate 41 with the recess 43. In the embodiment, the recess 43 is also formed before the magnetic base 47A is sintered or cured.
  • The third method for forming the recess 43 is illustrated below with reference to FIGS. 8A to 8C.
  • As shown in FIG. 8A, a magnetic base is sintered or cured to form a magnetic substrate 41. As shown in FIG. 8B, the recess 43 is formed on the magnetic substrate 41. In the embodiment, the recess 43 can be formed by a milling process, a semiconductor process or a MEMS process. The MEMS or semiconductor process can include the steps of: coating a photoresist layer PR on the magnetic substrate 41, disposing a mask having the pattern corresponding to the recess 43 over the photoresist layer PR, exposing and developing the photoresist layer PR through the mask, etching the magnetic base 47A (as shown in FIG. 8B), and removing the photoresist remaining to obtain the recess 43 (as shown in FIG. 8C). To be noted, the recess 43 of this embodiment is formed after the magnetic base 47 is sintered or cured.
  • In summary, the magnetic substrate of the invention is formed in advance, and the magnetic substrate has the recess for accommodating the coil. Compared with the prior art, the coil of the invention is directly surrounded by the magnetic substrate, so the magnetic device has a thinner thickness and higher inductance. Furthermore, the coil is formed after sintering or curing the magnetic substrate, so the magnetic substrate can have good magnetic properties. In addition, the material of the coil is not limited due to the high temperature process.
  • Although the invention has been described with reference to specific embodiments, this description is not meant to be construed in a limiting sense. Various modifications of the disclosed embodiments, as well as alternative embodiments, will be apparent to persons skilled in the art. It is, therefore, contemplated that the appended claims will cover all modifications that fall within the true scope of the invention.

Claims (24)

1. A manufacturing method of a magnetic device comprising steps of:
forming a first magnetic substrate having at least one recess; and
forming at least one coil in the recess.
2. The manufacturing method as recited in claim 1, wherein the first magnetic substrate is formed by sintering or curing a magnetic base, and the recess is formed on the magnetic base before the magnetic base is sintered or cured.
3. The manufacturing method as recited in claim 2, wherein before the step of sintering or curing the magnetic base, the manufacturing method further comprises steps of:
disposing a magnetic powder into a mold having a structure corresponding to the recess;
pressing the magnetic powder to form the magnetic base; and
removing the mold.
4. The manufacturing method as recited in claim 2, wherein before the step of sintering or curing the magnetic base, the manufacturing method further comprises a step of forming the recess on the magnetic base through a turning process, a MEMS process, a semiconductor process, an impression process or a grinding process.
5. The manufacturing method as recited in claim 2, wherein after the step of forming the first magnetic substrate, the manufacturing method further comprises a step of forming the recess on the first magnetic substrate by milling machining, EDM, laser machining a semiconductor process or a MEMS process.
6. The manufacturing method as recited in claim 4, wherein the MEMS process or the semiconductor process comprises steps of:
coating a photoresist layer on the magnetic base;
disposing a mask with a pattern corresponding to the recess on the photoresist layer;
exposing and developing the photoresist through the mask;
etching the magnetic base; and
removing the photoresist so as to form the recess.
7. The manufacturing method as recited in claim 5, wherein the MEMS process or the semiconductor process comprises steps of:
coating a photoresist layer on the magnetic base;
disposing a mask with a pattern corresponding to the recess on the photoresist layer;
exposing and developing the photoresist through the mask;
etching the magnetic base; and
removing the photoresist so as to form the recess.
8. The manufacturing method as recited in claim 1, wherein the step of forming the coil comprises steps of:
forming a metal layer on the recess; and
removing a portion of the metal layer to form the coil.
9. The manufacturing method as recited in claim 7, wherein the metal layer is formed by electroplating, electroless plating, deposition, or curing a copper paste or a silver paste printed in the recess, and the portion of the metal layer is removed by a semiconductor process, a MEMS process or a grinding process.
10. The manufacturing method as recited in claim 1, wherein after the step of forming the coil, the manufacturing method further comprises:
forming a non-magnetic material on the first magnetic substrate and the coil.
11. The manufacturing method as recited in claim 10, wherein the non-magnetic material is formed by deposition or coating, and the non-magnetic material comprises oxide, nitride, spin-on glass (SOG), a polymer material, an epoxy resin or an insulation material.
12. The manufacturing method as recited in claim 10, further comprising a step of forming a second magnetic substrate for connecting to the non-magnetic material by adhesion or wedging.
13. The manufacturing method as recited in claim 12, wherein the second magnetic substrate has at least one recess and at least one coil is disposed in the recess of the second magnetic substrate.
14. The manufacturing method as recited in claim 1, further comprising steps of:
forming two connection materials on opposite sides of the first magnetic substrate; and
connecting the connection materials to a second magnetic substrate and a third magnetic substrate, respectively.
15. A magnetic device comprising:
a first magnetic substrate having at least one recess; and
at least one coil disposed in the recess.
16. The magnetic device as recited in claim 15, wherein the first magnetic substrate has a plurality of recesses, and the recesses are disposed on opposite sides or one side of the first magnetic substrate.
17. The magnetic device as recited in claim 16, wherein when the coil is disposed on one side of the first magnetic substrate, the magnetic device is an inductor, and when the coils are disposed on the opposite sides of the first magnetic substrate, the magnetic device is a filter, a transformer or a double-layer inductor.
18. The magnetic device as recited in claim 15, wherein the first magnetic substrate is a magnetic core, or a cylindrical magnetic core, and the recess is disposed on an outer surface of the magnetic core.
19. The magnetic device as recited in claim 14, wherein a material of the first magnetic substrate comprises ferrite, NiZn ferrite, MnZn ferrite or metal soft magnetic powder mixed with a polymer material.
20. The magnetic device as recited in claim 15, wherein a material of the coil comprises metal, alloy, copper or aluminum.
21. The magnetic device as recited in claim 15, further comprising a non-magnetic material disposed on the coil and the first magnetic substrate such that the coil is disposed between the non-magnetic material and the first magnetic substrate.
22. The magnetic device as recited in claim 21, further comprising a second magnetic substrate connected to the nonmagnetic material, wherein the second magnetic substrate has at least one recess and at least one coil is disposed in the recess of the second magnetic.
23. The magnetic device as recited in claim 15, further comprising:
two non-magnetic materials disposed on opposite sides of the first magnetic substrate; and
a second magnetic substrate and a third magnetic substrate connected to the non-magnetic materials, respectively.
24. The magnetic device as recited in claim 20, wherein a material of the non-magnetic material comprises oxide, nitride, SOG, polymer material or epoxy resin.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100003193A1 (en) * 2008-07-03 2010-01-07 University Of Virginia Patent Foundation Unit dosage of apadenoson
CN103872790A (en) * 2012-12-13 2014-06-18 Lg伊诺特有限公司 Wireless power receiver and method of manufacturing the same
US20140203900A1 (en) * 2013-01-22 2014-07-24 Samsung Electro-Mechanics Co., Ltd. Common mode filter and method of manufacturing the same
US20150145629A1 (en) * 2013-11-26 2015-05-28 Samsung Electro-Mechanics Co., Ltd. Electronic component and circuit board having the same mounted thereon
US20160254579A1 (en) * 2013-10-07 2016-09-01 Koninklijke Philips N.V. Precision batch production method for manufacturing ferrite rods
US9553476B2 (en) 2012-03-23 2017-01-24 Lg Innotek Co., Ltd. Antenna assembly and method for manufacturing same
US9806565B2 (en) 2012-03-23 2017-10-31 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
WO2018200804A1 (en) * 2017-04-28 2018-11-01 3D Glass Solutions, Inc. Rf circulator
US20190279807A1 (en) * 2018-03-08 2019-09-12 Samsung Electro-Mechanics Co., Ltd. Coil component
US10665377B2 (en) 2014-05-05 2020-05-26 3D Glass Solutions, Inc. 2D and 3D inductors antenna and transformers fabricating photoactive substrates
US10854946B2 (en) 2017-12-15 2020-12-01 3D Glass Solutions, Inc. Coupled transmission line resonate RF filter
US10903545B2 (en) 2018-05-29 2021-01-26 3D Glass Solutions, Inc. Method of making a mechanically stabilized radio frequency transmission line device
US20210104357A1 (en) * 2019-10-08 2021-04-08 Murata Manufacturing Co., Ltd. Inductor component and method for manufacturing inductor component
US11076489B2 (en) 2018-04-10 2021-07-27 3D Glass Solutions, Inc. RF integrated power condition capacitor
US11139582B2 (en) 2018-09-17 2021-10-05 3D Glass Solutions, Inc. High efficiency compact slotted antenna with a ground plane
US11161773B2 (en) 2016-04-08 2021-11-02 3D Glass Solutions, Inc. Methods of fabricating photosensitive substrates suitable for optical coupler
US11264167B2 (en) 2016-02-25 2022-03-01 3D Glass Solutions, Inc. 3D capacitor and capacitor array fabricating photoactive substrates
US11270843B2 (en) 2018-12-28 2022-03-08 3D Glass Solutions, Inc. Annular capacitor RF, microwave and MM wave systems
US20220095462A1 (en) * 2020-09-18 2022-03-24 Advanced Semiconductor Engineering, Inc. Package substrate and method for manufacturing the same
US11342896B2 (en) 2017-07-07 2022-05-24 3D Glass Solutions, Inc. 2D and 3D RF lumped element devices for RF system in a package photoactive glass substrates
US11373908B2 (en) 2019-04-18 2022-06-28 3D Glass Solutions, Inc. High efficiency die dicing and release
US11458662B2 (en) * 2017-07-04 2022-10-04 Leoni Bordnetz-Systeme Gmbh Method for producing plastic/metal hybrid components
US11594457B2 (en) 2018-12-28 2023-02-28 3D Glass Solutions, Inc. Heterogenous integration for RF, microwave and MM wave systems in photoactive glass substrates
US11677373B2 (en) 2018-01-04 2023-06-13 3D Glass Solutions, Inc. Impedence matching conductive structure for high efficiency RF circuits
US11784502B2 (en) 2014-03-04 2023-10-10 Scramoge Technology Limited Wireless charging and communication board and wireless charging and communication device
US11908617B2 (en) 2020-04-17 2024-02-20 3D Glass Solutions, Inc. Broadband induction
US11962057B2 (en) 2020-04-03 2024-04-16 3D Glass Solutions, Inc. Glass based empty substrate integrated waveguide devices

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101134625B1 (en) * 2010-07-16 2012-04-09 주식회사 한림포스텍 Core assembly for wireless power transmission, power supplying apparatus for wireless power transmission having the same, and method for manufacturing core assembly for wireless power transmission
CN102867615A (en) * 2011-07-04 2013-01-09 官淑燕 Low-configuration and high-power inductor
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6448879B1 (en) * 1997-12-18 2002-09-10 Murata Manufacturing Co., Ltd. Coil component
US6713162B2 (en) * 2000-05-31 2004-03-30 Tdk Corporation Electronic parts
US6831543B2 (en) * 2000-02-28 2004-12-14 Kawatetsu Mining Co., Ltd. Surface mounting type planar magnetic device and production method thereof
US20060152321A1 (en) * 2005-01-07 2006-07-13 Samsung Electro-Mechanics Co., Ltd. Planar magnetic inductor and method for manufacturing the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0547563A (en) * 1991-08-09 1993-02-26 Tokin Corp Inductor and manufacture thereof
JPH06224042A (en) * 1993-01-27 1994-08-12 Matsushita Electric Ind Co Ltd Flat inductor and manufacture thereof
JPH06310334A (en) * 1993-04-23 1994-11-04 Tokin Corp Inductor and manufacture thereof
JPH07106141A (en) * 1993-09-30 1995-04-21 Tokin Corp Small size inductor and manufacture thereof
JPH07201574A (en) * 1993-12-28 1995-08-04 Fuji Elelctrochem Co Ltd Inductor and its manufacture
JP2004327612A (en) * 2003-04-23 2004-11-18 Tdk Corp Substrate having conductor line, its manufacturing method and electronic component

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6448879B1 (en) * 1997-12-18 2002-09-10 Murata Manufacturing Co., Ltd. Coil component
US6831543B2 (en) * 2000-02-28 2004-12-14 Kawatetsu Mining Co., Ltd. Surface mounting type planar magnetic device and production method thereof
US6713162B2 (en) * 2000-05-31 2004-03-30 Tdk Corporation Electronic parts
US20060152321A1 (en) * 2005-01-07 2006-07-13 Samsung Electro-Mechanics Co., Ltd. Planar magnetic inductor and method for manufacturing the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100003193A1 (en) * 2008-07-03 2010-01-07 University Of Virginia Patent Foundation Unit dosage of apadenoson
US9806565B2 (en) 2012-03-23 2017-10-31 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
US10804740B2 (en) 2012-03-23 2020-10-13 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
US10673141B2 (en) 2012-03-23 2020-06-02 Lg Innotek Co., Ltd. Antenna assembly and method for manufacturing same
US10277071B2 (en) 2012-03-23 2019-04-30 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
US10270291B2 (en) 2012-03-23 2019-04-23 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
US9553476B2 (en) 2012-03-23 2017-01-24 Lg Innotek Co., Ltd. Antenna assembly and method for manufacturing same
US10256540B2 (en) 2012-03-23 2019-04-09 Lg Innotek Co., Ltd. Antenna assembly and method for manufacturing same
EP2744119B1 (en) * 2012-12-13 2017-03-01 LG Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
US9653208B2 (en) * 2012-12-13 2017-05-16 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
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US20140167521A1 (en) * 2012-12-13 2014-06-19 Lg Innotek Co., Ltd. Wireless power receiver and method of manufacturing the same
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US10062493B2 (en) * 2013-11-26 2018-08-28 Samsung Electro-Mechanics Co., Ltd. Electronic component and circuit board having the same mounted thereon
US11784502B2 (en) 2014-03-04 2023-10-10 Scramoge Technology Limited Wireless charging and communication board and wireless charging and communication device
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