Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUS3650042 A
Publication typeGrant
Publication dateMar 21, 1972
Filing dateMay 19, 1969
Priority dateMay 19, 1969
Publication numberUS 3650042 A, US 3650042A, US-A-3650042, US3650042 A, US3650042A
InventorsFrank E Boerger, William H White
Original AssigneeIbm
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Gas barrier for interconnecting and isolating two atmospheres
US 3650042 A
Abstract
A transition or isolation zone for accommodating continuous free flow of a tier of articles between two distinct and isolated atmospheres. The transition zone includes a series of alternate inlet and outlet compartments for a non-reactive gas wherein the compartments contain inlet and outlet openings interconnecting with each other and the indicated atmospheres. The cross sections of the openings are complementary to the cross section of the tier of articles to provide a restricted orifice-size clearance therebetween, whereby the orifice phenomena can be employed by correlation of pressures to control the flow of gas and conversely to substantially completely isolate the indicated atmospheres without any measurable cross-migration therebetween.
Images(46)
Previous page
Next page
Claims  available in
Description  (OCR text may contain errors)

United States Patent Boerger et al. 5] Mar. 21, 1972 54] GAS BARRIER FOR 2,963,001 12/1960 Alexander ..34 242 x INTERCONNECTING AND ISOLATING 3,067,602 l2/ 1962 Brunt ..68/5 E wo S E S 1 3,349,578 10/1967 Greer ..34/242 X [72] Inventors: Frank E. Boerger; William H. White, both Primary Examiner-Edward J. Michael of Poughkeepsie, NY. Attorney-Hanifin and Jancin and Henry Powers [73] Assignee: International Business Machines Corpora- ABSTRACT tion, Armonk, NY.

A transition or isolation zone for accommodating continuous free flow of a tier of articles between two distinct and isolated atmospheres. The transition zone includes a series of alternate inlet and outlet compartments for a non-reactive gas wherein the compartments contain inlet and outlet openings interconnecting with each other and the indicated atmospheres. The cross sections of the openings are complementary to the cross section of the tier of articles to provide a restricted orifice-size clearance therebetween, whereby the orifice phenomena can be employed by correlation of pressures to control the flow of gas and conversely to substantially completely isolate the indicated atmospheres without any measurable cross-migration therebetween.

38 Claims, 71 Drawing Figures SHEET 01UF46 PATENTEUHARZI I972 INVENTORS FRANK E. BOERGER WILLIAM H. mm

ATTORNEY FIG.2

PATENTEB MAR 2! i972 SHEET 02 0F 46 SHEET 030F 46 PAIENTEDHARZI m2 PAIENTEB MAR 21 m2 SHEET on or 46 PAIENIEUMAR21 m2 SHEET 080F 16 PATENTEBMAR21 I972 SHEET 07UF 46 PATENTEDIARZ'I I972 SHEET 080F 16 m. wE

PATENTEnMARm I972 SHEET 1UUF46 PAIENTEDMAR21 I972 SHEET 110F416 s l. :T 3 T f m 3 a a 5 NNdE NZ a 32221: a

PATENTEUHAREI I972 SHEET 120F 46 n. r I I! PATENTEDHARZI I972 SHEET 130F 16 PATENTEBMARZI I972 SHEET 1ROF46 SHEET 150F 56 g a m PATENTED MAR 21 I972 PATENTEUHARZI I972 SHEET 190F 46 w g ..l 5 o: M m g

Patent Citations
Cited PatentFiling datePublication dateApplicantTitle
US2873597 *Aug 8, 1955Feb 17, 1959Fahringer Victor TApparatus for sealing a pressure vessel
US2890878 *Dec 28, 1956Jun 16, 1959Nat Res CorpApparatus for annealing in a high vacuum
US2963001 *Sep 16, 1957Dec 6, 1960Continental Can CoChamber sealing apparatus for web materials
US3067602 *Sep 18, 1961Dec 11, 1962British Nylon Spinners LtdApparatus for the treatment of textile materials
US3349578 *Aug 24, 1965Oct 31, 1967Burlington Industries IncSealing device
Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US4048955 *Sep 2, 1975Sep 20, 1977Texas Instruments IncorporatedContinuous chemical vapor deposition reactor
US4268977 *Dec 3, 1979May 26, 1981Exxon Research & Engineering CompanySealing apparatus for ovens
US4938834 *Feb 2, 1989Jul 3, 1990Mitsubishi Denki Kabushiki KaishaApparatus for preventing the oxidation of lead frames during bonding
US5736199 *Dec 5, 1996Apr 7, 1998Northeastern UniversityHeating alloy bath in a pressurized chamber
US6035925 *Apr 2, 1998Mar 14, 2000Northeastern UniversityGating system for continuous pressure infiltration processes
US6286230Sep 7, 1999Sep 11, 2001Applied Komatsu Technology, Inc.Method of controlling gas flow in a substrate processing system
US6387777 *Sep 2, 1998May 14, 2002Kelly T. HurleyVariable temperature LOCOS process
US6620288 *Mar 19, 2001Sep 16, 2003Semiconductor Energy Laboratory Co., Ltd.Substrate treatment apparatus
US6623686Sep 28, 2000Sep 23, 2003Bechtel Bwxt Idaho, LlcSystem configured for applying a modifying agent to a non-equidimensional substrate
US6652654 *Sep 27, 2000Nov 25, 2003Bechtel Bwxt Idaho, LlcSystem configured for applying multiple modifying agents to a substrate
US6799588 *Jul 14, 2000Oct 5, 2004Steag Microtech GmbhApparatus for treating substrates
US6962731Sep 23, 2003Nov 8, 2005Bechtel Bwxt Idaho, LlcProviding processing chambers configured for modifying substrate in continuous feed system; applying second modifying agent to substrate after first modifying agent is applied; providing seals; continuously passing substrate
US7241340Jul 24, 2003Jul 10, 2007Battelle Energy Alliance, LlcSystem configured for applying a modifying agent to a non-equidimensional substrate
US7877895 *Jun 1, 2007Feb 1, 2011Tokyo Electron LimitedSubstrate processing apparatus
US7897495Dec 12, 2006Mar 1, 2011Applied Materials, Inc.Formation of epitaxial layer containing silicon and carbon
US7941937 *Nov 21, 2003May 17, 2011Lg Electronics Inc.Laundry dryer control method
US8137464Mar 26, 2007Mar 20, 2012Lotus Applied Technology, LlcAtomic layer deposition system for coating flexible substrates
US8181356Dec 20, 2010May 22, 2012Tokyo Electron LimitedSubstrate processing method
US8202366Apr 6, 2010Jun 19, 2012Lotus Applied Technology, LlcAtomic layer deposition system utilizing multiple precursor zones for coating flexible substrates
US8372327 *Sep 21, 2007Feb 12, 2013The Boeing CompanyMethod for resin transfer molding composite parts
US8375758Jul 13, 2010Feb 19, 2013The Boeing CompanyInduction forming of metal components with slotted susceptors
US8556619Jul 6, 2011Oct 15, 2013The Boeing CompanyComposite fabrication apparatus
US8637117Oct 14, 2010Jan 28, 2014Lotus Applied Technology, LlcInhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
US8708691Dec 20, 2012Apr 29, 2014The Boeing CompanyApparatus for resin transfer molding composite parts
US8808793 *Oct 15, 2010Aug 19, 2014Seagate Technology LlcDisc vapor lubrication
US20100151131 *Dec 2, 2009Jun 17, 2010Tokyo Electron LimitedFilm deposition apparatus, film deposition method, and computer-readable storage medium
US20100206235 *Mar 16, 2010Aug 19, 2010Alta Devices, Inc.Wafer carrier track
US20110033612 *Oct 15, 2010Feb 10, 2011Seagate Technology LlcDisc vapor lubrication
US20110039026 *Aug 9, 2010Feb 17, 2011Tokyo Electron LimitedFilm deposition apparatus, film deposition method, and computer readable storage medium
US20130140455 *May 22, 2012Jun 6, 2013Dsa Detection LlcMulti-dopant permeation tube
WO2000003422A2 *Jul 13, 1999Jan 20, 2000Applied Komatsu Technology IncGas flow control in a substrate processing system
Classifications
U.S. Classification34/611, 34/242, 68/5.00R, 118/719
International ClassificationC30B31/10, C23F1/00, C23C14/56, C30B31/16, C23C16/54
Cooperative ClassificationH01L21/67173, C23F1/00, C30B31/16, H01L21/6719, H01L21/67109, C23C14/56, C30B31/106, C23C16/54
European ClassificationH01L21/67S2Z6, H01L21/67S2Z2L, H01L21/67S2H4, C30B31/10D, C30B31/16, C23C14/56, C23F1/00, C23C16/54