|Publication number||US3849906 A|
|Publication date||Nov 26, 1974|
|Filing date||Nov 7, 1973|
|Priority date||Nov 7, 1973|
|Also published as||CA1035574A1, DE2442309A1|
|Publication number||US 3849906 A, US 3849906A, US-A-3849906, US3849906 A, US3849906A|
|Inventors||Hansen H, Straub R, Tuczynski E|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (2), Referenced by (3), Classifications (10)|
|External Links: USPTO, USPTO Assignment, Espacenet|
United States Patent Hansen et al.
[ Nov. 26, 1974 ROTARY FLUID APPLICATOR International Business Machines Corporation, Armonk, NY.
Nov. 7, 1973 Inventors:
 References Cited UNITED STATES PATENTS l2/l950 Hensler 34/105 7/l952 Wellborn 34/229 Primary ExaminerKenneth W. Sprague Assistant Examiner.lames C. Yeung Attorney, Agent, or Firm William J. Dick  ABSTRACT Apparatus for applying a fluid medium to a workpiece, the apparatus comprising a chamber and a pair of rotatably mounted disks in the chamber. A workpiece is suspended in the chamber and the disks are provided with a plurality of apertures therein to create a flow of fluid media from one surface of the disk at an oblique angle to the workpiece. The disks are provided with blade-like scallops or notches along their periphery so that a fluid medium applied thereto will effect rotation thereof to create relative movement between the disk and the workpiece.
The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the application. This abstract is neither intended to define the invention of the application nor is it intended to be limiting as to the scope thereof.
10 Claims, 2 Drawing Figures PATENTEL HUVZS I974 FIG. I
ROTARY FLUID APPLICATOR SUMMARY OF THE INVENTION AND STATE OF THE PRIOR ART The present invention relates to apparatus for applying a fluid medium to a workpiece, and more particu larly relates to a rotary drier.
Driers for small workpieces to dispel fluid or the like therefrom are old in the art, and range from the simple expedient of the application of heated air or nitrogen, depending upon the surface coating of the workpiece or the composition thereof, to very elaborate schemes for the application of a drying medium to the work piece.
In view of the above it is a principal object of the present invention to provide novel apparatus for applying a fluid to a workpiece in which the surface of the workpiece is treated uniformly by the fluid.
Another object of the present invention is to provide a novel drier for drying workpiece in which the flow of drying medium against the workpiece is oblique to the surface thereof.
Yet another object of the present invention is to provide a novel drier for semiconductor wafers which more efficiently and in less time is able to dispel liquids from the surface of the wafer by providing a flow of drying medium against the surface thereof oblique to the surface of the wafer.
Yet another object of the present invention is to pro vide novel apparatus for applying a fluid medium to a workpiece which apparatus may be oriented in either the vertical or horizontal plane so as to easily accommodate any desired placement of the article.
Yet another object of the present invention is to provide a novel apparatus which may be duplicated on the opposite side of the workpiece so as to uniformly dry or apply other fluid media to opposite sides of the workpiece.
Other objects and a more complete understanding of the invention may be had by referring to the following specification and claims taken in conjunction with the accompanying drawings in which:
FIG. 1 is a fragmentary sectional view in side elevation of apparatus constructed in accordance with the present invention; and
FIG. 2 is a fragmentary sectional view taken along line 2-2 of FIG. 1.
Referring now to the drawing and especially FIG. 1 thereof, apparatus for applying a fluid medium such as air or nitrogen to a workpiece is illustrated therein. As shown the apparatus comprises a chamber 11 having a workpiece entry port 12 at one end thereof and a fluid medium discharge port 13 at the other end thereof. Means 14, in the illustrated instance a three point holder, acts to suspend a workpiece 15, in the present instance a silicon wafer, within the chamber 11.
In accordance with the invention, means are provided for effecting a flow of fluid medium at an oblique angle onto at least one surface of the workpiece 15. To this end, and as best illustrated in FIG. 1, the means comprises a wheel or disk 16 having a first major surface 16A and second major surface 168 coupled to and mounted for rotation on an axle 17. As shown, the first major surface 16A of the wheel or disk 16 includes a plurality of angulated slots or apertures 17 therein which are connected through passageways 18 to a conduit 19 centrally located in the axle 17. The axle 17, as shown, is mounted for rotation :in the side wall of a housing 20 as by a sleeve bearing 21. A supply of fluid media, such as air or nitrogen, is applied to the conduit 19 by suitable piping 22 which passes through a conduit extension 23 located in a housing extension 24.
The coupling of the conduit extension 23 to the conduit 19 is such as to allow a small amount of the fluid media to escape and pass through and out a media drain 25, located in the housing extension 24.
In order to provide a scrubbing; or swirling action of the media being provided against the workpiece from the slots 17 in the disk 16, means are provided to effect rotation of the disk. To this end, the peripheral edge 16C of the second major surface 168 of the disk 16 is provided with spaced scallops 26 which are aligned for registration with a nozzle 27 through the housing 20, to permit impingement of a second source of fluid media (not shown) against the scallops 26 thereby effecting rotation of the disk 16. Thus the scallops in effect are small blades forming part of a turbine wheel thereby causing the necessary rotation to the disk. This struc ture also permits the wheel or disk 16 to be fitted into the chamber without elaborate labyrinth seals, and permits the discharge of the fluid media, after impingement upon the blade-like scallops, about the periphery of the wheel 16 and into the chamber.
In practice, if it is desired to apply a fluid medium to both sides of the workpiece 15, an identical structure including a wheel or disk 30 may be mounted on the opposite side of the workpiece, the disk including a rear major surface having scallops 31 thereon to impart rotation to the wheel, while providing a source of fluid media as described above against the rear surface of the workpiece 15. In this connection, it may be desirable to effect counter rotation between the two wheels and/or a differential fluid pressure of the fluid medium against opposite surfaces of the workpiece.
Additionally, it may be desirable to provide a differential pressure between the inlet or entry port 12 and the fluid discharge port 13 so as to create a natural flow of fluid media from the chamber 11.
Also, it may be desirable, under certain circumstances, to locate the housing in the horizontal plane as opposed to the vertical plane illustrated in FIG. 1. In this connection the workpiece holder 14 may take one of several forms, none of which are critical to the proper operation of the apparatus. When operated in horizontal plane the flow of media will aid in suspending the workpiece and thus only means to prevent inadvertent displacement along the axis of the chamber Ill is required.
As shown in FIG. 2, the holder for silicon wafers may comprise a pair of arms 14A and 148 which may be separated and brought together to clamp the wafer 15 along its periphery in the present instance at three points.
In operation, the rotation of one or more disks or wheels when used as a drier, effects rapid and uniform drying of the surface of a workpiece such as a semiconductor wafer inasmuch as the provision of a fluid source to create a flow of fluid against the workpiece oblique to the surface thereof tends to drive off any liquids or fluid on the workpiece surface.
Thus the apparatus of the present invention provides for a uniform and quick application of fluids to a workpiece.
Although the invention has been described with a certain degree of particularly, it is understood that the present disclosure has been made only by way of example and that numerous changes in the details of construction and the combination and arrangement of parts and the mode of operation may be made without departing from the spirit and the scope of the invention as hereinafter claimed.
What is claimed is:
1. Apparatus for applying a fluid medium to a workpiece, said apparatus comprising: a chamber; a rotatably mounted disk in said chamber; means for suspending a workpiece in said chamber adjacent said disk, a plurality of angulated slots in the surface of said disk to provide a flow of fluid media from one surface of said disk at an oblique angle to said workpiece, and scallops on said disk, and means to provide a flow of fluid me dium against said scallops to effect a rotation of said disk as said fluid is ejected from said one surface thereof.
2. Apparatus in accordance with claim 1 including internal passageways in said disk and connected to said slots, and conduit means connected to said passageways to provide said fluid medium to said slots.
3. Apparatus in accordance with claim 1 wherein said disk is mounted on one side of said workpiece, and a second disk mounted for rotation on the opposite side of said workpiece, said second disk including a plurality of angulated slots in one surface thereof for providing a flow of fluid media from said one surface thereof at an oblique angle to said workpiece.
4. Apparatus in accordance with claim 3 including scallops on said second disk, and means to provide a flow of fluid medium against said scallops to effect rotation of said second disk.
5. Apparatus for applying a fluid to a workpiece, said apparatus comprising: a chamber having a workpiece entry port and a fluid discharge port; means for suspending a workpiece in said chamber; a disk including an axle and mounted for rotation in said chamber; said disk'having a first major surface and a second major surface; a plurality of angulated slots in said first major surface thereof, and means providing a source of fluid medium through said slots directed towards said worpiece, nozzle means, and means on said disk in registry with said nozzle means whereby a flow of fluid through said nozzle means effects rotation of said wheel to thereby create a flow of fluid against said workpiece oblique to the surface thereof.
6. Apparatus in accordance with claim 5 including internal passageways in said disk and connected to said slots, and conduit means connected to said passageways to provide said fluid medium to said slots.
7. Apparatus in accordance with claim 6 wherein said conduit means extends into and through said axle.
8. Apparatus in accordance with claim 5 wherein said means on said disk includes scallops on said disk.
9. Apparatus in accordance with claim 5 wherein said disk is mounted on one side of said workpiece, and a second disk mounted for rotation on the opposite side of said workpiece, said second disk including means for providing a flow of fluid media from one surface thereof at an oblique angle to said workpiece.
10. Apparatus in accordance with claim 9 including scallops on said second disk, and means to provide a flow of fluid medium against said scallops to effect rotation of said second disk.
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|Cited Patent||Filing date||Publication date||Applicant||Title|
|US2532494 *||Nov 23, 1946||Dec 5, 1950||Mcgraw Electric Co||Method of making paper tubes|
|US2602003 *||Oct 30, 1946||Jul 1, 1952||Willard Storage Battery Co||Rotating apparatus for blowing loose foreign material from articles|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US4736529 *||Jan 28, 1986||Apr 12, 1988||Carl Kramer||Device for the uniform application of gas on a plane surface|
|US4767317 *||Jan 24, 1986||Aug 30, 1988||Carl Kramer||Apparatus for mixing a gas main flow with at least one gas subflow|
|EP0189855A2 *||Jan 23, 1986||Aug 6, 1986||Carl Prof.Dr.-Ing. Kramer||Apparatus for evenly directing a gas towards a flat surface|
|U.S. Classification||34/229, 34/230|
|International Classification||H01L21/304, H01L21/00, H01L21/02, F26B21/00|
|Cooperative Classification||H01L21/67034, F26B21/004|
|European Classification||H01L21/67S2D4D, F26B21/00D|