|Publication number||US4340276 A|
|Application number||US 06/080,530|
|Publication date||Jul 20, 1982|
|Filing date||Oct 10, 1979|
|Priority date||Nov 1, 1978|
|Also published as||CA1134320A, CA1134320A1, DE2944404A1, DE2944404C2|
|Publication number||06080530, 080530, US 4340276 A, US 4340276A, US-A-4340276, US4340276 A, US4340276A|
|Inventors||Kent N. Maffitt, Richard F. Willson|
|Original Assignee||Minnesota Mining And Manufacturing Company|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (17), Non-Patent Citations (6), Referenced by (131), Classifications (25)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application is a continuation-in-part of U.S. Ser. No. 957,022, filed on Nov. 1, 1978 now abandoned, and discloses a microstructured article similar to that disclosed in U.S. Pat. No. 4,114,983, which patent issued Sept. 19, 1978, to K. N. Maffitt, H. U. Brueckner and R. D. Lowrey.
The present invention relates to a method for producing an article having a microstructured surface, and the resultant article. The surface of the article thus forms an interface between the article and the adjacent medium, which if of differing indices of refraction, results in enhanced light transmission and decreased reflectance without producing significant diffuse scattering.
Various types of coatings to reduce reflectivity and improve the transparency of articles such as lenses and windows, and to improve the efficiency of solar cells and solar absorption panels are well known. Perhaps the best known are the single, or preferably multiple, layer interference coatings used on optical lenses, filters and as antireflecting films used on windows. While such coatings are desirable in that they are durable and are known to provide an extremely low reflectivity at specific wavelengths, they exhibit a number of limitations. For example, the optical characteristics of such single layer films are highly sensitive to the wavelength, such that multiple layer coatings must be employed. However, if such multiple layer coatings are used, a significant sensitivity to the direction of incident light results. Interference coatings providing antireflecting characteristics which are simultaneously independent of the incident wavelength and in which the antireflection is substantially uniform over a wide range of incident angles, are, therefore, not known. Furthermore, such interferrometric films are relatively expensive to produce, requiring careful control of the thickness of the coating as well as multiple coating operations.
In addition to such articles in which the reflectance therefrom is reduced via a coating having optical interference characteristics, it is also known to provide articles in which the reflectance is reduced by providing a microstructured surface over which the effective index of refraction varies continuously from the substrate to the ambient environment. See, for example, U.S. Pat. No. 2,432,484 (Moulton) and the above referenced patent to Maffitt et al, which patent is assigned to the present assignee. It is believed that the highly sensitive vision of nocturnal insects, such as moths, is at least partly due to the low reflectivity from the surface of the eyes due to the presence of such a microstructure on the surface of the eye. G. C. Bernhard et al, Acta Physiologica Scand., Vol. 63 243, pp. 1-75 (1965).
Another example of a method of producing an antireflective surface utilizing a regular array of microprotuberances is disclosed in U.S. Pat. No. 4,013,465 (Clapham).
Solar collectors utilizing porous coatings to increase the absorptivity and to minimize the radiation loss due to reverse reflected radiation (visible or IR) are also known. It is also known to utilize micropores, grooves or other "textural" effects in such devices to effect an increase in absorptance. J. Vac. Sci. Tech., Vol. 12, No. 1, Jan/Feb (1975). For example, U.S. Pat. No. 3,490,982 (Sauveniere et al) discloses a method of treating a glass surface to provide a microstructured surface exhibiting reduced reflectivity. Commercial acceptance of some of the coatings, surface treatments and the like disclosed in the above cited references have not proven commercially acceptable, possibly due to the instability of the surfaces, cost or inability to provide uniform surfaces over extended areas.
Articles having a microstructured surface are also disclosed in U.S. Pat. No. 4,190,321, (Dorer & Mikelsons) which patent issued Feb. 26, 1980, and is assigned to the same assignee as the present invention. That patent discloses the treatment of an aluminum surface to form thereon an aluminum hydrate, or boehmite composition having a plurality of randomly positioned leaflets which give the treated surface an antireflecting characteristic. In a somewhat similar manner, U.S. Pat. Nos. 3,871,881, 3,975,197 and 4,054,467 disclose prior inventions of Mikelsons in which aluminum surfaces are treated to provide microstructured boehmite surfaces by which other coatings, applied to the aluminum prior to treatment, become tenaciously bonded to the aluminum. Also, U.S. Pat. No. 3,664,888 (Oga et al) depicts an electrochemical process for treating aluminum or aluminum alloy surfaces which etches the surface, leaving minute irregularities and pinhole cavities which are said to provide mechanical anchorage for subsequently applied resin coatings.
In contrast to prior art microstructured articles such as that of Maffitt et al (U.S. Pat. No. 4,114,983), in which a homogenous polymeric article is provided with a microstructured surface by replication of a master surface into a polymeric material, the present invention is directed to an article in which a durable, microstructured surface is formed directly on the article itself, thus eliminating any need for replication.
Such an article, preferably formed of a variety of polymers such as are increasingly commercially important, is formed, according to the method of the present invention, by first selecting a substrate having a predetermined rate of sputter etching under a given set of sputtering conditions. A material having a lower rate of sputter etching under the same set of conditions is then applied to the substrate in an average thickness in the range of 0.1 to 10 nm, to form a composite surface on which portions of the underlying substrate are exposed between discontinuous microislands of the material. Finally, the composite surface is sputter etched under the given set of sputtering conditions to preferentially etch the exposed portions of the higher sputtering rate substrate, while the discontinuous microislands are etched at a lower rate, resulting in a topography of micropedestals which vary in height within a range of approximately 0.01 and 0.2 μm and which are separated from adjacent micropedestals a distance within a range of approximately 0.05 to 0.5 μm. Such a topography of micropedestals has been found to provide a surface exhibiting substantially decreased specular reflectance, without an attendant increase in diffuse scattering as well as providing improved anchorage for subsequently applied coatings.
In a preferred embodiment, the substrate is selected of a substantially transparent organic polymer, such as a clear acrylic. Upon formation of the micropedestals thereon, the resultant surface exhibits enhanced transmittance as well as decreased reflectance. Even when the article per se is not transparent, such as when it includes a substrate on top of another base material, the substrate nonetheless serves as a non-reflecting, non-absorbing conduit to transmit incoming radiation as efficiently as possible, either completely through the article, as in the case of a lens or the like, or into a radiation absorbing member, as in the case of a heat absorber.
Further, it has been found preferable to utilize a refractory metal such as chromium to form the discontinuous islands. When applied to most polymers, such a metal, either in its metallic state or as converted to a metallic oxide, exhibits a rate of sputter etching which is typically at least an order of magnitude less than that of the polymer, thus resulting in the rapid formation of the micropedestals during the sputter etching operation. This operation is desirably carried out in a reactive atmosphere, e.g. oxygen. Such an atmosphere is believed to promote the formation of metallic oxides which frequently have an appreciably lower rate of sputter etching than that of the metal. Also, such a reactive atmosphere is believed to promote general degradation of polymeric substrates such that the rate of sputter etching is increased.
The articles of the present invention are characterized both by the presence of the micropedestals and the attendant reduction in specular reflectance and enchanced adherence properties, but also by the presence of a generally detectable lower sputtering rate material having a lower rate of sputter etching which remains after termination of the sputter etching operation, and which may contribute to the increased interface transmittance.
FIG. 1: An electron micrograph of a microstructured surface of an article prepared according to one embodiment of this invention;
FIG. 2: Curves A and B respectively show the percent of total reflectance as a function of wavelength for a prior art, untreated surface of a polycarbonate article and for surfaces of a polycarbonate article, one surface of which was treated with chromium pursuant to one embodiment of the present invention;
FIG. 3: Curves A and B respectively show the percent of total transmission as a function of wavelength for a prior art untreated polycarbonate article and for a polycarbonate article treated on one surface with chromium pursuant to one embodiment of the present invention;
FIG. 4: Curves A, B, C and D, respectively, show extent of diffuse scattering, i.e. scattering as a function of angle off normal incidence for the unscattered beam (A) the extent of scattering for a prior art untreated polycarbonate article (B), a polycarbonate article treated on both surfaces pursuant one embodiment of the present invention (C), and a polycarbonate article treated under conditions outside the limits of the present invention (D);
FIG. 5: Curves A and B respectively, show the percent total reflectance as a function of wavelength for prior art untreated surface of an oriented polyester article and for surfaces of an oriented polyester article, both of which were treated using chromium pursuant one embodiment of the present invention;
FIG. 6: Curves A and B respectively show the percent total transmission as a function of wavelength for a prior art untreated oriented polyester article and for an oriented polyester article treated on both surfaces with chromium pursuant one embodiment of the present invention;
FIG. 7: Curves A and B respectively show the percent total reflectance as a function of wavelength for prior art untreated surfaces of an oriented polyester article and for surfaces of an oriented polyester article, both of which were treated using glass pursuant one embodiment of the present invention; and
FIG. 8: Curves A and B respectively, show the percent total transmission as a function of wavelength for a prior art untreated oriented polyester article and for an oriented polyester article treated on both surfaces with glass pursuant one embodiment of the present invention.
In the present invention, a variety of composite surfaces have been found to provide the required differential rates of sputter etching. Such differences in etch rate or sputter yield are controlled by local variations in composition or crystallinity. While the preferred method of producing and controlling such variations is directed to the placement of a discontinuous metal or metal oxide film on an organic polymeric surface, other techniques are similarly within the scope of the present invention. For example, discrete metal particles may be applied to an organic polymer substrate. Such particles, however, are usually relatively large in size and often rearrange in clumps such that the resultant discontinuous microislands are sufficiently large that after the composite surface is sputter etched, the micropedestals are so large that the reflection characteristics of the surface are outside the limits desired of the invention.
Similarly, the sputter etching rate of crystalline polymers has been found to be different in many instances from that of the non-crystalline analog thereof. Accordingly, if a polymer is provided in which both crystalline and non-crystalline regions are present, the difference in sputter etching rate may be utilized to provide the requisite micropedestals. However, since the differences in sputter etching rate for most materials is rather small, the time required to provide the desired amplitude of micropedestals may be much longer than that necessary utilizing other methods.
Another technique involves the preparation of a polymer with metal oxide particles ranging in diameter between 10 and 50 nanometers uniformly dispersed within the polymer. Upon sputter etching, the metal oxide particles will be sputter etched at a rate less than that of a surrounding polymer. However, while such composites are available, the number of polymer choices is somewhat limited, thus restricting the utility of such a technique.
In a preferred embodiment, the structure required to reduce specular reflections below a desired level of 1% per surface across the visible spectrum is random in height within the limits of 0.01 to 0.2 micrometers, and wherein a predominant number of micropedestals in the structure are in the range of 0.1 to 0.2 micrometers. The peak-to-peak separation is also random and preferably ranges between the limitation of 0.05 to 0.5 micrometers, with the preferred separation being in the range of 0.1 to 0.2 micrometers.
In a preferred embodiment, such structures are preferably formed by the following series of steps: A substrate having a range of sputter etching under a given set of sputtering conditions is first selected. Preferably such a substrate is an organic polymer such as polyester, cellulose acetate butyrate, acrylics, and polycarbonates. Onto such a substrate is then applied, such as by vacuum evaporation or sputtering deposition, discontinuous microislands of a material having a rate of sputter etching lower than that of the substrate under the same set of sputter etching conditions. Such a material is applied in an average thickness in the range of 0.1 to 10 nanometers, with a preferred thickness in most cases being less than 2.0 nm. Such an average thickness is sufficiently thin that the material is deposited in the aforementioned discontinuous microislands. While the particular method by which the microislands are formed is not overly critical, it has been found that sputter deposition is preferred due to the fact that improved control is obtainable. Generally, sputter deposition proceeds at a lower rate. Furthermore, sputter deposited material is believed to arrive at the substrate surface with a higher kinetic energy than that of evaporated atoms, for example, and hence have a higher mobility. This higher mobility apparently allows the deposited material to move about on the substrate surface to coalesce with other material, thus remaining as discontinuous microislands having larger average thicknesses than that obtainable with evaporated coatings.
The thus formed composite surface is then sputter etched. Since the discontinuous microislands formed from the deposited films or deposition of fine particles or the like are formed from the materials having a rate of sputter etching which is lower than that of the substrate, the exposed portions of the underlying substrate then etch at a rate which is greater than that of the microislands. This differential etching rate results in the formation of a random topography of micropedestals which vary in height within a range of approximately 0.01 and 0.2 nm. The micropedestals are separated from the adjacent micropedestals a distance within the range of approximately 0.05 to 0.5 nm. The peak-to-peak spacing of the resultant micropedestals is controlled by the spacing of the discontinuous microislands, whereas the overall height of the micropedestals is controlled by a combination of the sputter etching time and power, and the difference in the sputtering yield between the material used to form the microislands and that of the underlying substrate.
The desired differences in the sputter etching rate of the substrate and that of the materials applied to provide the discontinuous microislands thereon is typically in the range of a factor of 10-1000. For example, most suitable polymers have been found to sputter etch at a rate ranging between 150 and 300 nanometers per minute under conditions of approximately 0.4 watts per square centimeter at a pressure of 5 to 10 microns of oxygen. Such sputter etching rates are generally a factor of 2 to 4 times less under similar sputter etching conditions when a partial atmosphere of an inert gas such as argon is used. Where microislands formed of a noble metal are utilized, the sputter etching rate is approximately 1/10 to 1/25 that of typical polymers. If a refractory metal such as chromium is utilized, the sputter etching rate has been found to be typically less than 1/10 that of such polymers, and where a metal oxide is provided, the sputtering rate may be typically as low as one-one hundredth that of the underlying substrate.
While organic polymeric substrates are of primary importance in the present invention, known inorganic substrates are similarly encompassed within the present invention. For example, quartz substrates may be utilized by overcoating the substrate with discontinuous microislands of a polymer, after which the composite surface is differentially sputter etched using a plasma containing a material such as trifluoromethane.
Maximization of differences in etch rate, thus reducing the time required to produce a reflection reducing microstructure on many polymer substrates is best achieved by reactively sputter etching in oxygen. The use of oxygen causes an oxide to form on the discontinuous film coating, thus reducing its etch rate while simultaneously reacting with the polymer and increasing its etch rate. Typically, the etch rate of polymers such as polyester and CR-39 is two to four times higher in oxygen than in argon.
The average film thickness required to form a discontinuous film suitable for production of reflection reducing microstructures is a function of the material being deposited, the composition and structure of the substrate, the substrate temperature, the deposition method and rate and vacuum conditions.
Some non-limiting combinations which have been found to produce the desired microstructures are listed below.
______________________________________ Film DepositionSubstrate Composition Composition Method______________________________________Polyester (oriented) Cr, glass, Al SputteringPolyester (amorphous) Au SputteringCellulose Acetate Glass, Cr SputteringButyrateAcrylic (Rohm and Haas) Cr Sputtering orType 147F Evaporationmethyl methacrylatePolycarbonate Cr SputteringCR-39, a proprietary polycarbonate producedby Pittsburg Plate Glass Inc. (PPG Corp.)especially for optical lens, etc., and whichis composed of diallyl glycol carbonate.______________________________________
As will become more apparent when the results of the specific examples to be discussed later are shown, the method of this invention has the following advantages over heretofore taught methods for producing antireflecting surfaces:
1. The method can be applied to any material that has a sputtering yield higher than that of metal oxides.
2. Microstructure surfaces can be produced on polymers, such as oriented polyester, which are difficult to emboss.
3. The method is adaptable to on-line continuous processing of a web.
4. The resulting microstructured surfaces appear to be more rugged than prior art microstructured surfaces.
5. The need for an expensive mold subject to wear and filling is eliminated.
6. The microstructure dimensions can be varied over a broad range.
7. The substrate may be of any shape so long as the surface can be coated.
A better understanding of the importance of the topographic control of a microstructured surface provided in this invention can be attained by reference to the following specific examples and accompanying figures.
FIG. 1 is a scanning electron micrograph showing a typical microstructured surface of an article of the present invention. As shown in FIG. 1, a typical polymeric optical article according to the present invention has a microstructured surface topographic which can generally be described as a plurality of randomly positioned peaks, a predominant number of which range in amplitude between 0.020 to 0.20 μm. In such articles, the reflectivity is significantly reduced from similar but untreated articles, and if the articles comprise a transparent substrate, the transmissivity is appreciably increased. It is believed that these characteristics are due to a gradation in the index of refraction between that of the medium outside the surface of the article and that of the bulk of the article. In the present invention, the changes in the effective index of refraction varies over a distance ranging between the wavelength of light down to one-tenth that wavelength. Accordingly, it is believed that it is the property of a graded change in the refractive index over this distance which renders the article of the present invention antireflecting, and, under certain conditions, more transmitting over an extended range of optical wavelengths.
A protective paper covering having a pressure-sensitive backing was stripped from a 15 cm×20 cm×0.16 cm piece of Homalite® type 911 (an ophthalmic grade polycarbonate, generally known as CR-39) obtained from the SGL Industries Inc. Wilmington, Del. The small amounts of adhesive remaining on the polymer surface were removed by scrubbing the surface using 95% ethanol. The surface was then further cleaned with a mild detergent and water, followed by a water rinse and a final 95% ethanol (0.8 micron filtered) rinse. The sample was blown dry with nitrogen gas and, if not further processed, stored in a clean laminar flow hood until further processing.
Further processing was done in a Vecco® model 776 radio frequency diode sputtering apparatus operating at a frequency of 13.56 MHz, modified to include a variable impedence matching network. The apparatus included two substantially parallel shielded circular aluminum electrodes 40.6 cm in diameter with a 5 cm gap between them. The electrodes were housed in a glass jar provided with R.F. shielding. The bell jar was evacuatable by means of a mechanical fore/roughing pump with a water cooled trap and oil diffusion pump. The cathode pedestal was cooled by circulating water, and covered by a plate of double strength window glass to prevent sputtering of the underlying aluminum electrodes.
The sample CR-39 panel was centrally attached to the aluminum anode plate by means of small pieces of pressure sensitive adhesive tape at the corners of the sample, with the surface of the CR-39 panel to which a sputtered film was to be applied facing the cathode electrode. The source of the material to be sputter deposited was an evaporated chromium coating in excess of 0.05 μm thick on a plate of double strength window glass, which plate was placed over the glass covered cathode electrode, with the Cr coating facing the CR-39 panel on the anode.
The system was then evacuated to 2×10-5 torr, and argon gas introduced through a needle valve. An equilibrium pressure of 6 to 9×10-3 torr was maintained as argon was continuously introduced and pumped through the system.
R.F. energy was capacitively coupled to the cathode, initiating a plasma and was increased until a cathode power density of 0.38 watts/cm2 is reached, thus causing chromium to be sputtered from the cathode and deposited on the opposing anode. The sputter deposition of chromium metal onto the sample was continued for seven minutes±ten seconds. Reflected power was less than 2%. The coupling capacitance was continuously manually adjusted to maintain the above stated power density. Subsequent measurements using an Airco Temescal FDC 8000 Film Deposition Controller to monitor film thicknesses as a function of time under identical conditions revealed that the sputtered discontinuous film was being deposited at a rate of approximately 0.13 nm/minutes. In seven minutes, the average film thickness was, therefore, approximately 0.9 nm.
The R.F power was then shut off, the argon needle valve closed and the system let up to atmospheric pressure using 0.2 micron filtered air. The chromium coated double strength window glass was removed, revealing the clean uncoated glass covering the aluminum cathode plate. The sample was detached from the anode and placed on the clean glass covered cathode such that the surface with sputter deposited chromium on it faced the anode.
The system was next evacuated to 2×10-5 torr and oxygen introduced by means of a needle valve. An oxygen equilibrium pressures of 6×10-3 torr was maintained in the system and R.F. energy capacitively coupled to the cathode, initiating a plasma. The energy was increased until a cathode power density of 0.31 watts/cm2 was reached. The reactive sputter etching was continued for 60 seconds±3 seconds.
A microstructured surface consisting of chromium or chromium oxide capped pyramid-like micropedestals having a peak-to-peak spacing small compared with the wavelengths of the visible light, such as shown in FIG. 1, was thus formed.
The articles produced by the method of the present invention as demonstrated in Example 1 are characterized by a marked decrease in interface reflectance, an increase in total transmission, and no significant increase of optical scattering. The reflectivity of the air/substrate interface over the range of wavelengths extending between 400 and 700 nm for a prior art nonstructured CR-39 surface and for the microstructured surface described above is shown in FIG. 2, curves A and B respectively. As can be seen, a dramatic reduction in interface reflectivity resulted, wherein the reflectance is essentially reduced to zero for the 400-520 nm region and does not increase to more than 0.7% for the rest of the wavelength region. In optical elements, it is most often desired to increase the interface transmittance and decrease the specular reflection. In such instances, diffuse reflection is to be avoided. The fact that this is indeed the case for the product of this invention is demonstrated by FIG. 3 in which the transmission for an untreated sheet of CR-39 and the sheet treated as in Example 1 are shown.
Further confirmation of the relative lack of diffuse scattering is shown in FIG. 4, where the intensity of light (HeNe laser at a wavelength of 633 nm) scattered from a given object is plotted semilogarithmically as a function of the angle off the normal. In Curve A of FIG. 4, the intensity of the light without an object in the path of the beam is plotted. Curve B shows the scattering of the light for a prior art control panel of CR-39 in which neither surface had been treated. In contrast, Curve C shows the intensity of light scattered from a CR-39 panel where both surfaces were treated as set forth in Example 1. As may there may be seen, the intensity of light scattered at 5° off the normal is approximately five orders of magnitude below the peak intensity at normal. Curve D shows the result when an undesirable surface microstructure is produced. In this case, the differential sputtering was continued for nine minutes, rather than the 60 seconds as in Example 1, to intentionally produce pyramids larger than the preferred range of this invention. As can be seen, the off-normal scattering is approximately two orders of magnitude greater than that for the preferred article. The microstructured surface thus produced according to the method of this invention provides an interface whose reflectivity is relatively independent of the angle of incidence, similar to microstructured surfaces produced by other means, such as, for example, that disclosed in U.S. Pat. No. 4,114,983 (Maffitt et al).
A CR-39 polycarbonate plano-convex lens blank was substituted for the planar sample of Example 1. Each surface of the lens blank was microstructured according to the procedure outlined in Example 1, except that the sputter deposition of chromium was continued for three minutes and the sputter etching was continued for 90 seconds, rather than the 60 seconds of Example 1. The topography of each surface was observed to be substantially the same as that of FIG. 1. Since each surface is microstructured, the transmission of an optical beam over a wavelength region of 400-700 nm was very near 100%, with essentially no off axis scattering.
In this Example, a 10 cm×10 cm×0.2 cm piece of Type 147F pure extruded polymethylmethacrylate sheet from E. I. DuPont Corporation was substituted for the polycarbonate substrates of the previous examples. The sheet was scrubbed clean in mild detergent and water as in Example 1. The sample was rinsed in distilled, deionized and filtered water, and subsequently blown dry with nitrogen gas. Chromium was then sputter deposited on the sample as in Example 1; however, the deposition time was continued for five minutes to provide an average film thickness of about 0.6 nm. Further processing was the same as in Example 1, with the exception that the sputter etch time was about 135 seconds. The air/sample interface produced by this method was characterized by a decrease in interface reflectance, increase in interface transmission and no significant increase of optical scattering, similar to the results as produced in Example 1.
To show the utility of the method of the invention, using other techniques for depositing the discontinuous microislands, in this Example all the materials, processing steps, etc. were the same as in Example 3, except that the discontinuous chromium metal film was produced by resistive evaporation from a tungsten boat in a vacuum of about 2×10-5 torr. Using aforementioned Airco Temescal FDC 8000 film deposition controller to control the deposition, an indicated film of about 0.1 nm of chromium was deposited. After sputter etching as before, reflectivity of the air/acrylic interface over the wavelength region 400-700 nm was observed to vary from about 1% to 2.5%. Thus a significantly decreased reflectance, and hence improved transmission, was demonstrated, although it was not quite as dramatic as in the preferred sputter deposited case.
In this example, both major surfaces of a sheet of 100 μm thick oriented polyester were treated according to the following preferred embodiment of this invention. The surfaces of the polyester were clean as received and thus needed no further cleaning prior to treatment. This sample was treated as in Example 1, except that the discontinuous chromium film was produced by sputter deposition for eight minutes from an evaporated chromium cathode at 0.38 watts/cm2 in 5-6×10-3 torr of Ar to produce an average thickness of about 1.0 nm. The composite surface was then sputter etched for 105 seconds at 0.31 watts/cm2 in 5 to 6μ oxygen. The results of the interface reflection reduction and the attendant transmission increase are shown in FIGS. 5 and 6. In FIG. 5, curve A shows that the total reflectance from both surfaces of an untreated sheet was about 13%, whereas after the surfaces were thus treated (Curve B), the total reflectance was reduced to about 3%. In FIG. 6, the transmission of an untreated sheet is shown in Curve A. In Curve B the transmission of the treated sheet is shown to be significantly increased.
To show the applicability of the present method using non-metallic materials to provide the discontinuous microislands, in this example microislands of glass were provided. As in Example 5, two major surfaces of a 100 μm thick oriented polyester sheet were treated. The surfaces were clean as received and needed no further cleaning. A discontinuous glass film on the polyester surfaces was produced by sputter deposition for eight minutes from a window glass cathode at 0.38 watts/cm2 in 6 to 7 μm argon to provide a discontinuous glass film having an average thickness of 0.7 nm. The sputter etching was carried out for 150 seconds at 0.31 watts/cm2 in 5 to 6μ oxygen. The optical results for this example are shown in FIGS. 7 and 8, wherein FIG. 7, Curve B, shows a total reflectance of about 4% over the visible spectrum for the treated sample, and FIG. 8, Curve B, shows an attendant increase in transmittance.
The use of other metals, particularly those which readily convert to a metal oxide having a very low sputter etching rate, is shown in this Example. An oriented polyester sheet as in Examples 5 and 6 was coated on one major surface with a discontinuous layer of aluminum by sputter deposition for ten minutes from an aluminum plate at 0.23 watts/cm2 in 6 ×10-3 torr of Ar. Under such conditions, Al is deposited at a rate of about 0.1 nm per minute; hence, a discontinuous film having a average thickness of about 1.0 nm was produced. The composite surface was then sputter etched for four minutes at 0.23 watts/cm2 in 6×10-3 torr of oxygen. The decrease in reflectance from the treated surface of about 5% and an attendant increase in transmittance of about 4% for the optical wavelength range of 400 to 700 nm was observed.
The applicability of the present invention to another type polymer and discontinuous film forming material is shown in this Example. Here, a thin, extruded sheet consisting of a layer of an amorphous mixture of 80% terephthalate and 20% isophthalate on an oriented polyester substrate was coated by a 30 second sputter deposition of gold from a gold cathode at 0.38 watts/cm2 in 6×10-3 torr of Ar to provide an average film thickness of about 2.8 nm. This surface was then sputter etched for one to three minutes at 0.31 watts/cm2 in 5 to 6×10-3 torr of oxygen. The microstructured surface which was produced resulted in a surface reflectance reduction as in previous examples.
In this Example, a base resin of Cellulose Acetate Butyrate (CAB) with no additives for extruding was extruded into a rough, approximately 250 μm thick, sheet. The sheet was then thermally flattened in a press at 150° C. and 9 kg/cm2 between chrome plated steel backed plates. The sheet was glass coated by sputter deposition for five minutes from a soft glass cathode in 5 to 6×10-3 torr of argon at 0.38 watts/cm2 to provide a discontinuous glass film having an average thickness of about 1.2 nm. The coated surface was then sputter etched for three minutes in 6×10-3 torr of oxygen at 0.31 watts/cm2 to form the microstructured surface. An interface reduction in reflectance and increase in transmittance resulted as in the previous examples.
The applicability of the invention to a layered substrate is shown in this Example in which a 30% solids solution of CAB and 50/50 MEK and toluene was cast onto a CR-39 substrate and allowed to dry at 30° C. in a nitrogen atmosphere. The sample was then treated as in Example 9, except that it was coated with a discontinuous film of chromium about 0.15 nm thick by sputter deposition for 75 seconds from a chromium cathode at 0.38 watts/cm2 in 6 to 8×10-3 Torr of Ar. The composite surface was sputter etched for 2.25 minutes at 0.31 watts/cm2 in 8×10-3 Torr of oxygen. Again, the surface exhibited a decreased reflectance and increased transmittance as a result of the resultant microstructure.
The utility of the present invention to provide a primed surface exhibiting enhanced adhesion is demonstrated in the following additional examples:
Two 10×30 cm pieces of 0.762 mm thick Rohm & Haas Brand "Tuffak" polycarbonate film were sputter-etched under the following conditions. Discontinuous microislands of Cr metal were first deposited on the film in an RF diode sputtering apparatus operating at 13.56 MH in an Ar gas plasma. A deposition time of 6 minutes at a power density of 0.4 W/cm2 was used. This was immediately followed by a reactive etch in an O2 gas plasma for 2.5 minutes at a power density of 0.32 W/cm2 to produce a desired microstructure.
One piece of the microstructured polycarbonate film was subjected to an adhesion tape peel test as follows. A 10 cm piece of Scotch brand Magic mending tape was folded over itself for 1/3 of its length. The remaining length of exposed adhesive was firmly adhered to the microstructured polycarbonate surface. The tape was then removed from the surface using a forcible upward motion, resulting in the delamination of the adhesive from the tape backing over the entire impressed microstructured area. No adhesive was delaminated when the same test was performed on the unstructured polycarbonate surface.
The second piece of microstructured polycarbonate was overcoated with an epoxy terminated silane UV polymerizable composition and allowed to cure to provide a hard, abrasion resistant layer. The cured overlayer was scored horizontally and vertically with a minimum of 10 lines/in. over an area at least 2.5 cm2 (cross-hatching). Scotch® brand Magic transparent tape was then firmly adhered to the scored area. Upon removal of the tape, delamination of the adhesive was observed, with no evidence of removal of the overlayer. The same test applied to a similar overlayer coated onto unstructured polycarbonate film resulted in a 100% removal of the overlayer and no adhesive delamination.
Two 10 cm×10 cm×0.63 cm pieces of Homalite® type 911 Cr-39 (diallyl glycol carbonate), obtained from SGL Industries, were sputter-etched as in Example 11. In this Example, the Cr deposition time was increased to 7 minutes, and the O2 etch time reduced to 1.25 minutes. A microstructure resulted.
One piece of CR-39 was submitted to the adhesive tape peel test as in Example 11. The adhesive applied to the microstructured surface was delaminated from the tape backing, whereas it remained on the tape backing when applied to the unstructured surface.
The second piece of microstructured CR-39 was coated with an epoxy terminated silane composition and allowed to cure as in Example 11. The coated surface was then scored and adhesive tape firmly adhered to it as in Example 11. Upon removal of the tape, the adhesive delaminated, and no evidence of removal or peeling of the coating was noticed. Submitting coated, unstructured CR-39 to the same test resulted in 100% coating removal (failure).
Two 10×30 cm pieces of 0.2 cm type 147F acrylic sheet such as described in Example 3 were sputter-etched as in Example 11, except that in this example, microislands of soft glass were deposited over a period of 5.5 minutes. After sputter etching in O2 as in Example 11, a microstructure resulted.
One piece of the microstructured acrylic sheet was subjected to the adhesive tape peel test as described in Example 11. The adhesive was delaminated by the microstructure surface but not by the unstructured surface, in a manner identical to the results in Example 11.
The second piece of microstructured acrylic sheet was also coated with an epoxy-terminated silane composition and allowed to cure. The coated surface was then scored and adhesive tape firmly adhered to it as in Example 11. Upon removal of the tape, no evidence of coating removal or peel was noticed. Submitting a similarly coated, unstructured acrylic sheet to the same test resulted in 100% coated removal (failure).
Two 10×30 cm pieces of 0.10 mm polyester film were sputter-etched as in Example 11, except that in this Example the O2 etch time was decreased to 1.75 minutes. A microstructure resulted.
One piece of the microstructured polyester film was subjected to the adhesive tape peel test as described in Example 11. The adhesive applied to the microstructured surface was delaminated, while that applied to the unstructured surface was not.
The second piece of microstructured polyester film was coated with the epoxy-terminated silane composition and allowed to cure. The coated surface was then scored and adhesive tape firmly adhered to it as in Example 11. Upon removal of the tape, no evidence of coating removal or peel was noticed. Submitting coated, unstructured polyester film to the same test resulted in 100% coating removal (failure).
A 0.076 mm film of polyvinylidene fluoride was RF sputter coated with SiO2 for 6 minutes at 0.38 w/cm2 in 5μ Ar. Subsequently, the masked film was etched in an RF generated oxygen plasma for 3 minutes at 0.31 w/cm2 in 5μ 02 to provide a microstructured surface. When tested in the same manner as in Example 11, the resulting film surface was found to delaminate the adhesive from Scotch Brand Magic Mending Tape, whereas the same test applied to an untreated sample of the same film resulted in no adhesive delamination.
0.076 mm films of polyethyleneterephthalate and polybutyleneterephthalate were RF sputter coated with SiO2 for 6 minutes at 0.38 w/cm2 in 5μ Ar. The films were then RF sputter etched in an oxygen plasma for 3 minutes at 0.31 w/cm2 and 5μ O2 to provide a microstructured surface. When tested as in Example 11, resulting microstructures were found to delaminate the adhesive from adhesive tape, whereas untreated samples would not delaminate the adhesive when identically tested.
A 2.5 mm thick piece of nylon resin (Monsanto Vydyne RP-260) was RF sputter coated with 6 min. SiO2 at 0.38 w/cm2 in 5μ Ar. The film was then RF sputter etched in an oxygen plasma for 3 minutes at 0.31 w/cm2 and 5μ O2 to provide a microstructured surface. The resulting surface was tested as before and was found to delaminate adhesive from the adhesive tape, whereas the untreated surface would not.
A 2.5 mm piece of acrylonitrile-butadienestyrene copolymer was RF sputter coated with 6 minutes SiO2 at 0.38 w/cm2 in 5μ Ar. The film was then RF sputter etched in an oxygen plasma for 3 minutes at 0.31 w/cm2 in 5μ O2 to provide a microstructured surface. This surface was again found to delaminate the adhesive from the adhesive tape while an untreated sample did not.
A 2.5 mm piece of a phenylene oxide-based resin (Noryl®) (type PN-235 manufactured by G. E. Corp.) was RF sputter coated with 6 minutes SiO2 at 0.38 w/cm2 in 5μ Ar. The sample was then RF sputter etched in an oxygen plasma for 3 minutes at 0.31 w/cm2 in 5μ O2 to provide a microstructured surface. As in the preceding examples, the treated surface was found to delaminate adhesive from the adhesive tape while an untreated sample did not.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US2432434 *||Mar 1, 1945||Dec 9, 1947||Remington Arms Co Inc||Sanding machine fixture|
|US2628921 *||Apr 18, 1949||Feb 17, 1953||Libbey Owens Ford Glass Co||Method of producing an intermediate metallic oxide film in a multiple layer articles|
|US3490982 *||Aug 24, 1966||Jan 20, 1970||Glaverbel||Method of modifying the light reflecting properties of glass and glass produced thereby|
|US3842306 *||Jun 21, 1973||Oct 15, 1974||Gen Electric||Alumina coatings for an electric lamp|
|US3871881 *||Feb 12, 1973||Mar 18, 1975||Minnesota Mining & Mfg||Coated aluminum substrates having a binder of aluminum hydroxyoxide|
|US3962495 *||Jan 2, 1975||Jun 8, 1976||Rca Corporation||Method of making duplicates of optical or sound recordings|
|US3975197 *||Jan 6, 1975||Aug 17, 1976||Minnesota Mining And Manufacturing Company||Coated aluminum substrates|
|US4005698 *||Oct 18, 1974||Feb 1, 1977||International Business Machines Corporation||Photon energy converter|
|US4013465 *||Feb 9, 1976||Mar 22, 1977||Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland||Reducing the reflectance of surfaces to radiation|
|US4019884 *||Jan 22, 1976||Apr 26, 1977||Corning Glass Works||Method for providing porous broad-band antireflective surface layers on chemically-durable borosilicate glasses|
|US4054467 *||Jun 2, 1976||Oct 18, 1977||Minnesota Mining And Manufacturing Company||Method of coating aluminum substrates|
|US4064030 *||Apr 14, 1976||Dec 20, 1977||Nitto Electric Industrial Co., Ltd.||Process for surface treating molded articles of fluorine resins|
|US4114983 *||Feb 18, 1977||Sep 19, 1978||Minnesota Mining And Manufacturing Company||Polymeric optical element having antireflecting surface|
|US4130672 *||Sep 11, 1974||Dec 19, 1978||Hoya Lens Co., Ltd.||Method for coating anti-reflection film on surface of optical material|
|US4155826 *||Oct 5, 1977||May 22, 1979||Nitto Electric Industrial Co., Ltd.||Process for surface treating molded articles of fluorine resins|
|US4160045 *||Jul 25, 1978||Jul 3, 1979||The United States Of America As Represented By The Secretary Of The Army||Method for producing a scabrous photosensitive surface|
|US4190321 *||Feb 18, 1977||Feb 26, 1980||Minnesota Mining And Manufacturing Company||Microstructured transmission and reflectance modifying coating|
|1||*||C. G. Bernhard, The Insect Corneal Nipple Array, Acta Physiologica Scandinavica, vol. 63, Supplementum 243, 1965, pp. 1-79.|
|2||*||M. Cantagrei . . . Masks For Ion-Beam Etching, J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, pp. 1340-1343.|
|3||*||M. J. Mirtich et al., Adhesive Bonding of Ion-Beam-Textured Metals and Fluoropolymers, J. Vac. Sci. Technol., vol. 16, No. 2, pp. 809-812.|
|4||*||R. E. Peterson et al., Thin Film Coatings in Solar-Thermal Power Systems, J. Vac. Scl. Technol., vol. 12, No. 1, Jan./Feb. 1975, pp. 174-181.|
|5||*||R. S. Berg et al., Surface Texturing by Sputter Etching, J. Vac. Sci. Technol., vol. 13, No. 1, Jan./Feb. 1976, pp. 403-405.|
|6||*||W. R. Hudson, Ion Beam Texturing, J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977 pp. 286-289.|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US4533449 *||Apr 16, 1984||Aug 6, 1985||The Perkin-Elmer Corporation||Rapid surface figuring by selective deposition|
|US4568598 *||Oct 30, 1984||Feb 4, 1986||Minnesota Mining And Manufacturing Company||Article with reduced friction polymer sheet support|
|US4812352 *||Aug 25, 1986||Mar 14, 1989||Minnesota Mining And Manufacturing Company||Article having surface layer of uniformly oriented, crystalline, organic microstructures|
|US4919994 *||Mar 20, 1987||Apr 24, 1990||Minnesota Mining And Manufacturing Company||Dry transfer graphics article and methods of preparation and use thereof|
|US4928908 *||Nov 16, 1989||May 29, 1990||Reiko Co., Ltd.||Balloon made of metal vapor deposited film|
|US4944986 *||Jan 13, 1989||Jul 31, 1990||Zuel Company||Anti-reflective glass surface|
|US4999076 *||Jan 16, 1990||Mar 12, 1991||Minnesota Mining And Manufacturing Company||Dry transfer graphics article method of preparation|
|US5039561 *||Nov 14, 1988||Aug 13, 1991||Minnesota Mining And Manufacturing Company||Method for preparing an article having surface layer of uniformly oriented, crystalline, organic microstructures|
|US5120605 *||Mar 27, 1990||Jun 9, 1992||Zuel Company, Inc.||Anti-reflective glass surface|
|US5121253 *||Dec 28, 1990||Jun 9, 1992||Waintroob Stewart B||Visor for a computer terminal display and method|
|US5238729 *||Apr 5, 1991||Aug 24, 1993||Minnesota Mining And Manufacturing Company||Sensors based on nanosstructured composite films|
|US5326619 *||Oct 28, 1993||Jul 5, 1994||Minnesota Mining And Manufacturing Company||Thermal transfer donor element comprising a substrate having a microstructured surface|
|US5336558 *||Jun 24, 1991||Aug 9, 1994||Minnesota Mining And Manufacturing Company||Composite article comprising oriented microstructures|
|US5387462 *||Jun 3, 1993||Feb 7, 1995||Minnesota Mining And Manufacturing Company||Sensors based on nanostructured composite films|
|US5418007 *||Aug 1, 1994||May 23, 1995||Minnesota Mining And Manufacturing Company||Method for making composite article comprising oriented microstructures|
|US5585186 *||Dec 12, 1994||Dec 17, 1996||Minnesota Mining And Manufacturing Company||Coating composition having anti-reflective, and anti-fogging properties|
|US5595804 *||Aug 22, 1994||Jan 21, 1997||Minnesota Mining And Manufacturing Company||Splice means, a method of splicing an abrasive article with same and the spliced abrasive article formed thereby|
|US5626800 *||Feb 3, 1995||May 6, 1997||Minnesota Mining And Manufacturing Company||Prevention of groove tip deformation in brightness enhancement film|
|US5635278 *||Feb 3, 1995||Jun 3, 1997||Minnesota Mining And Manufacturing Company||Scratch resistant optical films and method for producing same|
|US5645929 *||Apr 12, 1996||Jul 8, 1997||Minnesota Mining And Manufacturing Company||Composite article comprising oriented microstructures|
|US5716681 *||Jan 15, 1997||Feb 10, 1998||Minnesota Mining And Manufacturing Company||Scratch resistant optical films and methods for producing same|
|US5723175 *||Jul 19, 1996||Mar 3, 1998||Minnesota Mining And Manufacturing Company||Coating composition having anti-reflective and anti-fogging properties|
|US5726524 *||May 31, 1996||Mar 10, 1998||Minnesota Mining And Manufacturing Company||Field emission device having nanostructured emitters|
|US5763054 *||Sep 13, 1996||Jun 9, 1998||Trw Inc.||Anti-reflection treatment for optical elements|
|US5840141 *||Jul 12, 1996||Nov 24, 1998||Minnesota Mining And Manufacturing Company||Splice means, a method of splicing an abrasive article with same and the spliced abrasive article formed thereby|
|US5846650 *||May 10, 1996||Dec 8, 1998||Minnesota Mining And Manufacturing Company||Anti-reflective, abrasion resistant, anti-fogging coated articles and methods|
|US5855983 *||Feb 3, 1995||Jan 5, 1999||Minnesota Mining And Manufacturing Company||Flame retardant ultraviolet cured multi-layered film|
|US5873931 *||Oct 29, 1996||Feb 23, 1999||Minnesota Mining And Manufacturing Company||Coating composition having anti-reflective and anti-fogging properties|
|US5879827 *||Oct 10, 1997||Mar 9, 1999||Minnesota Mining And Manufacturing Company||Catalyst for membrane electrode assembly and method of making|
|US5879828 *||Oct 10, 1997||Mar 9, 1999||Minnesota Mining And Manufacturing Company||Membrane electrode assembly|
|US5883607 *||Oct 31, 1997||Mar 16, 1999||Minnesota Mining And Manufacturing Company||Computers comprising scratch resistant optical films|
|US5900287 *||Oct 31, 1997||May 4, 1999||Minnesota Mining And Manufacturing Company||Scratch resistant optical films and method for producing same|
|US5935758 *||Apr 22, 1997||Aug 10, 1999||Imation Corp.||Laser induced film transfer system|
|US5945249 *||Apr 22, 1997||Aug 31, 1999||Imation Corp.||Laser absorbable photobleachable compositions|
|US5997621 *||Oct 7, 1998||Dec 7, 1999||Minnesota Mining And Manufacturing Co.||Coating composition having anti-reflective and anti-fogging properties|
|US6004494 *||Jun 3, 1993||Dec 21, 1999||3M Innovative Properties Company||Method for preparing sensors based on nanostructured composite films|
|US6040053 *||Mar 2, 1998||Mar 21, 2000||Minnesota Mining And Manufacturing Company||Coating composition having anti-reflective and anti-fogging properties|
|US6042959 *||Oct 10, 1997||Mar 28, 2000||3M Innovative Properties Company||Membrane electrode assembly and method of its manufacture|
|US6114010 *||Aug 20, 1998||Sep 5, 2000||3M Innovative Properties Company||Devices with flame retardant ultraviolet cured multi-layered film|
|US6132844 *||Dec 11, 1997||Oct 17, 2000||3M Innovative Properties Company||Slip resistant articles|
|US6136412 *||Aug 6, 1999||Oct 24, 2000||3M Innovative Properties Company||Microtextured catalyst transfer substrate|
|US6171766||May 20, 1999||Jan 9, 2001||Imation Corp.||Laser absorbable photobleachable compositions|
|US6291143||Oct 16, 2000||Sep 18, 2001||Imation Corp.||Laser absorbable photobleachable compositions|
|US6356389||Nov 12, 1999||Mar 12, 2002||Reflexite Corporation||Subwavelength optical microstructure light collimating films|
|US6425993||Mar 23, 2000||Jul 30, 2002||3M Innovative Properties Company||Membrane electrode assembly and method of its manufacture|
|US6514674 *||Mar 8, 2000||Feb 4, 2003||Canon Kabushiki Kaisha||Method of forming an optical element|
|US6521324||Nov 30, 1999||Feb 18, 2003||3M Innovative Properties Company||Thermal transfer of microstructured layers|
|US6570710||Oct 6, 2000||May 27, 2003||Reflexite Corporation||Subwavelength optical microstructure light collimating films|
|US6770337||Jan 31, 2003||Aug 3, 2004||3M Innovative Properties Company||Thermal transfer of microstructured layers|
|US6838150 *||Aug 26, 2002||Jan 4, 2005||3M Innovative Properties Company||Pressure-sensitive adhesives having microstructured surfaces|
|US6855474||May 3, 2004||Feb 15, 2005||Kodak Polychrome Graphics Llc||Laser thermal color donors with improved aging characteristics|
|US6891677||May 23, 2003||May 10, 2005||Reflexite Corporation||Subwavelength optical microstructure light-redirecting films|
|US6929861||Mar 5, 2002||Aug 16, 2005||Zuel Company, Inc.||Anti-reflective glass surface with improved cleanability|
|US7033534||Oct 9, 2001||Apr 25, 2006||3M Innovative Properties Company||Method for forming microstructures on a substrate using a mold|
|US7176492||Oct 9, 2001||Feb 13, 2007||3M Innovative Properties Company||Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method|
|US7250210||Nov 22, 2004||Jul 31, 2007||3M Innovative Properties Company||Pressure-sensitive adhesives having microstructured surfaces|
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|US7622217||Oct 12, 2005||Nov 24, 2009||3M Innovative Properties Company||Fuel cell nanocatalyst|
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|US7803847||Jun 26, 2009||Sep 28, 2010||3M Innovative Properties Company||Fuel cell membrane electrode assembly|
|US7906251||Apr 20, 2006||Mar 15, 2011||3M Innovative Properties Company||Oxygen-reducing catalyst layer|
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|US8101317||Sep 20, 2004||Jan 24, 2012||3M Innovative Properties Company||Durable fuel cell having polymer electrolyte membrane comprising manganese oxide|
|US8192639 *||Sep 28, 2010||Jun 5, 2012||Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V.||Reflection-reducing interference layer system and method for producing it|
|US8367267||Oct 28, 2005||Feb 5, 2013||3M Innovative Properties Company||High durability fuel cell components with cerium oxide additives|
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|US8637193||Aug 25, 2009||Jan 28, 2014||3M Innovative Properties Company||Fuel cell nanocatalyst with voltage reversal tolerance|
|US9034538||Aug 24, 2010||May 19, 2015||3M Innovative Properties Company||Casting solution and method for making a polymer electrolyte membrane|
|US9085121||Nov 13, 2012||Jul 21, 2015||3M Innovative Properties Company||Adhesive-backed articles|
|US9137912 *||Feb 5, 2013||Sep 15, 2015||Htc Corporation||Casing of electronic device and method of manufacturing the same|
|US9199185||May 14, 2010||Dec 1, 2015||Cummins Filtration Ip, Inc.||Surface coalescers|
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|US20030082371 *||Aug 26, 2002||May 1, 2003||3M Innovative Properties Company||Pressure-sensitive adhesives having microstructured surfaces|
|US20030098528 *||Oct 9, 2001||May 29, 2003||3M Innovative Properties Company||Method for forming microstructures on a substrate using a mold|
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|US20040027676 *||May 23, 2003||Feb 12, 2004||Reflexite Corporation||Subwavelength optical microstructure light-redirecting films|
|US20040175583 *||Feb 5, 2002||Sep 9, 2004||Kinji Saijo||High polymer plate and conductive plate connecting body, and part using the connecting plate|
|US20050041093 *||Aug 22, 2003||Feb 24, 2005||Zwadlo Gregory L.||Media construction for use in auto-focus laser|
|US20050069755 *||Sep 29, 2003||Mar 31, 2005||3M Innovative Properties Company||Fuel cell cathode catalyst|
|US20050153102 *||Nov 22, 2004||Jul 14, 2005||3M Innovative Properties Company||Pressure-sensitive adhesives having microstructured surfaces|
|US20050233083 *||Jul 14, 2003||Oct 20, 2005||Ulrike Schulz||Method for reducing boundary surface reflection of plastic substrates and substrate modified in such a manner and use thereof|
|US20060063054 *||Sep 20, 2004||Mar 23, 2006||Frey Matthew H||Durable fuel cell|
|US20060063055 *||Sep 20, 2004||Mar 23, 2006||Frey Matthew H||Fuel cell durability|
|US20060066007 *||Nov 17, 2005||Mar 30, 2006||3M Innovative Properties Company||Methods for forming microstructures on a substrate using a mold|
|US20060087055 *||Dec 9, 2005||Apr 27, 2006||3M Innovative Properties Company||Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method|
|US20060228892 *||Apr 6, 2005||Oct 12, 2006||Lazaroff Dennis M||Anti-reflective surface|
|US20070018348 *||Jul 20, 2005||Jan 25, 2007||3M Innovative Properties Company||Aligned mold comprising support|
|US20070018363 *||Jul 20, 2005||Jan 25, 2007||3M Innovative Properties Company||Methods of aligning mold and articles|
|US20070059452 *||Sep 13, 2005||Mar 15, 2007||Debe Mark K||Formation of nanostructured layers through continued screw dislocation growth|
|US20070082256 *||Oct 12, 2005||Apr 12, 2007||3M Innovative Properties Company||Fuel cell nanocatalyst|
|US20070082814 *||Oct 12, 2005||Apr 12, 2007||3M Innovative Properties Company||Ternary nanocatalyst and method of making|
|US20070099052 *||Oct 28, 2005||May 3, 2007||3M Innovative Properties||High durability fuel cell components with cerium oxide additives|
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|US20070115554 *||Nov 22, 2005||May 24, 2007||Breitung Eric M||Antireflective surfaces, methods of manufacture thereof and articles comprising the same|
|US20070116934 *||Nov 22, 2005||May 24, 2007||Miller Scott M||Antireflective surfaces, methods of manufacture thereof and articles comprising the same|
|US20070248752 *||Apr 20, 2006||Oct 25, 2007||3M Innovative Properties Company||Method for making oxygen-reducing catalyst layers|
|US20070248875 *||Apr 20, 2006||Oct 25, 2007||3M Innovative Properties Company||Oxygen-reducing catalyst layer|
|US20080020261 *||Sep 13, 2005||Jan 24, 2008||Hendricks Susan M||Catalyst layers to enhance uniformity of current density in membrane electrode assemblies|
|US20080020923 *||Sep 13, 2005||Jan 24, 2008||Debe Mark K||Multilayered nanostructured films|
|US20080108612 *||Jul 5, 2007||May 8, 2008||Aventis Pharma S.A.||Use of Purine Derivatives as HSP90 Protein Inhibitors|
|US20090226796 *||Feb 16, 2006||Sep 10, 2009||3M Innovative Properties Company||Fuel cell catalyst|
|US20090261063 *||May 28, 2009||Oct 22, 2009||Peter Munzert||Method for Producing a Nanostructure on a Plastic Surface|
|US20100047668 *||Aug 25, 2009||Feb 25, 2010||3M Innovative Properties Company||Fuel cell nanocatalyst with voltage reversal tolerance|
|US20100062314 *||Nov 19, 2009||Mar 11, 2010||3M Innovative Properties Company||Durable fuel cell|
|US20100259823 *||Apr 9, 2009||Oct 14, 2010||General Electric Company||Nanostructured anti-reflection coatings and associated methods and devices|
|US20100297526 *||Jul 29, 2010||Nov 25, 2010||3M Innovative Properties Company||Catalyst layers to enhance uniformity of current density in membrane electrode assemblies|
|US20100316932 *||Aug 24, 2010||Dec 16, 2010||3M Innovative Properties Company||Fuel cell membrane electrode assembly|
|US20110051246 *||Sep 28, 2010||Mar 3, 2011||Ulrike Schulz||Reflection-Reducing Interference Layer System and Method for Producing It|
|US20110151353 *||Dec 22, 2010||Jun 23, 2011||3M Innovative Properties Company||Fuel cell electrode with nanostructured catalyst and dispersed catalyst sublayer|
|USRE35692 *||Dec 20, 1996||Dec 16, 1997||Minnesota & Mining Manufacturing Company||Method for making composite article comprising oriented microstructures|
|DE102010054274A1||Dec 13, 2010||Jul 7, 2011||GM Global Technology Operations LLC, ( n. d. Ges. d. Staates Delaware ), Mich.||Brennstoffzelle mit geschichteter Elektrode|
|DE112006002453T5||Aug 28, 2006||Jul 24, 2008||3M Innovative Properties Co., Saint Paul||Katalysatorschichten zum Verbessern der Gleichmäßigkeit der Stromdichte in Membranelektrodenanordnungen|
|DE112006002470T5||Sep 7, 2006||Aug 21, 2008||3M Innovative Properties Co., Saint Paul||Erzeugung von nanostrukturierten Schichten durch fortgesetztes Wachstum von Schraubenversetzungen|
|DE112006002630T5||Oct 10, 2006||Aug 21, 2008||3M Innovative Properties Co., St. Paul||Brennstoffzellen-Nanokatalysator|
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|EP0655974A1 *||Aug 12, 1993||Jun 7, 1995||Southwall Technologies, Inc.||Antireflection coatings|
|EP0655974A4 *||Aug 12, 1993||Aug 28, 1996||Southwall Technologies Inc||Antireflection coatings.|
|EP0788029A2||Jan 16, 1997||Aug 6, 1997||Minnesota Mining And Manufacturing Company||Laminable proofing elements|
|EP0790138A1||Jan 28, 1997||Aug 20, 1997||Minnesota Mining And Manufacturing Company||Laser-induced thermal transfer imaging process|
|EP2083991B1 *||Nov 28, 2007||Sep 18, 2013||Fraunhofer Gesellschaft zur Förderung der angewandten Forschung E.V.||Method for producing a nanostructure on a plastic surface|
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|U.S. Classification||359/581, 204/192.3, 428/412, 204/192.27, 428/339, 428/338, 428/148, 204/192.32, 428/333, 428/458, 427/164|
|International Classification||C08J7/12, B29D11/00|
|Cooperative Classification||Y10T428/31507, Y10T428/31681, Y10T428/269, C08J7/12, B29D11/00, Y10T428/24413, Y10T428/268, B29D11/00865, Y10T428/261|
|European Classification||B29D11/00, C08J7/12, B29D11/00K|