|Publication number||US5041303 A|
|Application number||US 07/165,047|
|Publication date||Aug 20, 1991|
|Filing date||Mar 7, 1988|
|Priority date||Mar 7, 1988|
|Publication number||07165047, 165047, US 5041303 A, US 5041303A, US-A-5041303, US5041303 A, US5041303A|
|Inventors||Michael R. Wertheimer, Henry P. Schreiber|
|Original Assignee||Polyplasma Incorporated|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (12), Referenced by (75), Classifications (15), Legal Events (5)|
|External Links: USPTO, USPTO Assignment, Espacenet|
The present invention relates to a method of depositing a thin layer of material upon a surface of a substrate. More particularly, the present invention pertains to the use of gas discharge methods to deposit on surfaces, (low pressure plasma deposition) a thin film providing to the substrate impermeability to gases and vapors such as oxygen and water.
Plasma deposition has been used to deposit coatings for improving the barrier between the substrate on which this deposition is effected and the surrounding atmospheric or environmental conditions.
A plasma is a partially ionized gas or vapor containing ions, electrons and various neutral species, many of which are chemically highly reactive. This plasma state may be produced by strong electromagnetic fields, for example at radio or microwave frequency, and the resulting plasma-chemical reactions may be used, for example, to deposit thin film coatings.
There exists a very extensive body of literature on thin films prepared by plasma-enhanced chemical vapor deposition, which films are widely used in microelectronics technology, for example as passivation layers on account of their excellent barrier properties towards water molecules and alkali ions.
U.S. Pat. No. 3,485,666 issued Dec. 23, 1969, to Sterling et al., describes a method of directly depositing an electrically insulating, amorphous, adherent solid layer of silicon nitride upon a surface of a substrate. This method is carried out with a radio frequency power source to establish the plasma.
In this patent, as well as in the literature, reference is sometimes made to the fact that the surface on which the layer is deposited, may be unheated. However, it is, in every case, added that it is desirable to heat the surface in order to improve the bonding within the layer to prevent water or OH groups from being included in the layer. For example, in the above patent, it is stated that the layer of silicon nitride be deposited at a temperature less than 300° C.; but, a subsequent step of heat treating the layer at a temperature of about 700° C. to 900° C. is recommended so that the silicon nitride layers be extremely hard, scratch and acid resistant.
There are three important limitations with this type of plasma deposition procedure. First, the use of a radio frequency plasma generator restricts it to relatively small surfaces or objects, i.e. surfaces or objects which may be placed between the electrodes forming the electric field required to generate the plasma. Second, the heating procedures of the prior art make it impossible to deposit these protective layers on substrates which cannot bear these temperatures without deforming or decomposing. Third, deposition rates by radio frequency plasma are inherently much slower than the same processes carried out at microwave frequency. For practical purposes, therefore, such as in a production line, radio frequency plasmas tend to be too slow, hence not cost effective.
It is therefore an object of the present invention to provide a method of depositing on large heat-sensitive surfaces or objects, particularly polymeric surfaces or objects, a plasma-generated thin barrier film at substantially ambient temperature; the substrate structure is not altered by a heating step in the process, nor is its size or shape a limiting factor in achieving an efficient gas or vapor barrier.
This is accomplished by using electromagnetic energy in the microwave range for generating the plasma. This allows one to avoid the problems of plasma generators of the prior art, which are limited to a relatively small plasma volume; furthermore, the substantially higher deposition rates which can be achieved with microwave plasmas permit much greater productivity, for example in a continuous production line process.
An apparatus by means of which a large volume microwave plasma can be generated is described in the applicant's Canadian patent No. 972,429 issued Aug. 5, 1975, the disclosure of which is incorporated herein. The principal distinguishing feature of said large volume microwave plasma apparatus is the means used for applying the microwave energy in order to create the plasma, the means being one or more slow wave structure applicators.
The present invention is particularly useful in the coating of plastic objects having a relatively large size and complex configuration, such as polyethylene terephtalate (PET) or polycarbonate containers or bottles, which are light, cheap and non-breakable, compared with alternatives, (namely glass or multilayer plastics); however, their permeation rate, to oxygen for example, is excessively high if they are used as containers for perishables such as foods. The invention is also suitable for coative polymeric surfaces based on polyacetal, polyamide, laminates of two or more polymers, and such polyblends, polyalloys, interpenetrating network polymers as may from time-to-time find use in packaging application.
It is also an object of the present invention to provide an effective plasma generated thin coating for such plastic containers or bottles in order to reduce oxygen, carbon dioxide and water permeation and to thereby enhance the life of the contents of such containers and bottles.
It is a further object of the present invention to provide an optically transparent, thin coating which confers greatly reduced overall permeability to a plastic object.
By depositing on these large complex surfaces, at ambient temperature, these plasma generated thin barrier films, advantageous characteristics are achieved, namely: improved barrier properties, optical transparency, adequate flexibility and adherence of the coatings, and improved resistance to abrasion.
Highly effective barriers against vapour and gas transmission have been obtained with plasma silicon nitride (P-SiN); plasma silicon oxide (P-SiO2); plasma silicon oxy-nitride (P-SiON); certain plasma polymers such as organo-silicons, copolymerized in plasma with oxygen; and certain halocarbons.
P-SiN films were prepared in a large-volume microwave plasma apparatus using SiH4 and NH3 gas mixtures. Films were deposited on the following substrates: Mylar (trademark) polyethylene terephthalate, polyethylene, polypropylene and Lexan (trademark) polycarbonate, (see Table 1a).
The left-hand side of Table 1a shows the substrate type, the fabrication conditions used to prepare the barrier coating, and the thickness of the latter. The right-hand side shows the flux of water vapor, which was measured using the procedure of ASTM E96-53T for both the uncoated (Fo) and coated (F) polymers. Delta F, given by (Fo-F)/Fo×100% is a measure of the barrier's effectiveness. Table 1b provides similar examples for the case of oxygen.
Fabrication parameters strongly affect the film quality, in particular, the flow rate ratio of SiH4 and NH3. The NH3 flow rate for all the series of samples used was 45 sccm, except sample 57 (30 sccm) and sample 58 (50 sccm), while the SiH4 flow was varied from 7 to 20 sccm. The frequency of the power source, substrate temperature and pressure were kept constant at f=2.45 GHz, Ts =25° C. and p=0.3 Torr, respectively. Plasma power was varied between 50 and 150 W and plasma volume varied from 1000 cm3 to 1500 cm3. The thickness of deposited film varied from 0.2 to 1.0 μm.
The best P-SiN coated samples showed a decrease in the water vapor flux up to 99.8%, and in oxygen flux up to 96.8%.
The values cited above are for illustration only, and are in no way intended to restrict the range of operating parameters. For example, much thinner films (less than 0.1 μm) have been found to constitute equally effective barriers if suitably prepared.
TABLE 1a__________________________________________________________________________MOISTURE PERMEATION IN P--SiN COATED POLYMERS Flux (g/m2 day) SiH4 NH3 Power Thickness Uncoated Coated Delta F# Substrate (sccm) (sccm) (W) (A) (Fo) (F) (%)__________________________________________________________________________ 3 Mylar (1) 7 45 100 5000 9.25 3.30 64.3 5 Mylar (1) 15 45 100 5000 9.25 1.30 85.9 6 Mylar (1) 15 45 100 10000 9.25 4.80 48.1 8 Mylar (1) 20 45 100 5000 8.80 5.30 39.811 PVC 15 45 100 5000 4.10 1.50 63.412 Mylar (1) 10 45 100 3000 8.80 1.30 85.217 Mylar (1) 15 45 100 1000 8.30 5.80 30.118 Mylar (1) 15 45 100 2000 8.30 5.60 32.519 Mylar (1) 15 45 100 4000 8.30 2.60 68.722 Mylar (1) 15 45 100 10000 8.30 3.60 56.623 Mylar (1) 15 45 100 5000 8.30 1.80 78.324 Mylar (1) 15 45 100 5000 8.30 1.50 81.925 Mylar (1) 15 45 100 5000 8.30 1.80 78.326 Mylar (1) 15 45 100 5000 8.30 1.20 85.534 Mylar (2) 15 45 100 5000 16.40 3.80 76.835 Mylar (2) 15 45 120 5000 16.40 4.60 72.036 Mylar (2) 15 45 80 5000 16.40 3.90 76.237 Mylar (2) 15 45 100 5000 16.40 5.10 68.938 Mylar (3) 15 45 100 5000 28.30 6.25 77.939 Mylar (3) 15 45 70 5000 28.30 9.90 65.040 Mylar (3) 15 45 150 5000 28.30 0.06 99.841 Mylar (3) 11 45 120 5000 28.30 3.80 86.642 Lexan 15 45 100 5000 72.70 25.40 65.143 Lexan 10 45 100 5000 72.70 30.50 58.046 Lexan 15 45 100 5000 72.70 29.10 60.049 Lexan 15 45 80 5000 72.70 14.50 80.150 Lexan 15 45 120 5000 72.70 12.40 82.951 Lexan 15 45 100 5000 72.70 16.00 78.052 Mylar (3) 15 45 100 5000 29.20 6.70 77.153 Mylar (3) 15 45 100 3000 29.20 7.00 76.054 Mylar (3) 15 45 100 5000 29.20 6.40 78.155 Mylar (3) 15 45 100 3000 29.20 5.30 81.857 Mylar (3) 10 30 100 5000 29.20 10.30 64.758 Mylar (3) 20 50 100 5000 29.20 11.10 62.0__________________________________________________________________________ N.B.: p = 0.3 Torr
TABLE 1b__________________________________________________________________________OXYGEN PERMEATION MEASUREMENTS* PRESSURE (02) TIME PERMEABILITYSAMPLE # SUBSTRATE (psig) (h) (cc/100 in2 atm)__________________________________________________________________________EXPERIMENTAL PROCEDUREuncoated Mylar (1) 50 1.626 Mylar (1) 50 72 024 Mylar (1) 50 48 0uncoated Lexan 20 72.5uncoated Lexan 20 71.550 Lexan 20 12 051 Lexan 20 12 050 Lexan 40 6.951 Lexan 40 10.4uncoated Mylar (3) 40 16.755 Mylar (3) 40 2.6__________________________________________________________________________ *Based on ASTM test method D1434
The following is a list of possible thin film barrier materials to be used in the present invention.
1.1 Silicon compounds (made by co-reacting SiH4, also known as mono-silane, with at least one other gas)
P-SiN = (SiH4 +NH3 and/or N2)
P-SiO = (SiH4 +N2 O)
P-SiO:P = (SiH4 +N2 O+PH3)
P-SiON = (SiH4 +NH3 +N2 O)
a-SiC:H = (SiH4 +CHx)
a-Si:H = (SiH4 alone or with an inert gas such as Ar, He, Ne or with hydrogen)
Similar reactions can also be carried out using higher silanes (e.g. Si2 H6) or their halogenated equivalents (e.g. SiF4, SiCl4, etc.)
1.2 metal compounds made by plasma deposition from a volatile organometallic compound (see Table 2):
if reacted alone, these form metal-containing plasma polymers (see category 2.3 below)
if co-reacted with O2 or NH3, they can form oxides or nitrides, as in the case of silicon compounds above.
A drawback of group 1.1 is that the principal reagent, silane, is dangerous (toxic and flammable in air). It may therefore be desirable to arrive at Si compound films starting from less dangerous compounds (organosilicones) (see table 3).
2.1 Organosilicon plasma polymers
These result from reaction of the "monomer" gas alone, or combined with an inert gas. (see table 3)
2.2 Silicon compounds (same list as in 1.1)
These can be obtained by co-reacting a monomer with oxygen (which yields P-SiO) or with oxygen and ammonia or nitrogen (which yields P-SiON). The role of oxygen is to "burn" (i.e. oxidize to form CO2 and H2 O) the organic part of the organosilicon monomer.
2.3 Organometallic plasma polymers
Same comments as in 2.1 above, but using compounds from table 2.
2.4 Metal compounds
Same comments as in 2.2 above, but using compounds from table 2.
3.1 Plasma Polymers
These are thin films produced from volatile organic compounds (i.e. other than organosilicon or organometallic, which are treated in category 2 above). These may be:
other organics containing O, N, S . . .
One preferred embodiment of the invention is to produce thin plasma polymer equivalents of known "conventional" barrier materials, namely:
ethylene-vinyl alcohol (EVAL)
3.2 Diamond-like carbon
Under suitable conditions, hydrocarbons may be converted in the plasma to diamond-like carbon films (symbolized by a-C:H). This material is very dense and has good barrier characteristics.
Although the invention has been described above in relation to specific embodiments, it will be evident to a person skilled in the art that it may be refined and modified in various ways. It is therefore wished to have it understood that the present invention should not be limited in interpretation except by the terms of the following claims.
TABLE 2______________________________________The following organometallic Monomers andmixtures may be used for depositing films as taught inthe present invention.MONOMER (or mixture) Structural formula______________________________________Copper phtalocyanine [Ph(CN)2 ]4 Cu Acetylacetonatedimethylgold ##STR1##Diethylzinc Et2 ZnDiethylzinc/Diethylselenide Et2 Zn/Et2 SeDimethylmercury Me2 HgTrimethylaluminium/Ammonia Me3 Al/NH3 or N2or NitrogenTri-sec-butyloxyaluminium (sec-BuO)3 AlTetramethylgermanium Me4 GeTetramethylgermanium/Oxygen Me4 Ge/O2Tetramethyltin Me4 SnTetramethyltin/Oxygen Me4 Sn/O2Tetramethyltin/Ammonia Me4 Sn/NH3Tetramethyltin/Nitrogen or Me4 Sn/N2 or CH4 or C2 H2Methane of AcetyleneTetramethyltin/Propene Me4 Sn/H2 CCHMeTetramethyltin/Methylmetha- Me4 Sn/H2 CC(Me)CO2 MecrylateTetramethyltin/Perfluoro- Me4 Sn/C6 F6benzeneTrimethylethyltin Me3 SnEtTrimethylvinyltin Me3 SnCHCH2Trimethylethynyltin Me3 SnCCHButyltrivinyltin BuSn(CHCH2)3Tetramethyllead Me4 PbPentaethoxytantalum (EtO)5 TaTrimethylbismuth Me3 BiDicyclopentadienylmanganese (C5 H5 )2 MnFerrocene (C5 H5)2 FeVinylferrocene H2 CCHC5 H4 FeC5 H5Cyclopentadienydicarbonyl- C5 H5 Co(CO)2cobaltAllylcyclopentadienyl- H2 CCHCH2 PdC5 H5palladium______________________________________
TABLE 3______________________________________The following Organosilicon Monomers andmixtures with other gases may be used for depositingfilms as taught in the present invention.MONOMER (or mixture) Structural Formula______________________________________Tetramethylsilane Me4 SiTetramethylsilane/Oxygen Me4 Si/O2Tetramethylsilane/Ammonia Me4 Si/NH3Tetramethylsilane/Hydrogen/ Me4 Si/H2 /ArArgonTetramethylsilane/Tetra- Me4 Si/CF4fluoromethaneEthyltrimethylsilane EtSiMe3Vinyltrimethylsilane H2 C═CHSiMe3Vinyltrimethylsilane/Tetra- H2 C═CHSiMe3 /CF4fluoromethaneEthylnyltrimethylsilane HC.tbd.CSiMe3Ethylnyltrimethylsilane/ HC.tbd.CSiMe3 /CF4TetrafluoromethaneAllytrimethylsilane H2 C═CHCH2 SiMe3Trimethylchlorosilance Me3 SiClPhenylsilane PhSiH3p-Chlorophenylsilane Cl--PhSiH3Diphenylsilane Ph2 SiH2Hexamethyldisilane (Me3 Si)2Bis(trimethylsilyl)methane (Me3 Si)2 CH2Disilybenzene (H3 Si)2 C6 H4Methyldimethoxysilane/Oxygen MeHSi(OMe)2 /O2Dimethyldimethoxysilane Me2 Si(OMe)2Methyltrimethoxysilane MeSi(OMe)3Methyltrimethoxysilane/Oxygen MeSi(OMe)3 /O2Vinyltrimethoxysilane H2 C═CHSi(OMe)3Tetramethoxysilane (MeO)4 SiVinyldimethylethoxysilane H2 C═CHMe2 SiOEtVinyldimethylethoxysilane/ H2 E═CHMe2 SiOEt/Styrene PhCH═CH2Vinyltriethoxysilane H2 C═CHSi(OEt)3Ethynyltriethoxysilane HC.tbd.CSi(OEt)3γ-Aminopropyltriethoxysilane H2 N(CH2)3 Si(OEt).sub. 3Tetraethoxysilane (EtO)4 SiTetraethoxysilane/Oxygen (EtO)4 Si/O2Trimethyvinyloxysilane Me3 SiOCH═CH2Tetramethyldisiloxane (Me2 SiH)2 OTetramethyldisiloxane/Oxygen (Me2 SiH)2 O2 /O2Hexamethyldisiloxane (Me3 Si)2 OHexamethyldisiloxane/Ammonia (Me3 Si)2 O/NH3Hexamethyldisiloxane/Vinyl- (Me3 Si)2 O/H2 C═CHSiMe3trimethylsilaneHexamethyldisiloxane/Toluene (Me3 Si)2 O/PhMeDivinyltetramethyldisiloxane (H2 C═CHSiMe2)2 OHexamethylcyclotrisiloxane (Me2 SiO)3Octamethylcyclotetrasiloxane (Me2 SiO)4Dimethylaminotrimethylsilane Me2 NSiMe3Diethylaminotrimethylsilane Et2 NSiMe3Bis(dimethylamino)methylsilane (Me2 N)2 SiHMeBis(dimethylamino)methyl- (Me2 N)2 SiMeCH═CH2vinylsilaneHexamethyldisilazane (Me3 Si)2 NHHexamethyldisilazane/Nitrogen (Me3 Si)2 NH/N2Hexamethyldisilazane/Toluene (Me3 Si)2 NH/PhMeHexamethylcyclotrisilazane (Me2 SiNH)3Hexamethylcyclotrisilazane/ (Me2 SiNH)3 /NH3AmmoniaNN'Bis(dimethylsilyl)tetra- (Me2 SiNSiHMe2)2methylcyclodisilazaneHexamethyldisilathiane (Me3 Si)2 S______________________________________
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US4401054 *||Apr 27, 1981||Aug 30, 1983||Nippon Telegraph & Telephone Public Corporation||Plasma deposition apparatus|
|US4478874 *||Dec 9, 1983||Oct 23, 1984||Cosden Technology, Inc.||Methods for improving the gas barrier properties of polymeric containers|
|US4569738 *||May 4, 1984||Feb 11, 1986||Leybold-Heraeus Gmbh||Method of producing amorphous carbon coatings on substrates by plasma deposition|
|US4585668 *||Aug 16, 1984||Apr 29, 1986||Michigan State University||Method for treating a surface with a microwave or UHF plasma and improved apparatus|
|US4599135 *||Sep 28, 1984||Jul 8, 1986||Hitachi, Ltd.||Thin film deposition|
|US4667620 *||Oct 29, 1985||May 26, 1987||Cosden Technology, Inc.||Method and apparatus for making plastic containers having decreased gas permeability|
|US4698234 *||Oct 17, 1986||Oct 6, 1987||Energy Conversion Devices, Inc.||Vapor deposition of semiconductor material|
|US4715937 *||May 5, 1986||Dec 29, 1987||The Board Of Trustees Of The Leland Stanford Junior University||Low-temperature direct nitridation of silicon in nitrogen plasma generated by microwave discharge|
|US4737379 *||Mar 31, 1987||Apr 12, 1988||Energy Conversion Devices, Inc.||Plasma deposited coatings, and low temperature plasma method of making same|
|US4752426 *||Jun 27, 1986||Jun 21, 1988||Yoshito Ikada||Process for manufacture of plastic resinous tubes|
|US4756964 *||Sep 29, 1986||Jul 12, 1988||The Dow Chemical Company||Barrier films having an amorphous carbon coating and methods of making|
|JPS6016810A *||Title not available|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US5288527 *||Nov 21, 1991||Feb 22, 1994||Saint Gobain Vitrage International C/O Saint Gobain Recherche||Silicon nitride thin films with improved properties|
|US5298587 *||Dec 21, 1992||Mar 29, 1994||The Dow Chemical Company||Protective film for articles and method|
|US5318928 *||Jun 11, 1992||Jun 7, 1994||Leybold Aktiengesellschaft||Method for the surface passivation of sensors using an in situ sputter cleaning step prior to passivation film deposition|
|US5319479 *||Aug 30, 1991||Jun 7, 1994||Ricoh Company, Ltd.||Deposited multi-layer device with a plastic substrate having an inorganic thin film layer|
|US5320875 *||Aug 27, 1993||Jun 14, 1994||The Dow Chemical Company||Method of providing an abrasion resistant coating|
|US5433786 *||Dec 20, 1993||Jul 18, 1995||The Dow Chemical Company||Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein|
|US5494712 *||Nov 17, 1994||Feb 27, 1996||The Dow Chemical Company||Method of forming a plasma polymerized film|
|US5565248 *||Feb 9, 1994||Oct 15, 1996||The Coca-Cola Company||Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance|
|US5567661 *||Jun 3, 1994||Oct 22, 1996||Fujitsu Limited||Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound|
|US5571470 *||Feb 18, 1994||Nov 5, 1996||The Coca-Cola Company||Method for fabricating a thin inner barrier layer within a preform|
|US5670224 *||Apr 17, 1995||Sep 23, 1997||Energy Conversion Devices, Inc.||Modified silicon oxide barrier coatings produced by microwave CVD deposition on polymeric substrates|
|US5721027 *||Oct 24, 1996||Feb 24, 1998||Tetra Laval Holdings & Finance S.A.||Package possessing superior barrier properties|
|US5789040 *||May 21, 1997||Aug 4, 1998||Optical Coating Laboratory, Inc.||Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition|
|US5795831 *||Oct 16, 1996||Aug 18, 1998||Ulvac Technologies, Inc.||Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers|
|US5849366 *||Mar 19, 1996||Dec 15, 1998||The Coca-Cola Company||Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization|
|US5879757 *||Jan 20, 1995||Mar 9, 1999||Commonwealth Of Australia Scientific And Research Organisation||Surface treatment of polymers|
|US5906787 *||Aug 8, 1996||May 25, 1999||The Coca-Cola Company||Hollow containers having a very thin inert or impermeable inner surface layer by coating the inside surface of the preform|
|US6083313 *||Jul 27, 1999||Jul 4, 2000||Advanced Refractory Technologies, Inc.||Hardcoats for flat panel display substrates|
|US6149982 *||Oct 5, 1999||Nov 21, 2000||The Coca-Cola Company||Method of forming a coating on an inner surface|
|US6171662 *||Dec 10, 1998||Jan 9, 2001||Mitsubishi Denki Kabushiki Kaisha||Method of surface processing|
|US6276296||Jul 8, 1998||Aug 21, 2001||The Coca-Cola Company||Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization|
|US6444155||Oct 9, 1998||Sep 3, 2002||The Coca-Cola Company||Hollow containers having a very thin inert or impermeable inner surface layer by coating the inside surface of the preform|
|US6696157||Mar 5, 2000||Feb 24, 2004||3M Innovative Properties Company||Diamond-like glass thin films|
|US6749813||Mar 5, 2000||Jun 15, 2004||3M Innovative Properties Company||Fluid handling devices with diamond-like films|
|US6827972 *||Jul 15, 2002||Dec 7, 2004||Sidel||Container with a coating of barrier effect material, and method and apparatus for manufacturing the same|
|US6998003 *||Oct 2, 2002||Feb 14, 2006||Unaxis Balzers Aktiengesellschaft||Optical element and its manufacturing process|
|US7470450 *||Jan 23, 2004||Dec 30, 2008||Intel Corporation||Forming a silicon nitride film|
|US7496255||Jun 22, 2004||Feb 24, 2009||3M Innovative Properties Company||Radiation-transmissive films on glass articles|
|US7985188||May 12, 2010||Jul 26, 2011||Cv Holdings Llc||Vessel, coating, inspection and processing apparatus|
|US8067070||Oct 11, 2007||Nov 29, 2011||Schott Ag||PICVD coating for plastic containers|
|US8512796||Jun 27, 2011||Aug 20, 2013||Si02 Medical Products, Inc.||Vessel inspection apparatus and methods|
|US8522514 *||Jun 24, 2010||Sep 3, 2013||Dr Pepper/Seven Up, Inc.||Beverage containers having coated labels with modified gas barrier properties and related methods|
|US8834954||Jul 12, 2013||Sep 16, 2014||Sio2 Medical Products, Inc.||Vessel inspection apparatus and methods|
|US9272095||Mar 30, 2012||Mar 1, 2016||Sio2 Medical Products, Inc.||Vessels, contact surfaces, and coating and inspection apparatus and methods|
|US9333696||Jun 1, 2011||May 10, 2016||Cryovac, Inc.||Plate and apparatus for forming a plastic material flanged hollow article|
|US9458536||Oct 12, 2012||Oct 4, 2016||Sio2 Medical Products, Inc.||PECVD coating methods for capped syringes, cartridges and other articles|
|US9545360||May 9, 2013||Jan 17, 2017||Sio2 Medical Products, Inc.||Saccharide protective coating for pharmaceutical package|
|US20020176947 *||Jul 15, 2002||Nov 28, 2002||Sidel||Container with a coating of barrier effect material, and method and apparatus for manufacturing the same|
|US20030030921 *||Oct 2, 2002||Feb 13, 2003||Unaxis Balzers Aktiengesellschaft Of Balzers||Optical element and its manufacturing process|
|US20040121146 *||Dec 20, 2002||Jun 24, 2004||Xiao-Ming He||Composite barrier films and method|
|US20040226677 *||Jun 22, 2004||Nov 18, 2004||Voith Paper Patent Gmbh||Process and a fluffer device for treatment of a fiber stock suspension|
|US20050109606 *||Oct 21, 2004||May 26, 2005||Xiao-Ming He||Composite barrier films and method|
|US20050163927 *||Jan 23, 2004||Jul 28, 2005||Mcswiney Michael L.||Forming a silicon nitride film|
|US20080090039 *||Oct 11, 2007||Apr 17, 2008||Schott Ag||PICVD coating for plastic containers|
|US20100298738 *||May 12, 2010||Nov 25, 2010||Felts John T||Vessel, coating, inspection and processing apparatus|
|US20110314772 *||Jun 24, 2010||Dec 29, 2011||Patrick George||Beverage containers having coated labels with modified gas barrier properties and related methods|
|CN102639322A *||Nov 29, 2010||Aug 15, 2012||3M创新有限公司||Conformable barrier sheet, methods, and device|
|CN102639322B *||Nov 29, 2010||Nov 25, 2015||3M创新有限公司||适形的阻隔片、方法及装置|
|DE4212501C1 *||Apr 14, 1992||Aug 5, 1993||Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De||Deposition of silicon nitride polymer layer on substrate - using linear or cyclic silazane in gas, giving good quality and high coating ratio|
|DE19722205A1 *||May 27, 1997||Dec 3, 1998||Leybold Systems Gmbh||Verfahren und Vorrichtung zur Beschichtung von Kunststoff- oder Glasbehältern mittels eines PCVD-Beschichtungsverfahrens|
|DE102006048658A1 *||Oct 14, 2006||Apr 17, 2008||Schott Ag||PICVD-Beschichtung für Kunststoffbehälter|
|DE102006048658B4 *||Oct 14, 2006||Mar 27, 2014||Khs Corpoplast Gmbh||PICVD-Beschichtung für Kunststoffbehälter und Verfahren zu deren Herstellung|
|EP0541916A1 *||Aug 26, 1992||May 19, 1993||Leybold Aktiengesellschaft||Process for passiveting the surface of sensors|
|EP0543634A1 *||Nov 18, 1992||May 26, 1993||Public Health Laboratory Service Board||Improvements in coating processes|
|EP0549528A1 *||Dec 11, 1992||Jun 30, 1993||Alusuisse-Lonza Services Ag||Method for fabrication of coated substrates|
|EP0667921A1 *||Nov 10, 1993||Aug 23, 1995||Energy Conversion Devices, Inc.||Microwave apparatus for depositing thin films|
|EP0667921A4 *||Nov 10, 1993||Dec 29, 1997||Energy Conversion Devices Inc||Microwave apparatus for depositing thin films.|
|EP0693975B2 †||Feb 9, 1995||Jul 30, 2003||The Coca-Cola Company||Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization|
|EP0740681A1 *||Jan 20, 1995||Nov 6, 1996||Commonwealth Scientific And Industrial Research Organisation||Surface treatment of polymers|
|EP0740681A4 *||Jan 20, 1995||Mar 4, 1998||Commw Scient Ind Res Org||Surface treatment of polymers|
|EP0931853A2 *||Nov 10, 1993||Jul 28, 1999||Energy Conversion Devices, Inc.||Method of depositing barrier coatings by plasma assisted chemical vapour deposition|
|EP0931853A3 *||Nov 10, 1993||Aug 4, 1999||Energy Conversion Devices, Inc.||Method of depositing barrier coatings by plasma assisted chemical vapour deposition|
|EP0936283A1 *||Nov 19, 1998||Aug 18, 1999||Leybold Systems GmbH||Barrier layer for packaging material and process for its manufacture|
|EP0943426A2 *||Jun 1, 1994||Sep 22, 1999||Tetra Pak (Suisse) S.A.||Packaging laminate with gas and aroma barrier properties|
|EP0943426A3 *||Jun 1, 1994||Nov 3, 1999||Tetra Pak (Suisse) S.A.||Packaging laminate with gas and aroma barrier properties|
|EP1174914A2 *||Jul 17, 2001||Jan 23, 2002||Canon Sales Co., Inc.||Semiconductor device and semiconductor device manufacturing method|
|EP1174914A3 *||Jul 17, 2001||Sep 10, 2003||Canon Sales Co., Inc.||Semiconductor device and semiconductor device manufacturing method|
|EP1252822A2 *||Apr 8, 1996||Oct 30, 2002||Energy Conversion Devices, Inc.||Microwave CVD method for deposition of robust barrier coatings|
|EP1252822A3 *||Apr 8, 1996||Dec 18, 2002||Energy Conversion Devices, Inc.||Microwave CVD method for deposition of robust barrier coatings|
|WO1994029103A1 *||Jun 1, 1994||Dec 22, 1994||Tetra Pak (Suisse) Sa||Packaging laminate with gas and aroma barrier properties|
|WO1996032846A1 *||Apr 8, 1996||Oct 24, 1996||Energy Conversion Devices, Inc.||Microwave cvd method for deposition of robust barrier coatings|
|WO1996033098A2 *||Mar 21, 1996||Oct 24, 1996||Xmx Corporation||Gas-impermeable, chemically inert container structure and method of producingthe same|
|WO1996033098A3 *||Mar 21, 1996||Dec 12, 1996||Xmx Corp||Gas-impermeable, chemically inert container structure and method of producingthe same|
|WO2000006794A1 *||Jul 27, 1999||Feb 10, 2000||N.V. Bekaert S.A.||Hardcoats for flat panel display substrates|
|WO2007062665A1 *||Nov 29, 2006||Jun 7, 2007||Nanon A/S||A method of producing a gas barrier polymer foil and a gas barrier polymer foil|
|U.S. Classification||427/575, 427/578, 427/579|
|International Classification||C23C16/511, C23C16/30, C23C16/00, C23C16/40|
|Cooperative Classification||C23C16/511, C23C16/401, C23C16/30, C08J7/123|
|European Classification||C23C16/30, C23C16/511, C23C16/40B, C08J7/12A|
|Mar 7, 1988||AS||Assignment|
Owner name: POLYPLASMA INCORPORATED, 630 DORCHESTER BOUL. WEST
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:WERTHEIMER, MICHAEL R.;SCHREIBER, HENRY P.;REEL/FRAME:004869/0881
Effective date: 19880217
Owner name: POLYPLASMA INCORPORATED,CANADA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:WERTHEIMER, MICHAEL R.;SCHREIBER, HENRY P.;REEL/FRAME:004869/0881
Effective date: 19880217
|Feb 16, 1995||FPAY||Fee payment|
Year of fee payment: 4
|Mar 16, 1999||REMI||Maintenance fee reminder mailed|
|Aug 22, 1999||LAPS||Lapse for failure to pay maintenance fees|
|Nov 2, 1999||FP||Expired due to failure to pay maintenance fee|
Effective date: 19990820