|Publication number||US6233263 B1|
|Application number||US 09/326,126|
|Publication date||May 15, 2001|
|Filing date||Jun 4, 1999|
|Priority date||Jun 4, 1999|
|Also published as||WO2000076040A1|
|Publication number||09326126, 326126, US 6233263 B1, US 6233263B1, US-B1-6233263, US6233263 B1, US6233263B1|
|Inventors||Constance J. Chang-Hasnain, Renato Dato, Peter Kner, Gabriel S. Li, Philip Worland, Rang-Chen Yu, Wupen Yuen|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (105), Non-Patent Citations (10), Referenced by (66), Classifications (19), Legal Events (10)|
|External Links: USPTO, USPTO Assignment, Espacenet|
1. Field of the Invention
This invention relates generally to a monitoring and control assembly for an optical system, and more particularly to a monitoring and control assembly for a laser system.
2. Description of Related Art
Optical fiber communication systems provide for low loss and very high information carrying capacity. In practice, the bandwidth of optical fiber may be utilized by transmitting many distinct channels simultaneously using different carrier wavelengths. The associated technology is called wavelength division multiplexing (WDM). In a narrow band WDM system 8, 16 or more different wavelengths are closely spaced to increase fiber transmission capacity.
The wavelength bandwidth that any individual channel occupies depends on a number of factors, including the impressed information bandwidth, and margins to accommodate for carrier frequency drift, carrier frequency uncertainty, and to reduce possible inter-channel cross-talk due to non-ideal filters.
To maximize the number of channels, lasers with stable and precise wavelength control are required to provide narrowly spaced, multiple wavelengths. Some laser sources, for example distributed feedback (DFB) lasers, exhibit wavelength drift over time, in excess of the requirements for narrow band WDM. The wavelength of the device tends to change with aging under continuous power. Since telecommunication systems are expected to have a lifetime of the order of 25 years, wavelength control must be added to the laser transmitter to ensure minimum cross-talk between narrowly spaced channels over extended time periods.
Single wavelength optical communications systems are widely used in the industry. Ideally, systems designers seek minimum disruption of existing systems and compatibility with existing packaging in development of WDM systems.
Typically, known laser wavelength monitoring and stabilization systems are based on a unit external to the standard package of a laser source (transmitter). One commercially available system for monitoring and control of the wavelength of a semiconductor laser is an assembly based on crystal gratings. For example, in a known system manufactured by Accuwave, and described in the product literature, a wavelength locker unit is provided which comprises a lithium niobate crystal in which two Bragg gratings are written, illuminated by a collimated beam from a laser source coupled to the assembly, and two photodetectors. Each grating has a slightly different Bragg wavelength and angle relative to the input beam. The output reflected from the gratings is directed to the two detectors and the differential output is used to provide feedback control to the laser. Wavelength stability of better than 10 pm can be achieved with the control loop. However, the locker utilizes a separate unit from the transmitter, and thus requires external coupling to the laser or light source. Moreover, the unit is designed for a specific wavelength, as specified by the grating parameters. Different units are required for different wavelengths.
Another known type of wavelength monitoring/control assembly is based on a fiber grating. For example, GB Patent Application No. 96/00478 filed Mar. 4, 1996 to Epworth et al., relates to an external cavity type laser whose external reflector is provided by a Bragg reflector located in an optical fibre butted to an anti-reflection coated facet of the semiconductor laser. The grating is placed far enough from the laser that the longitudinal modes are so closely spaced that the laser operates multimode with so many modes as to make mode partition noise negligible. Another GB Patent Application No. 95/19614.3, filed Sep. 26, 1995 to Epworth et al., relates to using a chirped fiber grating for equalization and laser frequency stabilization.
Another system for stabilization of a semiconductor laser is described in U.S. Pat. No. 4,309,671 to Malyon which uses a pair of matched photodiodes and two beam splitters. The first beam splitter and first photodiode monitor power, and a second beam splitter, a frequency dependent filter and second photodiode are used to monitor wavelength changes. The outputs of the matched photodiodes are fed via amplifiers to a subtractor amplifier and the output is fed as negative feedback to the amplifier controlling operation of the laser.
Other known systems are based on a filter element such as a Fabry-Perot etalon. For example, U.S. Pat. No. 5,331,651 to Becker et al. describes the use of a Fabry-Perot etalon for fine tuning in conjunction with a grating for coarse tuning of the output of a laser.
In a system described in U.S. Pat. No. 5,438,579 to Eda et al., a Fabry-Perot etalon is used with a single photodetector to generate a signal used to lock onto one peak of a semiconductor laser, requiring collimated beams. Hill et al., in U.S. Pat. No. 4,839,614 describe a system for referencing frequencies of radiation from multiple sources relative to a reference source, using a filter element such as a Fabry-Perot etalon and a corresponding plurality of detectors.
Another system for laser wavelength stabilization is described in U.S. Pat. No. 4,914,662 to Nakatani et al. which involves spectroscopically processing the output of a variable wavelength laser and measuring a spatial distribution using image processing apparatus, and then comparing the distribution to that of a reference light source of fixed wavelength. The latter image processing system is complex, and not readily compatible with providing a low cost, compact unit.
Japanese Patent Application 92-157780 relates to a frequency stabilizer for semiconductor laser, without using external modulating means, and is based on an inclined Fabry-Perot etalon on which the laser source is incident, and two photo-detectors to detect respectively the transmitted and reflected signals. By subtracting outputs of the two detectors, a signal is provided for controlling the oscillation frequency. Resonator length is altered by changing the inclination of the etalon to allow for tunability. The implementation of this system for minimum space requires using the FP at a relatively large angle, with decreased stability in terms of center wavelength and bandwidth. On the other hand, a small FP angle requires added components and space, as shown in FIG. 1B of this patent application. Also, independent detectors are used, with potentially different response and aging characteristics.
Consequently, various existing systems for wavelength stabilization are known using a crystal grating, fiber grating or etalon based arrangement. The grating based systems lack wavelength tunability and many systems are based on relatively large control units external to a packaged laser source, with concurrent coupling, space and power dissipation problems. While etalon based systems provide tunability, none of the known configurations are sufficiently compact to incorporate in known standard packages without disruption.
There is a need for a monitoring and control assembly for an optical system that is more compact in design, more robust, lower cost and has a higher level of integration.
Accordingly, an object of the present invention is to provide a monitoring and control assembly for an optical system.
Another object of the present invention is to provide a compact monitoring and control assembly for an optical system.
A further object of the present invention is to provide a monitoring and control assembly for a laser system.
Still another object of the present invention is to provide a monitoring and control assembly for a diode laser system.
Yet another object of the present invention is to provide a monitoring and control assembly for a VCSEL laser system.
Another object of the present invention is to provide a monitoring and control assembly for a tunable laser system.
These and other objects of the present invention are achieved in a monitoring and control assembly for an optical system that includes a tunable laser. The laser generates a divergent output beam along an optical axis. A first photodetector is provided. A wavelength selective filter is tilted at an angle relative to the optical axis that provides an angular dependence of a wavelength reflection of the wavelength selective filter and directs the reflected output beam towards the first photodetector.
In another embodiment, a monitoring and control assembly for an optical system includes a tunable laser that generates a divergent output beam along an optical axis. A collimating optical element is positioned along the optical axis. A pair of photodetectors are provided. A wavelength selective filter includes a Fabry-Perot Etalon with a distributed thickness to provide a positional dependence of a wavelength reflection or transmission of the filter and transmits or reflects the beam towards the pair of detectors.
FIG. 1 is a schematic diagram of one embodiment of a monitoring and control assembly for an optical system of the present invention with a wavelength selective filter positioned at an angle relative to an output face of a laser.
FIG. 2 is a schematic diagram of the assembly of FIG. 1 illustrating a change of the angle of the wavelength selective filter relative to the output face of the laser.
FIG. 3 is a schematic diagram of the assembly of FIG. 1 with the laser and a photodetector positioned on a common substrate.
FIG. 4 is a schematic diagram of another embodiment of a monitoring and control assembly for an optical system of the present invention with two photodetectors and a wavelength selective filter positioned at an angle relative to an output face of a laser.
FIG. 5 is a graph illustrating light reflected from the wavelength selective filter and received by the photodetector of FIG. 1 when the wavelength of the light output from the laser changes.
FIG. 6 is a graph illustrating the response expressed as intensity as a function of wavelength of the two photodetectors of FIG. 4.
FIG. 7 is a schematic diagram of a control loop circuit in combination with the assembly of FIG. 4.
FIG. 8 is a sectional view of a VCSEL laser useful with the assembly of FIG. 4.
FIG. 9 a sectional view of the VCSEL laser of FIG. 8 and a photodetector which form a monolithically integrated chip.
FIG. 10 is a sectional view of the VCSEL laser of FIG. 8 and two photodetectors which form a monolithically integrated chip.
FIG. 11 is a schematic diagram illustrating a laser and a wavelength selective filter of the present invention positioned on a common substrate.
FIG. 12 is a schematic diagram of an embodiment of a monitoring and control assembly for an optical system of the present invention with a wedged wavelength selective filter operating in a transmissive mode.
FIG. 13 is a graph illustrating the response of the first and second photodiodes of the assembly of FIG. 12.
FIG. 14 is a schematic diagram of the assembly of FIG. 12 coupled with a control loop circuit.
FIG. 15 is a schematic diagram of an embodiment of a monitoring and control assembly for an optical system of the present invention with a wedged wavelength selective filter operating in a reflective mode.
FIG. 16 is a schematic diagram of the assembly of FIG. 15 with the laser and photodiodes positioned on a common substrate.
FIG. 17 is a schematic diagram of an embodiment of a monitoring and control assembly for an optical system of the present invention with a wedged wavelength selective filter and a reflective element that collimates the output of the laser.
FIG. 18 is a schematic diagram of an embodiment of a monitoring and control assembly for an optical system of the present invention with a wedged wavelength selective filter coupled to the insulator that supports the laser and photodiodes.
FIG. 19 is a graph illustrating an embodiment of the assembly of the present invention where the free spectra range of the wavelength selective filter coincides with the ITU grid spacing.
FIG. 20 is a schematic diagram of an embodiment of a monitoring and control assembly for an optical system of the present invention that includes a control loop circuit and is programmable.
Referring now to FIGS. 1 and 2, one embodiment of a monitoring and control assembly 10 for an optical system includes a tunable laser 12 that generates a divergent output beam 14 along an optical axis 16. Laser 12 can be any single mode semiconductor diode laser. Preferably, laser 12 is a vertical cavity surface emitting laser (VCSEL) or output facet of a single mode fiber (SMF). Output beam 14 is preferably utilized for communication applications, with a wavelength in the range of 800 nm to 1650 nm.
Also included is one or more photodetectors 24. Photodetector 24 can be an avalanche photodiode, a PIN photodiode, a metal-semiconductor-metal detector, and the like. Preferably, photodetector 24 is a PIN photodiode. Photodetector 24 converts optical energy into an electric current. Changes in electric current are used for monitoring and control of laser 12. Two or more photodetectors may be employed. In one embodiment, an array of photodetectors 24 is utilized. More than one photodiode 24 can be used greater discrimination in monitoring and control of laser 12, as more fully described hereafter.
Positioned along optical axis 16 is a wavelength selective filter 20. Suitable wavelength selective filters 20 include but are not limited to a Bragg grading, multilayer-thin-film filter or solid Fabry-Perot etalon. Preferably wavelength selective filter 20 is a Fabry-Perot etalon or a multilayer-tnin-film filter. Wavelength selective filter 20 can be tilted at an angle θ relative to optical axis 16 to provide an angular dependence of a wavelength reflection of wavelength selective filter 20 and direct the reflected output beam 14 towards photodetector 24. FIG. 2 illustrates a change in angle θ. Wavelength selective filter 20 is distanced from laser 12 and tilted at the angle θ relative to optical axis 16 in order to provide an angular dependence of wavelength reflection from wavelength selective filter 20. Wavelength selective filter 20 directs the reflected output beam 14 in a direction towards photodetector 24.
Wavelength selective filter 20 splits incident output beam 14 into a transmitted portion and a reflected portion. The ratio of the transmitted and reflected portions is a function of wavelength of output beam 14 and the angle θ that is defined by an incident face 19 of wavelength selective filter 20 relative to the incident beam.
In FIG. 1, one photodetector 24 is illustrated. Received power by photodetector 24 is a function of wavelength. When the wavelength of output beam 14 changes, there is change in received power by photodetector 24. When the total output power of output beam 14 is a constant, any change in received power at photodetector 24 is used as an indication that there has been a change in the wavelength of laser 12.
When wavelength selective filter 20 reflects a portion of output beam 14 to photodetector 24, the result is a compact assembly that can be an integral unit. This creates a folded back geometry of output beam 14 with a reduction size of monitoring and control assembly 10. In comparison, when wavelength selective filter 20 is in a transmitting mode, wavelength selective filter 20 is positioned between laser 12 and photodiode 24. This does not produce the folded back geometry. Additionally, the folded back geometry allows monolithic integration of laser 12 with photodetector 24 on the same chip.
As illustrated in FIG. 3, laser 12 and photodetector 24 can be positioned on a common substrate. This is particularly advantageous for surface emitting devices. It can be difficult to fabricate in-plane photodetectors 24 with an in-plane diode laser 12 on a common substrate. This problem is alleviated with surface emitting devices. Photodetector 24 is positioned in a lateral direction relative to laser 12. An output face 22 of laser 12 can be parallel to a face 18 of photodetector 24.
The divergence of laser 12 can be controlled by a lens 21 which can be an a spherical lens, a cylindrical lens, a spherical lens, a graded index lens of plastic or glass, and the like. a larger spot size gives wavelength selective filter 20 a shape closer to desired and provides better power transfer to photodetector 24. Alternatively, monitoring and control assembly 10 need not include lens 21 depending on the divergence of laser 12.
For dense WDM applications, where precise wavelengths are required, differential detection scheme is utilized to further enhance accuracy. A differential detection scheme compares the output from a pair of photodetectors 24. When there is an array, there is still a comparison between a pair of adjacent or non-adjacent photodetectors 24, one comparison made at a time. When a pair of photodetectors 24 is used a difference in response of the two photodetectors 24 is used to determine wavelength deviation from a pre-set wavelength.
Usually, output beam 14 is divergent. This divergence is used as an advantage for differential detection schemes. When output beam 14 is divergent there is a range of incident angles θmin to θmax. on face 19. The larger the divergence, the larger the difference between θmin and θmax. When laser 12, photodetector 24 and wavelength selective filter 20 are in fixed positions relative to each other, and a beam receiving area of photodetector 24 is small, photodetector 24 only receives the portion of reflected output beam 14 with a particular incident angle θ1.
As shown in FIG. 4, a second photodetector 28 can be included and positioned adjacent to photodetector 24. In this embodiment, two different parts of output beam 14 are incident on photodetectors 24 and 26. a change in wavelength from laser 12 is converted to a difference in transmission detected by photodetectors 24 and 28.
FIG. 5 illustrates in one example of light reflected off wavelength selective element 20 that is received by photodiode 24 when the wavelength of the light output from laser 12 changes. In FIG. 2, a Fabry-Perot etalon is used as wavelength selective filter 20. The sharp changes at the 1552 nm region may be utilized for wavelength change detection between points A-B and C-D shown in FIG. 5.
Referring again to FIG. 4, second photodetector 28 is distanced from first photodetector 28 and receives a different portion of the reflected output beam 14 with a different incident angle θ2. Because of the difference of the incidence angles, the optical path lengths are different for the two portions of output beam 14 received by the respective photodetectors 18. Therefore, the relationship between the received power at each photodetector 18 verses wavelength is shifted.
This shift is determined by the distance between photodetectors 18, their distance from face 19 of wavelength selective filter 20, and the distance between wavelength selective filter 20 to laser 12, as illustrated in FIG. 6. At point E, at which the responses from photodetectors 24 and 28 are equal, this is used in setting up the target wavelengths for wavelength locking purposes. Any deviation from the wavelengths results in a difference in response intensity at the two photodetectors. This difference can be used in a feedback control loop to change the wavelength of laser 12 back to the target wavelength, as described in greater detail hereafter. In WDM applications each communication channel is set at a pre-determined wavelength. The wavelength of each transmitter output should be stabilized to much better than the channel spacing. For example, for 50 GHz channel spacing, the wavelengths should be stabilized to at least 5 GHz.
Referring now to FIG. 7, one embodiment of a control loop circuit, generally denoted as 30, is coupled to photodetectors 24 and 28 and laser 12. Control loop circuit 30 includes a trans impedance amplifier 32, a differential amplifier 34 and an integrator circuit 36. Control loop circuit 30 provides a feedback of a difference signal generated by photodetectors 24 and 28 in response to a change in wavelength of laser 12. Control loop circuit 30 provides wavelength stabilization of the laser in response to a change in wavelength of the laser.
Photodetectors 24 and 28 convert optical energy to a current for a feedback loop for controlling laser 12. The wavelength of laser 12 determines how much of output beam 14 is reflected by wavelength selective filter 20. The signal received by each photodetector 24 and 28 is dependent on the wavelength emitted by laser 12. Because of the angular dependence of wavelength selective filter 20 a wavelength variation from laser 12 is converted to a transmission and reflection change. The wavelength change is detected as a power change. The output signals from photodetectors 24 and 28 are used to generate a difference signal in differential amplifier 34 which is fed to integrator circuit 36 for controlling the output wavelength of laser 12. By arranging that the reflection detected by photodetectors 24 and 28 is the same at a selected wavelength, the difference signal is set to be zero at the predetermined wavelength (the locked wavelength). The locked wavelength can be set with equivalent stability to different values by using unequal gains for photodetectors 24 and 28. If the wavelength of laser 12 changes the differential signal generated by photodetectors 24 and 28, the error signal, is wavelength dependent and is used to monitor the wavelength of laser 12.
Monitoring and control of laser 12 is wavelength tunable by changing the angle of inclination θ of wavelength selective filter 20. Wavelength selective filter 20 can be mounted on an adjustable support with four degrees of freedom. Control loop circuit 30 is dependent on a number of different factors. These factors include, the wavelength selective filter 20 tilt angles in the x and y axis, the wavelength selective filter 20 index change with temperature, the photodetectors 24 and 28 x and y axis offsets and the divergent angle of the incident beam from laser 12.
In various embodiments, laser 12 can be coupled with any number of photodetectors. With a plurality of photodetectors, different pairs of photodetectors can be used for wavelength subsets in a broader wavelength range. Thus, the use of multiple pairs of photodetectors provides coverage for any selected wavelength range. An array of photodetectors can be used. In one embodiment, an array of photodetectors is formed as a monolithically integrated chip and/or an integral assembly. An array has a number of advantages including but not limited to, enhancing flexibility of geometry of monitoring and control assembly 10, providing photodetector redundancy to enhance reliability and lifetime and provides a larger range of wavelengths, for example to cover a broad wavelength range such as 800 nm to 1650 nm. In one embodiment, the array and monitoring and control assembly 10 can be used as a wavelength tuning and locking element.
One embodiment of laser 12 is a VCSEL with a cantilever apparatus that uses an electrostatic force that pulls on a cantilever arm. The mechanical deflection resulting from this electrostatic force is used to change the length of the laser's Fabry-Perot microcavity and consequently to the resonance wavelength.
Referring now to FIG. 8, cantilever apparatus 38 has a cantilever structure 40 consisting of a base 42, an arm 44 and an active head 46. The bulk of cantilever structure 40 may consist of a plurality of reflective layers 48 which form a distributed Bragg reflector (DBR). Layers can be formed of different materials including but not limited to AlGaAs. Different compositional ratios are used for individual layers 48, e.g., Al0.09 Ga0.91 As/Al0.58 Ga0.42 As. The topmost layer of layers 48 is heavily doped to ensure good contact with an electrical tuning contact 52 deposited on top of cantilever structure 40.
The actual number of layers 48 may vary from 1 to 20 and more, depending on the desired reflectivity of the DBR. Furthermore, any suitable reflecting material other than AlGaAs may be used to produce layers 48. Active head 46 is made of layers 48. However, arm 44 and base 42 do not need to be made of layers 48.
Base 42 can have a variety of different geometric configurations and large enough to maintain dimensional stability of cantilever structure 38. The width of arm 44 ranges typically from 2 to 8 mu m while its length is 25 to 100 mu m or more. The stiffness of arm 44 increases as its length decreases. Consequently, shorter cantilevers require greater forces to achieve bending but shorter cantilevers also resonate at a higher frequency. The preferred diameter of active head 46 falls between 5 and 40 mu m. Other dimensions are suitable.
Electrical tuning contact 52 resides on all or only a portion of a top of cantilever structure 40. Tuning contact 52 be sufficiently large to allow application of a first tuning voltage Vtl. Base 54 rests on a substrate 56 across which a voltage can be sustained. Block 54 can be made of the same material as layers 50. a voltage difference between layers 50 and substrate 56 causes a deflection of arm 44 towards substrate 56. If layers 50 and substrate 56 are oppositely doped, then a reverse bias voltage can be established between them. Substrate 56 is sufficiently thick to provide mechanical stability to entire cantilever apparatus 38. Inside substrate 56 and directly under active head 46 are one or more sets of reflective layers with each set forming a second DBR 57. a more complete description of cantilever apparatus 38 is disclosed in U.S. Pat. No. 5,629,951, incorporated herein by reference.
Referring now to FIG. 9, an embodiment of assembly 10 is illustrated with laser 12 and photodiode 24 forming an integrated circuit 58 on an insulator 60. In FIG. 9, laser 12 is shown as being cantilever apparatus 38 of FIG. 8. However, any suitable laser 12 may be utilized to form the integrated circuit. As shown in FIG. 9, integrated circuit includes a common node 62 for a cantilever and VCSEL anode. Also included are a VCSEL cathode 64. More than one photodiode 24 and 28 can be combined with laser 12 to form integrated circuit 58 (FIG. 10). Insulator 60 can have the additional function as being wavelength selective filter 20 as illustrated in FIG. 10 and can also include second DBR 57.
As illustrated in FIG. 11, laser 12 and wavelength selective filter 20 can be positioned on a common substrate 66. This improves ease of assembly and mechanical stability.
In another embodiment of the present invention shown in FIG. 12, wavelength selective filter 20 has a wedged shape with a thickness that varies monotonically in a lateral direction. Output beam 14 is collimated by lens 21. Each photodiode 24 and 28 respectively, receives light that corresponds to different positions of wavelength selective filter 20 with a different thickness. With wedged shaped wavelength selective filter 20, each photodiode 24 and 28 has a distinct wavelength dependence. In one embodiment, the wedge angle of wavelength selective filter 20 is determined by a desired capture range. It is preferred that the capture range substantially match the deviation of emitted laser wavelengths from the targeted wavelengths.
Referring to FIG. 13, an example of a resultant response curve vs wavelengths with wavelength selective filter 20 of FIG. 12 is shown. In FIG. 13, the two curves represent the response magnitude of each photodetector 24 and 28 as a function of wavelength.
Referring now to FIG. 14, control loop circuit 30 can be utilized with the assembly of FIG. 12.
Wedged selective wavelength filter 20 can be used in the reflective mode as illustrated in FIGS. 15 and 16.
In another embodiment shown in FIG. 17, a reflector 68 is used to redirect output beam 14 which is collimated. Reflector 68 can be a prism, hologram, conical reflector, truncated conical reflector, a pair of mirrors and the like. In this embodiment, wedged wavelength selective filter 20 is used in a transmission mode. The embodiment of FIG. 17 provides a folded back geometry of output beam 14 back to common substrate 66 and forms the integrated assembly or a monolithic chip. In FIG. 18, reflector 68 is coupled to wedged wavelength selective filter 20 and thus is also included in common substrate 66. In this embodiment, wedged wavelength selective filter 20 can be glued, epoxied or the like to common substrate 66.
Monitoring and control assembly 10 can be programmable. In WDM applications, a set of discrete wavelengths with equal spacing in frequency is defined as the ITU grid. It is desirable to have a programmable WDM source that can be set to any wavelengths on the ITU grid and stabilized at that wavelength per demand.
In one embodiment, illustrated in FIG. 19, wavelength selective filter 20 can be an etalon with a free spectra range that coincides with the ITU grid spacing. During assembly, the response of photodiodes 24 and 28 is set up such that the locking wavelength coincides with the precise ITU grid wavelength. Monitoring and control assembly 10 can be programmable and tunable with voltage tuning, temperature tuning and current tuning. FIG. 20 illustrates a voltage tuning embodiment with a voltage source 70. The wavelength vs. tuning voltage characteristics of laser 12 are tabulated and saved. In the embodiment of FIG. 20, programmability can be achieved by, (i) disabling control loop circuit 30, (ii) stepping the voltage to the value that corresponds to the destination wavelength which may be saved in a look-up table in a memory chip and (iii) turning on control loop circuit 30.
All embodiments of assembly 10 disclosed herein, can be utilized as an optical multiplexer or de-multiplexer as described in U.S. Patent Applications, identified as Attorney Docket Nos. 21123-705 and 21123-706, filed on the same date as this application, and incorporated herein by reference. The lasers disclosed in U.S. Patent Applications, Attorney Docket Nos. 21123-702 and 21123-703703, filed on the same date as this application, and incorporated herein by reference, can be utilized in all embodiments of assembly 10.
The foregoing description of a preferred embodiment of the invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise forms disclosed. Obviously, many modifications and variations will be apparent to practitioners skilled in this art. It is intended that the scope of the invention be defined by the following claims and their equivalents.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US4244045||Jan 31, 1979||Jan 6, 1981||Nippon Telegraph And Telephone Public Corporation||Optical multiplexer and demultiplexer|
|US4493113||Sep 10, 1982||Jan 8, 1985||At&T Bell Laboratories||Bidirectional fiber optic transmission systems and photodiodes for use in such systems|
|US4577009||Sep 18, 1984||Mar 18, 1986||Coal Industry (Patents) Limited||Polyimide product from phenanthrene|
|US4577207||Dec 30, 1982||Mar 18, 1986||At&T Bell Laboratories||Dual wavelength optical source|
|US4595454||Jun 15, 1984||Jun 17, 1986||At&T Bell Laboratories||Fabrication of grooved semiconductor devices|
|US4605942||Oct 9, 1984||Aug 12, 1986||At&T Bell Laboratories||Multiple wavelength light emitting devices|
|US4660208||Jun 15, 1984||Apr 21, 1987||American Telephone And Telegraph Company, At&T Bell Laboratories||Semiconductor devices employing Fe-doped MOCVD InP-based layer for current confinement|
|US4700210||Nov 21, 1984||Oct 13, 1987||American Telephone And Telegraph Company, At&T Bell Laboratories||Asymmetric chip design for LEDS|
|US4709413||Jun 13, 1985||Nov 24, 1987||American Telephone And Telegraph Company, At&T Bell Laboratories||Bidirectional fiber optic systems|
|US4756590||Sep 3, 1985||Jul 12, 1988||American Telephone And Telegraph Company, At&T Bell Laboratories||Optical component package|
|US4768070||Feb 17, 1987||Aug 30, 1988||Hitachi, Ltd||Optoelectronics device|
|US4774554||Dec 16, 1986||Sep 27, 1988||American Telephone And Telegraph Company, At&T Bell Laboratories||Semiconductor devices employing Ti-doped Group III-V epitaxial layer|
|US4824200||Feb 6, 1987||Apr 25, 1989||Fujitsu Limited||Optical branching filter|
|US4843280||Jan 15, 1988||Jun 27, 1989||Siemens Corporate Research & Support, Inc.||A modular surface mount component for an electrical device or led's|
|US4888624||Apr 20, 1988||Dec 19, 1989||American Telephone And Telegraph Company, At&T Bell Laboratories||Semiconductor devices employing high resistivity in-based compound group III-IV epitaxial layer for current confinement|
|US4949350||Jul 17, 1989||Aug 14, 1990||Bell Communications Research, Inc.||Surface emitting semiconductor laser|
|US4991179||Apr 26, 1989||Feb 5, 1991||At&T Bell Laboratories||Electrically pumped vertical cavity laser|
|US4999315||Dec 15, 1989||Mar 12, 1991||At&T Bell Laboratories||Method of controlling dopant incorporation in high resistivity In-based compound Group III-V epitaxial layers|
|US4999842||Mar 1, 1989||Mar 12, 1991||At&T Bell Laboratories||Quantum well vertical cavity laser|
|US4999843||Jan 9, 1990||Mar 12, 1991||At&T Bell Laboratories||Vertical semiconductor laser with lateral electrode contact|
|US5005935||Apr 17, 1990||Apr 9, 1991||Fujitsu Limited||Wavelength-division multiplexing optical transmission system|
|US5018157||Jan 30, 1990||May 21, 1991||At&T Bell Laboratories||Vertical cavity semiconductor lasers|
|US5034344||Jun 18, 1990||Jul 23, 1991||Bell Communications Research, Inc.||Method of making a surface emitting semiconductor laser|
|US5034958||Apr 19, 1990||Jul 23, 1991||Bell Communications Research, Inc.||Front-surface emitting diode laser|
|US5063569||Dec 19, 1990||Nov 5, 1991||At&T Bell Laboratories||Vertical-cavity surface-emitting laser with non-epitaxial multilayered dielectric reflectors located on both surfaces|
|US5068868||May 21, 1990||Nov 26, 1991||At&T Bell Laboratories||Vertical cavity surface emitting lasers with electrically conducting mirrors|
|US5073041||Nov 13, 1990||Dec 17, 1991||Bell Communications Research, Inc.||Integrated assembly comprising vertical cavity surface-emitting laser array with Fresnel microlenses|
|US5101460||Sep 4, 1990||Mar 31, 1992||Motorola, Inc.||Simultaneous bidirectional optical interconnect|
|US5102812||Nov 9, 1989||Apr 7, 1992||Bell Communications Research||Method of making a lateral bipolar heterojunction structure|
|US5104824||Nov 6, 1990||Apr 14, 1992||Bell Communications Research, Inc.||Selective area regrowth for surface-emitting lasers and other sharp features|
|US5115441||Jan 3, 1991||May 19, 1992||At&T Bell Laboratories||Vertical cavity surface emmitting lasers with transparent electrodes|
|US5135605||Apr 29, 1991||Aug 4, 1992||At&T Bell Laboratories||Methods for making mirrors|
|US5136603||Apr 29, 1991||Aug 4, 1992||At&T Bell Laboratories||Self-monitoring semiconductor laser device|
|US5146078||Jan 10, 1991||Sep 8, 1992||At&T Bell Laboratories||Articles and systems comprising optically communicating logic elements including an electro-optical logic element|
|US5158908||Sep 28, 1990||Oct 27, 1992||At&T Bell Laboratories||Distributed bragg reflectors and devices incorporating same|
|US5164949||Sep 9, 1991||Nov 17, 1992||Motorola, Inc.||Vertical cavity surface emitting laser with lateral injection|
|US5170407||Oct 11, 1991||Dec 8, 1992||At&T Bell Laboratories||Elimination of heterojunction band discontinuities|
|US5171704||Feb 28, 1991||Dec 15, 1992||At&T Bell Laboratories||Gaas device fabrication utilizing metalorganic molecular beam epitaxy (mombe)|
|US5182787||Mar 5, 1992||Jan 26, 1993||At&T Bell Laboratories||Optical waveguide structure including reflective asymmetric cavity|
|US5206526||May 13, 1991||Apr 27, 1993||At&T Bell Laboratories||Staircase bandgap photodetector using recombination|
|US5206871||Dec 27, 1991||Apr 27, 1993||At&T Bell Laboratories||Optical devices with electron-beam evaporated multilayer mirror|
|US5206872||Nov 1, 1991||Apr 27, 1993||At&T Bell Laboratories||Surface emitting laser|
|US5212701||Mar 25, 1992||May 18, 1993||At&T Bell Laboratories||Semiconductor surface emitting laser having enhanced optical confinement|
|US5212702||Mar 25, 1992||May 18, 1993||At&T Bell Laboratories||Semiconductor surface emitting laser having reduced threshold voltage and enhanced optical output|
|US5214838||Jun 11, 1992||Jun 1, 1993||Globe Products Inc.||Method for inserting stator coil lead wires into terminals having wire-receiving channels|
|US5216686||Feb 3, 1992||Jun 1, 1993||Motorola, Inc.||Integrated HBT and VCSEL structure and method of fabrication|
|US5216727||May 8, 1992||Jun 1, 1993||At&T Bell Laboratories||Integrated nonlinear waveguide spectrometer|
|US5223723||Jun 18, 1991||Jun 29, 1993||At&T Bell Laboratories||Light emitting device|
|US5226053||Dec 27, 1991||Jul 6, 1993||At&T Bell Laboratories||Light emitting diode|
|US5227006||Nov 27, 1991||Jul 13, 1993||At&T Bell Laboratories||Method for selectively growing gallium-containing layers|
|US5244749||Aug 3, 1992||Sep 14, 1993||At&T Bell Laboratories||Article comprising an epitaxial multilayer mirror|
|US5257648||Apr 6, 1992||Nov 2, 1993||American Brass & Aluminum Foundry Company, Inc.||Pressure testing of tubular fitting installed to a ported wall|
|US5258316||Mar 26, 1992||Nov 2, 1993||Motorola, Inc.||Patterened mirror vertical cavity surface emitting laser|
|US5262360||Jun 24, 1991||Nov 16, 1993||The Board Of Trustees Of The University Of Illinois||AlGaAs native oxide|
|US5281542||Mar 25, 1993||Jan 25, 1994||At&T Bell Laboratories||Planar quantum well photodetector|
|US5288657||Nov 1, 1990||Feb 22, 1994||At&T Bell Laboratories||Device fabrication|
|US5291502||Sep 4, 1992||Mar 1, 1994||The Board Of Trustees Of The Leland Stanford, Jr. University||Electrostatically tunable optical device and optical interconnect for processors|
|US5311526||Feb 25, 1993||May 10, 1994||At&T Bell Laboratories||Article that comprises a semiconductor laser, and method of operating the article|
|US5316968||Feb 11, 1993||May 31, 1994||At&T Bell Laboratories||Method of making semiconductor surface emitting laser|
|US5317587||Aug 6, 1992||May 31, 1994||Motorola, Inc.||VCSEL with separate control of current distribution and optical mode|
|US5323416||Aug 20, 1993||Jun 21, 1994||Bell Communications Research, Inc.||Planarized interference mirror|
|US5328854||Mar 31, 1993||Jul 12, 1994||At&T Bell Laboratories||Fabrication of electronic devices with an internal window|
|US5331658||Aug 26, 1992||Jul 19, 1994||Motorola, Inc.||Vertical cavity surface emitting laser and sensor|
|US5337327||Feb 22, 1993||Aug 9, 1994||Motorola, Inc.||VCSEL with lateral index guide|
|US5343490||Sep 11, 1992||Aug 30, 1994||At&T Bell Laboratories||Whispering mode micro-resonator|
|US5348912||Feb 11, 1993||Sep 20, 1994||At&T Bell Laboratories||Semiconductor surface emitting laser having enhanced optical confinement|
|US5351257||Mar 8, 1993||Sep 27, 1994||Motorola, Inc.||VCSEL with vertical offset operating region providing a lateral waveguide and current limiting and method of fabrication|
|US5351261||Apr 14, 1993||Sep 27, 1994||At&T Bell Laboratories||Integrated optics|
|US5351262||Sep 10, 1992||Sep 27, 1994||Bell Communications Research, Inc.||Multi-stripe array grating integrated cavity laser|
|US5355385||Nov 6, 1991||Oct 11, 1994||Fuji Electric Co., Ltd.||Laser diode device having a protective layer on its light-emitting end face|
|US5362977||Dec 28, 1992||Nov 8, 1994||At&T Bell Laboratories||Single mirror light-emitting diodes with enhanced intensity|
|US5387543||Mar 28, 1994||Feb 7, 1995||Motorola, Inc.||Method of making a VCSEL with lateral index guide|
|US5418183||Sep 19, 1994||May 23, 1995||At&T Corp.||Method for a reflective digitally tunable laser|
|US5446752||Jul 7, 1994||Aug 29, 1995||Motorola||VCSEL with current blocking layer offset|
|US5457760||May 6, 1994||Oct 10, 1995||At&T Ipm Corp.||Wavelength division optical multiplexing elements|
|US5493577||Dec 21, 1994||Feb 20, 1996||Sandia Corporation||Efficient semiconductor light-emitting device and method|
|US5495360||Dec 2, 1994||Feb 27, 1996||Bell Communications Research Inc.||1.5 μm wavelength asymmetric fabry-perot modulator with negative chirp|
|US5498883||Oct 3, 1994||Mar 12, 1996||Motorola, Inc.||Superluminescent edge emitting device with apparent vertical light emission and method of making|
|US5574744||Feb 3, 1995||Nov 12, 1996||Motorola||Optical coupler|
|US5598040 *||May 31, 1995||Jan 28, 1997||Eastman Kodak Company||Laser writer having high speed high current laser driver|
|US5614436||Mar 8, 1995||Mar 25, 1997||Nec Corporation||Multiple quantum well distributed feedback semiconductor laser device and method for fabricating the same|
|US5619609||Feb 2, 1996||Apr 8, 1997||E-Tek Dynamics, Inc.||Fiberoptic support clip|
|US5629951||Oct 13, 1995||May 13, 1997||Chang-Hasnain; Constance J.||Electrostatically-controlled cantilever apparatus for continuous tuning of the resonance wavelength of a fabry-perot cavity|
|US5638392||May 15, 1995||Jun 10, 1997||Motorola||Short wavelength VCSEL|
|US5659640||Jun 27, 1995||Aug 19, 1997||Lucent Technologies Inc.||Integrated waveguide having an internal optical grating|
|US5661075||Feb 6, 1995||Aug 26, 1997||Motorola||Method of making a VCSEL with passivation|
|US5677924||Nov 13, 1995||Oct 14, 1997||Sharp Kabushiki Kaisha||Resonant-cavity optical device|
|US5696023||Jun 7, 1995||Dec 9, 1997||The Board Of Trustees Of The University Of Illinois||Method for making aluminum gallium arsenide semiconductor device with native oxide layer|
|US5719891||Dec 18, 1995||Feb 17, 1998||Picolight Incorporated||Conductive element with lateral oxidation barrier|
|US5719893||Jul 17, 1996||Feb 17, 1998||Motorola, Inc.||Passivated vertical cavity surface emitting laser|
|US5737104||Dec 18, 1995||Apr 7, 1998||Dicon Fiberoptics||Wavelength division multiplexer and demultiplexer|
|US5742630||Jul 1, 1996||Apr 21, 1998||Motorola, Inc.||VCSEL with integrated pin diode|
|US5748350||Jun 19, 1996||May 5, 1998||E-Tek Dynamics, Inc.||Dense wavelength division multiplexer and demultiplexer devices|
|US5751757||Jul 1, 1996||May 12, 1998||Motorola, Inc.||VCSEL with integrated MSM photodetector|
|US5757836||Jul 1, 1996||May 26, 1998||Motorola, Inc.||Vertical cavity surface emitting laser with laterally integrated photodetector|
|US5760419||Jul 31, 1996||Jun 2, 1998||The Board Of Trustees Of The Leland Stanford Junior University||Monolithic wavelength meter and photodetector using a wavelength dependent reflector|
|US5764671||Oct 21, 1996||Jun 9, 1998||Motorola, Inc.||VCSEL with selective oxide transition regions|
|US5764679||Aug 23, 1996||Jun 9, 1998||Motorola, Inc.||Mode locked laser with negative differential resistance diode|
|US5771253||Jan 29, 1997||Jun 23, 1998||The Board Of Trustees Of The Leland Stanford Junior University||High performance micromechanical tunable verticle cavity surface emitting laser|
|US5805624||Jul 30, 1996||Sep 8, 1998||Hewlett-Packard Company||Long-wavelength infra-red vertical cavity surface-emitting laser on a gallium arsenide substrate|
|US5812577||Nov 13, 1995||Sep 22, 1998||Sharp Kabushiki Kaisha||Surface-emitting laser|
|US5825792 *||Jul 11, 1996||Oct 20, 1998||Northern Telecom Limited||Wavelength monitoring and control assembly for WDM optical transmission systems|
|US5903586||Jul 30, 1997||May 11, 1999||Motorola, Inc.||Long wavelength vertical cavity surface emitting laser|
|US5978408||Sep 30, 1997||Nov 2, 1999||Xerox Corporation||Highly compact vertical cavity surface emitting lasers|
|USH147||May 31, 1983||Nov 4, 1986||At&T Bell Laboratories||High resistivity group III-V compounds by helium bombardment|
|1||Anan, T. et al., Improved Reflectivity of AIPSb/GaPSb Bragg Reflector for 1.55mum Wavelength; Electronics Letters; Dec. 8, 1994, vol. 30, No. 25.|
|2||Anan, T. et al., Improved Reflectivity of AIPSb/GaPSb Bragg Reflector for 1.55μm Wavelength; Electronics Letters; Dec. 8, 1994, vol. 30, No. 25.|
|3||Blum, O. et al., Digital Alloy AlAsSb/AlGaAsSb Distributed Bragg Reflectors Lattice Matched to InP For 1.3-1.55mum Wavelength Range; Electronics Letters; Jul. 20, 1995, vol. 31, No. 15.|
|4||Blum, O. et al., Digital Alloy AlAsSb/AlGaAsSb Distributed Bragg Reflectors Lattice Matched to InP For 1.3—1.55μm Wavelength Range; Electronics Letters; Jul. 20, 1995, vol. 31, No. 15.|
|5||Goldstein, L. et al., "Metamorphic GaAs/AIAs Bragg deposited on InP for 1,3/1,55mum vertical cavity lasers" Centre D'Elaboration Des Materiaux Et D'Etudes Structurales.|
|6||Goldstein, L. et al., "Metamorphic GaAs/AIAs Bragg deposited on InP for 1,3/1,55μm vertical cavity lasers" Centre D'Elaboration Des Materiaux Et D'Etudes Structurales.|
|7||Ishii, H. et al., "Wavelength stabilisation of a three-electrode distributed Bragg reflector laser with longitudinal mode control", Electronics Letters, vol. 33, No. 6, Mar. 13, 1997, pp. 494-496.|
|8||Lambert, B. et al., High Reflectivity 1.55mum (Al) GaAsSb/AlAsSb Bragg Reactor Lattice Matched on InP Substrates; France Telecom CNET Lab/Rio ; Jul. 19, 1994.|
|9||Lambert, B. et al., High Reflectivity 1.55μm (Al) GaAsSb/AlAsSb Bragg Reactor Lattice Matched on InP Substrates; France Telecom CNET Lab/Rio ; Jul. 19, 1994.|
|10||Mikio, Y., "Circuit for Stabilizing Oscillating Wavelength of Laser Diode", Patent Abstracts of Japan, vol. 014, No. 163, Mar. 29, 1990, (JP02020084).|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US6321003 *||Oct 10, 2000||Nov 20, 2001||Bandwidth9, Inc.||Tunable semiconductor laser system|
|US6333941 *||Aug 1, 2000||Dec 25, 2001||Micro Photonix Integration Corporation||Tunable optical transmitter and tunable light source|
|US6408014 *||Jul 7, 1999||Jun 18, 2002||Agere Systems Guardian Corp.||Apparatus and method for stabilizing the frequency of a light source|
|US6526079 *||Aug 10, 2000||Feb 25, 2003||Coretek, Inc.||Single etalon optical wavelength reference device|
|US6549687 *||Oct 26, 2001||Apr 15, 2003||Lake Shore Cryotronics, Inc.||System and method for measuring physical, chemical and biological stimuli using vertical cavity surface emitting lasers with integrated tuner|
|US6594022 *||Aug 23, 2000||Jul 15, 2003||Coretek, Inc.||Wavelength reference device|
|US6600760 *||Jul 27, 2000||Jul 29, 2003||Intel Corporation||Method and apparatus for tuning a laser|
|US6678480 *||Aug 9, 2000||Jan 13, 2004||Hitachi, Ltd.||Optical transmitter and optical communication system|
|US6711188 *||Dec 12, 2001||Mar 23, 2004||Nec Compound Semiconductor Devices, Ltd.||Wavelength stabilizing unit and wavelength stabilized laser module|
|US6735224 *||Dec 20, 2001||May 11, 2004||Applied Optoelectronics, Inc.||Planar lightwave circuit for conditioning tunable laser output|
|US6738140 *||Sep 17, 2001||May 18, 2004||Lambda Control, Inc.||Wavelength detector and method of detecting wavelength of an optical signal|
|US6788717 *||Mar 12, 2001||Sep 7, 2004||Nec Corporation||Wavelength stabilized laser module|
|US6807204 *||Oct 16, 2000||Oct 19, 2004||Tsunami Photonics Limited||Optoelectronic device incorporating a tunable laser and method of characterization thereof|
|US6819812||Apr 14, 2003||Nov 16, 2004||Lake Shore Cryotronics, Inc.||System and method for measuring physical, chemical and biological stimuli using vertical cavity surface emitting lasers with integrated tuner|
|US6821026||Sep 4, 2002||Nov 23, 2004||International Business Machines Corporation||Redundant configurable VCSEL laser array optical light source|
|US6836330||Mar 28, 2002||Dec 28, 2004||Lambda Control, Inc.||Optical beamsplitter for a polarization insensitive wavelength detector and a polarization sensor|
|US6836578||Dec 22, 2003||Dec 28, 2004||Lake Shore Cryotronics, Inc.||System and method for measuring physical stimuli using vertical cavity surface emitting lasers with integrated tuning means|
|US6839366 *||Aug 29, 2001||Jan 4, 2005||Cisco Technology, Inc.||Laser frequency control using dithered control signal|
|US6858834 *||Mar 1, 2001||Feb 22, 2005||Fibera, Inc.||Light wavelength meter|
|US6859469||Dec 11, 2001||Feb 22, 2005||Adc Telecommunications, Inc.||Method and apparatus for laser wavelength stabilization|
|US6894789 *||Aug 31, 2001||May 17, 2005||Avanex Corporation||Method of extending the capture range of a wavelength monitor and a wavelength monitor and laser system therefor|
|US7027473 *||Oct 1, 2002||Apr 11, 2006||Sumitomo Electric Industries, Ltd.||Multimode semiconductor laser module, wavelength detector, wavelength stabilizer, and Raman amplifier|
|US7038782 *||Dec 11, 2001||May 2, 2006||Adc Telecommunications, Inc.||Robust wavelength locker for control of laser wavelength|
|US7075656 *||Dec 11, 2001||Jul 11, 2006||Adc Telecommunications, Inc.||Method and algorithm for continuous wavelength locking|
|US7106919 *||Dec 11, 2002||Sep 12, 2006||Lake Shore Cryotronics, Inc.||Magneto-optical sensing employing phase-shifted transmission bragg gratings|
|US7116869||Apr 25, 2002||Oct 3, 2006||Bigbangwidth Inc.||Method and apparatus for monitoring fiber optic communications|
|US7154922 *||Jun 19, 2003||Dec 26, 2006||Nikon Corporation||Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method|
|US7164865 *||Mar 15, 2001||Jan 16, 2007||Opnext Japan, Inc.||Optical fiber communication equipment and its applied optical systems|
|US7209499 *||Sep 22, 2004||Apr 24, 2007||Corning Incorporated||Mode-selective frequency tuning system|
|US7254286||Nov 15, 2005||Aug 7, 2007||Lake Shore Cryotronics, Inc.||Magneto-optical resonant waveguide sensors|
|US7901870||May 12, 2005||Mar 8, 2011||Cirrex Systems Llc||Adjusting optical properties of optical thin films|
|US7965949||Jun 21, 2011||Cirrex Systems Llc||Robustly stabilizing laser systems|
|US8428094||Dec 18, 2008||Apr 23, 2013||Osram Opto Semiconductors Gmbh||Surface-emitting semiconductor laser|
|US8521038||May 6, 2011||Aug 27, 2013||Cirrex Systems, Llc||Robustly stabilizing laser systems|
|US8986922||Jan 26, 2011||Mar 24, 2015||Cirrex Systems, Llc||Adjusting optical properties of optical thin films|
|US9065572||Jul 24, 2013||Jun 23, 2015||Cirrex Systems, Llc||Robustly stabilizing laser systems|
|US20020044286 *||Aug 31, 2001||Apr 18, 2002||Alcatel||Method of extending the capture range of a wavelength monitor and a wavelength monitor and laser system therefor|
|US20020051270 *||Mar 15, 2001||May 2, 2002||Kimio Tatsuno||Optical fiber communication equipment and its applied optical systems|
|US20020125405 *||Mar 1, 2001||Sep 12, 2002||Tsai John C.||Light wavelength meter|
|US20020172237 *||Dec 20, 2001||Nov 21, 2002||Applied Optoelectronics, Inc.||Planar lightwave circuit for conditioning tunable laser output|
|US20030063636 *||Oct 1, 2002||Apr 3, 2003||Goro Sasaki||Multimode semiconductor laser module, wavelength detector, wavelength stabilizer, and Raman amplifier|
|US20030076568 *||Oct 22, 2001||Apr 24, 2003||Adc Telecommunications, Inc.||Light frequency stabilizer|
|US20030107746 *||Dec 11, 2001||Jun 12, 2003||Altitun Ab||Robust wavelength locker for control of laser wavelength|
|US20030108071 *||Dec 11, 2001||Jun 12, 2003||Altitun Ab||Method and apparatus for laser wavelength stabilization|
|US20030108072 *||Dec 11, 2001||Jun 12, 2003||Altitun Ab||Method and algorithm for continuous wavelength locking|
|US20030128727 *||Sep 24, 2002||Jul 10, 2003||Hiroyasu Torazawa||Semiconductor laser module|
|US20030133657 *||Dec 11, 2002||Jul 17, 2003||Vladimir Kochergin||Magneto-optical sensing employing phase-shifted transmission bragg gratings|
|US20030138007 *||Mar 19, 2002||Jul 24, 2003||Kwangju Institute Of Science And Technology||Method and system for stabilizing wavelength and optical power of optical channels in WDM optical communication system|
|US20030234854 *||Jun 19, 2003||Dec 25, 2003||Nikon Corporation||Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method|
|US20040042737 *||Sep 4, 2002||Mar 4, 2004||International Business Machines Corporation||Redundant configurable VCSEL laser array optical light source|
|US20040101861 *||Nov 27, 2002||May 27, 2004||Little Roger G.||Resonant cavity photodiode array for rapid DNA microarray readout|
|US20040202399 *||Apr 14, 2003||Oct 14, 2004||Lake Shore Cryotronics, Inc.||System and method for measuring physical, chemical and biological stimuli using vertical cavity surface emitting lasers with integrated tuner|
|US20040202400 *||Dec 22, 2003||Oct 14, 2004||Lake Shore Cryotronics, Inc.||System and method for measuring physical stimuli using vertical cavity surface emitting lasers with integrated tuning means|
|US20040208435 *||Apr 25, 2002||Oct 21, 2004||Brian Moore||Method and apparatus for monitoring fiber optic communications|
|US20060062261 *||Sep 22, 2004||Mar 23, 2006||Nestor Farmiga||Mode-selective frequency tuning system|
|US20060103380 *||Nov 15, 2005||May 18, 2006||Lake Shore Cryotronics, Inc.||Magneto-optical resonant waveguide sensors|
|US20060109873 *||Sep 13, 2005||May 25, 2006||Eric Crosson||External cavity laser having improved single mode operation|
|US20150029515 *||Feb 8, 2013||Jan 29, 2015||Nkt Photonics A/S||Laser device|
|EP1072936A2 *||Jul 17, 2000||Jan 31, 2001||Lucent Technologies Inc.||Method and device for obtaining a desired phase of optical characteristic of a fabry-perot etalon|
|EP1433231A2 *||Oct 8, 2002||Jun 30, 2004||SUMITOMO ELECTRIC INDUSTRIES Ltd||Multimode semiconductor laser module, wavelength detector, wavelength stabilizer, and raman amplifier|
|WO2001094988A2 *||May 17, 2001||Dec 13, 2001||Coretek Inc||Gimbaled lens mount and alignment assembly for a sensitive optical alignment|
|WO2002097936A2 *||May 30, 2002||Dec 5, 2002||Altitun Ab||Apparatus and method for controlling the operating wavelength of a laser|
|WO2003038953A1 *||Oct 23, 2002||May 8, 2003||Lake Shore Cryotronics Inc||System and method for measuring stimuli using vcsel|
|WO2006000729A1 *||Jun 13, 2005||Jan 5, 2006||Commissariat Energie Atomique||Device for sampling part of a light beam originating from a light-emitting optoelectronic component|
|WO2006036576A2 *||Sep 15, 2005||Apr 6, 2006||Corning Inc||Mode-selective frequency tuning system|
|WO2009094967A2 *||Dec 18, 2008||Aug 6, 2009||Osram Opto Semiconductors Gmbh||Surface-emitting semiconductor laser|
|U.S. Classification||372/32, 372/9, 372/29.01, 372/20|
|International Classification||H01S5/02, H01S5/183, H01S5/14, H01S5/0683, H01S5/0687, H01S5/026|
|Cooperative Classification||H01S5/0208, H01S5/0683, H01S5/026, H01S5/0264, H01S5/18366, H01S5/0687, H01S5/0422, H01S5/0078|
|Aug 13, 1999||AS||Assignment|
Owner name: BANDWIDTH9, CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHANG-HASNAIN, CONSTANCE;DATO, RENATO;KNER, PETER;AND OTHERS;REEL/FRAME:010169/0773;SIGNING DATES FROM 19990804 TO 19990805
|Dec 1, 2004||REMI||Maintenance fee reminder mailed|
|May 16, 2005||REIN||Reinstatement after maintenance fee payment confirmed|
|Jun 28, 2005||AS||Assignment|
Owner name: NEOPHOTONICS CORPORATION, CALIFORNIA
Free format text: COURT ORDERED SALE;ASSIGNOR:BANDWIDTH9, INC.;REEL/FRAME:016195/0042
Effective date: 20041102
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Effective date: 20050515
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|Sep 3, 2007||PRDP||Patent reinstated due to the acceptance of a late maintenance fee|
Effective date: 20070907
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