|Publication number||US6856086 B2|
|Application number||US 09/961,846|
|Publication date||Feb 15, 2005|
|Filing date||Sep 24, 2001|
|Priority date||Jun 25, 2001|
|Also published as||US20020196401|
|Publication number||09961846, 961846, US 6856086 B2, US 6856086B2, US-B2-6856086, US6856086 B2, US6856086B2|
|Inventors||Anthony J. Grace, Kieran F. Drain, Yukihiko Sasaki|
|Original Assignee||Avery Dennison Corporation|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (59), Referenced by (44), Classifications (40), Legal Events (7)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application claims the benefit of U.S. Provisional Application No. 60/300,682, filed Jun. 25, 2001, which is incorporated by reference in its entirety.
1. Technical Field of the Invention
The invention relates to optical display devices, and to methods for making the same.
2. Background of the Related Art
Liquid crystal display (LCD) devices are one example of well-known display devices that are useful in a number of applications where light weight, low power and a flat panel display are desired. Typically, these devices comprise a pair of sheet-like, glass substrate elements or “half-cells” overlying one another with liquid crystal material confined between the glass substrates. The substrates are sealed at their periphery with a sealant to form the cell or device. Transparent electrodes are generally applied to the interior surface of the substrates to allow the application of an electric field at various points on the substrates thereby forming addressable pixel areas on the display.
Various types of liquid crystal materials are known in the art and are useful in devices referred to as twisted nematic (TN), super twisted nematic (STN), cholesteric, and ferroelectric display devices.
Other types of display device are electroluminescent displays, such as organic light emitting devices (OLEDs) and polymer light emitting device (PLEDs).
It is desirable to be able to manufacture large area displays of relatively light weight for use in portable devices such as computers, electronic books, personal digital assistants, and the like. Certain organic, polymeric substrates are much lighter than glass while being transparent and are therefore preferred for use over glass in large area, lightweight displays. However, one problem with polymeric substrate displays is the difficulty of properly aligning such substrates, especially if both films are produced using roll-to-roll formation processes. In addition, polymeric substrates often require organic or inorganic coatings with high barrier properties, to prevent ingress of moisture, oxygen, and/or other contaminants into the substrates.
A display includes a front panel and a back panel with a light control material in between. One of the panels includes a rigid substrate, for example made of glass or rigid plastic. The other of the panels includes a flexible substrate, for example made of a flexible plastic film. The panel with the flexible substrate may be made by a roll-to-roll process, with various fabrication operations formed while the flexible substrate is still part of a web of material. The panel with the rigid substrate may be separately fabricated, then combined with the other panel on the web through a pick and place operation that accurately locates the front panel relative to the back panel. The combined front and back panels may be then separated from the web to form the display. The display may be any of a variety of displays, such as liquid crystal displays (LCDs), and electroluminescent displays, such as polymer light emitting devices (PLEDs) and organic light emitting devices (OLEDs).
According to an aspect of the invention, a display includes a rigid front substrate and a flexible back substrate.
According to another aspect of the invention, a display includes a glass front substrate and a plastic film back substrate.
According to another aspect of the invention, a display includes a rigid plastic front substrate and a flexible plastic film back substrate.
According to still another aspect of the invention, a display device includes a front panel and a back panel with a light control material therebetween, wherein one of the panels has a rigid substrate and the other of the panels has a flexible substrate.
To the accomplishment of the foregoing and related ends, the invention comprises the features hereinafter fully described and particularly pointed out in the claims. The following description and the annexed drawings set forth in detail certain illustrative embodiments of the invention. These embodiments are indicative, however, of but a few of the various ways in which the principles of the invention may be employed. Other objects, advantages and novel features of the invention will become apparent from the following detailed description of the invention when considered in conjunction with the drawings.
In the annexed drawings:
In the description given below, first the substrate of an LCD device is described briefly, in broad terms. Then a process for making the LCD device is described. Following this, the substrate of a PLED device is described in broad terms, and a process of making the PLED device is described with particular attention to operations in which that process differs from the process previously described for LCD devices. Variation on the process and the device are also described throughout.
The front panel 12 may include a front substrate 22, front electrodes 24, and a front alignment or orientation coating or layer 26. A seal ring 30 joins the front panel 12 and the back panel 14, and retains the liquid crystal material 16 between the front panel 12 and the back panel 14. The back panel 14 may include a back substrate 32, back electrodes 34, a back alignment or orientation coating or layer 36, an outer-side protective layer 40, a back barrier layer 42, an opaque layer 44, and an internal protective layer 46.
The front substrate 22 may be a rigid substrate. For example, the front substrate 22 may be a glass substrate. The glass may be a conventionally-available glass, for example having a thickness of approximately 0.2-1 mm. Alternatively, the front substrate 22 may be made of other suitable transparent materials, such as a rigid plastic or a plastic film. The plastic film may have a high glass transition temperature, for example above about 65 degrees C., and may have a transparency greater than 85% at 530 nm.
The back substrate 32 may be a flexible substrate, such as a polymeric film substrate. The back substrate 32 may be made of an optically-transparent thermoplastic polymeric material. Examples of suitable such materials are polycarbonate, polyvinyl chloride, polystyrene, polymethyl methacrylate, polyurethane polyimide, polyester, and cyclic polyolefin polymers. More broadly, the back substrate 32 may be a flexible plastic such as a material selected from the group consisting of polyether sulfone (PES), polyethylene terephthalate (PET), polyethylene naphthalate, polycarbonate, polybutylene terephthalate, polyphenylene sulfide (PPS), polypropylene, aramid, polyamide-imide (PAI), polyimide, aromatic polyimides, polyetherimide, acrylonitrile butadiene styrene, and polyvinyl chloride. Further details regarding substrates and substrate materials may be found in International Publication Nos. WO 00/46854, WO 00/49421, WO 00/49658, WO 00/55915, and WO 00/55916, the entire disclosures of which are herein incorporated by reference in their entireties.
The back substrate 32 may be a transparent polymer film with better than 85% transmission at 530 nm.
The electrodes 24 and 34 may include commonly-known transparent conducting oxides, such as indium tin oxide (ITO). It will be appreciated that other metal oxides may be employed, such as indium oxide, titanium oxide, cadmium oxide, gallium indium oxide, niobium pentoxide, and tin oxide. In addition to a primary oxide, the electrodes may include a secondary metal oxide such as an oxide of cerium, titanium, zirconium, hafnium, and/or tantalum. The possible transparent conductive oxides include ZnO2, Zn2SnO4, Cd2SnO4, Zn2In2O5, MgIn2O4, Ga2O3—In2O3, and TaO3. The electrodes 24 and 34 may be arranged on the inside surface of the substrates 22 and 32 in either a segmented or X-Y matrix design, as is well known in the art, to form a plurality of picture elements (pixels). The electrodes 24 and 34 may be formed, for example, by low temperature sputtering or direct current sputtering techniques (DC-sputtering or RF-DC sputtering), followed by selective removal of material. Although only a few electrodes are shown, in practice a large number of electrodes are incorporated in the cell and the number will generally increase as the area dimensions of the cell increase. The electrodes 24 and 34 may have leads that are connected to bus leads, which in turn are connected to addressing electronics. The electrodes 24 and 34 may be addressed independently to create an electric field at selected pixels. In some addressing schemes, the electrodes are sequentially and repeatedly scanned at a rapid rate to provide moving images similar to television images. This requires “refreshing” the display at short time intervals to rapidly turn pixels on and off.
In an exemplary embodiment, the electrodes 24 and 34 may each have a width of 200 microns, with a 20 micron gap between electrodes, thus resulting in a display having pixels that are 200 microns by 200 microns in size, although it will be appreciated that other electrode sizes and gap sizes may be employed. The electrodes may have a sheet resistance of less than about 60 ohms.
The back electrodes 34 alternatively may be opaque electrodes, such as copper or aluminum electrodes. More broadly, the back electrodes may be elemental metal electrodes (opaque or transparent) that contain silver, aluminum, copper, nickel, gold, zinc, cadmium, magnesium, tin, indium, tantalum, titanium, zirconium, cerium, silicon, lead, palladium, or alloys thereof. Metal electrodes on plastic film have the advantage of higher conductivity than ITO electrodes on film.
The alignment coatings 26 and 36 cause a desired orientation of the liquid crystal material 16 at its interface with the panels 12 and 14. This ensures that the liquid crystal rotates light through angles that are complementary to the alignment of the polarizers that may be associated with the cell. The display 10 may include polarizing elements, depending on the type of display (the type of liquid crystal material utilized).
The alignment compositions may include a variety of well-known polymeric materials, for example a polyimide which can be spin coated or printed from solvent, and (if necessary) rubbed with cloth, such as velvet, to provide a useful alignment layer.
The barrier layer 42 prevents moisture and oxygen from being transported through the display. The barrier layer 42 functions to protect layers underneath from environmental damage caused by exposure to oxygen and/or water. In addition, the barrier layer 42 may also function as an adhesion promoter. As the LCD cell gap shrinks, the requirement in barrier performance increases because ingress of fewer water molecules will result in formation of undesirable black spots in the display. The moisture and oxygen barrier may be a conventional suitable material, such as SiO2. Alternatively, the barrier may be SiOx, where 1<x<2. Using SiOx instead of SiO2 may provide an additional moisture and oxygen barrier for the display 10, better preventing moisture and oxygen from being transported through the display. The value x for the SiOx may be controlled, for example, by controlling the oxide ratio in the material used in sputtering the oxide layer, by adding oxygen to an SiO material.
It will be appreciated that the materials for the front substrate 22 and/or the back substrate 32 may be selected to act on their own as a suitable moisture and oxygen barrier. Thus the need for a separate moisture and oxygen barrier may be avoided entirely. For example, a glass front substrate may be sufficiently impermeable to moisture and oxygen to function on its own as a barrier.
Generally speaking, it will be appreciated that the liquid crystal material 16 may include any of a wide variety of suitable liquid crystal materials, such as twisted nematic, cholesteric, and ferroelectric materials.
Twisted nematic liquid crystal devices have a helical or twisted molecular orientation, for example turned by 90 degrees. When an electric field is applied to the liquid crystal material by electrodes incorporated into the device, the molecules re-orient and “unwind” due to the electrical anisotropy of the molecules. This behavior allows the molecules to rotate polarized light when in the twisted state and thereby pass light without rotation when in the untwisted state. When used in combination with polarizers, this ability to rotate polarized light allows the display to act as a light valve, either blocking or passing transmitted or reflected light. When individually addressable electrodes, such as the electrodes 24 and 34, are incorporated into the display, the display device has the ability to display images.
The back panel 14 may be opaque. The opaqueness of the back panel 14 may accomplished in any of a variety of way. For example, the back substrate 32 may be made of an opaque material, such as a suitable opaque polymer material, for example one of the transparent polymer materials discussed above to which a dye or other pigmentation is added. Alternatively, and as illustrated in
Alternatively or in addition, as noted above, the electrode material for the back electrodes 34 itself may be opaque. For example, the electrode material may be aluminum or copper, which is opaque when deposited on the polymer substrate material. The depositing of the electrode material may be by sputtering, for example.
It will be appreciated that a suitable opaqueness may alternatively be achieved by printing an opaque ink between all or a portion of the back substrate 32 and the back electrodes 34.
The opaque substrate and/or electrode material may be used for display devices where light is not transmitted therethrough, but is either reflected by the liquid crystal material or is absorbed by the opaque substrate and/or electrode material. An exemplary suitable liquid crystal material for such a display is a zero field multistable cholesteric liquid crystal mix, such as that described in U.S. Pat. No. 5,889,566, which is incorporated herein by reference. Displays including zero field multistable liquid crystal display (FMLCD) technology have many advantages, such as inherent stability in the display without the need to refresh the display, thus allowing a display that can maintain an image in a no-power mode; excellent sunlight readability; and fast switching operation, for example on the order of 30 milliseconds per frame; and the ability to display various gray scales.
It will be appreciated that alternatively the front panel may be opaque and the back panel transparent, with suitable modifications to the above-described structure.
The front substrate 22 may have an organic coating thereupon to facilitate adhesion of the sealant ring 30. The sealant ring 30 may be made of a conventional suitable sealant material that may be used for containing the liquid crystal material 16 between the front panel 12 and the back panel 14. It will be appreciated that the sealant ring 30 may alternatively be a part of the back panel 14, if desired. The liquid crystal material 16 may be placed between the panels 12 and 14 prior to the joining of the panels, for example by printing the liquid crystal material on either of the panels. Another method is a dispensing method, in which exact amount of liquid crystal is dispensed on to the substrate before joining two panels. Alternatively, and as in the method described below, the liquid crystal material 16 may be placed between the panels 12 and 14 after the joining of the panels 12 and 14, for example by filling the space between the panels through a gap in the sealant ring 30, the gap in the sealant ring subsequently being plugged or otherwise blocked.
In order to allow the preparation of large area displays with uniform spacing and resulting appearance the front panel 12 and/or the back panel 14 may include protrusions and/or other spacers to maintain desired spacing between the front substrate 22 and the back substrate 32.
The outer-side protective layer 40 serves to protect the back substrate 32 from damage and to give dimensional stability to the film. The protective layer 40 may be a copper or aluminum foil, for example. In embodiments for which the back substrate 32 is transparent and the opaque layer 44 is eliminated, a metal protective layer may also function as a reflective layer. The protective layer also serves as a moisture and oxygen barrier. The protective layer may be a metallic film or a film-foil laminate.
The internal protective layer 46 may be an acrylic hard coat layer. As described in further detail below, laser light such as excimer laser light may be used to pattern the back electrodes 34. The internal protective layer 46 may protect laser light penetrating and damaging functional layers (such as the opaque material layer 44 and the barrier layer 42) between the internal protective layer 46 and the back substrate 32. Acrylic, like other organic polymers, has a relatively low thermal conductivity, thereby minimizing lateral damage in ablation that may accompany the laser ablation to pattern the back electrodes 34. It will be appreciated that other suitable materials, such as other suitable polymers, may alternatively be included in the internal protective layer 46.
Turning now to
In step 104 a back panel web is formed by roll-to-roll processing in which the part or all of the structures of the back panels 14 are formed on a web of material, for example on a web of polymer (plastic) film which forms the back substrates 32 of multiple back panels.
Thereafter, in step 106 hybrid processing is performed on the front panels 12 and the back panel web. As explained in greater detail below, further processing is performed on the back panel web to produce the structures of the back panels 14. Then the front panels 12 are placed in proper alignment with and are joined to respective of the back panels 14. The placement of the front panel 12 on the back panel 14 may be accomplished by a pick and place operation. Known suitable mechanical and/or vacuum pick and place devices may be utilized in the pick and place operation.
Referring now to
After the substrate is cleaned in substep 126, the layer of alignment material 26 is then coated onto the substrate in substep 128. In substep 130, the alignment material 26 is cured or allowed to dry. As noted above, the layer of alignment material 26 may be spin coated or printed, and may be rubbed to produce the desired alignment.
Thereafter, in substep 132, the individual front panels 12 are scribed and separated from each other and from the remainder of the sheet 120. In substep 134 the separate front panels 12 are stacked in a magazine, to be later joined with the web of back panels, such as in a pick and place operation.
It will be appreciated that the substeps 122-134 shown in FIG. 3 and described above are but one method of forming the front panels 12. The sheet processing operations may be performed in a different order, if suitable. In addition, some of the steps described above may be omitted, if desired, and other steps may be substituted or added. For example, the fabrication process may include printing or otherwise depositing the liquid crystal material on the front panel 12. As another example, the fabrication process may include depositing spacers upon the front panel 12 or forming spacers as part of the front panel 12. The spacers function to maintain a desired separation between the front substrate 22 of the front panel 12, and the back substrate 32 of the back panel 14. The spacers may take the form of plastic spheres which are not attached to either of the panels 12 and 14, and which may be sprayed onto the panels. Alternatively, the spacers may be protrusions such as posts, ribs, ridges, or other structures that are formed as part of the front panel 12, for example being attached to the alignment coating layer 26. It will be appreciated that a wide variety of spacers are known in the art, including structures which may be formed after joining of front and back panels, for example by selectively curing a resin material which is mixed with the liquid crystal material.
It will be further appreciated that some or all of substeps of the forming of the front panels 12 may be performed other than as sheet processing operations.
Turning now to
In substep 146 the webstock is coated or laminated with the barrier layer 42 to prevent contaminants such as moisture and oxygen from reaching the liquid crystal material. Then the opaque material 44, such as a layer of black material, is laminated or coated on the webstock in substep 148. The opaque material is used for reflective cells, for example in FMLCD cells in which the liquid crystal material itself reflects light. It will be appreciated that the opaque material may be omitted where non-FMLCD cells are employed, for example in transmissive LCD cells and reflective LCD cells where a metal layer is used as a reflector. In substep 149 the inner protective layer 46 is coated, laminated, or otherwise deposited.
The back electrode material, such as indium tin oxide, is then coated onto the web stock in substep 150. As noted above, the electrode material may be a copper or aluminum that is deposited, such as by sputter coating, or is printed, onto the webstock. After coating, the webstock is rewound in substep 151, and is sent to a separate processing station for electrode patterning.
The further processing begins in substep 151 a with unwinding of the webstock. Then in substep 151 b the webstock is cleaned. In substep 152, the electrode material is patterned to form the electrodes. The patterning may include conventional processes, such as wet etching. Alternatively or in addition, the patterning may include ablation of the electrode material to remove the electrode material between electrodes. The ablation may include removal of the electrode material through use of an excimer laser. For example, an XeCl excimer laser with a wavelength of 308 nm or a KRF excimer laser with a wavelength of 248 nm may be used to ablate the electrode material. The laser may provide a range of energy per pulse of 50-1000 mJ/cm2, spectrally narrowed laser wavelengths with the difference between longer and shorter wavelengths being about 0.003 nm or less, large beam dimensions (e.g., 7 mm by 7 mm (about 50 mm2)). Further details of excimer laser ablation may be found in U.S. application Ser. No. 09/783,105, filed Feb. 14, 2001, titled “Multilayered Electrode/Substrate Structures and Display Devices Incorporating the Same,” and U.S. application Ser. No. 09/783,122, filed Feb. 14, 2001, titled “Multilayer Electrode/Substrate Structures and Liquid Crystal Devices Incorporating the Same,” both of which are herein incorporated by reference in their entireties.
Finally, in substep 154 the webstock is rewound to await further processing in the hybrid processing step 106.
The substeps 142-154 may be performed in one or more roll-to-roll operations. The substeps 142-154 are merely one example of substeps employed in forming the back webstock, and it will appreciated that other steps may be added, and/or that some of the steps described above may be suitably altered and/or omitted, if desired.
In substep 164 the alignment layer 36 is applied to the webstock 160. The alignment layer 36 may be a polyimide alignment layer printed on the webstock 160 by use of a flexo press, which is schematically represented by press rollers 166 and 168 in FIG. 7. Alternatively, the alignment layer material 36 may be deposited by sputtering, or by other suitable methods, such as physical vapor deposition (PVD) or spin coating. The alignment layer 36 is cured in substep 170, for example by subjecting the webstock to heating from a heater 172. If desired, the alignment layer 36 may be rubbed or otherwise treated to impart a directional alignment to the layer.
Thereafter the seal ring 30 is applied in substep 174. The seal ring 30 may be applied by printing of the seal ring at appropriate locations on the webstock 160, by use of a printing device 176. In substep 180, spacers are spread on the webstock 160, such as by spraying the spacers on the webstock 160 using a sprayer 182. In substep 183 the alignment material 26 is spot-coated with adhesive material, such as a UV-curable adhesive material. The adhesive material may patterned to be located at the perimeter of the front panels 12 so that the panels may be later anchored to a web of back panels.
In substep 184 the position of the back panel 14 on the webstock 160 is registered, for example using a CCD camera 186 to detect a registration or alignment mark on or near the back panel 14. Then in substep 188 the front panel 12 is removed from a magazine 190 and placed on the back panel 14 in a pick and place operation. It will be appreciated that the magazine 190 may be the same magazine into which the front panels 12 were loaded in substep 134 of step 102, as described above. The front panels 12 may be advanced to the front of the magazine 190 by a spring, and may be lightly retained for pick off by springy or mechanically retracting retainer fingers.
The pick and place operation may be performed by a pick and place device, which may include mechanical and/or vacuum grips to grip the front panel 12 while moving it into the desired location in alignment with the back panel 14. It will be appreciated that a wide variety of suitable pick and place devices are well known. Examples of such devices are the devices disclosed in U.S. Pat. Nos. 6,145,901, and 5,564,888, both of which are incorporated herein by reference, as well as the prior art devices that are discussed in those patents. Alternatively, rotary placers may be utilized to place the front panel 12 upon the back panel 14. An example of such a device is disclosed in U.S. Pat. No. 5,153,983, the disclosure of which is incorporated herein by reference.
The registration of the back panel 14 may be coordinated with placement of the front panel 12 on the back panel 14. For example, the CCD camera 186 and the pick and place device may be operatively coupled so as to insure alignment of the front panel 12 relative to the back panel 14 during and/or after the placement of the front panel onto the back panel. It will be appreciated that use of the pick and place device allows greater accuracy in the placement of the front panel 12 relative to the back panel 14, when compared to joining of front and back panels roll-to-roll processes involving combining respective front and back panel rolls. Devices produced by combining front and back panels from respective rolls may be prone to errors in alignment, due to the variations in dimension which may occur during fabrication of the front and back panels, variations in dimensions due to heating, stretching, and other processes involved in roll-to-roll fabrication.
The alignment during and after placement of the front panel 12 on the back panel 14 may improve electrode registration between the front electrodes 24 of the front panel 12 and the back electrodes 34 of the back panel 14. The electrodes of the panels may be registered to within 5 microns, and may even be registered to within 1 micron.
It will be appreciated that the front panels 12 must be sufficiently rigid so as to maintain sufficient dimensional stability and stiffness throughout the pick and place and registration processes. If the front panels 12 are too limp, they may flutter during the pick and place operation, interfering with proper position of the front panel 12 relative to the back panel 14. As an example, a suitable Gurley stiffness of the front panels in the machine direction may be about 40 mg or greater. Further information regarding acceptable stiffness for pick and place operations may be found in U.S. Pat. No. 6,004,682, the specification of which is incorporated herein by reference.
Thereafter, in substep 192, the front panel 12 is bonded to the back panel 14. The bonding may be accomplished by using a UV light source 193 to spot cure the adhesive applied to the front panel 12 in substep 183 of step 106, described above. The spot coating provides a way of quickly anchoring the front panel 12 and the back panel 14 together, to maintain the desired relative alignment of the front panel 12 and the back panel 14 during further processing steps.
Thereafter, the sealant rings 30 of the combined front and back panels may be cured in substep 194, such as by heating or by exposure to suitable radiation. Then, the combined front and back panels are cut and stacked in substep 196, and are loaded into a magazine 195. The space between the front panel 12 and the back panel 14 is filled with liquid crystal material in substep 197. Then the gap in the sealant ring 30 may be filled in substep 198 and cured in substep 198 a. Further steps, such as singulating the displays 10 and testing the displays, may then be performed.
The fabrications steps and substeps described above are merely one example of the fabrication of a display, and it will be appreciated that the above-described method may be suitably modified by adding, removing, or modifying steps or substeps. For example, the display material alternatively may be deposited by printing, such as by ink jet printing or printing using a letterpress.
Turning now to
The posts 199 a may be located such that they do not contact either the back electrodes 34 or the front electrodes 24. The posts 199 a and the ribs 199 b may be used in conjunction with unattached spacers, such as the spherical plastic spacers described above.
The posts 199 a and/or the ribs 199 b may be formed prior to the coating with electrode material performed in substep 150 in the fabrication method described above. It will be appreciated that suitable modifications may be made in the above-described fabrication method to account for the presence of the posts 199 a and/or the ribs 199 b.
The posts 199 a and/or the ribs 199 b may be physically and chemically integral to the back substrate 32, and may be formed by a microreplication process. One technique of microreplicating arrays with very small surfaces requiring a high degree of accuracy is found in the use of continuous embossing to form cube corner sheeting. A detailed description of equipment and processes to provide optical quality sheeting are disclosed in U.S. Pat. Nos. 4,486,363 and 4,601,861. Tools and a method of making a tool used in those techniques are disclosed in U.S. Pat. Nos. 4,478,769; 4,460,449; and 5,156,863. The disclosures of all the above patents are incorporated herein by reference.
A machine 200 for producing a substrate such as that described above is shown in elevation in
A supply reel 208 of unprocessed thermoplastic web 160 a, 160 b is mounted on the right-hand side of the frame 204; so is a supply reel 212 of flexible plastic film 215. An example of a suitable flexible plastic film 215 is a PET film available from DuPont, which is heat stabilized and has a glass transition temperature of 78 degrees C. and a use temperature of up to 120 degrees C. The flat web 160 a, 160 b and the film 215 are fed from the reels 208 and 212, respectively, to the embossing means 205, over guide rollers 220, in the direction of the arrows.
The embossing means 205 includes an embossing tool 222 in the form of an endless metal belt 230 which may be about 0.020 inches (0.051 cm) in thickness. The width and circumference of the belt 230 will depend in part upon the width or material to be embossed and the desired embossing speed and the thickness of the belt 230. The belt 230 is mounted on and carried by a heating roller 240 and a cooling roller 250 having parallel axes. The rollers 240 and 250 are driven by chains 245 and 255, respectively, to advance belt 230 at a predetermined linear speed in the direction of the arrow. The belt 230 is provided on its outer surface with a continuous female embossing pattern 260 that matches the general size and shape of the particular protrusions (posts 199 a and/or ribs 199 b) to be formed in the web 160 a, 160 b.
Evenly spaced sequentially around the belt, for about 180° around the heating roller 240, are at least three, and as shown five, of pressure rollers 270 of a resilient material, preferably silicone rubber, with a durometer hardness ranging from Shore A 20 to 90, but preferably, from Shore A 60 to 90.
While rollers 240 and 250 may be the same size, in the machine 200 as constructed, the diameter of heating roller 240 is about 10.5 inches (26.7 cm) and the diameter of cooling roller 250 is about 9 inches (22.9 cm). The diameter of each pressure roller 270 is about 6 inches (15.2 cm).
It may be desirable to maintain additional pressure about the tool and substrate during cooling, in which case the cooling roller 250 could be larger in diameter than the heating roller, and a plurality of additional pressure rollers, (not shown) also could be positioned about the cooling roller.
Either or both heating roller 240 or cooling roller 250, has axial inlet and outlet passages (not shown) joined by an internal spiral tube (not shown) for the circulation therethrough of hot oil (in the case of heating roller 240) or other material (in the case of cooling roller 250) supplied through appropriate lines (not shown).
The web 160 a, 160 b and the film 215, as stated, are fed to the embossing means 205, where they are superimposed to form a laminate 280 which is introduced between the belt 230 and the leading roller of the pressure rollers 270, with the web 160 a, 160 b between the film 215 and the belt 230. From thence, the laminate 280 is moved with the belt 230 to pass under the remaining pressure rollers 270 and around the heating roller 240 and from thence along belt 230 around a substantial portion of cooling roller 250. Thus, one face of web 160 a, 160 b directly confronts and engages embossing pattern 260 and one face of the film 215 directly confronts and engages pressure rollers 270.
The film 215 provides several functions during this operation. First, it serves to maintain the web 160 a, 160 b under pressure against the belt 230 while traveling around the heating and cooling rollers 240 and 250 and while traversing the distance between them, thus assuring conformity of the web 160 a, 160 b with the precision pattern 260 of the tool during the change in temperature gradient as the web (now embossed substrate) drops below the glass transition temperature of the material. Second, the film 215 maintains what will be the outer surface of substrate in a flat and highly finished surface for other processing, if desired. Finally, the film 215 acts as a carrier for the web 160 a, 160 b in its weak “molten” state and prevents the web from adhering to the pressure rollers 270 as the web is heated above the glass transition temperature.
The embossing means 205 finally includes a stripper roller 285, around which laminate 280 is passed to remove the same from the belt 230, shortly before the belt 230 itself leaves cooling roller 250 on its return path to the heating roller 240.
The laminate 280 is then fed from stripper roller 285 over further guiding rollers 220, eventually emerging from frame 204 at the lower left hand corner thereof. Laminate 280 is then wound onto a storage winder 290 mounted on the outside of frame 204 at the left hand end thereof and near the top thereof. On its way from the lower left hand corner of frame 204 to winder 290, additional guiding rollers guide the laminate 280.
The heating roller 240 is internally heated (as aforesaid) so that as belt 230 passes thereover through the heating station, the temperature of the embossing pattern 260 at that portion of the tool is raised sufficiently so that web 160 a, 160 b is heated to a temperature above its glass transition temperature, but not sufficiently high as to exceed the glass transition temperature of the film 215.
The cooling roller 250 is internally “fueled” (as aforesaid) so that as belt 230 passes thereover through the cooling station, the temperature of the portion of the tool embossing pattern 260 is lowered sufficiently so that web 160 a, 160 b is cooled to a temperature below its glass transition temperature, and thus becomes completely solid prior to the time laminate 280 is stripped from tool 230.
It has been found that the laminate 280 can be processed through the embossing means 205 at the rate of about 3 to 4 feet per minute, with satisfactory results in terms of the accuracy and dimensional stability and other pertinent properties of the finished substrate.
It will further understood that temperatures of the heating roller and cooling rollers may need to be adjusted within certain ranges depending upon the web material selected. Certain materials have higher glass transition temperature TG than others. Others may require cooling at a higher temperature then normal and for a longer time period. Preheating or additional heating at the entrance of the nips may be accomplished by a laser, by flameless burner, or by another device, and/or by adjusting the temperature of the heating roller to run at higher preselected temperature. Similar adjustments may be made at the cooling level.
A preferred material for the embossing tool disclosed herein is nickel. The very thin tool (about 0.010 inches (0.025 cm) to about 0.030 inches (0.076 cm)) permits the rapid heating and cooling of the tool 230, and the web 160 a, 160 b, through the required temperatures gradients while the pressure rolls and the carrier film apply pressure. The result is the continuous production of a precision pattern where flatness and angular accuracy are important while permitting formation of sharp corners with minimal distortion of other surfaces, whereby the finished substrate provides an array of protrusions (such as posts 199 a and/or ribs 199 b) formed with high accuracy.
The embossing means described herein, with suitable modifications of the tooling, substrate materials and process conditions, may be used to produce any one of the various substrate configurations disclosed herein. For example, in addition to the LCD spacer protrusions of 199 a and 199 b, the embossing means may be used to produce additional formations, including the recesses of the substrate of FIG. 12 and the ridges and wells of the substrate film for PLEDs of FIG. 16.
An alternative method of forming the protrusions 199 a and/or 199 b of
A further method of forming a substrate element includes forming protrusions on a major surface of a substrate by a photolithography process. The photoresist for the photolithography process may be a black matrix material of the type commonly used for producing color filters. A preferred material of this type is CSP series photo-sensitive rib materials by Fuji Film Olin Co., Ltd (Japan).
It will be appreciated that a structure or arrangement of protrusions and recesses may also be formed on a rigid substrate, an example being the front substrate 22 a shown in FIG. 10A. The front substrate 22 a has recesses 291 surrounded or bordered by protrusions 292. The arrangement of the recesses 291 and protrusions 292 on the rigid front substrate 22 a may include any of a variety of suitable geometries of recesses and protrusions.
The arrangement of the recesses 291 and the protrusions 292 may be formed by any of a variety of suitable methods. For example, the above-described methods involving printing and curing UV-curable resins, and photolithography, may be utilized. As another alternative, a suitable embossing process may be used to form the arrangement of recesses and protrusions. A press 294 for carrying out an embossing process on rigid substrates is shown in
Continuous presses, of which the press 294 of
In use, the product is “grabbed” by the two belts and drawn into the press at a constant speed. At the same time, the product, when in a relatively long flat plane, is exposed to pressure in a direction normal to the product. Of course, friction is substantial on the product, but this may be overcome by one of three systems. One system is the gliding press, where pressure-heating plates are covered with low-friction material such as polytetrafluoroethylene and lubricating oil. Another is the roller bed press, where rollers are placed between the stationary and moving parts of the press. The rollers are either mounted in a fixed position on the pressure plates or incorporated in chains or roller “carpets” moving inside the belts in the same direction but at half speed. The roller press is sometimes associated with the term “isochoric.” This is because the press provides pressure by maintaining a constant distance between the two belts where the product is located. Typical isochoric presses operate to more than 700 psi.
A third system is the fluid or air cushion press, which uses a fluid cushion of oil or air to reduce friction. The fluid cushion press is sometimes associated with the term “isobaric” and these presses operate to about 1000 psi. Pressure on the product is maintained directly by the oil or the air. Air advantageously provides a uniform pressure distribution over the entire width and length of the press.
In double band presses, heat is transferred to thin products from the heated rollers or drums via the steel belts. With thicker products, heat is transferred from heated pressure plates to the belts and then to the product. In gliding presses, heat is also transferred by heating the gliding oil itself. In roller bed presses, the rollers come into direct contact with the pressure-heating plates and the steel belts. In air cushion presses, heat flows from the drums to the belts to the product, and, by creating turbulence in the air cushion itself, heat transfer is accomplished relatively efficiently. Also, heat transfer increases with rising pressure.
Another advantage of the double band press is that the product may be heated first and then cooled, with both events occurring while the product is maintained under pressure. Heating and cooling plates may be separately located one after the other in line. The belts are cooled in the second part of the press and these cooled belts transfer heat energy from the product to the cooling system fairly efficiently.
Continuous press machines fitting the general description provided hereinabove are sold by Hymmen GmbH of Bielefeld, Germany (U.S. office: Hymmen International, Inc. of Duluth, Ga.) as models ISR and HPL. These are double belt presses and also appear under such trademarks as ISOPRESS and ISOROLL. To applicants' knowledge, such presses heretofore have not generally been used to emboss precise recesses, especially with polymeric materials.
Using the press in forming an arrangement of protrusions and recesses on a rigid substrate, such as a thermoplastic substrate, involves the following steps: providing a continuous press with an upper set of rollers, a lower set of rollers, an upper belt disposed about the upper set of rollers, a lower belt disposed about the lower set of rollers, a heating station, a cooling station, and pressure producing elements; passing an amorphous thermoplastic material through the press; heating the material to about 490° F. (255° C.); applying pressure of at least about 250 psi (17 bars) to the material; cooling the material to near its Tg and, if desired, maintaining pressure on the material while the material is cooled.
Making reference to
Heat and pressure are applied in a portion of the press referred to as the reaction zone 300. Within the reaction zone are means for applying pressure and heat, such as three upper matched pressure sections 301 a, 302 a, 303 a and three lower matched pressure sections 301 b, 302 b, 303 b. Each section is about 39 inches (100 cm) long and the width depends on the width of roll desired, one example being 27.5 inches (70 cm). Heat and pressure may be applied in other ways that are well known by those skilled in the art. Also, it is understood that the dimensions set forth are for existing or experimental continuous presses, such as those manufactured by Hymmen; these dimensions may be changed if desired.
The lower belt 298 will be smooth if only one side of a product is to be embossed. It is to be understood that the pressure sections may be heated or cooled. Thus, for example, the first two upstream pressure sections, upper sections 301 a, 302 a and the first two lower sections 301 b, 302 b may be heated whereas the last sections 303 a and 303 b may be cooled or maintained at a relatively constant but lower temperature than the heated sections.
Thermoplastic materials such as polysulfone, polyarylate, high Tg polycarbonate, polyetherimide, and copolymers may be used in the press 294 (or the embossing machine 200). With such material, the pressure range is approximately 180 to 1430 psi and the temperature range is approximately 485° F. to 580° F. (250° C. to 340° C.). Material thicknesses of 75 μm to 250 μm may be embossed to provide the desired receptor recesses.
With the dimensions and reaction zones stated above, the process rate may move at about 21 to 32 feet per minute.
As discussed above, the embossing machine 200 shown in
The opaque material layer 310 may be a polymer material with a pigment or dye added, as described above. It will be appreciated that the opaque material layer 310 may be placed on top of the transparent material 312, forming part of the protrusions 302. Alternatively, the opaque material layer 310 may be underneath or within the transparent material. The opaque material may be of the same polymer type as the transparent material, or may be a different type of polymer. The opaque material layer may be joined to the transparent material by a variety of suitable, well-known methods. For instance, the opaque material layer 310 may be bonded with the transparent material 312 in a roll operation using the machine 200 shown in FIG. 10.
Alternatively, the opaque material layer 310 may be a metallic layer deposited on the transparent material 312 by sputtering or another suitable deposition method. As another alternative, the opaque material layer 310 may be an opaque ink layer.
The back electrodes 34 of the back panel 14″ are metal electrodes, such as copper or aluminum electrodes. Use of metal electrodes may allow for easier connection between the electrodes 34 and the microstructure elements 330, when compared to conventional connections between ITO electrodes and microstructure elements. Specifically, electrochemical problems of interconnections between ITO electrodes and Al conductors of the microstructure elements may be avoided.
Turning now to
The metal foil layer 440 may include an aluminum foil, a copper foil, or a stainless steel foil. The metal foil may be from 25 to 75 microns thick. The metal foil 440 functions both as a reflective layer and a barrier layer.
The substrate film 442 may include a polycarbonate film, a PET film, or a PES film. The substrate film 442 may have a thickness from 50 to 200 microns. The polycarbonate film may have a glass transition temperature from 120 to 220 degrees C. Suitable polycarbonate films include HA 120 and HT 200 films available from Teijin Limited, of Osaka, Japan. A suitable PET film is a PET film available from DuPont, which is heat stabilized and has a glass transition temperature of 78 degrees C. and a use temperature of up to 120 degrees C. It will be appreciated that other substrate film materials may be employed, such as those discussed above.
The solvent-resistant or primer layer may include an acrylic coating with a thickness of about 1 to 5 microns. The solvent-resistant material protects the underlying material from solvents used in later fabrication/processing operations, such as in depositing/coating an alignment material, or in wet etching to pattern the electrodes 434.
The back electrodes 434 may include ITO, a metal such as silver or aluminum, or a metal alloy such as a silver alloy. The ITO may have a surface resistance from 30 to 60 ohm/square. The silver or silver alloy may have a surface resistance from 5 to 30 ohm/square. The aluminum electrodes may have a surface resistance from 1 to 30 ohm/square.
The back substrate 532 includes a substrate film layer 542, coated on its back side with a barrier layer 544 and a protective opaque layer 546. Alternatively, the barrier layer 544 may be on the inside of the substrate film layer 542. The back substrate 532 may be a laminate. The substrate film layer 542 may be similar to the substrate film layer 442 shown in FIG. 13 and discussed above. The barrier layer 544 and the opaque layer 546 may include materials discussed above with regard to other embodiments. In addition, alternatively the barrier layer 544 may be a multilayer coating, such as a coating of alternating polymer and SiOx layers.
The primer layer 536 may include an acrylic coating 2 to 5 microns thick.
The electrodes 534 may be similar to the electrodes 434 shown in FIG. 13 and discussed above.
It will be appreciated that the back panels 414 and 514 may be modified to include microreplicated spacers (such as shown in
The back panels 414 and 514 may be utilized with suitable front panels. Front panels for utilization with the back panels 414 and 514 may include glass panels, for example 0.2 to 1 mm thick, with patterned electrodes, for example ITO electrodes having a surface resistance from 1 to 60 ohm/square. Alternatively, front panels for utilization with the back panels 414 and 514 may include rigid plastic panels with light transmission greater than 85% in the visible range, for example 0.2 to 2.5 mm thick polycarbonate or polymethylacrylate, with patterned electrodes, such as ITO electrodes having a surface resistance from 1 to 60 ohm/square. The resulting combination of the back panels 414 or 514 with suitable front panels may be utilized in liquid crystal displays.
Referring now to
The layers 616 may include any of a variety of suitable materials, such as semiconductor materials; organic compounds such as conjugated organics or conjugated polymers that have many of the characteristics of semiconductors; and suitable polymers such as poly-paraphenylene vinylene (PPV). For an OLED, the hole transport material may have a thickness from 100 to 500 Angstroms, and the emitter may have a thickness from 50 to 100 Angstroms. Further detail on suitable materials may be found in U.S. Pat. No. 5,703,436 and in U.S. Pat. No. 5,965,280, both of which are incorporated by reference in their entireties.
The electrodes 624 and 634 may be arrayed such that various parts of the light emitting material may be selectively actuated to luminesce. Further details regarding a suitable arrangement of electrodes may be found in the above-referenced U.S. Pat. No. 5,703,436.
The back panel 614 may include a flexible substrate 632 similar to the substrate 32 described above. The back panel 614 may also include an acrylic or other hard layer to facilitate laser ablation of the back electrodes 634. The back panel 614 may include a barrier coating, such as a multilayer barrier coating, to prevent contaminants, such as water and/or moisture, from entering.
Turning now to
The substrate film 712 may be polycarbonate, PET, or PES. The anode 720 is a transparent electrode, such as an ITO electrode or an electrode composed of silver or silver alloy. Formation of such transparent electrodes is described further in U.S. Pat. No. 5,667,853, which is incorporated herein by reference in its entirety. The hole transport layer 722 may include PEDOT/PSS material (polyethylene dioxy thiophene/polystyrene sulphonate), and may have a thickness from 20 to 60 nm. The LEP 724 may include poly(phenylene vinylene) derivatives, and may have a thickness of less than 200 nm. The cathode 728 may be a low work function electrode material, for example including Ca or Mg.
The back panel 730 may include glass, and may have an opaque coating such as a black coating or a metal coating to improve the contrast ratio of the display device 710. Alternatively, the back panel 730 may be uncoated, non-transparent (such as opaque) glass. As another alternative, the back panel 730 may be a polymer-metal laminate, such as the material for the back substrate 432 shown in FIG. 13 and described above. It will be appreciated that the polymer-metal laminate back panel may be part of a roll of such material.
The ridges or protrusions 714 may have straight sides (as shown in FIG. 16), or alternatively may have tapered sides (as shown in
A potential difference between the anode 720 and the cathode 728 causes flow of electrons through the structure in the well 728, which causes the LEP 724 to emit light. This light passes through the transparent anode 720 and the transparent substrate film 712, and out of the display device 710.
The substrate film 712 may have one or more coatings to provide a barrier against contamination of the display device 710 by oxygen and/or moisture.
A process for making the display device 710 may include forming the anodes 720 in the wells 716 by sputtering ITO followed by laser etching or by sputtering with shadow masking during the sputtering. The hole transport layer 722 and the LEP 724 may by deposited by sequential ink jet printing of PEDOT and LEP into the wells 716. Then sputter coating of the cathodes 728 is followed by placement and sealing of the back panel 730.
More broadly, manufacture of the display 710 may include the following steps: 1) microreplicate the substrate film 712 to form the ridges 714 and the wells 716; 2) sputter coat the material for the anodes 720; 3) laser etch to remove the anode material from the tops and sides of the ridges 714; 4) inkjet print the hole transport layer 722 in the wells 716; 5) inkjet print the LEP 724 in the wells 716; 6) sputter deposit the material for the cathodes 728; 7) laser etch to remove the cathode material from the tops and sides of the ridges 714 (removing excess hole transport layer material and LEP as well); 8) printing the sealant; 9) laminating the back panel 730 onto the ridges 714 by a pick and place operation; 10) curing the sealant; and 11) cutting the finished display device 710, separating it from a roll including multiple such devices. Steps 1, 2, and 3 of the above process may each be performed separately, in one or more process lines separate from the production line for the remaining process. Alternatively or in addition, the sputter coating and/or laser etching steps may be performed separately. As another alternative, the ridges 714 may be formed by printing UV-curable material, followed by UV irradiation or photolithography.
It will be appreciated that suitable alternatives may be used for some of the above steps. For example, wet etching may be used instead of one or both of the laser etchings. As another example, sputtering deposition may be used instead of one or both of the inkjet printing processes.
An alternative passive matrix PLED display device 810 is shown in FIG. 17. Components/features 812-830 correspond to components/features 712-730 of the display device 710 shown in FIG. 16 and described above. However, in the display device 810 the light from the LEP 824 exits the display through the front panel 830. Thus the front panel 830 and the cathode 828 are sufficiently transparent to allow light to pass therethrough. The front panel may be transparent glass. The cathode 828 may be a low work function electrode material. Examples of transparent, low work function electrodes may be found in U.S. Pat. No. 6,150,043, which is incorporated herein by reference in its entirety.
The substrate film 812 forms part of the back panel of the display device 810. The substrate film 812 may be laminated to a metal foil 840, to provide good barrier properties and enhanced reflectivity and/or contrast. The metal foil 840 may be an aluminum foil, a copper foil, or a stainless steel foil, for example.
The anode 820 need not be transparent, and may be a patterned metal electrode, such as an electrode including aluminum, copper, or ITO, for example.
The PLED 910 includes a continuous cathode layer 928. Each of the anodes 920 has a corresponding thin film transistor (TFT) 944. The TFT 944 is used in selectively providing power to the corresponding anode 920. The TFT may be a polysilicon TFT. Alternatively, the TFT 944 may be a printed organic semiconductor TFT.
The substrate film 912 may be coated with polyimide to improve thermal resistance. Polyimide-coated films are described further in International Publication WO 00/41884, which is incorporated herein by reference in its entirety.
Steps in manufacture of the display 910 may include the following steps: 1) microreplicate the substrate film 912 to form the ridges 914 and the wells 916; 2) sputter coat the material for the anodes 920; 3) laser etch to remove the anode material from the tops and sides of the ridges 914; 4) form the TFTs 944 in the wells 916; 5) inkjet print the hole transport layer 922 in the wells 916; 6) inkjet print the LEP 924 in the wells 916; 7) sputter deposit the material for the cathodes 928; 8) printing the sealant; 9) laminating the back panel 930 onto the ridges 914 by a pick and place operation; 10) curing the sealant; and 11) cutting the finished display device 910, separating it from a roll including multiple such devices.
For passive matrix displays such as those of
After deposition of the hole transporting and LEP layers, such as by printing, and before depositing the cathode material, an insulator, such as SiO2, may be selectively deposited, for example being deposited in the shaded areas 1054 shown in FIG. 23. The insulator may reduce the occurrence of electrical shorting in the display device.
As another alternative manufacturing method, after microreplication of a substrate film such as the substrate film 1012, the bottom of the film may be cut off, thus transforming the wells 1016 into holes through the film. Then the film may be adhered to a glass or other rigid substrate with patterned electrodes (such as ITO electrodes) already formed thereupon. It will be appreciated that the substrate film 1012 may be suitable registered so as to desirably align the holes with the patterned electrodes.
Displays of the sort described above may be coupled to other components as a part of a wide variety of devices, for display of various types of information. For example, a display may be coupled to a microprocessor, as part of a computer, electronic display device such as an electronic book, cell phone, calculator, smart card, appliance, etc., for displaying information.
It will be appreciated that the devices and methods described above have many advantages over prior art devices. For instance, as already mentioned above, the use of the pick and place device to align the front panel 12 relative to the back panel 14 allows improved accuracy in alignment. Use of a glass front substrate 22 results in a better brightness and contrast than what is presently achieved with complete plastic displays. Use of a glass front substrate 22 in combination with an opaque back panel 14 also allows for high conductivity at low cost. The glass front substrate 22 may also advantageously act as a moisture and oxygen barrier, reducing or eliminating the need for multiple transparent barrier layer films.
Although the invention has been shown and described with respect to a certain embodiment or embodiments, it is obvious that equivalent alterations and modifications will occur to others skilled in the art upon the reading and understanding of this specification and the annexed drawings. In particular regard to the various functions performed by the above described elements (components, assemblies, devices, compositions, etc.), the terms (including a reference to a “means”) used to describe such elements are intended to correspond, unless otherwise indicated, to any element which performs the specified function of the described element (i.e., that is functionally equivalent), even though not structurally equivalent to the disclosed structure which performs the function in the herein illustrated exemplary embodiment or embodiments of the invention. In addition, while a particular feature of the invention may have been described above with respect to only one or more of several illustrated embodiments, such feature may be combined with one or more other features of the other embodiments, as may be desired and advantageous for any given or particular application.
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|U.S. Classification||313/498, 349/179, 315/169.3, 428/917, 313/495, 313/504, 313/244, 313/506, 349/168, 349/33, 313/512, 315/169.4, 349/175, 313/501, 348/790, 345/207, 349/158, 313/292|
|International Classification||G02F1/1333, H01L51/56, H01L27/32, H01L51/52, G02F1/1341|
|Cooperative Classification||Y10S428/917, H01L51/52, H01L27/3244, H01L51/525, G02F2001/133354, H01L51/56, H01L27/3281, G02F1/1341, H01L2251/566, G02F1/133305, G02F2001/133368, H01L2251/5338|
|European Classification||H01L51/52, H01L51/56, G02F1/1341, H01L27/32M4, H01L27/32M2|
|Jan 28, 2002||AS||Assignment|
Owner name: AVERY DENNISCN CORPORATION, CALIFORNIA
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|Mar 27, 2007||AS||Assignment|
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