|Publication number||US7591708 B2|
|Application number||US 11/236,062|
|Publication date||Sep 22, 2009|
|Filing date||Sep 26, 2005|
|Priority date||Feb 6, 2002|
|Also published as||CN1735478A, CN101172332A, CN101172332B, US7001242, US7374477, US20030148706, US20030148721, US20060025052, US20080064301|
|Publication number||11236062, 236062, US 7591708 B2, US 7591708B2, US-B2-7591708, US7591708 B2, US7591708B2|
|Inventors||Manoocher Birang, Boguslaw A. Swedek, Hyeong Cheol Kim|
|Original Assignee||Applied Materials, Inc.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (109), Non-Patent Citations (6), Referenced by (11), Classifications (22), Legal Events (3)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application is a divisional application and claims the benefit of priority under 35 U.S.C. Section 120 of U.S. application Ser. No. 10/124,507, filed on Apr. 16, 2002, which issued on Feb. 1, 2006, as U.S. Pat. No. 7,001,242 and claims priority to U.S. Provisional Application Ser. No. 60/353,419, filed on Feb. 6, 2002. The disclosure of each prior application is considered part of and is incorporated by reference in the disclosure of this application.
This present invention relates to methods and apparatus for monitoring a metal layer during chemical mechanical polishing.
An integrated circuit is typically formed on a substrate by the sequential deposition of conductive, semiconductive or insulative layers on a silicon wafer. One fabrication step involves depositing a filler layer over a non-planar surface, and planarizing the filler layer until the non-planar surface is exposed. For example, a conductive filler layer can be deposited on a patterned insulative layer to fill the trenches or holes in the insulative layer. The filler layer is then polished until the raised pattern of the insulative layer is exposed. After planarization, the portions of the conductive layer remaining between the raised pattern of the insulative layer form vias, plugs and lines that provide conductive paths between thin film circuits on the substrate. In addition, planarization is needed to planarize the substrate surface for photolithography.
Chemical mechanical polishing (CMP) is one accepted method of planarization. This planarization method typically requires that the substrate be mounted on a carrier or polishing head. The exposed surface of the substrate is placed against a rotating polishing disk pad or belt pad. The polishing pad can be either a “standard” pad or a fixed-abrasive pad. A standard pad has a durable roughened surface, whereas a fixed-abrasive pad has abrasive particles held in a containment media. The carrier head provides a controllable load on the substrate to push it against the polishing pad. A polishing slurry, including at least one chemically-reactive agent, and abrasive particles if a standard pad is used, is supplied to the surface of the polishing pad.
One problem in CMP is determining whether the polishing process is complete, i.e., whether a substrate layer has been planarized to a desired flatness or thickness, or when a desired amount of material has been removed. Overpolishing (removing too much) of a conductive layer or film leads to increased circuit resistance. On the other hand, under-polishing (removing too little) of a conductive layer leads to electrical shorting. Variations in the initial thickness of the substrate layer, the slurry composition, the polishing pad condition, the relative speed between the polishing pad and the substrate, and the load on the substrate can cause variations in the material removal rate. These variations cause variations in the time needed to reach the polishing endpoint. Therefore, the polishing endpoint cannot be determined merely as a function of polishing time.
One way to determine the polishing endpoint is to monitor polishing of the substrate in-situ, e.g., with optical or electrical sensors. One monitoring technique is to induce an eddy current in the metal layer with a magnetic field, and detect changes in the magnetic flux as the metal layer is removed. In brief, the magnetic flux generated by the eddy current is in opposite direction to the excitation flux lines. This magnetic flux is proportional to the eddy current, which is proportional to the resistance of the metal layer, which is proportional to the layer thickness. Thus, a change in the metal layer thickness results in a change in the flux produced by the eddy current. This change in flux induces a change in current in the primary coil, which can be measured as change in impedance. Consequently, a change in coil impedance reflects a change in the metal layer thickness.
In one aspect, the invention is directed to a polishing system that has a polishing pad with a polishing surface, a carrier to hold a substrate against the polishing surface of the polishing pad, and an eddy current monitoring system including a coil. The coil is positioned on a side of the polishing surface opposite the substrate and extends at least partially through the polishing pad.
Implementations of the invention may include one or more of the following features. The polishing pad may include a recess formed in a bottom surface thereof, and the coil may be at least partially positioned into the recess. The coil is secured to the polishing pad, e.g., embedded in the polishing pad. The coil may be wound about the core. The coil may extend at least partially through a transparent window of an optical monitoring system. The polishing pad may be mounted on a top surface of a platen, and the coil may be supported by the platen.
In another aspect, the invention is directed to a polishing system that has a polishing pad with a polishing surface, a carrier to hold a substrate against the polishing surface of the polishing pad, and an eddy current monitoring system including a ferromagnetic body. The ferromagnetic body is positioned on a side of the polishing surface opposite the substrate and extends at least partially through the polishing pad.
Implementations of the invention may include one or more of the following features. A recess may be formed in a bottom surface of the polishing pad, and the ferromagnetic body may be positioned into the recess. The polishing pad may be attached to a platen, and the ferromagnetic body may be supported by the platen. A gap may separate the ferromagnetic body from the polishing pad. The polishing pad may include an aperture formed therethrough, and the ferromagnetic body may be positioned in the aperture. A core of the eddy current monitoring system may be aligned with the ferromagnetic body when the polishing pad is secured to the platen. The ferromagnetic body may extend at least partially through a transparent window of an optical monitoring system. The ferromagnetic body may be secured to the polishing pad, e.g., with a polyurethane epoxy or embedded in the polishing pad. A coil may be wound around the ferromagnetic body. The coil may extend at least partially through the polishing pad. The ferromagnetic body may be biased against the polishing pad.
In another aspect, the invention is directed to a polishing system that includes a polishing pad having a polishing surface and a backing surface with a recess formed therein, and an eddy current monitoring system including an induction coil positioned at least partially in the recess.
In another aspect, the invention is directed to a polishing system that includes a polishing pad having a polishing surface and a backing surface with a recess formed therein, and an eddy current monitoring system including a ferromagnetic body positioned at least partially in the recess.
In another aspect, the invention is directed to a polishing pad that has a polishing layer with a polishing surface and a solid transparent window in the polishing layer. The transparent window has top surface that is substantially flush with the polishing surface and a bottom surface with at least one recess formed therein.
Implementations of the invention may include one or more of the following features. The transparent window may be formed of polyurethane. A backing layer may be positioned on a side of the polishing layer opposite the polishing surface. An aperture may be formed in the backing layer and aligned with the window.
In another aspect, the invention is directed to a polishing pad that has a polishing layer and an induction coil secured to the polishing layer.
Implementations of the invention may include one or more of the following features. The induction coil may be embedded in the polishing pad. A recess may be formed in a bottom surface of the polishing pad, and the coil may be positioned into the recess. The coil may be positioned with a primary axis perpendicular to a surface of the polishing layer. The coil may be positioned with a primary axis at an angle greater than 0 and less than 90 degrees to a surface of the polishing layer.
In another aspect, the invention is directed to a polishing pad with a polishing layer and a ferromagnetic body secured to the polishing layer.
Implementations of the invention may include one or more of the following features. The polishing layer may include a recess formed in a bottom surface thereof, and the ferromagnetic body may be positioned into the recess. The polishing layer may include a plurality of recesses, and a plurality of ferromagnetic bodies may be positioned into the recesses. The polishing layer may include an aperture formed therethrough, and the ferromagnetic body may be positioned in the aperture. A plug may hold the ferromagnetic body in the aperture. The plug may have a top surface substantially flush with a surface of the polishing layer. A position of the ferromagnetic body may be adjustable relative to a surface of the polishing layer. A top surface of the ferromagnetic body may be exposed to the polishing environment. The ferromagnetic body may be positioned with a longitudinal axis perpendicular to a surface of the polishing layer, or the ferromagnetic body may be positioned with a longitudinal axis at an angle greater than 0 and less than 90 degrees to a surface of the polishing layer. The ferromagnetic body may be secured to the polishing layer with an epoxy. A transparent window may be formed through the polishing layer, and the ferromagnetic body may be secured to the transparent window. A recess or aperture may be formed in the transparent window. A coil may be wound around the ferromagnetic body.
In another aspect, the invention is directed to a carrier head for a polishing system that has a substrate receiving surface and a ferromagnetic body behind the substrate receiving surface.
In another aspect, the invention is directed to a method of polishing. The method includes bringing a substrate into contact with a polishing surface of a polishing pad, positioning an induction coil on a side of the polishing surface opposite the substrate so that the induction coil extends at least partially through the polishing pad, causing relative motion between the substrate and the polishing pad, and monitoring a magnetic field using the induction coil.
In another aspect, the invention is directed to a method of polishing. The method includes bringing a substrate into contact with a polishing surface of a polishing pad, positioning a ferromagnetic body on a side of the polishing surface opposite the substrate so that the ferromagnetic body extends at least partially through the polishing pad, causing relative motion between the substrate and the polishing pad, and monitoring a magnetic field using an induction coil that is magnetically coupled to the ferromagnetic body.
In another aspect, the invention is directed to a method of manufacturing a polishing pad. The method includes forming a recess in a bottom surface of a solid transparent window, and installing the solid transparent window in a polishing layer so that a top surface of the solid transparent window is substantially flush with a polishing surface of the polishing pad.
Implementations of the invention may include one or more of the following features. Forming the recess may include machining the recess or molding the window. Installing the window may includes forming an aperture in the polishing layer and securing the window in the aperture, e.g., with an adhesive.
The details of one or more embodiments of the invention are set forth in the accompanying drawings and the description below. Other features, objects, and advantages of the invention will be apparent from the description and drawings, and from the claims.
Like reference symbols in the various drawings indicate like elements.
The polishing apparatus 20 includes a rotatable platen 24 on which is placed a polishing pad 30. The polishing pad 30 can be a two-layer polishing pad with a hard durable outer layer 32 and a soft backing layer 34. The polishing station can also include a pad conditioner apparatus to maintain the condition of the polishing pad so that it will effectively polish substrates.
During a polishing step, a slurry 38 containing a liquid and a pH adjuster can be supplied to the surface of polishing pad 30 by a slurry supply port or combined slurry/rinse arm 39. Slurry 38 can also include abrasive particles.
The substrate 10 is held against the polishing pad 30 by a carrier head 70. The carrier head 70 is suspended from a support structure 72, such as a carousel, and is connected by a carrier drive shaft 74 to a carrier head rotation motor 76 so that the carrier head can rotate about an axis 71. In addition, the carrier head 70 can oscillate laterally in a radial slot formed the support structure 72. A description of a suitable carrier head 70 can be found in U.S. patent application Ser. Nos. 09/470,820 and 09/535,575, filed Dec. 23, 1999 and Mar. 27, 2000, the entire disclosures of which are incorporated by reference. In operation, the platen is rotated about its central axis 25, and the carrier head is rotated about its central axis 71 and translated laterally across the surface of the polishing pad.
A recess 26 is formed in platen 24, and an in-situ monitoring module 50 fits into the recess 26. A transparent window 36 fits over a portion of the module 50. The transparent window 36 has a top surface that lies flush with the top surface of the polishing pad 30. The module 50 and window 36 are positioned such that they pass beneath substrate 10 during a portion of the platen's rotation.
The transparent window 36 can be an integral part of the module 50 itself, or it can be an integral part of the polishing pad 30. In the former case, the polishing pad can be formed with an aperture that matches the dimension of the window. When the polishing pad is installed, the aperture fits around the window. In the later case, the polishing pad can be placed on platen 24 so that the window is aligned with the module 50. The transparent window 36 can be a relatively pure polymer or polyurethane, e.g., formed without fillers, or the window can be formed of Teflon or a polycarbonate. In general, the material of the window 36 should be non-magnetic and non-conductive.
The in-situ monitoring module 50 includes an situ eddy current monitoring system 40 and an optical monitoring system 140. The optical monitoring system 140, which will not be described in detail, includes a light source 144, such as a laser, and a detector 146. The light source generates a light beam 142 which propagates through transparent window 36 and slurry to impinge upon the exposed surface of the substrate 10. Light reflected by the substrate is detected by the detector 146. In general, the optical monitoring system functions as described in U.S. patent application Ser. No. 09/184,775, filed Nov. 2, 1998, and Ser. No. 09/184,767, filed Nov. 2, 1998, the entire disclosures of which are incorporated herein by references.
The eddy current monitoring system 40 includes a core 42 positioned in the recess 26 to rotate with the platen. A drive coil 44 is wound around a first part of the core 42, and a sense coil 46 wound around a second part of the core 42. In operation, an oscillator energizes the drive coil 44 to generate an oscillating magnetic field 48 that extends through the body of core 42. At least a portion of magnetic field 48 extends through the window 36 toward the substrate 10. If a metal layer is present on the substrate 10, the oscillating magnetic field 48 will generate eddy currents. The eddy current produces a magnetic flux in the opposite direction to the induced field, and this magnetic flux induces a back current in the primary or sense coil in a direction opposite to the drive current. The resulting change in current can be measured as change in impedance of the coil. As the thickness of the metal layer changes, the resistance of the metal layer changes. Therefore, the strength of the eddy current and the magnetic flux induced by eddy current also change, resulting in a change to the impedance of the primary coil. By monitoring these changes, e.g., by measuring the amplitude of the coil current or the phase of the coil current with respect to the phase of the driving coil current, the eddy current sensor monitor can detect the change in thickness of the metal layer.
The drive system and sense system for the eddy current monitoring system will not be described in detail, as descriptions of suitable systems can be found in U.S. patent application Ser. Nos. 09/574,008, 09/847,867, and 09/918,591, filed Feb. 16, 2000, May 2, 2001, and Jul. 27, 2001, respectively, the entire disclosures of which are incorporated by reference.
Various electrical components of the optical and eddy-current monitoring systems can be located on a printed circuit board 160 located in the module 50. The printed circuit board 160 can include circuitry, such as a general purpose microprocessor or an application-specific integrated circuit, to convert the signals from the eddy current sensing system and optical monitoring system into digital data.
As previously noted, the eddy current monitoring system 40 includes a core 42 positioned in the recess 26. By positioning the core 42 close to the substrate, the spatial resolution of the eddy current monitoring system can be improved.
The lower surface of the transparent window 36 includes two rectangular indentations 52 that provide two thin sections 53 in the polishing pad. The prongs 42 a and 42 b of the core 42 extend into the indentations 52 so that they pass partially through the polishing pad. In this implementation, the polishing pad can be manufactured with recesses preformed in the lower surface of the window. When the polishing pad 30 is secured to the platen, the window 36 fits over the recess 26 in the platen and the recesses 52 fit over the ends of the prongs of the core. Thus, the core can be held by a support structure so that the prongs 42 a and 42 b actually project beyond the plane of the top surface of the platen 24. By positioning the core 42 closer to the substrate, there is less spread of the magnetic fields, and spatial resolution can be improved.
The recesses can be formed by machining the recesses into the bottom surface of the solid window piece, or by molding the window with the recesses, e.g., by injection molding or compression molding so that the window material cures or sets in mold with an indentation that forms the recess. Once the window has been manufactured, it can be secured in the polishing pad. For example, an aperture can be formed in the upper polishing layer, and the window can be inserted into the aperture with an adhesive, such as a glue or adhesive. Alternatively, the window could be inserted into the aperture, a liquid polyurethane could be poured into the gap between the window and pad, and the liquid polyurethane could be cured. Assuming that the polishing pad includes two layers, an aperture can be formed in the backing layer that aligns with the window 36, and the bottom of the window could be attached to the exposed edges of the backing layer with an adhesive.
The carrier head 70 also includes a plate 100 formed of a ferromagnetic material, such as ferrite. The plate 100 can be positioned inside the pressurizable chamber 106, and can rest on the flexible membrane 104. Because the plate 100 is more magnetically permeable than the surrounding carrier head, the magnetic field is channeled preferentially through the plate and the magnetic field lines remain relatively concentrated or collimated as they pass through the substrate 10. Consequently, the magnetic field passes through a relatively small portion of the substrate, thereby improving the spatial resolution of the eddy current monitoring system 40.
Alternatively, instead of a flexible membrane and a pressurizable chamber, the carrier head can use a rigid backing member that is formed of a ferromagnetic material. A thin compressible layer, such as a carrier film, can be placed on the outer surface of the rigid backing member.
The core 42′ is oriented substantially vertically, i.e., with its longitudinal axis relatively perpendicular to the plane of the polishing surface. The window 36 includes a single indentation 52′, and the core 42′ can be secured so that a portion of the core 42′ extends into the indentation 52′. When the drive and sense coil 44′ is energized, the magnetic field passes through the thin section 53′ to interact with the metal layer on the substrate. The core 42′ can be secured with an epoxy, such as polyurethane epoxy, or by using a liquid polyurethane and curing the polyurethane with the core in place.
The coil 44′ can be attached to the core 42′, or it can be an unattached element that is secured in the module 50. In the later case, when the polishing pad 30 and window 36 are secured to the platen 24, the core 42′ can slide into the cylindrical space in the interior formed by the coil 42′. In the former case, the coil will end in an electrical connection that can be coupled and or decoupled from the remaining electronics in the polishing system. For example, the coil can be connected to two contact pads, and two leads can extend from the printed circuit board 160. When the polishing pad 30 and window 36 are secured to the platen 24, the contact pads are aligned and engage the leads from the printed circuit board 160.
In operation, CMP apparatus 20 uses eddy current monitoring system 40 and optical monitoring system 140 to determine when the bulk of the filler layer has been removed and to determine when the underlying stop layer has been substantially exposed. The computer 90 applies process control and endpoint detection logic to the sampled signals to determine when to change process parameter and to detect the polishing endpoint. Possible process control and endpoint criteria for the detector logic include local minima or maxima, changes in slope, threshold values in amplitude or slope, or combinations thereof.
The eddy current and optical monitoring systems can be used in a variety of polishing systems. Either the polishing pad, or the carrier head, or both can move to provide relative motion between the polishing surface and the substrate. The polishing pad can be a circular (or some other shape) pad secured to the platen, a tape extending between supply and take-up rollers, or a continuous belt. Terms of vertical positioning are used, but it should be understood that the polishing surface and substrate could be held in a vertical orientation or some other orientation. The polishing pad can be affixed on a platen, incrementally advanced over a platen between polishing operations, or driven continuously over the platen during polishing. The pad can be secured to the platen during polishing, or there could be a fluid bearing between the platen and polishing pad during polishing. The polishing pad can be a standard (e.g., polyurethane with or without fillers) rough pad, a soft pad, or a fixed-abrasive pad.
Although illustrated as positioned in the same hole, optical monitoring system 140 could be positioned at a different location on the platen than eddy current monitoring system 40. For example, optical monitoring system 140 and eddy current monitoring system 40 could be positioned on opposite sides of the platen, so that they alternately scan the substrate surface. Moreover, the invention is also applicable if no optical monitoring system is used and the polishing pad is entirely opaque. In these two cases, the recesses or apertures to hold the core are formed in one of the polishing layers, such as the outermost polishing layer of the two-layer polishing pad.
The eddy current monitoring system can include separate drive and sense coils, or a single combined drive and sense coil. In a single coil system, both the oscillator and the sense capacitor (and other sensor circuitry) are connected to the same coil.
A number of embodiments of the invention have been described. Nevertheless, it will be understood that various modifications may be made without departing from the spirit and scope of the invention. Accordingly, other embodiments are within the scope of the following claims.
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|U.S. Classification||451/5, 451/526|
|International Classification||B24B37/005, B24B37/20, B24B37/26, B24B37/24, B24B37/04, B24B49/10, B24D11/00, B24B49/12, B24D13/14, B24D7/12|
|Cooperative Classification||B24B37/205, B24B37/013, B24B49/105, B24B49/12, B24B49/10|
|European Classification||B24B37/013, B24B37/20F, B24B49/10B, B24B49/10, B24B49/12|
|Sep 26, 2005||AS||Assignment|
Owner name: APPLIED MATERIALS, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BIRANG, MANOOCHER;SWEDEK, BOGDAN;KIM, HYEONG-CHEOL;REEL/FRAME:017053/0911;SIGNING DATES FROM 20020411 TO 20020415
|Feb 25, 2013||FPAY||Fee payment|
Year of fee payment: 4
|Feb 24, 2017||FPAY||Fee payment|
Year of fee payment: 8