|Publication number||US7880307 B2|
|Application number||US 12/186,913|
|Publication date||Feb 1, 2011|
|Priority date||Aug 5, 2005|
|Also published as||CN101238572A, CN101238572B, EP1920460A1, EP1920460B1, US7429529, US20070032061, US20080308910, WO2007019199A1|
|Publication number||12186913, 186913, US 7880307 B2, US 7880307B2, US-B2-7880307, US7880307 B2, US7880307B2|
|Inventors||Warren M. Farnworth, Alan G. Wood|
|Original Assignee||Micron Technology, Inc.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (69), Non-Patent Citations (3), Referenced by (17), Classifications (14), Legal Events (3)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application is a divisional of application Ser. No. 11/198,338, filed Aug. 5, 2005, now U.S. Pat. No. 7,429,529, issued Sep. 30, 2008. The disclosures of the previously referenced U.S. patent application and patent are hereby incorporated by reference in their entirety.
1. Field of the Invention
The present invention relates generally to semiconductor manufacturing techniques and methods of forming electrical contacts in semiconductor substrates. More particularly, the present invention relates to methods of forming through-wafer interconnects in semiconductor substrates and structures resulting therefrom.
2. State of the Art
Semiconductor substrates often have vias extending therethrough, wherein the vias are filled with conductive materials to form interconnects (commonly known as a through-wafer interconnect, or “TWI”) used, for example, to connect circuitry on one surface of the semiconductor device to circuitry on another surface thereof, or to accommodate connection with external circuitry.
As used herein, a “via” refers to a hole or aperture having conductive material or a conductive member therein and which extends substantially through a substrate (e.g., from one surface substantially to another opposing surface). The via may be used to accommodate electrical connection of a semiconductor device, an electrical component, or circuitry located on a side of the substrate other than where bond pads have been formed. Vias are conventionally formed in a variety of substrates for a variety of uses. For example, interposers for single die packages, interconnects for multi-die packages, and contact probe cards for temporarily connecting semiconductor dice to a test apparatus often employ vias in their structures.
In a more specific example, a test apparatus may be configured for the temporary and simultaneous connection of bond pads of a semiconductor die (e.g., on a full or partial wafer test apparatus). A substrate, employed as a test interposer, may include vias passing therethrough providing a pattern of conductive interconnect structures on one side of the interposer substrate to match the bond pad patterns of the semiconductor dice, as well as a plurality of interconnect structures on an opposing side of the interposer substrate for connection with the test apparatus. Thus, the vias of the interposer substrate provide electrical interconnection between the semiconductor dice (or other device) and the test apparatus.
Where a via is to be formed through a semiconductive material such as silicon, one known method for constructing the via includes forming a first hole (sometimes referred to as a “precursor hole”) by a so-called “trepan” process, wherein a very small bit of a router or drill is rotated about a longitudinal axis while being moved radially about the axis to create the precursor hole. The precursor hole is larger in diameter than the intended diameter of the completed via. Following precursor hole formation, an insulation (or dielectric) layer is formed in the hole by either forming a thin silicon oxide layer on the hole's surface by exposure to an oxidizing atmosphere or by oxidizing the hole and then coating it with an insulative polymeric material. When a polymeric insulative material coating is desired, a suitable polymer, such as PARYLENE™ polymer, may be vapor deposited over the substrate and into each precursor hole on one side thereof while applying a negative pressure (i.e., a vacuum) to an opposing end of the hole. In some cases, because adhesion of a given polymer material to the silicon may be relatively poor, the surface of the hole may be oxidized to improve adhesion of the polymer material.
The insulative polymeric material is drawn into and fills each precursor hole and the polymer is cured. A via hole is drilled (such as by percussion drill or laser) or otherwise formed in the hardened insulative polymeric material so as to exhibit a diameter smaller than that of the precursor hole. The via hole is then filled with a conductive material, which conventionally includes a metal, metal alloy, or metal-containing material, to provide a conductive path between the opposing surfaces of the substrate. The conductive material of the via is insulated from the substrate itself by the layer or layers of insulative polymeric material.
While such a method provides adequate structures for enabling electrical interconnection from one surface of a substrate to another surface of the substrate, it is noted that it is difficult to achieve dense spacing of vias and difficult to form vias exhibiting high aspect ratios (i.e., height to width, or cross-sectional dimension ratios) using such a method.
In another prior art method of forming a via, a silicon wafer is provided with a thin layer of silicon dioxide on both major, opposing surfaces. A pattern is formed on the wafer by use of mask layers which prevent etching in non-via areas. An etchant is applied to both major surfaces to form holes or “feedthroughs” which meet in the middle of the wafer. A dielectric layer is then formed over the wafer surfaces including the feedthrough side walls. A metal layer is formed over the dielectric layer and conductive material is placed in the feedthroughs to complete the conductive vias. It is noted that, in order to isolate each via, the metal layer must be configured to cover the feedthrough surfaces only, or be subsequently removed from the outer surfaces of the via and wafer. Again, it is difficult to obtain high aspect ratio vias using such conventional methods and, therefore, provide a high level of density of such vias for a given application.
Other prior art methods for forming vias are generally illustrated in U.S. Pat. No. 5,166,097 to Tanielian, U.S. Pat. No. 5,063,177 to Geller et al., and U.S. Pat. No. 6,400,172 to Akram et al.
It is a continuing desire to improve the manufacturing techniques and processes used in semiconductor fabrication. It would be advantageous to provide a more efficient method for forming through-wafer interconnects that enables a higher density of vias, enables the fabrication of high aspect ratio TWI structures and improves the simplicity of the fabrication process while maintaining or improving the reliability of the TWI structures.
The present invention discloses methods for forming conductive vias, herein also known as through-wafer interconnects (TWIs), in substrates and the resulting semiconductor devices, electrical components and assemblies including TWI structures.
In one embodiment, a method of forming a through-wafer interconnect comprises forming an aperture in a first surface of a substrate, depositing a first dielectric layer on an inner surface of the aperture, depositing an electrically conductive layer over the first dielectric layer, depositing a second dielectric layer on the inner surface of the aperture, and exposing a portion of the electrically conductive layer through the second, opposing surface of the substrate.
In accordance with another aspect of the present invention, another method is provided for forming through-wafer interconnect structures. The method includes forming an aperture in a first surface of the substrate, depositing a first dielectric layer on an inner surface of the aperture, depositing a conductive layer over the first dielectric layer, depositing a second dielectric layer over the first surface and at least a portion of the electrically conductive layer, and removing the second dielectric layer from the first surface of the substrate such that the second dielectric layer remains over at least a portion of the electrically conductive layer. A portion of the first dielectric layer is exposed through a second surface of the substrate and a third dielectric layer is disposed over the opposing, second surface of the substrate and the exposed portion of the first dielectric layer. A portion of the third dielectric layer is removed to expose a portion of the first dielectric layer through a remaining portion of the third dielectric layer. The exposed portion of the first dielectric layer is removed thereby exposing a portion of the electrically conductive layer through the second, opposing surface of the substrate and the remaining portion of the third dielectric layer.
In accordance with another aspect of the present invention, a semiconductor device is provided. The semiconductor device comprises a substrate having a first surface and a second, opposing surface, and a through-wafer interconnect extending into the first surface of the substrate. The through-wafer interconnect includes an electrically conductive material extending from the first surface of the substrate to the second, opposing surface of the substrate, wherein a first portion of the electrically conductive material is exposed through the first surface of the substrate and a second portion of the electrically conductive material is exposed through the second, opposing surface of the substrate. A first dielectric material is disposed between the electrically conductive material and the substrate and extends from the second, opposing surface of the substrate to the first portion of the conductive material. A second dielectric material is disposed over a portion of the electrically conductive material and exhibits a surface that defines a blind aperture extending from the first surface toward the second, opposing surface.
In the drawings, which depict nonlimiting embodiments of various features of the present invention, and in which various elements are not necessarily to scale:
In the present invention, semiconductor wafers or portions thereof, substrates and components in which a conductive via or through-wafer interconnect (TWI) is to be formed are identified herein as “substrates” regardless of the purpose of the TWI or material of construction of the substrate or TWI. Thus, for example, the term “substrate” may be used in reference to semiconductor wafers, semiconductor wafer portions, other bulk semiconductor substrates, semiconductor devices, interposers, probe test cards, and the like. The invention is described as generally applied to the construction of a semiconductor substrate. Methods of making the TWIs in semiconductor devices are described, as well as the resulting structures, components and assemblies so made.
The methods of forming the TWIs and the resulting structures benefit from the use of lower temperature processes than conventional methods since some of the methods disclosed herein use polymers that are used at ambient temperatures. Further, some of the methods of forming the TWIs of the present invention do not require venting for a hot solder process and no flux clean is required because no solder fill process is required. Additionally the methods described herein enable the fabrication of high aspect ratio TWIs which may or may not be filled with an electrically conductive material.
Referring now to
The substrate 16 may comprise, without limitation, a bulk semiconductor substrate (e.g., a full or partial wafer of a semiconductor material, such as silicon, gallium arsenide, indium phosphide, polysilicon, a silicon-on-insulator (SOI) type substrate, such as silicon-on-ceramic (SOC), silicon-on-glass (SOG), silicon-on-sapphire (SOS), or a polymeric material suitable for semiconductor fabrication, etc., that may include a plurality of semiconductor dice or other semiconductor devices formed therein. If the substrate 16 is a wafer, the substrate 16 may also be a full thickness wafer as received from a vendor or a wafer that has been thinned (e.g., thereby defining the second surface 14) after fabrication of the semiconductor device 10. While not specifically illustrated, the semiconductor device 10 may further include, or be further processed to include, various conductive elements, active areas or regions, transistors, capacitors, redistribution lines, or other structures used to produce integrated circuitry. The TWIs of the present invention may be formed at the semiconductor die level or at the wafer (or other bulk substrate) level, depending on the particular needs of the manufacturing process. Thus, while
As shown in
After the aperture 20 is formed, a metallized or other conductive layer 22 may be formed on a portion of the bond pad 18. The conductive layer 22 may provide increased material adhesion between the bond pad 18 and a subsequent conductive material such as a metal liner or a material plating. For example, if the bond pad 18 were formed of a material such as aluminum, and if a subsequent conductive layer 22 of material comprised nickel, the conductive layer 22 may be disposed on the bond pad 18 to ensure the adherence of the nickel plating.
Still referring to
A conductive layer 26 is deposited over the insulation layer 24 and may be partially disposed over the first surface 12 of the semiconductor device 10 in a manner circumscribing the aperture 20. The conductive layer 26 comprises at least one layer of a conductive material such as, for example, nickel (Ni).
In one embodiment, the conductive layer 26 may include another layer such as a plating-attractive coating (PAC) or some type of seed layer that is placed over the insulation layer 24 to enhance the deposition of the conductive layer 26. For instance, titanium nitride (TiN) may be placed over the insulation layer 24 using chemical vapor deposition (CVD) techniques to act as the PAC for the subsequent deposition of the seed layer with a plating process such as, for example, electroless or electrolytic plating to form the conductive layer 26.
Other conductive materials that may be used to form the conductive layer 26 include, without limitation, titanium (Ti), polysilicon, palladium (Pd), tin (Sn), tantalum (Ta), tungsten (W), cobalt (Co), copper (Cu), silver (Ag), aluminum (Al), iridium, gold (Au), molybdenum (Mo), platinum (Pt), nickel-phosphorus (NiP), palladium-phosphorus (Pd—P), cobalt-phosphorus (Co—P), a Co—W—P alloy, other alloys of any of the foregoing metals, a conductive polymer or conductive material entrained in a polymer (i.e., conductive or conductor-filled epoxy) and mixtures of any thereof.
Other deposition processes that may be used to deposit the various layers of the conductive layer 26 include metallo-organic chemical vapor deposition (MOCVD), physical vapor deposition (PVD), plasma-enhanced chemical vapor deposition (PECVD), vacuum evaporation and sputtering. It will be appreciated by those of ordinary skill in the art that the type and thickness of material of the various layers or materials used for the conductive layer 26 and the deposition processes used to deposit the layers of the conductive layer 26 will vary depending on, for example, the electrical requirements and the type of desired material used to form the TWI and the intended use of the TWI.
Referring now to
The portion of the second layer of insulation 28, overlying the conductive layer 26 and the first surface 12 of the semiconductor device 10, is removed with a process such as, for example, spacer etching with a reactive ion (dry) etch. This results in the semiconductor device 10 structure shown in
Referring now to
Referring now to
As shown in
In a further embodiment, if an insulative epoxy is used, a resist may be used to frame the epoxy pattern, the epoxy applied, and then the resist removed, leaving second surfaces 14′ covered and insulation layer 24 exposed.
In another embodiment when PBO is used as the third insulation layer 30, the PBO may be selectively exposed, photodeveloped and baked to leave the protruding insulation layer 24 exposed.
In yet another embodiment, a stereolithography process (i.e., such as from Japan Science Technology Agency (JST)) may be used to selectively provide the third insulation layer 30 over the second surface 14′ and leave the protruding insulation layer 24 exposed. In a further embodiment, a polymer may be dispersed in a pattern over the third insulation layer 30 using POLYJET™ technology from Objet Geometries Inc., Bellerica, Mass., to leave the insulation layer 24 exposed. In another embodiment, when LSO or PDL is used as the third insulation layer 30, CMP may be used to remove the portion of the third insulation layer 30 and expose the protruding insulation layer 24. Of course, other techniques, or various combinations of such techniques, may also be used to selectively remove portions of the third insulation layer 30 as will be appreciated by those of ordinary skill in the art.
Referring now to
It is noted that, in some embodiments of the present invention, removal of the third insulation layer 30 and removal of the otherwise protruding portion of insulation layer 24 may be accomplished during the same act. However, depending on the underlying material from which the conductive layer 26 is formed, it may be desirable to remove a portion of the third insulation layer 30 and expose the interconnecting pad 31 of the conductive layer 26 in separate acts. For example, if the conductive layer 26 is formed of nickel, and a CMP process is used to remove the portion of the third insulation layer 30, such a process may not result in a uniform surface on the nickel interconnecting pad 31. Thus, a separate act, as described with respect to
Referring now to
In yet another embodiment, the aperture 20 may be filled with a conductive filler material. For example, the aperture 20 may be filled with tin (Sn), silver (Ag), copper (Cu), one of the materials that may be used for the conductive layer 26 previously described herein, any combination thereof, or other material used to fill vias or used to form a solid conductive via known in the art. Other filler materials include metal powder, a metal or alloy powder, a solder (for example, Pb/Sn or Ag/Sn), a flowable conductive photopolymer, a thermoplastic conductive resin, or resin-covered particulate metal material. Additionally, various processes may be used to fill the aperture 20 with conductive material including, for example, wave solder techniques, vacuum solder reflow techniques, or use of laser sphere techniques available from Pac Tech GmbH of Nauen, Germany to deposit solder balls in the aperture 20.
In an embodiment where the aperture 20 is filled with a conductive filler material, a portion of the insulation layer 24 may be removed using a suitable process such that the filler material is in electrical connection with the conductive layer 26. Additionally, the filler material may be configured to be in contact with, for example, the portions of the conductive layer 26 that have been defined herein as the interconnecting pads 29.
It is further noted that, when a conductive filler is used, the substrate 16 may be thinned to the point of allowing the filler to be exposed through the second surface 14′ of the substrate 16, although such is not necessary due to the presence of the conductive layer 26 providing an interconnecting pad 31 on the second surface 14′.
Table 1 lists data obtained for various through-wafer interconnects (TWIs) produced in accordance with the presently disclosed invention. In one embodiment, the insulation layer 24 of the various TWIs comprises a PDL and the conductive layer 26 includes a PAC of Ta or W, a seed layer of Cu, and a liner of Ni of the indicated cross-sectional thicknesses.
The methods described herein, with regard to
The TWIs produced in accordance with the present invention may also be used for subsequent connection to integrated circuitry, if desired. For instance, a higher-level packaging system may include semiconductor devices having TWIs produced with the method of the instant invention. For example, a PC board having a first semiconductor device and a second semiconductor device may be placed in a stacked arrangement utilizing the TWI structure of the present invention.
It is further noted that the above-described semiconductor device 10, or other components incorporating one or more TWI structures of the present invention, may be utilized in a computer environment. For example, referring to
Although the foregoing description contains many specifics, these are not to be construed as limiting the scope of the present invention, but merely providing certain example embodiments. Similarly, other embodiments of the invention may be devised which do not depart from the spirit or scope of the present invention. The scope of the invention is, therefore, indicated and limited only by the appended claims and their legal equivalents, rather than by the foregoing description. All additions, deletions, and modifications to the invention, as disclosed herein, which fall within the meaning and scope of the claims are encompassed by the present invention.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US4074342||Dec 20, 1974||Feb 14, 1978||International Business Machines Corporation||Electrical package for lsi devices and assembly process therefor|
|US4445978||Mar 9, 1983||May 1, 1984||Rca Corporation||Method for fabricating via connectors through semiconductor wafers|
|US4806111||Nov 3, 1986||Feb 21, 1989||Hitachi, Ltd.||Connector structure|
|US5063177||Oct 4, 1990||Nov 5, 1991||Comsat||Method of packaging microwave semiconductor components and integrated circuits|
|US5166097||Nov 26, 1990||Nov 24, 1992||The Boeing Company||Silicon wafers containing conductive feedthroughs|
|US5229647||Sep 21, 1992||Jul 20, 1993||Micron Technology, Inc.||High density data storage using stacked wafers|
|US5236551||Nov 6, 1992||Aug 17, 1993||Microelectronics And Computer Technology Corporation||Rework of polymeric dielectric electrical interconnect by laser photoablation|
|US5269880||Apr 3, 1992||Dec 14, 1993||Northern Telecom Limited||Tapering sidewalls of via holes|
|US5380681||Mar 21, 1994||Jan 10, 1995||United Microelectronics Corporation||Three-dimensional multichip package and methods of fabricating|
|US5420520||Jun 11, 1993||May 30, 1995||International Business Machines Corporation||Method and apparatus for testing of integrated circuit chips|
|US5426072||Jan 21, 1993||Jun 20, 1995||Hughes Aircraft Company||Process of manufacturing a three dimensional integrated circuit from stacked SOI wafers using a temporary silicon substrate|
|US5438212||Feb 24, 1994||Aug 1, 1995||Mitsubishi Denki Kabushiki Kaisha||Semiconductor device with heat dissipation structure|
|US5483741||Nov 7, 1994||Jan 16, 1996||Micron Technology, Inc.||Method for fabricating a self limiting silicon based interconnect for testing bare semiconductor dice|
|US5495667||Nov 7, 1994||Mar 5, 1996||Micron Technology, Inc.||Method for forming contact pins for semiconductor dice and interconnects|
|US5528080||Dec 13, 1994||Jun 18, 1996||Goldstein; Edward F.||Electrically conductive interconnection through a body of semiconductor material|
|US5541525||Nov 14, 1994||Jul 30, 1996||Micron Technology, Inc.||Carrier for testing an unpackaged semiconductor die|
|US5559444||May 30, 1995||Sep 24, 1996||Micron Technology, Inc.||Method and apparatus for testing unpackaged semiconductor dice|
|US5592736||Jan 5, 1995||Jan 14, 1997||Micron Technology, Inc.||Fabricating an interconnect for testing unpackaged semiconductor dice having raised bond pads|
|US5607818||May 30, 1995||Mar 4, 1997||Micron Technology, Inc.||Method for making interconnects and semiconductor structures using electrophoretic photoresist deposition|
|US5686317||Feb 13, 1995||Nov 11, 1997||Micron Technology, Inc.||Method for forming an interconnect having a penetration limited contact structure for establishing a temporary electrical connection with a semiconductor die|
|US5796264||Mar 19, 1997||Aug 18, 1998||Micron Technology, Inc.||Apparatus for manufacturing known good semiconductor dice|
|US5841196||Nov 14, 1997||Nov 24, 1998||Advanced Micro Devices, Inc.||Fluted via formation for superior metal step coverage|
|US5843844||Jan 24, 1996||Dec 1, 1998||Matsushita Electric Industrial Co., Ltd.||Probe sheet and method of manufacturing the same|
|US6013948||Apr 1, 1998||Jan 11, 2000||Micron Technology, Inc.||Stackable chip scale semiconductor package with mating contacts on opposed surfaces|
|US6018196||Feb 26, 1999||Jan 25, 2000||W. L. Gore & Associates, Inc.||Semiconductor flip chip package|
|US6022797||Nov 24, 1997||Feb 8, 2000||Hitachi, Ltd.||Method of manufacturing through holes in a semiconductor device|
|US6054377||May 19, 1997||Apr 25, 2000||Motorola, Inc.||Method for forming an inlaid via in a semiconductor device|
|US6080664||May 29, 1998||Jun 27, 2000||Vanguard International Semiconductor Corporation||Method for fabricating a high aspect ratio stacked contact hole|
|US6110825||Nov 25, 1998||Aug 29, 2000||Stmicroelectronics, S.R.L.||Process for forming front-back through contacts in micro-integrated electronic devices|
|US6114240||Feb 12, 1999||Sep 5, 2000||Micron Technology, Inc.||Method for fabricating semiconductor components using focused laser beam|
|US6214716||Sep 30, 1998||Apr 10, 2001||Micron Technology, Inc.||Semiconductor substrate-based BGA interconnection and methods of farication same|
|US6221769||Mar 5, 1999||Apr 24, 2001||International Business Machines Corporation||Method for integrated circuit power and electrical connections via through-wafer interconnects|
|US6355181||Mar 16, 1999||Mar 12, 2002||Surface Technology Systems Plc||Method and apparatus for manufacturing a micromechanical device|
|US6400172||Dec 30, 1999||Jun 4, 2002||Micron Technology, Inc.||Semiconductor components having lasered machined conductive vias|
|US6410431||Dec 19, 2000||Jun 25, 2002||International Business Machines Corporation||Through-chip conductors for low inductance chip-to-chip integration and off-chip connections|
|US6410976||Sep 12, 2000||Jun 25, 2002||Micron Technology, Inc.||Integrated circuitry having conductive passageway interconnecting circuitry on front and back surfaces of a wafer fragment|
|US6420209||Mar 29, 2000||Jul 16, 2002||Tru-Si Technologies, Inc.||Integrated circuits and methods for their fabrication|
|US6458696||Apr 11, 2001||Oct 1, 2002||Agere Systems Guardian Corp||Plated through hole interconnections|
|US6479382||Mar 8, 2001||Nov 12, 2002||National Semiconductor Corporation||Dual-sided semiconductor chip and method for forming the chip with a conductive path through the chip that connects elements on each side of the chip|
|US6541280||Mar 20, 2001||Apr 1, 2003||Motorola, Inc.||High K dielectric film|
|US6620731||Jan 4, 2002||Sep 16, 2003||Micron Technology, Inc.||Method for fabricating semiconductor components and interconnects with contacts on opposing sides|
|US6667551||Jan 22, 2001||Dec 23, 2003||Seiko Epson Corporation||Semiconductor device and manufacturing thereof, including a through-hole with a wider intermediate cavity|
|US6712983||Apr 12, 2001||Mar 30, 2004||Memsic, Inc.||Method of etching a deep trench in a substrate and method of fabricating on-chip devices and micro-machined structures using the same|
|US6716737||Jul 29, 2002||Apr 6, 2004||Hewlett-Packard Development Company, L.P.||Method of forming a through-substrate interconnect|
|US6770923||Mar 15, 2002||Aug 3, 2004||Freescale Semiconductor, Inc.||High K dielectric film|
|US6809421||Aug 20, 1999||Oct 26, 2004||Kabushiki Kaisha Toshiba||Multichip semiconductor device, chip therefor and method of formation thereof|
|US6821877||Dec 30, 2003||Nov 23, 2004||Anam Semiconductor Inc.||Method of fabricating metal interconnection of semiconductor device|
|US6841883||Mar 31, 2003||Jan 11, 2005||Micron Technology, Inc.||Multi-dice chip scale semiconductor components and wafer level methods of fabrication|
|US6844241||Aug 28, 2001||Jan 18, 2005||Tru-Si Technologies, Inc.||Fabrication of semiconductor structures having multiple conductive layers in an opening|
|US6846725||Jan 27, 2003||Jan 25, 2005||Institute Of Microelectronics||Wafer-level package for micro-electro-mechanical systems|
|US6852621||Nov 3, 2003||Feb 8, 2005||Seiko Epson Corporation||Semiconductor device and manufacturing method therefor, circuit board, and electronic equipment|
|US6979652||Apr 8, 2002||Dec 27, 2005||Applied Materials, Inc.||Etching multi-shaped openings in silicon|
|US7001825||Dec 16, 2004||Feb 21, 2006||Tru-Si Technologies, Inc.||Semiconductor structures having multiple conductive layers in an opening, and methods for fabricating same|
|US7029937||Nov 10, 2003||Apr 18, 2006||Seiko Epson Corporation||Semiconductor device and method of manufacturing the same, circuit board, and electronic instrument|
|US7109060||Dec 16, 2004||Sep 19, 2006||Seiko Epson Corporation||Manufacturing method of semiconductor device, semiconductor device, circuit substrate and electronic equipment|
|US7109068||May 26, 2005||Sep 19, 2006||Micron Technology, Inc.||Through-substrate interconnect fabrication methods|
|US7135762||May 13, 2004||Nov 14, 2006||Seiko Epson Corporation||Semiconductor device, stacked semiconductor device, methods of manufacturing them, circuit board, and electronic instrument|
|US20020115290 *||Feb 22, 2001||Aug 22, 2002||Halahan Patrick B.||Semiconductor structures having multiple conductive layers in an opening, and methods for fabricating same|
|US20040080040||Sep 26, 2003||Apr 29, 2004||Sharp Kabushiki Kaisha||Semiconductor device and chip-stack semiconductor device|
|US20040192033||Jan 14, 2004||Sep 30, 2004||Kazumi Hara||Semiconductor device, method of manufacturing the same, circuit board, and electronic instrument|
|US20040207089||Mar 15, 2004||Oct 21, 2004||Seiko Epson Corporation||Semiconductor device, method of manufacturing three-dimensional stacking type semiconductor device, circuit board, and electronic instrument|
|US20040217483||Apr 30, 2004||Nov 4, 2004||Infineon Technologies Ag||Semiconductor device and method for fabricating the semiconductor device|
|US20050006768||Feb 26, 2004||Jan 13, 2005||Mukundan Narasimhan||Dielectric barrier layer films|
|US20050121768||Dec 5, 2003||Jun 9, 2005||International Business Machines Corporation||Silicon chip carrier with conductive through-vias and method for fabricating same|
|US20050199973||Feb 7, 2005||Sep 15, 2005||Hubert Benzel||Differential pressure sensor|
|US20060043599||Sep 2, 2004||Mar 2, 2006||Salman Akram||Through-wafer interconnects for photoimager and memory wafers|
|US20060170110||Mar 17, 2006||Aug 3, 2006||Salman Akram||Through-substrate interconnect structures and assemblies|
|US20080150089||Nov 6, 2007||Jun 26, 2008||Yong-Chai Kwon||Semiconductor device having through vias and method of manufacturing the same|
|EP0926723A1||Nov 26, 1997||Jun 30, 1999||SGS-THOMSON MICROELECTRONICS S.r.l.||Process for forming front-back through contacts in micro-integrated electronic devices|
|1||Chu et al., Laser Micromachining of Through Via Interconnects in Active Die for 3-D Multichip Module, IEEE/CMPT Int'l EMT Symposium, 1995, pp. 120-126.|
|2||International Search Report from PCT/US2006/030167, dated Nov. 16, 2005, 4 pages.|
|3||Lee et al., Laser Created Silicon Vias for Stacking Dies in MCMs, EMT Symposium, 1991, Tampa, Florida, pp. 262-265.|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US8097946 *||Jan 17, 2012||Sanyo Electric Co., Ltd.||Device mounting board, semiconductor module, and mobile device|
|US8263493 *||Dec 28, 2009||Sep 11, 2012||Advanced Semiconductor Engineering, Inc.||Silicon chip having through via and method for making the same|
|US8405190 *||Oct 20, 2009||Mar 26, 2013||Robert Bosch Gmbh||Component having a silicon carbide coated via|
|US8736028||Mar 22, 2013||May 27, 2014||Micron Technology, Inc.||Semiconductor device structures and printed circuit boards comprising semiconductor devices|
|US8896127 *||Nov 8, 2012||Nov 25, 2014||Taiwan Semiconductor Manufacturing Company, Ltd.||Via structure and via etching process of forming the same|
|US8900969||Jan 27, 2012||Dec 2, 2014||Skyworks Solutions, Inc.||Methods of stress balancing in gallium arsenide wafer processing|
|US9093506||May 8, 2012||Jul 28, 2015||Skyworks Solutions, Inc.||Process for fabricating gallium arsenide devices with copper contact layer|
|US9231068||Oct 31, 2014||Jan 5, 2016||Skyworks Solutions, Inc.||Methods of stress balancing in gallium arsenide wafer processing|
|US9275957 *||Oct 23, 2013||Mar 1, 2016||Semiconductor Components Industries, Llc||EM protected semiconductor die|
|US9385166||Jan 14, 2015||Jul 5, 2016||Samsung Electronics Co., Ltd.||Image sensor and image processing device|
|US20090115056 *||Oct 31, 2008||May 7, 2009||Kouichi Saitou||Device mounting board, semiconductor module, and mobile device|
|US20100230759 *||Dec 28, 2009||Sep 16, 2010||Hsueh-An Yang||Silicon Chip Having Through Via and Method for Making the Same|
|US20110193241 *||Aug 11, 2011||Yu-Lin Yen||Chip package and method for forming the same|
|US20110198609 *||Aug 18, 2011||Taiwan Semiconductor Manufacturing Company, Ltd.||Light-Emitting Devices with Through-Substrate Via Connections|
|US20120038049 *||Oct 20, 2009||Feb 16, 2012||Achim Trautmann||Component having a via, and a method for manufacturing such a component|
|US20130062767 *||Nov 8, 2012||Mar 14, 2013||Taiwan Semiconductor Manufacturing Company, Ltd.||Via structure and via etching process of forming the same|
|US20140048917 *||Oct 23, 2013||Feb 20, 2014||Semiconductor Components Industries, Llc||Em protected semiconductor die|
|U.S. Classification||257/774, 438/667, 257/E21.085, 257/781, 257/E23.011|
|International Classification||H01L23/52, H01L29/40|
|Cooperative Classification||H01L2924/09701, H01L21/76898, H01L2924/12044, H01L2924/0002, H01L23/481|
|European Classification||H01L23/48J, H01L21/768T|
|Jul 2, 2014||FPAY||Fee payment|
Year of fee payment: 4
|May 12, 2016||AS||Assignment|
Owner name: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGEN
Free format text: SECURITY INTEREST;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038669/0001
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Owner name: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL
Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038954/0001
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