|Publication number||US8040521 B2|
|Application number||US 12/422,210|
|Publication date||Oct 18, 2011|
|Filing date||Apr 10, 2009|
|Priority date||Jul 26, 1999|
|Also published as||US6512385, US6803777, US6972577, US7323889, US7420687, US7728958, US7773230, US8405823, US8736823, US20030057972, US20040046577, US20050156609, US20070018662, US20070019209, US20080186580, US20090002717, US20100091292, US20120133922, US20130181722, US20140103935|
|Publication number||12422210, 422210, US 8040521 B2, US 8040521B2, US-B2-8040521, US8040521 B2, US8040521B2|
|Inventors||Paul L. Pfaff|
|Original Assignee||Attofemto, Inc.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (126), Non-Patent Citations (93), Referenced by (6), Classifications (12), Legal Events (5)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application is a continuation application of U.S. Ser. No. 12/172,629 filed Jul. 14, 2008, now U.S. Pat. No. 7,773,230 which is a continuation of U.S. Ser. No. 11/536,617 filed Sep. 28, 2006 (U.S. Pat. No. 7,420,687), which is a continuation of U.S. Ser. No. 11/050,034 filed Feb. 3, 2005 (U.S. Pat. No. 7,323,889), which is a continuation application of Ser. No. 10/660,189 filed Sep. 10, 2003 (U.S. Pat. No. 6,972,577), which is a continuation of Ser. No. 10/219,599 filed Aug. 14, 2002 (U.S. Pat. No. 6,803,777), which is a continuation of Ser. No. 09/626,420 filed Jul. 26, 2000 (U.S. Pat. No. 6,512,385), which claims priority to Provisional application Ser. No. 60/145,617 filed Jul. 26, 1999.
The development of advanced integrated circuit devices and architectures has been spurred by the ever increasing need for speed. For example, microwave, fiber optical digital data transmission, high-speed data acquisition, and the constant push for faster digital logic in high speed computers and signal processors has created new demands on high-speed electronic instrumentation for testing purposes.
Conventional test instruments primarily include two features, the integrated circuit probe that connects the test instrument to the circuit and the test instrument itself. The integrated circuit probe has its own intrinsic bandwidth that may impose limits on the bandwidth achievable. In addition, the probe also determines an instrument's ability to probe the integrated circuit due to its size (limiting its spatial resolution) and influence on circuit performance (loading of the circuit from its characteristic and parasitic impedances). The test instrument sets the available bandwidth given perfect integrated circuit probes or packaged circuits, and defines the type of electric test, such as measuring time or frequency response.
Connection to a test instrument begins with the external connectors, such as the 50 ohm coaxial Kelvin cable connectors (or APC-2.4). The integrated circuit probes provide the transitions from the coaxial cable to some type of contact point with a size comparable to an integrated circuit bond pad. Low-frequency signals are often connected with needle probes. At frequencies greater than several hundred megahertz these probes having increasing parasitic impedances, principally due to shunt capacitance from fringing fields and series inductance from long, thin needles. The parasitic impedances and the relatively large probe size compared to integrated circuit interconnects limit their effective use to low-frequency external input or output circuit responses at the bond pads.
Therefore, electrical probes suffer from a measurement dilemma. Good high-frequency probes use transmission lines to control the line impedance from the coaxial transition to the integrated circuit bond pad to reduce parasitic impedances. The low characteristic impedance of such lines limits their use to input/output connections. High-impedance probes suitable for probing intermediate circuit nodes have significant parasitic impedances at microwave frequencies, severely perturbing the circuit operation and affecting the measurement accuracy. In both cases, the probe size is large compared to integrated circuit interconnect size; limiting their use to test points the size of bond pads. Likewise sampling oscilloscopes, spectrum analyzers, and network analyzers rely on connectors and integrated circuit probes, limiting their ability to probe an integrated circuit to its external response. For network analysis, a further issue is de-embedding the device parameters from the connector and circuit fixture response, a task that grows progressively more difficult at increasing frequencies.
With the objective of either increased bandwidth or internal integrated circuit testing with high spatial resolution (or both) different techniques have been introduced. Scanning electron microscopes or E-beam probing uses an electron beam to stimulate secondary electron emission from surface metallization. The detected signal is small for integrated circuit voltage levels. The system's time resolution is set by gating the E-beam from the thermionic cathodes of standard SEM's. For decreasing the electron beam duration required for increased time resolution, the average beam current decreases, degrading measurement sensitivity and limiting practical systems to a time resolution of several hundred picoseconds. Also, SEM testing is complex and relatively expensive.
Valdmanis et al., in a paper entitled “Picosecond Electronics and Optoelectronics”, New York: Springer-Verlag, 1987, shows an electro-optic sampling technique which uses an electrooptic light modulator to intensity modulate a probe beam in proportion to a circuit voltage. Referring to
Weingarten et al. in a paper entitled, “Picosecond Optical Sampling of GaAs Integrated Circuits”, IEEE Journal of Quantum Electronics, Vol. 24, No. 2, February 1988, disclosed an electro-optic sampling technique that measures voltages arising from within the substrate. Referring to
A microwave generator 48 drives the substrate 42 and is also connected to an RF synthesizer 50, which in turn is connected to a timing stabilizer 52. The pulse output of the laser 32 is likewise connected to the timing stabilizer 52. The output of the stabilizer 52 connects back to the laser 32 so that the frequency of the microwave generator 46 locks onto a frequency that is a multiple of the laser repetition rate plus an offset. As a consequence, one may analyze the electric fields produced within the integrated circuit as a result of being voltage drive, thus providing circuit analysis of the integrated circuit operation. In essence, the voltage of the substrate imposed by the microwave generator 48 will change the polarization in the return signal that results in a detectable change at the diode detector 44.
Since the system taught by Weingarten et al. does not include a probe proximate the circuit under test the limitations imposed by capacitive loading of the circuit to be tested is avoided. However, the system taught by Weingarten et al. is limited to “point probing,” by the lens 41 converging the input beam into a test point on the order of one wavelength. Unfortunately, to test an entire circuit an excessive number of tests must be performed. In addition, it is not possible to test multiple points simultaneously without the use of multiple systems, which may be useful in testing different portions of the circuit that are dependant upon one another. The resulting data from the system is presented to the user as a single amplitude measurement, i.e., the intensity of the signal produced at the photo-diode 44 depends simply upon the degree to which the polarization of the reflected light entering the beam splitter 36 has been rotated, so that not only are the actual phase and polarization data that derive the reflection process lost, but the precision and accuracy of the measurement becomes subject to the linearity and other properties of the photo-diode 44 and the display 46.
Various other techniques by which semiconductors may be characterized, using electromagnetic radiation of different wavelengths under different conditions is cataloged by Palik et al. in “Nondestructive Evaluation of Semiconductor Materials and Device,” Plenum Press, New York, 1979, chapter 7, pp. 328-390. Specifically, treatment is given of (1) infrared reflection of GaAs to obtain the optical parameters n and k and then the carrier density N and mobility u; (2) infrared transmission in GaAs to determine k from which is determined the wavelength dependence of free carrier absorption; (3) infrared reflection laser (spot size) scanning of and transmission through GaAs to determine free carrier density in homogeneity, including local mode vibrations; (4) far infrared impurity spectra; (5) infrared reflection and transmission from thin films on a GaAs substrate; microwave magneto plasma reflection and transmission; (6) sub millimeter-wave cyclotron resonance in GaAs to determine magneto transmission; (7) ruby laser radiation to form a waveguide in a GaAs film on a GaAs substrate, the propagation features of which are then measured using infrared radiation; (8) infrared reflectance from multilayers of GaAs on a GaAs substrate; (9) reflectance measurements of graded free carrier plasmas in both PbSnTe films on PbSnTe substrates and InAs on GaAs substrates; (10) interferometric measurements of ion implanted layers; (11) infrared restrahlen spectra, also to determine lattice damage effects; (13) ellipsometric measurements of ion-implanted GaP; (14) determination of optical constants by internal reflection spectroscopy; (15) laser raster scanning of semiconductor devices to measure photoconductivity, to track the flow of logic in a MOS shift register (because of current saturation, the effect of the laser light differs in cells in the 0 or 1 logic state), and with a more intense laser power level to change those logic states (i.e., to write to the circuit); (16) laser raster scanning of semiconductor devices to determine variations in resistivity and carrier lifetimes; (17) thermal imaging of circuits to find hot spots; (18) Raman backscattering to determine free carrier density; (19) carrier injection to study the band edge; (20) birefringence measurements in monolayers of GaAs and AlAs on GaAs to characterize the resultant strain; (21) photoluminescence and cathodoluminescence measurements of implanted layers and acceptor and donor densities. With the exception of (7) above which relates to waveguide transmission, and also of (15) and (17), these techniques relate to the characterization of static systems. While (15) relates to a spot scanning technique of the operational integrated circuit and (17) relates to hot-characterization of the device temperature.
What is desired, therefore, is a non-invasive technique to measure voltage levels within a device.
The present inventor came to the realization that the single point non-invasive probing technique of semiconductor materials could be enhanced if both the phase and amplitude, or polarization and amplitude properties of light transmitted thorough or reflected off of a semiconductor material could be recorded or otherwise preserved in some manner. Semiconductor materials generally exhibit electro-optic (generally ⅗ semiconductor materials) or photo-refractive effects (generally silicon based expitaxal circuits), which can be made to become birefringent by the application of an electric field, either as such or as embodied in electromagnetic radiation. Also, surface reflection and/or transmission probing of semiconductor materials, such as for example, GaAs, germanium or silicon, can be modulated by for example, cathode reflections modulation (E-beam), an electric field, voltage, heat, pressure, x-ray radiation, magnetic fields, and photo injection. The present inventor then came to the realization that if an object in a state in which it is not birefringent, but such birefringence can then be brought about in some manner such as electrical or electromagnetic techniques, the nature of the birefringence so introduced can be studied to determine characteristics of the material. Upon further consideration the present inventor then came to the realization that holographic techniques can record both the phase and amplitude, or the polarization and amplitude properties of light, such as that passing through or reflected off a semiconductor material, which can then be reconstructed. Holographic techniques provide the ability to examine materials using a wave front that is greater than, and typically substantially greater than, the physical focal point of the wavelength of the light. Further, the present inventor came to the realization that using field based interference patterns detail regarding the structure and operating characteristics of semiconductor devices considerably smaller than the physical focal point of the applied light or applied signal may be determined. Likewise, obtaining such holographic information will enable the development of other devices, such as for example, lenses, filters, and optical devices, which are based on, at least in part, the operating characteristics of semiconductors.
A hologram is created by a coherent light beam being transmitted through or reflected from an object onto a recording medium, which at the same time the original beam is also directed onto that recording medium as a reference beam. Various characteristics of the resultant transmitted or reflected beam, herein called the “object wave,” are recorded in the resultant interference pattern between the object wave and the reference beam, i.e., as a hologram. These characteristics can later be observed by illumination of the hologram by that reference beam alone. That is to say, inasmuch as the phases or polarizations of the reference beam and the object wave have been recorded in that interference pattern along with their intensities, the wave produced by illuminating the hologram with the reference beam is essentially an exact replica of the object wave. Those characteristics are in part a consequence of the physical structure (i.e., “appearance”) of the illuminated object, hence the wave so observed appears as a three dimensional image of that object. Optical Holography, Second Edition, by P. Hariharan, 1996 describes some general optical holographic techniques; and is incorporated by reference herein in its totality.
The present inventor also realized that particular semiconductor materials are generally transparent to light of particular wavelengths so that the light may freely pass through and reflect back though all or a portion of the semiconductor, or otherwise pass through the semiconductor, substantially “unaffected” when the semiconductor is not stressed, such as by no applied voltage, not subject to a electromagnetic (e.g. radio wave) field or signal, magnetic field, x-ray radiation, gravity wave, sub-atomic particle radiation, pressure, temperature, photo-generated carriers, subject to electron- or ion-beam devices; bioelectric, or chemical. Likewise, when the semiconductor material, such as one including an integrated circuit, is stressed by applying a voltage therein by energizing a circuit fabricated therein, or by applying a different energy level, the same light will reflect or otherwise pass through the semiconductor material, while being affected by the changes imposed by the applied voltage, thereby resulting in a different pattern. The stressed and unstressed states may be recorded as different holographic images. In addition, it is within the scope of the present invention to make a comparison between two different stressed states. The two holographic images may then be compared to one another to determine the actual operating characteristics within the semiconductor material. In addition, by its nature, holographic imaging techniques record a significant spatial region much larger than a single wavelength simultaneously which is important for characterizing regions of the semiconductor material. For example, the operational characteristics of two different regions may be interrelated which is unobtainable using techniques limited to a wavelength in “spot size.” The present inventor's realization that the application of holographic techniques for the testing of semiconductor devices, was only after at least the culmination of the aforementioned realizations.
Of particular interest is the “real-time” characterization of operating characteristics of integrated circuits where such birefringence is introduced by the electro-optic effect, i.e., the imposition of a voltage onto the object (as in the ordinary operation of the integrated circuit) causes birefringence therein. Birefringence in ⅗ materials generally imposes a rotation of the polarization which is primarily a polarization and/or amplitude shift. Voltage induced changes in silicon materials generally imposes a refractive index shift which is primarily a phase and/or amplitude shift. Both of these occurrences are detectable, such as for example, with a polarized beam, a polarization recording hologram, an amplitude hologram, and/or a phase hologram. In other words, upon application of an electric field the material, such as GaAs or silicon, introduces an anisotropy and the ordinary complex refractive index n* of the material is decomposed into no* and ne* components. Another technique applicable to appropriate substrates whether or not any operational voltages are also applied thereto, lies in utilization of the photo-refraction effect, wherein electromagnetic radiation of a required intensity is illuminated onto the substrate, and a birefringence or change in birefringence is then brought about. Inasmuch as semiconductor and like materials are generally characterized by a wavelength threshold below which photo-refraction will occur, but above which no photo-refraction takes place, this latter mode of operation employs electromagnetic radiation of differing wavelengths, first to bring about a desired photo-refractive effect, and then secondly to analyze the effect so brought about.
Plane wave 218 is then incident on a beam splitter 220 that provides two reference beams: first reference beam 222 a that is incident on test object (TO) 224, a second reference beam 222 b that will ultimately impinge on recording device (RD) 226. Beam splitter 220 may, for example, be a pellicle beam splitter. For RD 226, either infrared photographic film, an infrared sensitive electronic device, such as an infrared CCD, or an infrared thermo-plastic recorder, or any other similar device may be used. As a result of first reference beam 222 a being reflected back from the surface of TO 224, a object beam 228 will pass back onto beam splitter 220 so as to be reflected towards and ultimately impinge upon RD 226. Since both a reference beam (second reference beam 222 b) and an object beam (object beam 228) that derive from a common, preferably coherent source (laser 202) are simultaneously incident on the recording device 226, the conditions for forming a polarization preserving hologram are present.
To permit such a procedure, the in line apparatus of
As to the case in which the TO 224 is a functional but not energized IC, a first hologram, can be recorded therefrom using the apparatus as shown in
Alternatively, a second hologram can be recorded using the apparatus in the in line configuration shown in
One of the sources of error as just noted is removed when recording a first hologram onto an infrared thermoplastic plate. For example, if a holographic recorder is used in conjunction with an installed thermoplastic plate, after exposure the thermoplastic plate is developed in situ, i.e., the plate is not removed from the optical path for such purposes. The error brought about by removing the recording medium for development and then replacing that medium back into the experimental apparatus is thus eliminated. Also; holographic image reconstruction from a voltage pattern or a microwave signal in the thermoplastic device recorded at a wavelength of 1:15 μm may be obtained using a shorter wavelength such as 0.633 μm by increasing the image by a factor of two. Also, differences in the spectral sensitivity and optical resolution (lines per unit of length) of the thermoplastic plate and CCD camera 234 remain as a significant source of experimental error.
A CCD camera 234 may be used as the sole recording device, whereby the first and indeed a multiplicity of subsequent holograms can be recorded. If the recording rate of the CCD camera 234 is slower than the rates of operation of an IC itself, timed optical pulses may be used for sampling the device under test. An additional advantage in using only the CCD camera for recording holograms is that the “reference” hologram, i.e., the hologram recorded from the TO 224 (either as an IC or as a semiconductor wafer) at a time that no voltages or birefringence-inducing laser light was applied thereto, will be recorded digitally as well, and comparisons between the reference and subsequent holograms can be made by means other than within the experimental apparatus itself, i.e., by ordinary Digital Signal Processing (DSP).
For the purpose of processing such a data stream,
In order to illustrate the uses of the aforesaid components and those to be describe hereinafter, it is appropriate to outline in greater detail the characteristics of an exemplary representative TO 224, which for purposes of illustration to is taken be a wafer of GaAs that has been industrially prepared as a substrate for subsequent IC manufacture. GaAs is a direct-gap (but nearly indirect-gap) semiconductor having the zinc blended structure with a lattice constant of 0:5653 nm, i.e., it has the face-centered cubic structure but without inversion symmetry, and thus belongs to the point group Td. The static dielectric constant of Gas is 12, and the exciton binding energy EB is 4.2 meV.
Td symmetry defines an isotropic material that at any selected wavelength exhibits but a single refractive index n. In order to observe birefringent effects in GaAs, therefore, it is necessary to induce the same, either by the electro-optic effect or by the photorefractive effect. The manner in which such effects can be measured most productively can be related to the manner in the birefringence so produced relates to the GgAs crystal structure. That is, changes in the optical properties of the GaAs crystal that render it birefringent may be treated in terms of that crystal no longer being cubic, i.e., any crystal that exhibits birefringence should have one or more unique optic axes and hence, at least with respect to optical refraction, no longer exhibits cubic symmetry.
For purposes of future reference, the standard definitions of the planes in a cubic crystal are shown in
The symmetry aspects of applying external forces to crystals have been discussed by J. F. Nye in Physical Properties of Crystals (Clarendon Press, Oxford, 1972), pp. 235-259, and especially pp. 245-246. A principal characteristic of such force applications is that a force that has one or more symmetry elements in common with those of the crystal to which the force is applied will be effective, while any symmetry elements of that force that is do not likewise characterize the crystal will have no effect thereon. At first glance, this would not seem to be particularly important as to GaAs which, being a cubic crystal has the maximum number of symmetry elements. However, inasmuch as the result of applying a force having a particular symmetry element is exhibited by way of altered features of the crystal that share that particular symmetry element, the precise nature of the effect brought about will depend upon which symmetry elements characterized the applied force. For example, while any voltage of sufficient magnitude will cause birefringence in a GaAs crystal, but precisely what kind of birefringence that will be and how it would appear if examined holographically will depend upon the orientation of that electric field relative to the crystal axes.
An electric field that is normal to the exposed (001) face of a GaAs crystal would have the effect of defining the corresponding z axis as the optic axis. An electric field that is tangential to that (001) face will define an optic axis lying somewhere in that face, i.e., either coincident with one or the other of the x and y axes or lying at some angle thereto. The indicatrix for the resultant uniaxial “structure,” which will then determine the directions of propagation of the transmitted rays that would result from imposing an incident beam of light thereon, will have a corresponding orientation relative to the x and y axes. Because of the induced birefringence, there will be two rays, linearly polarized at right angles to each other, that transmit through the uniaxial crystal so formed, and by conservation principles the corresponding rays that reflect therefrom will likewise be so polarized. As will be seen below, this combination of events lends itself to direct determination by the present invention, since the apparatus that embodies the invention preserves not only the amplitude and phase of the reflected radiation as in a normal hologram, but also the polarization.
With regard to another aspect of holographic apparatus 300 (and of all variations thereof described herein), the ability of holographic apparatus 300 and variations thereof to accomplish measurements of an entire wafer (or portion thereof) or the like at once provides yet another advantage. That is, region 274 shown in
Different embodiments of the invention as described also differ in the nature of the elements used to transmit appropriately structured laser beams onto the TO 224, and for that purpose the second laser module 280 is shown in
Including the additional laser module 280 or 350 provides additional benefits. If the laser module provides a small illumination point at a photo-generating wavelength, such as for example ultraviolet, then circuits may be triggered. By using a broad beam substantial portions of the test object may be illuminated which helps identify test object characteristics, such as for example fault locations. Also, if the laser module provides a non-invasive beam it may be used to characterize individual portions of the test object.
That is, in apparatus 300 of
The fabrication of integrated circuits typically uses structures, such as metal lines and ground planes, that are not generally transmissive, unless sufficiently thin. Using a transmissive holographic technique requires the light to pass through the test device. On extremely high density devices the feature density may be too high to permit sufficient transmission. The presence of a ground plane may also restrict transmission. To accommodate structures that are not sufficiently transmissive a reflection technique may be employed. Transmissive and reflective techniques typically require different holographic systems. Referring to
Unfortunately, the in-line holographic techniques result in the virtual image and the coherent source being viewed in-line and are superimposed upon one another making analysis difficult. The present inventor realized that an off-axis technique results in two images that are separated, as in the reference beam. This results in a clearer unobscured image that may be readily used, such as for interferometry. One example of an off axis technique is shown in
Another example of an off axis transmissive beam technique is shown in
The present inventor came to the further realization that interferometric testing, as described by Weingarten et al. in a paper entitled, “Picosecond Optical Sampling of GaAs Integrated Circuits”, IEEE Journal of Quantum Electronics, Vol. 24, No. 2, February 1988, is limited to the rules of conventional microscopy. Such limitations include the inability to resolve particles with a limited depth of field. In addition, the system described by Weingarten et al. requires accurate alignment of the polarization wave plates in order to interfere with the light, which is difficult at best to achieve. Referring to
The present inventor came to the realization that if the CCD camera resolution and sensitivity to photo-generated voltages could be enhanced together with increasing the ability of the CCD camera to resolve individual pixels, then the system would not be directly limited to the physical attributes of the CCD camera. To achieve such enhancements the present inventor determined that using both holographic microscopy and/or holographic interferometry of the voltage displacement contours or interferometric fringes of the CCD camera may be used to substantially enhance the resolution. The optical image on the CCD produces a varying electric field on the pixels and associated structures which in result modulates the refractive index of the semiconductor crystals through the electro-optic effect or rotates the polarization of the incident beam. If the incident light distribution light changes the crystal in a manner that is different than was obtained by the CCD at rest, then a new charge pattern and thus a modified image may be obtained. A second sensor that is sensitive to a different wavelength of light than the first sensor (CCD) is used to sense the voltage patterns imposed on the first sensor. The second sensor may then observe the fringes in the voltage patterns of the first sensor representative of the variations of voltage as a result of stressing the test device. Inspection of the fringe pattern gives considerable amount of information about the stressed test device. Referring to
The inventor then realized, holographic microscopy when combined with conventional microscopy offers much greater usefulness in recording both phase and amplitude than is obtainable with conventional optical lens elements and devices. Likewise, optical holography offers the means to eliminate cumbersome optics, beam polarizers, and filters and permit in situ placement of more sensitive optics within the ergometric dimensions of conventional semiconductor packaging.
Holographic measurements of dynamic voltage patterns in semiconductors and freecarrier devices distributed throughout an appreciable volume and area are not possible with a conventional optical microscopic system. This is because a conventional microscope which can resolve particles of diameter d has a limited depth of field as shown in the following equation:
Holography permits storing a high resolution, three-dimensional image of the whole field at any instant. The stationary image reconstructed by the hologram can be examined subsequently in detail, throughout its volume by a conventional IR microscope.
In-line holography can be used for such examinations whenever a sufficient amount (>80%) is directly transmitted to serve as a reference beam. This permits very simple optical system as shown in
where the diffracted field due to the voltage induced refractive index or polarization shifts is its Fraunhofer diffraction pattern.
To give a satisfactory reconstructed image of a semiconductor device under test, the hologram should record the central maximum and at least side lobe of its diffraction pattern. This would correspond to IR waves traveling at a maximum angle
to the directly transmitted wave, and hence, to a maximum fringe frequency of 4/d, which is independent of the values of λ and z. Accordingly, for a device under test with 10 μm lithography, the recording material should have a modulation transfer function which extends beyond 400 mm−1.
Recording devices and films with lower resolution, which are faster and easily employed, can be used effectively if a hologram is recorded of a magnified image of the device under test. For this, the imaged area of the device under test is imaged near the holographic plane, as shown in
The inventor then realized from this material that the depth of the field is also limited by the dimensions of the recording material. Examination of the previous expression for calculating the maximum angle, it follows that x, the half-width of the hologram, must be greater than 4zλ/d. Hence, the maximum depth of field over which the required resolution can be maintained is given by the relation
Δz max =xd/4λ (4)
Determining film or recording medium-resolution requirements for off-axis multiple beam holographic recording setups.
Holographic interferometry of phase objects provides a very simple approach to in-line holography when a sufficient amount of light is directly transmitted through the device under test serves as a reference beam. Even in applications such as flow visualization and heat transfer studies, where conventional interferometry has been used for many years, holographic interferometry has practical advantages.
In this first instance, mirrors and windows of relatively low optical quality be used. [e.g., the 1 cm holographic plate is much larger than the 10 μm object. Since the phase errors due to these contribute equally to both interfering wavefronts, they cancel out, and only the effects changes in the optical path are seen. However, a significant advantage is the possibility of incorporating a diffusing screen (a ground glass plate) in the interferometer. This gives an interference pattern that is localized near the phase object, and can be viewed and photographed over a range of angles. This makes it possible to study three-dimensional refractive index distributions.
If the refractive index gradients in the test section are assumed to be small, so that rays propagate through it along straight lines parallel to the z axis, φ(x,y) the phase difference at any point in the interference pattern is given by the relation:
where no is the refractive index of the medium in the test section in its initial unpreturbed state and n(x, y, z) is the final refractive index distribution.
The simplest case is that of a two-dimensional phase object with no variation of refractive index in the z direction. In this case the refractive index distribution can be calculated directly from (5). This is a valid approximation to many practical situations.
Another case which lends to analytic treatment is that of a refractive index distribution f(r) which is radically symmetric about an axis normal to the line of sight (for convenience say, the y axis).
For a ray traveling in the z direction at a distance x from the center, we then have:
so that (5) becomes:
This is the Abel transform of f(r), and it can be inverted to find f(r),
The evaluation of an asymmetric refractive index distribution f(r,θ) is much more difficult and is possible only by recording a large number of interferograms from different directions. The problem becomes even more complicated when the effects of ray curvature due to refraction cannot be neglected.
Holographic interferometry has been found particularly useful in high-energy plasma diagnostics. Since, unlike a neutral gas, plasma is highly dispersive, measurements of the refractive index distribution at [different] two wavelengths make it possible to determine the electron density directly. This has shown that “the interference fringes are contours of constant dispersion and, hence of constant electron density.” Both these approaches while demonstrating plasma diagnostics, are limited in their utility because of the inability of the two holograms to provide real-time interferometry, as needed.
When using Real-Time holographic interferometry techniques, the hologram is replaced, after processing, in exactly the same position in which it was recorded. When it is illuminated with the original reference beam, the virtual image coincides with the object. If, however, the shape of the object changes very slightly, two sets of light waves reach the observer, one being the reconstructed wave (corresponding to the object before the change) and the other directly transmitted wave form its present state (e.g., changes in the index of refraction will alter the reflected optical path).
The two wave amplitudes will add at the points where the difference in optical paths is zero or a whole number of wavelengths, and cancel at some other points in between. As a result, an observer, photo detector or device viewing the reconstructed image sees it covered with interference fringes, which is a contour map of the changes in shape of the object. These changes can be observed in real-time.
Considering an off-axis holographic recording system, the intensity at the photographic plate when the hologram is recorded is:
where r(x,y) is the complex amplitude due to the reference beam and
is the complex amplitude due to the object in its normal state.
Assuming that the amplitude transmittance of the photographic plate after processing is linearly related to the exposure, the amplitude transmittance of the hologram is:
τ(x,y)=τo +β·T·I(x,y) (10)
An alternative to
The arrangements shown in FIGS. 14A/14B/14C can also be employed to enhance the sensitivity of other voltage measurement and electronic devices shown in
By analyzing the position of the holographic fringes and the shifts reveals information as to the nature of the voltages in the CCD or within the Josephson devices. The result is that the holographic fringes provide a high sensitivity to changes in voltage of the test device. Also the fringes increase the density of the sampling points of the CCD not directly provided by the pixels themselves. Analysis of the data from the CCD may provide information regarding the structure of the test device substantially smaller than the wavelength of the light used.
Factors limiting the resolution holographic lithography and photography are not so much limited by the quality optics as in conventual photography and lithographic techniques but, upon the coherent nature of the hologram's interfering coherent beams or wavefronts upon the recording medium.
For infrared testing it may be desirable to include an infrared sensitive photo-conductor as the holographic recording medium. Generally such an infrared sensitive photo conductor generates a photo-current when exposed to infrared light. Such a photo-conductor may be, for example, silicon (for creating photogenerated voltages up to short infrared wavelengths of 1.1 μm), Lead Selenide, Indium Arsenide, GaAs, PbTe, GaAs doped with zinc, and Lead Sulfide. Accordingly, the photocurrent generated in the infrared sensitive photo-conductor is generally less than one electron volt. The photocurrent then performs the step of reducing the surface potential, as in standard visible light photo-thermoplastics for in-line and off-axis holographic techniques.
The unique capabilities of holographic interferometry are due to the fact that holography permits storing a wave front for reconstruction at a later time and are suitable for electrical measurement. Wavefronts which were originally separated in time or space or even wavefronts of different wavelengths can be compared by holographic interferometry. It is possible to observe holographic interferometry in real time. After processing the first hologram, leaving the holographic material in place or replacing it, when it is illuminated with the original reference beam, it reconstructs the object wave, and the virtual image coincides with the object. If, however, the characteristics of the object changes very slightly, two sets of light waves reach the observer, one being the reconstructed wave (corresponding to the object before the change) and the other the directly transmitted wave from the object in its present state. The two wave amplitudes add the points where the difference in optical paths is zero, or a whole number of wavelengths, and cancel at some other points in between. As a result, an observer viewing the reconstructed image sees it covered with a pattern of interference fringes, which is a contour map of the changes in shape of the object. These changes can be observed in real time. In addition, by viewing at multiple angles, a three dimensional model may be developed of the object. One general limitation of real-time holographic interferometry is that while the light diffracted by the hologram is linearly polarized, the light scattered by a diffusely reflecting object is largely depolarized, resulting in a significant drop in the visibility of the fringes. To avoid this, it is helpful to use a polarizer when viewing or photographing the fringes.
In double exposure holographic interferometry which may be used to test electronic devices, interference takes place between the wavefronts reconstructed by two holograms of the object recorded on the same photographic plate. Typically, the first exposure is made with the object in its initial, unstressed condition, and the second is made with a stress applied to the object. When the processed hologram is illuminated with the original reference beam, it reconstructs two images, one corresponding to the object in its unstressed state, and the other corresponding to the stressed object. The resulting interference pattern reveals the changes in shape of the object between the two exposures. Double exposure holographic interferometry has an advantage over real-time holographic interferometry, because the two interfering waves are always reconstructed in exact register. Distortions of the emulsion affect both images equally, and no special care need be taken in illuminating the hologram when viewing the image. In addition, since the two diffracted wavefronts are similarly polarized and have almost the same amplitude, the visibility of the fringes is good. However, double-exposure holographic interferometry has certain limitations. The first of which is that where the object (or object's refractive index) has not moved between the exposures, the reconstructed waves, both of which have experienced the same phase shift, add to give a bright image of the object. As a result it is difficult to observe small displacements or changes in the material's index of refractive or polarization state. A dark field, and much higher sensitivity, can be obtained by holographic subtraction, which merely involves shifting the phase of the reference beam by 180 degrees between the two exposures. An alternative method, which also helps to resolve ambiguities in the sense of changes, is to shift the phase of the reference beam by 90 degrees between the two exposures, or, better, to introduce a very small tilt in the wave-front illuminating the object between the two exposures. In the latter technique, equally spaced reference fringes are obtained, whose change is modulated by the phase shifts being studied. Another limitation of the double-exposure technique is that information on the intermediate states of the object is lost. This problem can be overcome to some extent by multiplexing techniques using spatial division of the hologram. In the latter procedure, a series of masks are used in which the apertures overlap in a systematic fashion, and a sequence of holograms is recorded at different stages of loading. The images can then be reconstructed, two at a time, so that interference patterns between any two images can be studied. An alternative is to use thermoplastic recording material, by which real-time fringes can be observed and the fringe pattern subsequently frozen to give a permanent holographic record.
Control of the fringes, to compensate for rigid body motion and eliminate ambiguities in interpretation, is not normally possible with a doubly exposed hologram. However, it is possible with two holograms recorded with different angularly separated reference waves. These holograms may be either on the same plate or different plates.
The testing of electronic devices in semiconductor materials may likewise be tested using stroboscopic holographic interferometry where a hologram of a stressed test object is recorded using a sequence of light pulses that are triggered at different times during the stressing of the test object.
A surface relief hologram can be recorded in a thin layer of thermoplastic which is combined with a photo-conductor and charged to a high voltage. On exposure, a spatially varying electrostatic field is created. The thermoplastic is then heated so that it becomes soft enough to be deformed by the field and, finally, cooled to fix the pattern of deformation. Such materially have a reasonably high sensitivity over the whole visible spectrum and yield a thin phase hologram with fairly high diffraction efficiency. In addition, they have the advantage that they do not require wet processing. If a glass substrate is used, the hologram can be erased and the material re-used a number of times. One structure of a photo-thermoplastic is a multi-layer structure consisting of a substrate (e.g., glass, Kodar, or Mylar) coated with a thin, transparent, conducting layer, an infrared sensitive photo-conductor, and a thermoplastic. Referring to
An infrared semi-transparent material, such as a thin gold layer or a transparent electrode, or a suitable organic photoconductor, may be deposited on the exterior surface of the thermoplastic. Besides serving as an electrode to the photo-conductor it also acts in a manner to filter the image. The stressed or unstressed states of the infrared image from the test device is exposed and fixed in the thermoplastic material. Thereafter, if an infrared sensitive camera views the thermoplastic material when exposed to the opposite of the stressed or unstressed state of the infrared image from the test device. The result is a set of fringes on the thermoplastic material corresponding to the maximum and minimum intensity distribution. Computer aided evaluation of the resulting thermoplastic holographs or inferograms may be used, as desired. If an infrared semi-transparent material is used then the infrared camera may be used to view the thermoplastic material from the front side through the transparent photo-conductor, as the infrared semi-transparent material, such as thin semiconductor material or glass, will make it simpler to detect the fringes.
One approach to making thin-phase thermoplastic holographic recordings is to sensitize the photoconductor to 1.15-μm infrared light. The photoconductor is formed by adding a sensitizer to polyvinylcabazole (PVK); the dye 2,4,7,-trinitro-9-fluorenone is widely used as a sensitizer with visible light. Since the photoconductor formed with this dye in complex with PVK is not sensitive to radiate at 1.15 μm, other dyes must be used. The PVK can be sensitized to near infrared by either of two sensitizes, 2.4,5,7-tetranitrofluorenone or (2,4,7-trinitrofluorenylidene)-malononitrile. A photoconductor solution is prepared by dissolving PVK in tetrahydrofuran and adding sensitizer at a weight ratio of one part sensitizer to four to ten parts PVK. The holographc device prepared by dip coating the glass substrate and its transparent electrode with the photoconductor. A thermoplastic layer is added by a second dip coating with an ester resin dissolved in naptha. Solution concentrations and dip speeds are adjusted to photoconductor and thermoplastic layer thicknesses of approximately 2 and 0.8 μm, respectively. The sensitizer forms a complex with the PVK that appears to the eye as dark brown or gray.
While it is potentially conceivable to use infrared photographic films as a recording medium they are not especially suitable for several reasons. First, infrared photographic films sense and record the infrared light as visible light when developed, and not as non-viewable to the human eye infrared light. Typical infrared films record the infrared light to a maximum of 1,314 nm, where the developed image (Bragg cells) on the film is in visible light (550-800 nm) and hence the visible image cannot refract or diffract infrared light. Second, typical infrared photographic films have limited sensitivity and tend to fog due to chemical sensitivity. The fogging is principally because of background thermal radiation. Third, after its spectral sensitization, a photographic plate is subject to thermal background radiation during its preparation and storage, and the various stages in the photographic process. This gives rise to a fog and reduces the “lifetime” of a plate, and is the main obstacle to the achievement of reasonable photographic sensitivity. What would be desirable is an infrared “film” type recorder that senses infrared light and records the infrared light as an infrared image.
In addition to recording ultraviolet holograms of voltages and plasmas in free-metals with conventional photographic and holographic films, the present inventor has identified several infrared holographic recording mediums for recording plasma and voltages in semiconductors using single and dual wavelength for Gabor-type, in-line holography, off-axis holography, and holographic interferograms. A Bismuth recording film has demonstrated good sensitivity for recording infrared holography for wavelengths from 1.06 μm to 10.6 μm. A film of Magnesium-Bismuth (MnBi) has demonstrated good recording characteristics at 1.06 μm. Plexiglas has been used to record infrared holograms at 10.6 μm.
The present inventor came to the realization that a controlling factor should be included with the recording medium to permit the recording of infrared light only while the medium is “turned on,” so that the recording material is sensitive only when a useful image is projected on it. In addition, at the end of the exposure, the factor should be “switched off” so that the material remains insensitive throughout the subsequent storage of the exposed material. Thus the basic principle of controllable sensitivity is the sensitization of a photographic material only during its exposure. Also, if desirable, the controlled sensitivity may be switched on and off only in a certain spectral region (controlled spectral sensitization). The present inventor further came to the realization that semiconductor materials exhibiting a photoelectric sensitivity in the infrared range may be used as a recording device. It needs to be understood that in electro-photograph recording techniques charge dispersion and diffusion are limiting factors on image resolution. The use of voltage channeling conductive elements and their subsequent arrangements are to be applied to the recording devices described herein, as desired.
One potential semiconductor material may include bringing into contact, during the exposure time, two separate parts of a photographic system, each of which is not photographically sensitive on its own but only when in contact with the other material. For example, a thin photosensitive semiconducting film may be brought into contact with an aqueous electrolytic solution. However, the electrolytic solution and the photosensitive semiconducting film tends to be, by itself, insensitive to infrared light. When the two materials are brought into contact, an oxidation-recombination reaction takes place at the semiconductor-electrolyte interface. The rate of the reaction is dependant, at least in part, on the electron (hole) density in the semiconductor, i.e., on the intensity of illumination falling on the semiconducting film. The reaction may be ended by breaking the contact of the two pieces, or any other suitable technique. Thus, the semiconductor film is again insensitive to infrared radiation. Alternatively, a semitransparent film of lead sulfide evaporated on a glass substrate should also be used as a photographic plate. Combined with a germanium filter, this plate may be exposed to obtain an optical image, or the exposure stopped in the latent image stage and the optical density could then be increased by “physical” development. Alternatively, a thin semiconductor plate of n-type gallium arsenide in contact with electrolyte solution containing HNO3 produces an image by selective photo etching of the semiconductor surface. However, this requires a physical manipulation of the parts, which is not highly desirable.
An alternative structure includes electrically controlled processes where an “electric shutter” is used to “switch on” the photosensitivity during exposure. There are two general techniques to electrically control the photographic process with a self-contained current-sensitive film, namely, a liquid process and a process with a self-contained current-sensitive film. Referring to
Another further embodiment of the image is not formed on the surface of a semiconductor but in a self-contained current sensitive film. Referring to
Yet another alternative embodiment of a semiconductor as the basis of the film consists of the following. A charge is uniformly distributed across the surface of a high-resistivity semiconductor placed on a conducting substrate. The charge leaks away from the illuminated regions because of their photoconductivity and a latent electrophotographic image is formed on the plate. The image is made visible by development involving the precipitation of the charged colored particles of the developer on the unilluminated parts of the image. The photographic sensitivity of the plate is absent during its preparation and is imparted by charging the plate. The charging process acts as a controlling factor which “switch-on” the sensitivity. However, the latent image has only a limited lifetime and the sensitivity cannot be “switched off” after the exposure. The process can be completed by electrostatic development.
There are addition techniques that may be employed. The effect on a photographic plate of the background thermal radiation during the plate's storage and preparation before its exposure and during its subsequent treatment can be suppressed by exploiting the uniform illuminance of this radiation. A process can be developed in which the photographic effect is obtained only by projection of an image with regions of different illuminance but not by uniform illumination. A photographic process of this type may ensure insensitivity of a photographic material to the fogging effect of the thermal radiation and still give an optical image. One of possible variants of such a process involves the use of the photo emf in semiconductors, p-n, n-p-n, or p-n-p, junctions for the purpose of obtaining a photographic image. Referring to
Other suitable materials for this process include a base layer of n-material Aluminum overlaid by layer of p-material silicon, which would a photovoltaic response from ultraviolet to approximately an infrared wavelength of 1.1 μm. Since the Aluminum layer is reflective to infrared radiation, it is useful in making films for infrared reflection (non-transmission) holograms. Both layers can be plasma deposited onto a high refractive index wafer or quartz (glass) surface (with the Aluminum layer outward) so that the hologram is recording through the quartz. The image quality of the developed hologram can be enhanced by the addition, a thin (or at wavelength specific thickness) dark infrared light absorbing layer of either p-, n-semiconductor or dielectric materials can be sandwiched between the silicon and aluminum layers. In infrared-transparent semiconductor materials, the materials' higher index of refraction gives a higher line resolution per millimeter in the processed film.
It is possible to increase the resolution of the aforementioned semiconductor based recording devices by the combination of an infrared wave front (or a relatively equal ultraviolet wave front strength to the infrared wave front) and e-beam convergence on the semiconductor in place of an applied voltage.
A further embodiment includes a recording device including a polycrystalline film, and in particular polycrystalline film including lead sulfide and selenide.
Another embodiment includes a lead sulfide recording device including sensitivity-controlling by an electric field applied to a semiconductor—electrolyte system where the image is formed directly on the semiconductor surface. A lead sulfide film may be prepared by vacuum evaporation followed by annealing. For example, the films may be deposited on a glass substrate with semitransparent tin dioxide electrodes (such as a surface resistance below 50 ohms/square). During exposure the semiconductor film is brought into contact with an electrolyte. The exposure is made through a film, such as a germanium filter. The light is focused onto the surface of the Pbs film. For best results the electrolyte should have the following characteristics: (1) the effect of light should not result in the formation of an image in the absence of an electric field; (2) the selectivity of the electrolyte should be high in contrast to the electrolytes employed in electroplating; (3) the electrolyte should have a high current efficiency and the electrolysis should give rise to heterogeneous catalysis centers necessary for efficient development; (4) the electrolyte should produce an image with a high color contrast on the gray background of the semiconductor film. One potential electrolyte is a solution of simple salts, such as lead or silver nitrates, copper sulfate, or calcium chloride. A potential explanation of the mechanism of formation includes consideration of the semiconductor—electrolyte interface in an electric field. Cathodic polarization of the semiconductor surface produces a negative space—charge region and a corresponding blocking barrier at the surface of the p-type semiconductor. The selection of the elements of the light sensitive PbS—electrolyte system consists of addition of oxidizing or reducing agents to the electrolyte in accordance with the type of conduction of PbS. Referring to
Yet another alternative is a recording medium is a photo-conduct-o-graphic system. The principal advantage of such a system is the formation of an image in a separable film and the consequent reusability of the photosensitive layer. One potential material utilizes high-resistivity gallium arsenide without a protective coating which is a compromise between photo-conduct-o-graphic and semiconductor-electrolyte systems, combining the advantages of both. Referring to
The counter-electrode (anode) is located at such a distance from the photo-conductor that the products of the anodic reaction in the current-carrying film near the counter-electrode can not diffuse into the main part of the assembly and spoil the useful image by accidental blackening.
The use of high-resistivity gallium arsenide eases the requirements that the electrolyte must satisfy in respect of the differential resistance in cathodic reactions, i.e., the resistance of the current—carrying film can be relatively high. When a high-resistivity photo-conductor is used in direct contact with a current—carrying film (without a protective layer) it is found that the system described above operates more or less efficiently with electrolytes. It follows that the protective layer need not be used, if desired.
The principal photographic characteristics of the system are a function of the electrolyte used and of the ability of the latent-image center to become localized in the current-carrying film during exposure and to remain in this film for some time after the exposure. These characteristics depend also on the process responsible for the visualization of the nonmetallic latent-image centers. For example, if a Phenidone electrolyte is used, the latent-image centers localized in the film may remain for several minutes and during this time the latent image is not affected by ordinary or acidified water. When the electrolyte is a weak aqueous solution of a neutral salt, the latent-image centers localized in the film have a sufficient degradation time. This time is sufficient for retention of the latent image from the end of the exposure to the beginning of the visualization process.
There may be at least two general types of reactions between a semiconductor material and molecules of an adsorbed reactant, controlled by active radiation. First, the chemical reaction between the components of the reagent is catalyzed by non-equilibrium carriers from the semiconductor. The visual image is produced by heterogeneous—catalysis reaction products. Second, the reaction or oxidation of the reagent on the semiconductor surface involving non-equilibrium electrons or holes, respectively, and the chemical reaction of the products with the semiconductor material. The image is produced either through local etching of the surface, when the reaction products are soluble or gaseous and are removed from the surface, or by colored insoluble reaction products adsorbed on the surface. For example, a gas photo-corrosion of thin semiconducting films of indium antimonide may be used. Since the bonds in AIIIBV compounds are covalent, a strong oxidizing agent such as nitric acid (vapor) may be used as a constituent of the etchant. The deep penetration of the corrosion reaction, to a depth where the distribution of lattice defects is still significant, may reduce considerably the absorption of visible light in a thin film, if the reaction products are removed from its surface. Alternatively, an image may be formed by using a colored film of insoluble oxide on InSb. The system my include indium antimonide and nitric acid vapor together with polycrystalline InSb films 0.5-1.5 microns thick, deposited by evaporation on glass substrates. The following model may explain the process. Initially, the contact between the InSb and the nitric acid vapor produces a poly-molecular adsorbed layer of nitric acid. The reduction of the nitric acid by equilibrium electrons (minority carriers) is slow. Optical excitation causes a sharp increase in the electron density at the surface, and the reaction becomes much faster. The adsorption equilibrium between the InSb surface and the nitric acid vapor is shifted in the direction of further adsorption of the reagent molecules. The equation may be as follows 3H++NO3 −+2e−->HNO2+H2O. The products of the reaction interact with indium antimonide and form, at points where there is location illumination of the semiconductor, a black film of oxide, which constitutes the image. This photographic effect may also be observed in photo-sensitive films of lead sulfide exposed to a mixture of hydrochloric and acetic acid vapors.
An extension of the aforementioned semiconductor based photography into infrared wavelengths may be achieved if the photo-sensitive element is cooled. For example, consider a film of semi-insulating GaAs is doped with zinc, 100 microns or less thick, and its resistivity generally 108 ohms cm. The dielectric layer may be a film of polyethylene 10 microns or less thick covered by a conducting coating. The semiconductor and the dielectric layer are pressed together between conducting electrodes and immersed in liquid nitrogen to achieve cooling, if desired. Preferably, the liquid nitrogen is evaporated from the gap between the semiconductor and the dielectric. Then simultaneously the system is illuminated and subjected to a voltage pulse. The charge is transported across the gap between the dielectric and the semiconductor, which was filled with gaseous nitrogen. The dielectric may be extracted from the system and developed in a developer which can be subsequently fixed to an optical surface or device. In addition, other thin dielectric mediums may be used, such as doped Mylar or Kodar films.
Yet another recording material including semiconductor material with forbidden bands are narrower than the forbidden band of silicon. In addition, this may be extended to polycrystalline films, if desired. For example, a reaction of lead sulfide or selenide with an aqueous solution of AgNO3 may be used. The rate of the reaction is based, at least in part, for p-type PbS or PbSe by the rate of the cathodic component, i.e., by the rate of precipitation of silver. This precipitation rate is determined by the density of non-equilibrium carriers (electrons) in the surface layer of the semiconductor; consequently, it depended on the illumination. The precipitation of silver was thus localized on the illuminated parts of the sample, whereas the sulfide or selenide was dissolved in the unilluminated region. In the case of silicon, the image may be projected on that surface of the sample which is opposite to the surface in contact with the electrolyte. Pbs films may be evaporated in vacuum on glass substrates and activated by heating in air. The thickness of the films is preferably such that they are semi-transparent after activation. This makes it feasible to obtain the image by transmission.
A two part system shown in
The inventor then realized that these two-part or three-part system films satisfies the requirements for making thin, phase, thin-amplitude, thin-phase, and thin-phase-reflection holograms, the films did not readily meet the requirements for creating volume- and volume-transmission, and volume reflection holograms. The inventor then realized that IR volume holograms could be readily achieved if an IR recording material could created which was able to record and resolve greater amplitude and refractive-index values.
The present inventor came to the realization that temporary transient holograms utilizing a spatially modulated free carrier pattern would be useful in providing real-time hologram recording and interferometric evaluation of TO 224. When a photoconductor receives nonuniform illumination e.g., illumination limited to just a small portion of the interelectrode spacing, some special effects can be obtained. In general, insulators subjected to such nonuniform illumination would be expected to show a negible fractional increase in photocurrent because the flow of the current would be effectively prohibited by the buildup of space charge. The same is true of semiconductors, if carriers of only one type are mobile, but not if the carriers of both types are mobile.
The effects which can be obtained with a nonuniformly excited insulator. As indicated in
A similar set up for the type of photocurrent (primary or secondary) to be expected from nonuniform illumination of a photoconductor. This discussion leads naturally to the reason why nonnegible photocurrents can occur in semiconductors with both carriers mobile, even for nonuniform illumination. Shown in
The trapped holes from a space-charge of +Q cm2, and their presence causes electrons to enter the crystal from the cathode. If the excess electron's which this enter the crystal constitute a charge of −aQ cm2, the effect of the net charge is to increase the field at the cathode
where electrostatic units have been used, Eo is the field in the absence excitation, and e is the dielectric constant. The increase in current density corresponding to the increase in field is given by
This increase in current may also expressed as
Equating these two relationships for Δj shows that
If strongly absorbed light or radiation is used to excite the material, x˜d, and then examination of the previous expression β shows that quantity b can be expressed as the ratio of two times
where we have inserted the numerical factor to make the expression usable with conventional units for the resistivity ρ and e. Thus
so that the ratio of secondary to primary photocurrent is
To measure a primary photocurrent without any contribution from the secondary photocurrent, then β must be much less than unity; i.e., τr>>τn. All other quantities being about the same, this means that a pure primary photocurrent can be observed in material only with a resistivity, i.e., insulators.
The same kind of reasoning is involved in determining the type photoconductivity which results from nonuniform illumination of a material in which both carriers are mobile. The key question is this. When electron-hole pairs are generated in a material by nonuniform illumination, do the electrons and holes separate, each going to the appropriate electrode, or do the photoexcited minority carriers move toward their appropriate electrode and take along with them an equal number of majority carriers to maintain an absence of space charge. The answer is that, τr>>τmaj, the carriers move in opposite directions; this is the condition found in insulators where nonuniform illumination products a space-charge limitation on the current. In homogenous photoconductor materials, when both carriers are mobile but the holes are not replenished at the anode, the gain is given by
If τmaj>τr, on the other hand, the minority carriers take with them an equal number of majority carriers, and the photocurrent results from this slice of increased conductivity;
this is the condition found in semiconductors where nonuniform illumination is not to very small values by space-chare limitations if both carriers are mobile. The actual gain of the photocurrent is the same as the previous case [for the definition of Gain]. In the later case, the space-charge which would be built up by the separation of the charges is rapidity dissipated by normal conduction processes, the neutralization of the charge being carried out through those carriers which contribute the most to conductivity, i.e., the majority carriers.
In holographic filtering discrete voltage levels can be targeted, allowing for voltage induced jittering or timing; giving optional optical filtering conditions, i.e., negative (low) background voltage level permits target photocurrents, a large voltage exceeds the targeted voltage level recorded by the holographic filter.
The free-carrier pattern acting as a pure-phase volume hologram and decays by diffusion of the free carriers using an apparatus as shown in FIGS. 4/5/7/8/14 a/ 14 b/ 14 c/ 26/27/28/29/31/32/33. When a beam from a Q-switched Nd:YAG laser (λ=1.06 μm, hv=1.16 eV [need to lower this photogenerating threshold by selectively doping semiconductor materials]) passes through a thin slice of Si (Eg=1.11 eV), a large concentration of free electrons and holes are created by optical interband transitions.
Two-wavelength holographic image production utilizes the interaction of photovoltages to produce computer generated holograms into voltage patterns on the free-carrier optical element to create a free-carrier image by a visible or UV wavelength which is subsequently read by another wavelength of non-photoelectric generating IR light. Several suitable techniques are described later is in this disclosure for making computer generated holograms of devices and conditions to be holographically tested. The amplitude and phase patterns of the short photogenerating wavelength are optically enlarged so that they correspond directly to the wave front dimensions of the IR optically read hologram. The photogenerating wavelength incident to free-carrier recording medium can be created or generated using, but not limited to, display devices such as cathode, liquid crystals, gas-plasma, of other free-carrier based devices.
Holographic filters in conjunction with holographic (initial polarization recording) mapping of the active optical surface are used to observe by non-invasive polarized light-the facsimile voltage patterns correspond to the optical amplitudes and phases that create the optical wavefront of the holographic image to be displayed. An electron lens or a cathode-ray element can be used to electrically reduce the voltage patterns down and transfer them to another optically active surface to increase image resolution if necessary.
Another approach is to use the following holographic technique of four-wave mixing utilizing free carriers and optical frequency doubling to enable real-time phase-conjunctent (4-wave mixing) examination of TO 224 shown in
In addition, other films may be used, as desired.
Additional recording mediums also include Bi12SiO20(BSO) or Bi12GeO20 (BGO) electro-optic recording devices sensitized to infrared by enclosing the BGO or BSO crystal in a vacuum chamber (having infrared transparent windows) which eliminates air induced resistances to infrared generated photo-currents. These electro-optic devices can enable four-wave mixing or phase conjugate imaging holographic techniques to be applied to the inspection and voltage characterization of TO 224.
IR volume holograms offer to semiconductor voltage test and characterization, the ability to record two different transparencies (each formed by a different recording wavelength) on the same recording medium for subsequent reconstruction without crosstalk. The IR volume hologram recording process can be varied to also enable same-wavelength multiple hologram storage by rotating the recording medium after each exposure. Another suitable technique of essentially multiplexing multiple-images on a single recording medium is by considering the context of color holography; different non-overlapping regions of the same photographic plate can be utilized to record IC (TO 224) holograms of different substrate voltage signals, recording beam angles, wavelengths and beam polarizations. Unlike conventional holographic beam recording techniques where the incident beam of identical polarization is required to reconstruct the hologram, in polarization holography hologram reconstruction requires both the recording wavelength and beam polarization.
Holograms created by computer calculations provide opportunity to generate wavefronts of any prescribed amplitude and phase distribution; this has been demonstrated to be extremely useful for generating three-dimensional images, testing optical surfaces, optical spatial-filtering, laser scanning, as well as pattern recognition of semiconductor devices and substrate voltage waveforms. See
Production of these holograms employs a discrete Fourier transform to generate the complex amplitude and phase distributions of an array of Nn×Nn elements. Each element of the image is broken into Fourier coefficients which are computed using the fast Fourier transform (FFT). In holography, the second step follows which produces a transparency (the hologram), which reconstructs the object wave when suitably illuminated. Any dynamic changes in the test object's transparency away from ideal or recorded conditions, such as by defects in the TO 224's circuitry or from prescribed voltage operating parameters, will not result in the reconstruction of the desired object wave or holographic image. Refer to
The Fourier transform describe functions into different dimensions or coordinates such as Cartesian to spherical. For example, a function could be represented in the domains of time and frequency. The concept of the 3-D FFT has the safe form as the mathematical representation of utilizing a 2-D FFT utilizing a 1-D FFT. Here, an element (n1, n2, n3) of the 3-D array (N1, N2, N3) would be defined in a 1-D device where:
n:=N 1 ·N 2 ·n 1 +N 3 ·n 2 +n 3 (20)
Similarly, the 3-D FFF can derive from a time sample x(k1, k2, k3) a frequency sample X(k1, k2, k3). The parameter N can be expressed as:
N=N 1 ×N 2 ×N 3 (21)
Character & Condition Recognition
This property of associative storage has been used for recognizing a character with a hologram, it is applied to recognize the presence of a specific electronic circuit and detect specific voltage levels within the TO 224 circuit. It makes it also possible to use an isochromatic hologram to perform recognition of voltage condition(s) present in temporal voltage waveforms and in selected microelectronic devices and circuits. Like the previous section, this technique is essentially a spatial filtering operation in which the hologram functions as a matched filter. The approach here is to
An optical system for this is shown in
where f(y−cj)j is the complex amplitude due to a typical character centered at cj, while that due to the reference source is δ(y+b).
If we assume linear recording, the transmittance of the hologram can be written as
The hologram is replaced, after processing, in exactly the same position in which it was recorded and illuminated by single character of the set centered on the axis. A computer generated hologram (CGH) of TO can be created utilizing IC layout tools and experimental data as well as theoretical test conditions can be subsisted in its place. If the amplitude due to the target device and its operating characteristics in the input plane is f(y)1, the transmittance of the hologram is
The complex amplitude in the input output plane is then the Fourier transform of (26), which is
the only term of interest in (27) is the last but one on the right hand side which corresponds to the correlation of f(y)1 with all the characters of the set. If we ignore the constant factor βT, this can be expanded as
If the auto correlation function of the character presented is sharply peaked, the first term on the right hand side of (90) represents a bright spot of light, which is the reconstructed image of the reference source, located at
y:=−c 1 −b (31)
The presence of this bright spot in the output plane corresponds to recognition of the targeted microelectronic circuitry and accompanying voltage conditions present as one belonging to the original set. The fact that this image is reconstructed at a distance −c1 from its correct identifies the character presented as f(y−c1)1.
This basic circuit test condition recognition technique has been extended to permit simultaneous identification of all the circuit test targets and conditions on a single recording medium to allow multiple device and condition tests to be carried out in parallel. Shown in
When real-time operation is not required, a more direct technique can be used. This involves the use two transparencies in the input plane. One of these f(y+b)1 is a transparency of the character to be located, while the other f(y+b)2 is a transparency of the recording medium of the circuits and voltage conditions to be searched. The transmittance of the Fourier hologram formed with these two sources is then
If this hologram is illuminated with a plane wave, the complex amplitude in the output plane is proportional to the Fourier transform of t(η). As before, the only term of interest is the third within the square brackets which, if we neglect a constant factor, is
ζ(F(η)1 ·F(η)2·exp(−i·2·π·η·b)):=(f(y)1 ·Δf(y)2)·αδ(y+b) (34)
If F(y)2 is identical to F(y)1, this term will result in a bright auto correlation peak at y=−b. If, however, F(y)2 contains more than one such character f(y−c1)1, identical with f(y)1 but located at different positions and equal number of auto correlation peaks will be formed at locations y=−b−c1, corresponding to the centers of these patterns.
In isochromatic electron-shading, this approach is very useful for providing pattern and condition recognition both continual and real-time monitoring (using non-invasive light) for targeted devices and operating conditions in either temporal voltage waveforms, analogue and digital operations. This can be used to initiate various software and hardware functions such as: initiating both “stop” and “load” codes, program and node addresses, and initiating “link” operations for individual node's (both star and cascade architecture's) in parallel processors. The limiting factors on system performance and operating bandwidth, are the physical dimensions hence, optical transit time, the physical dimensions of the voltage waveforms, and the compactly of the holographic storage medium.
Local optical archival of information offers virtual immunity of binary code for computers from degradation. For IR-based holography and optoelectronic devices, holography provides storage opportunities to similarly record and preserve the spectral and spatial integrity of light used for optical filters and waveguides.
The simplest approach of optical access employs a space variant approach. Here, the location and position(s) of the input field determines the composition of the output field from the hologram. The basic properties of such a system has been investigated for its applications in data processing.
To carry out a two-dimensional linear space-variant operation it is necessary to have a system having impulse response is a function of four independent variables (two more than a normal optical system). Two methods based on holographic techniques are described here.
The first is a simple method to perform the coordinate transformation
x:=G 1·(x,y) (35)
y:=G 2·(x,y) (36)
This transformation is effected with the optical shown in FIG. (b), which uses a computer-generated hologram whose spatial frequencies at any point (u,v) are
Light from a point in the input plane having coordinates (u,v) is then diffracted at an angle such that an image of this point is formed in the back focal plane of the lens L2 at a point whose coordinates (x,y) satisfy (35) and (36).
More general operations can be realized, in principle, by a hologram array. Each input pixel is backed by a hologram element which generates the desired response for the targeted device and voltage conditions. However, there are serious limitations on the number of devices and conditions which can be handled in this fashion due to the limited resolution of hologram elements when targets are made very small.
Another method of obtaining a space-variant impulse response is to use a thick holographic element such as shown in
Higher selectivity can be obtained by the use of coded reference beams. For this, a diffuser is inserted into the input plane, and each of the holograms in the filter is recorded with a reference derived from a small area on this diffuser. Since the auto correlation functions of the reference beam are sharply peaked, each point in the input produces an output from the corresponding holographic filter. The diffuse background arising from the cross-correlation functions of the elementary diffusers is minimized by using a thick recording medium.
Holographic Image Generation
Holograms or computer generated holograms surface mounted on either frontside or backside can be made of IR absorbing materials to form transmission holograms, in the case of reflection-probing of TO 224 IR reflective materials can be utilized on TO 224's backside so that an interference pattern of the IC's internal circuitry and voltage topography can be determined and resolved as to be in-phase or out-of-phase with the computer generated hologram. See
Holograms created by computer calculations provide opportunity to generate wavefronts of any prescribed amplitude and phase distribution; this has been demonstrated to be extremely useful for generating three-dimensional images, testing optical surfaces, optical spatial-filtering as well as laser scanning. Production of these holograms employs a discrete Fourier transform to generate the complex amplitude and phase distributions of an array of Nn×Nn elements. Each element of the image is broken into Fourier coefficients which are computed using the fast Fourier transform (FFT). In holography, the second step follows which produce a transparency (the hologram) which reconstructs the object wave when suitably illuminated.
Many techniques have been developed for creating computer generated holograms (CGHs) and holographic lens elements (HLEs). CGHs are representations of the image's optical diffraction structure that has been calculated from either a mathematical description (e.g., Fourier analysis) of the wavefront or from samples. Several methods exist for creating and calculating HLEs and CGHs.
In conventional approaches to performing CGH calculations, the amplitude and relative phase of waveforms are plotted and optically reduced and transferred to holographic film. Illumination of the developed film creates the three dimensional image of the object calculated for viewing. Similar rules apply for creating HLEs such as concave, convex, cylindrical and achromatic lenses, prisms, beam gratings, etc. See
Replicating CGH plots by using a shorter (½ or ¼ of the IR wavelength) photogenerating wavelength so that free-carrier voltage waveforms or patterns approximating optically by a 2-times enlargement of the image. This technique eliminates the need for photo reduction of amplitude and wave phases since the voltage wave patterns directly correlate to IR and UV optical interference waveforms. Also, the reflection brightness value (+70%) of the metal mirror surface is greater than the light transmission values of presently available holographic transmission films (1% to 10%).
A Binary Detour-Phase Hologram (see
To produce the hologram, the surface area of the optically active projection surface is divided into array of N×N cells. Each cell corresponds to the N×N coefficients of the discrete Fourier transform of the complex amplitude of the in the object plane. Each Fourier coefficient is, then represented by a single transparent area within the corresponding cell, whose site is determined by the modulus of the Fourier coefficient. This method derives its name from the fact that a shift of the transparent area in each cell results in light traveling a longer or short path to the reconstructed image. The effect here is achieved through the modulation of the TO 224 material's polarization phase or in the refractive of the image. An example showing both the cells and the image of a typical binary detour-phase hologram of the letters ICO is shown in
This method of encoding the phase works, by a rectangular opening (a×b) in an opaque sheet (the hologram) centered on the origin of the coordinates, as shown on
Illustration showing the configuration of the cells in a binary detour-phase hologram shown in
We now assume that the center of the rectangular opening is shifted to a point (Δxo, Δyo) and the sheet is illuminated by a plane wave incident at an angle. See
If ax1<λz, byi<λz, equation (42) reduces to:
If then, the computed complex amplitude of the object wave at a point nΔxo, mΔyo) in the hologram plane is
o(nΔx o , mΔy o):=|o(nΔx o , mΔy o)|·exp(iφ(nΔx o , mΔy o)) (44)
its modulus and phase at this point can be encoded, as shown in equation (44), by making the area of the opening located in this cell equal to the modulus so that
a·b:=|o(nΔx o ,mΔy o) (45)
and displacing the center of the opening from the center by an amount given by the relation
To show the validity of this method of encoding, we consider the complex amplitude in the far field due to this opening, which is obtained by summing the complex amplitudes due to all the N×N openings, is therefore
If the dimensions of the cells and the angle of illumination are chosen so that
αΔx o:=2·π (48)
βΔy o:=2·π (49)
δx nm :=λz (50)
equation (47) reduces to
This is the discrete Fourier transform of the computed complex amplitude in the hologram plane, or in other words, the desired reconstructed image.
Illustration of a typical cell in a binary detour-phase hologram showing the configuration of a single cell in the binary detour-phase hologram shown in
Binary Detour-Phase Holograms
Binary detour-phase holograms have several attractive features. It is possible to use a simple pen-and-ink plotter to prepare the binary master, and problems of linearity do not arise in the photographic reduction process. Their chief disadvantage is that they are very wasteful of plotter resolution, since the number of addressable plotter points in each cell must be large to minimize the noise due to quantization of the modulus and the phase of the Fourier coefficients. See
Gunary Binary Detour-Phase Holograms
In this method, as shown in
Generalized Binary Detour-Phase Holograms
The Fourier transforms of the wavefronts corresponding to simple electronic circuits and their voltage levels have very large dynamic ranges, because the coefficients of the dc and low-frequency terms have much larger moduli than those of the high-frequency terms. This results in nonlinearity because of the limited dynamic range of the recording media.
To minimize this problem, it is convenient, where the phase of the final reconstructed image is not important, to multiply the complex amplitude at the original sampled object points by a random phase factor before calculating the. Fourier transform. In transmission holography, this is optically analogous to placing a diffuser in front of the object transparency and has the effect of making the magnitudes of the Fourier coefficients much more uniform, as shown in
In the case where the object is diffusely illuminated, the magnitudes of the Fourier coefficients are relatively unimportant, and the object can be reconstructed using only the values of their phases. This led to the concept of a completely different type of hologram called a kinoform.
This a computer generated hologram in which all the cells are completely transparent so that the moduli of all the Fourier coefficients are arbitrarily set equal to unity, and only the phase of the transmitted light is controlled in accordance with the phase of the computed Fourier coefficients. Thus, the amplitude transmittance trim of the cell corresponding to a Fourier coefficient with modulus Onm and phase. φnm would be:
t nm:=exp(iφ nm) (52)
However, to simplify recording, integral multiples of 2π radians are subtracted from the computed phases, so that they vary only between 0 and 2π over the entire kinoform.
Kinoforms have the advantage that they can diffract all the incident light into the final image. However, to achieve this, care is necessary to ensure that the phase matching condition expressed by (52) is satisfied accurately. Any error in the recorded phase shift, as altered by subsequent non-functionalities from the ideal test values of the TO 224, results in light diffracted into the zero order which can spoil the image and thus signal the presence of test failure conditions being present in the TO 224.
Computer Generated Interfergrams
Problems can arise with detour-phase holograms when encoding wavefronts with large phase variations since, when the phase of the wavefront moves through a multiple of 2π rad, the two apertures near the crossover may overlap. This has led to an alternative approach to the production of binary holograms based on the fact that an image hologram of a wavefront that has no amplitude variations is essentially similar to an interferogram, so that the exact locations of the transparent elements in the binary hologram can be determined by solving a grating equation which correlates with the TO 224 circuitry and operating voltage parameters of the test. See
Different methods can be used to incorporate information on the amplitude variations in the object wavefront into the binary fringe patterns. In one, the two-dimensional nature of the Fourier transform hologram used is used to record the phase information along the x-direction, while the fringe heights in the y-direction are adjusted to correspond to the amplitude. In another, the phase and the amplitude are recorded by the position and width of the fringes along the direction of the carrier frequency, while in the third, the phase and amplitude of the object wave are encoded by the superposition of two phase-only holograms.
This approach can be duplicated by plotter and photo reduction, or conventional photolithographic, techniques as well as implementation in a free-carrier recording medium. Here the computer calculates the hologram at two levels of its amplitude transmittance-either one or zero (top). The reconstructed image appears in the lower illustration
Creating the voltage patterns with invasive light is accomplished by optically retrieving indexed patterns (matrices) that correspond to x, y, and z, coordinates of the holograph image field to be generated as well as Fourier transform functions. It is important to note in creating optical grating patterns metal mirror's photo-active surface using voltage waveform patterns, that the wavelength of electrons is less than 100,000 times shorter than visible light so no photo-reduction is necessary. The electron shadow that is created on the photovoltaic cell proportionally corresponds 1:1 to the interference lines of the real image upon the electro-optic surface. In this application, the isochromatic element serves as a mapping filter of the voltage waveforms.
One approach to display a holographic image for viewing is to generate multiple voltage patterns so that they are transposed beside each other in such a way that they bisect the active optical surface and interfere with each other in parallel to provide a parallax composite image.
In effect, the image's optical targets or input registers can also serve as index keys to retrieve multiple stored optical patterns that serve as precalculated optical patterns (copyrightable). These elements serve as templates to create the complex features (multiple Bragg cell conditions present) of the electro-static surface topographic electro-optic surface that goes into making three dimensional holographic images for display within a defined field (e.g., 6 mm [width]×3 μm [depth]).
The inventor then realized that the ability to resolve supra resolution in CCD detector devices disclosed in FIGS. 14A/14B/14C/etc. by using holographic microscopy techniques enabled the creation and development of new microwave frequency optoelectronic discrete devices.
The inventor then realized that the ability to resolve supra resolution in CCD detector and sensing devices previously disclosed in FIGS. 14A/14B/14C/etc. by using holographic microscopy techniques, enabled the creation and developing of new high frequency microwave multivalued discrete optoelectronic devices. The large (roughly 262 μm) detector pixels in the average CCD device contrast with the present state-of-the-art in semiconductor microelectronic line and device (e.g., 0.014 μm and the pending 25 nm) lithographic techniques. The inventor then realized that the dimensions of high frequency microwave devices are limited not by the available lithography but, rather by the resonance of the electromagnetic waveform or carrier signal itself which propagates through the individual electronic components in the microwave device.
In contrast to conventional lithography techniques and design conventions where more expitaxal devices are packed closer together onto a single chip to form more complex semiconductor devices, the inventor realized that the solution to developing higher operating frequencies was not in creating more discrete expitaxal devices but, instead creating individual devices which would have more functionality if one could be able to resolve and alter the dynamic free carrier structure within a single, simple or complex expitaxal device. See
The inventor then realized that the electrical characteristics at p-n junctions would serve as an effective free-carrier host device.
Angular Dependence of Photovoltaic effects—useful for multivalue logic devices with multiple inputs and outputs on a single substrate and on multi-substrate systems.
“Photoangular Effect”—useful for multivalue logic devices with multiple inputs and outputs on a single substrate and on multi-substrate systems.
Macro-device host circuits—utilize microwave multivibrator and oscillator electronic circuits and macro devices having optical path and circuit phase/mode matching.
Four-wave mixing in free-carrier mediums which target character and voltage specific conditions In infrared stimulated luminescence, carriers can be excited out of traps by optical excitation. Since in most semiconductors the depth of the trap is less than 1.5 eV, the excitation can be obtained by infrared illumination. After the carrier is excited out of the trap, it makes a radiative transition, emitting a photon hvEt. Hence after the semiconductor crystal has been “pumped” at low temperature, the luminescence which occurs when the traps are emptied by IR radiation. The depth of the traps are determined by the spectrum of the incident optical radiation. The inventor then realized that if a material such as ZnS were used as an IR optical receiver for reflective or transmitted radiation from a free-carrier host device of a free-carrier host array, visible, invasive or photogenerating, radiation luminescence can be stimulated at low temperatures when the material is illuminated with 1.2 μm radiation. The photogenerating radiation can be subsequently directed back to free-carrier host to invasively write a free-carrier pattern which function as an optical register hold, or can be directed as shift register carry-over to another free-carrier host device. The invasive beam from the ZnS surface can also serve as an object beam to a holographic associative memory and/or holographic pattern recognition device which would subsequently write an invasive free-carrier pattern which would subsequently as a logical or analogue function as it interacts with other free-carrier fields resident with the host device. The inventor then realized that IR quenching of luminescence can be accomplished in some materials during the afterglow of phosphorescence or during excitation. Quenching of illumiscence can result from the application of an electric field, from heating, or from illumination with infrared radiation. Depending upon the characteristics of the material, the radiative transition may become filled, or a non-radiative path may become available. In ZnS a broad band of radiation at about 0.75 μm always quenches the flourence and phosphorescence; but at 1.2 μm, which always quenches the luminescence at room temperature, it can also stimulate the luminescence at 77° K. Applying an electric field in conjunction with IR radiation provides better timing control of the ZnS material in integrating it within a free-carrier device system or an optoelectronic array.
The present invention relates to improved voltage test systems, improved electronic devices and sensors, semiconductor manufacturing, and signal processing.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US3663194||May 25, 1970||May 16, 1972||Ibm||Method for making monolithic opto-electronic structure|
|US3956698||Feb 12, 1974||May 11, 1976||Westinghouse Electric Corporation||Contactless test method for integrated circuits|
|US4053833||Feb 27, 1975||Oct 11, 1977||Westinghouse Electric Corporation||Contactless test method for integrated circuits|
|US4188123||Aug 30, 1978||Feb 12, 1980||Rca Corporation||Optically measuring the carrier concentration in a semiconductor|
|US4211488||Oct 3, 1978||Jul 8, 1980||Rca Corporation||Optical testing of a semiconductor|
|US4242635||Jan 26, 1979||Dec 30, 1980||The United States Of America As Represented By The Secretary Of The Air Force||Apparatus and method for integrated circuit test analysis|
|US4355278||Aug 6, 1980||Oct 19, 1982||The United States Of America As Represented By The Secretary Of The Air Force||Method for testing and analyzing surface acoustic wave interdigital transducers|
|US4415851||May 26, 1981||Nov 15, 1983||International Business Machines Corporation||System for contactless testing of multi-layer ceramics|
|US4482863||Aug 14, 1981||Nov 13, 1984||At&T Bell Laboratories||Apparatus and method for measuring electronic response of high speed devices and materials|
|US4554453||Mar 28, 1984||Nov 19, 1985||Siemens Aktiengesellschaft||Apparatus for recording X-ray images|
|US4618819||Mar 27, 1984||Oct 21, 1986||The University Of Rochester||Measurement of electrical signals with subpicosecond resolution|
|US4681449||Sep 7, 1984||Jul 21, 1987||Stanford University||High speed testing of electronic circuits by electro-optic sampling|
|US4703260||Sep 23, 1985||Oct 27, 1987||International Business Machines Corporation||Full chip integrated circuit tester|
|US4714826||Aug 18, 1986||Dec 22, 1987||Westinghouse Electric Corp.||Apparatus and method for testing outputs of logic circuits by modulating optical sequals|
|US4745361||Mar 3, 1987||May 17, 1988||University Of Rochester||Electro-optic measurement (network analysis) system|
|US4758092||Mar 4, 1986||Jul 19, 1988||Stanford University||Method and means for optical detection of charge density modulation in a semiconductor|
|US4760249||Dec 22, 1986||Jul 26, 1988||Motorola, Inc.||Logic array having multiple optical logic inputs|
|US4786864||Nov 18, 1986||Nov 22, 1988||International Business Machines Corporation||Photon assisted tunneling testing of passivated integrated circuits|
|US4816755||Mar 2, 1988||Mar 28, 1989||Wright State University||Method and apparatus for measuring photoresistivity and photo hall-effect of semiconductor wafers|
|US4827212||Jan 20, 1988||May 2, 1989||Semitest, Inc.||Noninvasive method and apparatus for characterization of semiconductors|
|US4843329||Oct 9, 1987||Jun 27, 1989||International Business Machines Corporation||Method for contactless testing for electrical opens and short circuits in conducting paths in a substrate|
|US4868492||Oct 9, 1987||Sep 19, 1989||International Business Machines Corporation||Method for contactless testing of conducting paths in a substrate using photo-assisted tunneling|
|US4875006||Sep 1, 1988||Oct 17, 1989||Photon Dynamics, Inc.||Ultra-high-speed digital test system using electro-optic signal sampling|
|US4881029||Sep 26, 1986||Nov 14, 1989||Kabushiki Kaisha Toshiba||Semiconductor integrated circuit devices and methods for testing same|
|US4896109||Dec 7, 1987||Jan 23, 1990||The United States Of America As Represented By The Department Of Energy||Photoconductive circuit element reflectometer|
|US4933634||Jan 19, 1989||Jun 12, 1990||Commissariat A L'energie Atomique||Device and method to measure a short radiation pulse or an electric pulse|
|US4953983||Mar 25, 1988||Sep 4, 1990||Nicholas Bottka||Non-destructively measuring local carrier concentration and gap energy in a semiconductor|
|US4970461||Jun 26, 1989||Nov 13, 1990||Lepage Andrew J||Method and apparatus for non-contact opens/shorts testing of electrical circuits|
|US4983911||Feb 15, 1990||Jan 8, 1991||Photon Dynamics, Inc.||Voltage imaging system using electro-optics|
|US4999577||Jun 15, 1989||Mar 12, 1991||International Business Machines Corporation||Method for contactless testing of conducting paths in a substrate using photon-assisted tunneling|
|US5034683||Jan 3, 1990||Jul 23, 1991||Hamamatsu Photonics K.K.||Voltage detecting device|
|US5059897||Dec 7, 1989||Oct 22, 1991||Texas Instruments Incorporated||Method and apparatus for testing passive substrates for integrated circuit mounting|
|US5165045 *||Oct 10, 1991||Nov 17, 1992||Eselun Steven A||Method and apparatus for measuring displacement having parallel grating lines perpendicular to a displacement direction for diffracting a light beam|
|US5216359||Jan 18, 1991||Jun 1, 1993||University Of North Carolina||Electro-optical method and apparatus for testing integrated circuits|
|US5407850||Jun 29, 1993||Apr 18, 1995||Digital Equipment Corporation||SOI transistor threshold optimization by use of gate oxide having positive charge|
|US5422723||Sep 21, 1992||Jun 6, 1995||Texas Instruments Incorporated||Diffraction gratings for submicron linewidth measurement|
|US5438439||Aug 13, 1993||Aug 1, 1995||Mok; Fai||Non-destructive readout mechanism for volume holograms using two wavelengths|
|US5570011||Oct 12, 1994||Oct 29, 1996||Photon Dynamics, Inc.||Method for testing an electronic device using voltage imaging|
|US5682236||Jul 2, 1993||Oct 28, 1997||Metrolaser||Remote measurement of near-surface physical properties using optically smart surfaces|
|US5895972||Dec 31, 1996||Apr 20, 1999||Intel Corporation||Method and apparatus for cooling the backside of a semiconductor device using an infrared transparent heat slug|
|US5930588||Mar 11, 1998||Jul 27, 1999||Intel Corporation||Method for testing an integrated circuit device|
|US5969517||Feb 13, 1998||Oct 19, 1999||Intel Corporation||Apparatus for performing quantitative measurement of DC and AC current flow in integrated circuit interconnects by measurement of magnetic fields with a magneto optic laser probe|
|US5995223||Jun 1, 1998||Nov 30, 1999||Power; Joan Fleurette||Apparatus for rapid phase imaging interferometry and method therefor|
|US5999152||Feb 27, 1997||Dec 7, 1999||Varintelligent (Bvi) Limited||Electro-Optic display providing a grey scale by utilizing voltage dependent birefringence|
|US6075908||Dec 19, 1997||Jun 13, 2000||Intel Corporation||Method and apparatus for optically modulating light through the back side of an integrated circuit die|
|US6084396||Sep 3, 1996||Jul 4, 2000||Intel Corporation||Method for performing quantitative measurement of DC and AC current flow in integrated circuit interconnects by the measurement of magnetic fields with a magneto optic laser probe|
|US6163378||Jun 14, 1999||Dec 19, 2000||Khoury; Jehad||Spectroscopic time integrative correlation for rapid medical diagnostic and universal image analysis|
|US6166846||Dec 30, 1998||Dec 26, 2000||Intel Corporaqtion||Through silicon modulator and method|
|US6172752||Aug 5, 1997||Jan 9, 2001||Matsushita Electric Industrial Co., Ltd.||Method and apparatus for simultaneously interferometrically measuring optical characteristics in a noncontact manner|
|US6218194||Feb 10, 1997||Apr 17, 2001||Thermo Fast Uk Limited||Analytical methods and apparatus employing an optical sensor device with refractive index modulation|
|US6218655||Mar 17, 1999||Apr 17, 2001||Pioneer Electronic Corporation||Optical pickup|
|US6231194||Mar 26, 1999||May 15, 2001||Intel Corporation||Projection system|
|US6246098||Dec 31, 1996||Jun 12, 2001||Intel Corporation||Apparatus for reducing reflections off the surface of a semiconductor surface|
|US6251706||Apr 23, 1998||Jun 26, 2001||Intel Corporation||Method for cooling the backside of a semiconductor device using an infrared transparent heat slug|
|US6269199||Dec 30, 1998||Jul 31, 2001||Intel Corporation||Through silicon modulator and method using polarized light|
|US6323985||Dec 30, 1998||Nov 27, 2001||Intel Corporation||Mosfet through silicon modulator and method|
|US6374003||Sep 30, 1999||Apr 16, 2002||Intel Corporation||Method and apparatus for optically modulating light through the back side of an integrated circuit die using a plurality of optical beams|
|US6421473||Sep 28, 2000||Jul 16, 2002||Intel Corporation||Method and apparatus for switching an optical beam in an integrated circuit die|
|US6434289||Sep 28, 2000||Aug 13, 2002||Intel Corporation||Method and apparatus for confining an optical beam in an optical switch|
|US6449405||Sep 28, 2000||Sep 10, 2002||Intel Corporation||Method and apparatus for switching a plurality of optical beams in an optical switch|
|US6458495||Jun 30, 2000||Oct 1, 2002||Intel Corporation||Transmission and phase balance for phase-shifting mask|
|US6463193||Dec 6, 2000||Oct 8, 2002||Intel Corporation||Method and apparatus for switching an optical beam using a phase array disposed in a higher doped well region|
|US6470104||Dec 12, 2000||Oct 22, 2002||Intel Corporation||Method and apparatus for switching an optical beam by modulating the phase of a portion of the optical beam in a semiconductor substrate|
|US6480641||Nov 4, 1999||Nov 12, 2002||Intel Corporation||Method and apparatus for optically modulating light through the back side of an integrated circuit die along the side walls of junctions|
|US6483954||Dec 20, 2000||Nov 19, 2002||Intel Corporation||Method and apparatus for coupling to regions in an optical modulator|
|US6501092||Oct 25, 1999||Dec 31, 2002||Intel Corporation||Integrated semiconductor superlattice optical modulator|
|US6512385||Jul 26, 2000||Jan 28, 2003||Paul Pfaff||Method for testing a device under test including the interference of two beams|
|US6522812||Dec 19, 2001||Feb 18, 2003||Intel Corporation||Method of precision fabrication by light exposure and structure of tunable waveguide bragg grating|
|US6548417||Sep 19, 2001||Apr 15, 2003||Intel Corporation||In-situ balancing for phase-shifting mask|
|US6566679||Sep 18, 2002||May 20, 2003||Intel Corporation||Integrated semiconductor superlattice optical modulator|
|US6600760||Jul 27, 2000||Jul 29, 2003||Intel Corporation||Method and apparatus for tuning a laser|
|US6600864||Dec 20, 2000||Jul 29, 2003||Intel Corporation||Method and apparatus for switching an optical beam using an optical rib waveguide|
|US6631146||Jul 6, 2001||Oct 7, 2003||Intel Corporation||Tunable laser control system|
|US6642531||Dec 23, 2002||Nov 4, 2003||Intel Corporation||Contamination control on lithography components|
|US6643025 *||Mar 29, 2002||Nov 4, 2003||Georgia Tech Research Corporation||Microinterferometer for distance measurements|
|US6650802||Dec 22, 1999||Nov 18, 2003||Intel Corporation||Method and apparatus for switching an optical beam|
|US6653161||May 16, 2002||Nov 25, 2003||Intel Corporation||Method and apparatus for forming a capacitive structure including single crystal silicon|
|US6658031||Jul 6, 2001||Dec 2, 2003||Intel Corporation||Laser apparatus with active thermal tuning of external cavity|
|US6660649||Aug 29, 2002||Dec 9, 2003||Intel Corporation||In-situ balancing for phase-shifting mask|
|US6665321||Dec 31, 2002||Dec 16, 2003||Intel Corporation||Tunable laser operation with locally commensurate condition|
|US6687269||Dec 31, 2002||Feb 3, 2004||Intel Corporation||Spread spectrum dither for locking to transmission peak in tunable laser|
|US6704332||Mar 15, 2002||Mar 9, 2004||Intel Corporation||Tunable external cavity laser|
|US6724790||Dec 31, 2002||Apr 20, 2004||Intel Corporation||Laser facet phase control|
|US6751002||May 6, 2002||Jun 15, 2004||Intel Corporation||Method and apparatus for semiconductor-based integrated polarization modulator/compensator|
|US6753969 *||Mar 29, 2002||Jun 22, 2004||Geogia Tech Research Corporation||Microinterferometer for measuring distance with improved sensitivity|
|US6763047||Jun 15, 2002||Jul 13, 2004||Intel Corporation||External cavity laser apparatus and methods|
|US6778102||Jun 9, 2000||Aug 17, 2004||Intel Corporation||Communication system and apparatus with synchronous orthogonal coding|
|US6778750||Jun 26, 2002||Aug 17, 2004||Intel Corporation||Polarization-insensitive planar lightwave circuits and method for fabricating the same|
|US6782164||Jan 31, 2002||Aug 24, 2004||Intel Corporation||Thermally wavelength tunable laser having selectively activated gratings|
|US6785430||Feb 25, 2002||Aug 31, 2004||Intel Corporation||Method and apparatus for integrating an optical transmit module|
|US6788724||Jul 6, 2001||Sep 7, 2004||Intel Corporation||Hermetically sealed external cavity laser system and method|
|US6788727||Jun 13, 2002||Sep 7, 2004||Intel Corporation||Method and apparatus for tunable wavelength conversion using a bragg grating and a laser in a semiconductor substrate|
|US6803777||Aug 14, 2002||Oct 12, 2004||Paul Pfaff||Voltage testing and measurement|
|US6804278||Jul 6, 2001||Oct 12, 2004||Intel Corporation||Evaluation and adjustment of laser losses according to voltage across gain medium|
|US6816516||Mar 21, 2001||Nov 9, 2004||Intel Corporation||Error signal generation system|
|US6822979||Jul 6, 2001||Nov 23, 2004||Intel Corporation||External cavity laser with continuous tuning of grid generator|
|US6972577||Sep 10, 2003||Dec 6, 2005||Paul Pfaff||Voltage testing and measurement|
|US7068377 *||Mar 29, 2002||Jun 27, 2006||Georgia-Tech Rsearch Corporation||System and method for surface profiling a target object|
|US7116430 *||Nov 10, 2003||Oct 3, 2006||Georgia Technology Research Corporation||Highly-sensitive displacement-measuring optical device|
|US7206078||Mar 4, 2003||Apr 17, 2007||Attofemto, Inc.||Non-destructive testing system using a laser beam|
|US7268860 *||Sep 20, 2004||Sep 11, 2007||Taitec, Inc.||Color Moiré interferometry|
|US7323889||Feb 3, 2005||Jan 29, 2008||Attofemto, Inc.||Voltage testing and measurement|
|US7400411||Mar 31, 2006||Jul 15, 2008||Attofemto, Inc.||Method for optically testing semiconductor devices|
|US7420687||Sep 28, 2006||Sep 2, 2008||Attofemto, Inc.||Condition assessment system for a structure including a semiconductor material|
|US7440117 *||Apr 17, 2006||Oct 21, 2008||Georgia Tech Research Corp.||Highly-sensitive displacement-measuring optical device|
|US7728958 *||Dec 14, 2007||Jun 1, 2010||Attofemto, Inc.||Condition assessment method for a structure including a semiconductor material|
|US20020163648 *||Mar 29, 2002||Nov 7, 2002||Degertekin Fahrettin L.||Microinterferometer for distance measurements|
|US20030020915 *||Nov 1, 2001||Jan 30, 2003||Schueller Olivier J. A.||Optical modulator/detector based on reconfigurable diffraction grating|
|US20030038949 *||Mar 29, 2002||Feb 27, 2003||Degertekin Fahrettin L.||Microinterferometers with performance optimization|
|US20030057972||Aug 14, 2002||Mar 27, 2003||Paul Pfaff||Voltage testing and measurement|
|US20030067312||Jun 12, 2001||Apr 10, 2003||Paul Pfaff||Voltage testing and measurement|
|US20030184761 *||Mar 29, 2002||Oct 2, 2003||Degertekin Fahrettin L.||System and method for surface profiling|
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|1||Amadesi et al., Holographic Methods for Painting Diagnostics, Applied Optics, 1974.|
|2||Applied Physics Letters (excerpts) Jan. 1969.|
|3||Asundi and Yung, Phase Shifting and Logical Moire, J. Opt. Soc. Am. Oct. 1991.|
|4||B.J. Thompson, "Holographic Particle Sizing Techniques," J. Physics E: Scientific Instruments, vol. 7 pp. 781-788, 1974.|
|5||Banyasz et al., Holographic and Holographic Inferometry with a Near IR Sensitive Photopolymer System Jan. 1997.|
|6||Belyakov et al., Use of Evaporated Lead Sulfide Films in Electrolytic Photography, Soviet Physics-Semiconductors, Jan. 1972.|
|7||Belyakov et al., Use of Evaporated Lead Sulfide Films in Electrolytic Photography, Soviet Physics—Semiconductors, Jan. 1972.|
|8||Brandt, Hologram-Moire Interferometry for Transparent Objects, Applied Optics, Sep. 1967.|
|9||Buse et al., Infrared Holographic Recording in LiNbO3:Cu, Applied Physics, 1994.|
|10||C.N. Kurtz, Holographic Polarization Recording with an Encoded Reference Beam, Applied Physics Letters 14(2), 59-61, 1969.|
|11||Caulfield, A New Approach to Computer Holography, Optics Communciations 1970.|
|12||Colburn et al., Holographic Recording in Thermoplastic at 1.15 um, Appl. Phys., Aug. 1973.|
|13||Courjon et al, Simplifications of the Bilimnear Transfer for Microscopic Binary Objects, J. Opt. Soc. Am. Jul. 1988.|
|14||Creath, Phase Shifting Speckle Interferometry, Applied Optics, Sep. 15, 1985.|
|15||D.N. Goryachev et al., Photographic Process Based on Oxidation-Reduction Reactions on the Surface of Silicon, Soviet Physics-Semiconductors, Feb. 1971, vol. 4, No. 8, Leningrad, USSR.|
|16||D.N. Goryachev et al., Photographic Process Based on Oxidation-Reduction Reactions on the Surface of Silicon, Soviet Physics—Semiconductors, Feb. 1971, vol. 4, No. 8, Leningrad, USSR.|
|17||D.N. Goryachev et al., Photographic Process Based on Oxidation-Reduction Reactions on Thin Films of Lead Sulfide and Selenide, Soviet Physics-Semiconductors, Feb. 1971, vol. 4, No. 8 Leningrad, USSR.|
|18||D.N. Goryachev et al., Photographic Process Based on Oxidation-Reduction Reactions on Thin Films of Lead Sulfide and Selenide, Soviet Physics—Semiconductors, Feb. 1971, vol. 4, No. 8 Leningrad, USSR.|
|19||Daniele et al., "Photoelectric Effect from a Metal Surface: A Revised Theroretical Model" J. Opt. Soc. Am. Oct. 1992.|
|20||Dickson et al., "Holographic Polarization Separation Elements" Applied Optics Aug. 10, 1994.|
|21||Fujimaki et al., 9ps gate Delay Josephson OR Gate with Modified Variable Threshold Logic, JP. J Appl. Phy. Jan. 1985.|
|22||G.B Abdllaev, Formation of Photographic Images on Thin Films of Gallium and Indium Selenides, Soviet Physics-Semiconductors, Dec. 1972, vol. 6, No. 6 Leningrad, USSR.|
|23||G.B Abdllaev, Formation of Photographic Images on Thin Films of Gallium and Indium Selenides, Soviet Physics—Semiconductors, Dec. 1972, vol. 6, No. 6 Leningrad, USSR.|
|24||G.B. Gorlin et al., Possible Use of the Semiconductior-Dielectric Electrophotographic System in Long-Wavelength Semiconductor Photography, Soviet Physics-Semiconductors, Aug. 1972, vol. 6, No. 2, Leningrad, USSR.|
|25||G.B. Gorlin et al., Possible Use of the Semiconductior—Dielectric Electrophotographic System in Long-Wavelength Semiconductor Photography, Soviet Physics—Semiconductors, Aug. 1972, vol. 6, No. 2, Leningrad, USSR.|
|26||Graham Saxby, Practical Display Holography, Chapter 20-"Embossed Holograms" 1988.|
|27||Graham Saxby, Practical Display Holography, Chapter 20—"Embossed Holograms" 1988.|
|28||Grischkowsky et al., Capacitance Free Generation and Detection of Subpicosecond Electrical Pulses on Coplanar Transmission Lines, Journal of Quantum Electronics, Feb. 1988.|
|29||Groh and Marie, Information Input in an Optical Pattern Recognition System Using a Relay Tube based on the Pockets Effect Optics Communications Aug. 1970.|
|30||H.K. Heinrich et al., "Noninvasive sheet charge density probe for integrated silicon devices." Appl. Phys. Lett 48(16) Apr. 21, 1986, p. 1066-1068 with Errata, Appl. Phys. Lett. 48(26) Jun. 30, 1986, p. 1811.|
|31||Handbook of Infrared Optical Materials, Paul Kloceked ed. 1991.|
|32||Hariharan, Simple Laser Inferometer with Variable Shear and Tilt. Applied Optics May 1975.|
|33||Hariharan,Simple Laser Inferometer with viable Shear and Tilt, Applied Optics, May 1975.|
|34||Heggarty and Chevallier "Signal Window Minimum Average Error Algorithm for Computer Generated Holograms" J. Opt. Soc. Am. Mar. 1988.|
|35||Heinrich et al. "Measurement of Real Time Digital Signals in a Silicon Bipolar Junction Transistor Using a Noninvasive Optical Probe" May 6, 2001.|
|36||Heinrich et al. "Noninvasive Sheet Charge Density Probe for Integrated Silicon Devices" Feb. 3, 2005.|
|37||Ichirou Yamaguchi et al., Phase-shifting Digital Holography, Optics Letters, Aug. 14, 1997, vol. 22, No. 16.|
|38||Iniechen et al., Thermoplastic Film Camera for holographic Recording of Extended Objects in Industrial Applications, Applied Optics, Jun. 15, 1982.|
|39||Ivanova et al., "Semiconductor Photographic System Based on High-Resistivity Gallium Arsenide," Soviet Physics-Semiconductors, vol. 6, No. 9, Mar. 1973, pp. 1585-1587.|
|40||Ivanova et al., "Semiconductor Photographic System Based on High-Resistivity Gallium Arsenide," Soviet Physics—Semiconductors, vol. 6, No. 9, Mar. 1973, pp. 1585-1587.|
|41||Jaboda et al., Fractional-Fringe Holographic Plasma Interferometry, Applied Optics, Aug. 1967.|
|42||K.J. Schmidt-Tiedemann, Stress Optical Constants of Germanium, Philips Research Lab Hamburg, Hamburg, Germany, Letters to the Editor, pp. 2058 & 2059.|
|43||Kaminow and Turner, "Electrooptic Light Modulators" Proceedings of the IEEE, vol. 54 pp. 10 Oct. 1966.|
|44||Kewitch et al., Electric Field Multiplexing/Demultiplexing of Volume Holograms in Photorefractive Media, Optics letters, Apr. 1, 1993.|
|45||Knight, Holographic Associative Memory Processor, Applied Optics, May 1975.|
|46||Kolner and Bloom, Electrooptic Sampling in GaAs Integrated Circuits, Journal of Quantum Electronics, Jan. 1986.|
|47||Kotani et al., 5.6 ps Gate Delay All Refractory Josephson OR Gate with Modified Variable Threshold Logic 1985.|
|48||Kristal, Pulsed HF Laser Holographic Interferometry, Applied Optics, Mar. 1975.|
|49||Kurt J. Weingarten et al., Picosecond Optical Sampling of GaAs Integrated Circuits, IEEE Journal of Quantum electronics, Feb. 1988, vol. 24 No. 2.|
|50||L. Ek et al., Detection of the Nodal Lines and the Amplitude of Vibration by Speckle Interferometry, Optics Communications, Feb. 1971, vol. 2 No. 9.|
|51||Lohman and Paris, Computer Generated Spatial Filters for Coherent Optical Data Processing, Applied Optics, Apr. 1968.|
|52||Lohmann, "Reconstruction of Vectorial Wavefronts" Applied Optics, 1967.|
|53||Mandelis, Laser Infrared Photothermal Radiometry of Semiconductors: Principles and Applications, Solid State Electronics 1998.|
|54||Mendlovic, Compact Optical Temporal Processors, Applied Optics, Jul. 10, 1995.|
|55||Nakadate and Saito, Fringe Scanning Speckle-Pattern Interferometry, Applied Optics, Jul. 15, 1985.|
|56||Nassenstein, Superresolution by Diffraction of Subwaves, Optics Communications, Oct. 1970.|
|57||Nikolova et al., Polarization-Preserving Wavefront Reversal by Four Wave Mixing in Photanisotropic Materials, Applied Optics, Apr. 15, 1988.|
|58||O'Regan and Dudderar, "A new Holographic Inferometer for Stress Analysis" Experimental Mechanics Jun. 1971.|
|59||P. Hariharan, "Optical Holigraphy:Principles, Techniques, and Applications", 2nd ed. Cambridge University Press 1996.|
|60||Paritskii and Ryvkin, "Use of Semiconductors in Long-Wavelength Photography" Soviet Physics-Semiconductors Oct. 1970.|
|61||Paritskii and Ryvkin, "Use of Semiconductors in Long-Wavelength Photography" Soviet Physics—Semiconductors Oct. 1970.|
|62||Paritskii et al., Formation of Photographic Images at the Interface Between a Semiconductor and an Active Gas Medium, Soviet Physics-Semiconductors, Jan. 1973.|
|63||Rastogi and Pflug, Holographic Moire Phase Reinforcement Procedure to Obtain Variable Sensitivity Surface Topographic Mapping: Extension to Phase Steping, Optics and Laser Technology 1992, vol. 24(4), p. 203-207.|
|64||Rastogi and Pflug, Novel Concept for Obtaining Continuously Variable Topographic Contour Mapping Using Holographic Interferometry, Applied Optics, Oct. 10, 1990.|
|65||Rioux, Plastic Recording Media for Holography at 10.6 um, Applied Optics, Jul. 1977.|
|66||Roberds, Particle Sizing Using Laser Interferometry, Applied Optics, Jul. 1977.|
|67||Saito et al., Enhancement of a Sensitivity by Stratifying a Photoconductor on Thermoplastic-Photoconductor Media J. Optics 1981.|
|68||Saito et al., Solvent Vapour Method in Thermoplastic Photoconductor Media, J Optics, 1980.|
|69||Saito et al., Solvent Vapour Method in Thermoplastic Photoconductor Media, J. Optics, 1980, pp. 285-292.|
|70||Schmidt-Tiedmann "Experimental Evidence of Birefringence by Free Carriers in Semiconductors" Physical Review Letters Nov. 15, 1961.|
|71||Schweider et al., Homogeneity Testing by Phase Sampling Interferometry, Applied Optics, Sep. 15, 1985.|
|72||Snow and Vandewarker, An Application of Holography to Interference Microscopy, Applied Optics, Mar. 1968.|
|73||Som and Budhiraja, Noise Reductions by Continuous Addition of Subchannel Holograms, Applied Optics, Jul. 1975.|
|74||Soviet Physics-Semiconductors (excerpts), Feb. 4, 1981.|
|75||Soviet Physics—Semiconductors (excerpts), Feb. 4, 1981.|
|76||Srinath and Sarma, Role of Light Ellipse in Photoelasticity and New Methods for Isoclinic-parameter Determination, Experimental Mechanics, Jun. 1971.|
|77||Takashi Nakashima et al., Optical Time Domain Reflectometer with a Laser Diode Operating as Light Emitter/Photodetector, Japanese Journal of Applied Physics, Feb. 1985, vol. 24, No. 2, pp. L135-L136. Letters to the Editor, pp. 2058 & 2059, Feb. 3, 2005.|
|78||Thompson, "Holographic Particle Sizing Techniques" Apr. 15, 2000.|
|79||Tilford, Analytical Procedure for Determining Lengths from Fractional Fringes, Applied Optics, Jul. 1977.|
|80||Todorov et al., Polarization Holography, Applied Optics, Mar. 1985.|
|81||Tull et al., Self-Scanned Digicon: A Digital Image Tube for Astronomical Spectroscopy, Applied Optics, May 1975.|
|82||Vanin, "Influence of the Polarization of the Object and Reference Waves on the Hologram Quality" 1979.|
|83||Vienot et al., Three Dimensional Object Recognition in real Time by Multiplex Spatial Filtering, Optics Communications, Feb. 1971.|
|84||Woerdman "Formation of a Transient Free Carrier Hologram in Si" Optics Communications Oct. 1970.|
|85||Yamaguchi and Takahashi, Elipsometric Method for Separate Measurements of n and d of a Transparent Film, Applied Optics Aug. 1985.|
|86||Yamaguchi and Takahashi, Ellipsometric Method for Separate Measurements of a and d of a Transparent Film, Applied Optics, Aug. 1975.|
|87||Yatagai, Cellular Logic Architectures for Optical Computers, Applied Optics, May 15, 1986.|
|88||Yu, et al., "Direct Measurement of the Refractive Index Change of Silicon with Optically Injected Carriers" Appl. Phys. Lett. 1996.|
|89||Zaidel et al., Plasma Diagnostics by Holography, Soviet Physics-Technical Physics, Mar. 1969.|
|90||Zaidel et al., Plasma Diagnostics by Holography, Soviet Physics—Technical Physics, Mar. 1969.|
|91||Zh. D.N. Goryachev et al., Photographic Process Based on Photo-electric Action of a Surface-Barrier Junction in Silicon, Soviet Physics-Semiconductors, Feb. 1971, vol. 4, No. 8, Leningrad, USSR.|
|92||Zh. D.N. Goryachev et al., Photographic Process Based on Photo-electric Action of a Surface-Barrier Junction in Silicon, Soviet Physics—Semiconductors, Feb. 1971, vol. 4, No. 8, Leningrad, USSR.|
|93||Zhu, Holographic Tomography in Three-Dimensional Photoelasticity Within the Born Approximation, J. Opt. Soc. Am., Nov. 1992.|
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|U.S. Classification||356/457, 356/521|
|International Classification||G01R31/311, G01B9/02, G01B9/021|
|Cooperative Classification||G03H2260/53, G01R31/311, G01R15/241, G01R31/2653, G01R31/2656|
|European Classification||G01R31/311, G01R15/24B|
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