|Publication number||US8048326 B2|
|Application number||US 10/531,469|
|Publication date||Nov 1, 2011|
|Filing date||Oct 31, 2003|
|Priority date||Oct 31, 2002|
|Also published as||US20060048891, WO2004042788A2, WO2004042788A3|
|Publication number||10531469, 531469, PCT/2003/31528, PCT/US/2003/031528, PCT/US/2003/31528, PCT/US/3/031528, PCT/US/3/31528, PCT/US2003/031528, PCT/US2003/31528, PCT/US2003031528, PCT/US200331528, PCT/US3/031528, PCT/US3/31528, PCT/US3031528, PCT/US331528, US 8048326 B2, US 8048326B2, US-B2-8048326, US8048326 B2, US8048326B2|
|Inventors||Hongyu Yue, Hieu A. Lam|
|Original Assignee||Tokyo Electron Limited|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (74), Referenced by (1), Classifications (9), Legal Events (2)|
|External Links: USPTO, USPTO Assignment, Espacenet|
This application claims priority to U.S. Provisional Application Ser. No. 60/422,511, filed Oct. 31, 2002, and is related to application 60/422,510, entitled “Method and apparatus for detecting endpoint,”, filed on Oct. 31, 2002. The contents of these applications are incorporated herein by reference.
1. Field of the Invention
The present invention relates to a method and apparatus for plasma processing a substrate, and more particularly to an in-situ method and apparatus for determining an etch property of a layer on a substrate during a plasma etch process.
2. Discussion of the Background
The fabrication of integrated circuits (IC) in the semiconductor device manufacturing industry typically employs plasma to create and assist surface chemistry necessary to remove material from and to deposit material to a substrate. In general, plasma is formed within a plasma processing system under vacuum conditions by heating electrons to energies sufficient to sustain ionizing collisions with a supplied process gas. Moreover, the heated electrons can have energy sufficient to sustain dissociative collisions and, therefore, a specific set of gases under predetermined conditions (e.g., chamber pressure, gas flow rate, etc.) are chosen to produce a population of charged species and chemically reactive species suitable to the particular process being performed within the processing system (e.g., etching processes during which materials are removed from the substrate or deposition processes during which materials are added to the substrate). During, for example, an etch process, monitoring the etch rate and the spatial uniformity of the etch rate can be very important when determining the state of a plasma processing system and for qualifying such a system following a maintenance interval. In current manufacturing practice, system qualification is usually performed by executing a series of qualification substrates and measuring the resultant etch rate and etch rate uniformity to determine whether to continue production or to perform system maintenance such as a wet clean of the process chamber. Furthermore, the method of determining the etch rate and the uniformity of the etch rate involves substrate cleaving (i.e. sacrifice of the substrate), and SEM (scanning electron microscope) analysis. Using SEM micrographs, feature etch depths can be measured at different locations on the qualification substrates and, when combined with the etch time, information for etch rate and etch rate uniformity can be acquired.
Consequently, significant system production time is expended and qualification substrates are consumed, hence, leading to greater production costs during the tedious qualification process. Moreover, production substrates and qualification substrates can differ substantially and, therefore, lead to erroneous conclusions regarding system qualification. For example, the measured etch rate on qualification substrates does not necessarily reflect the real etch rate on the production wafer.
The present invention provides a method and system for determining an etch property during an etch process, wherein the method advantageously addresses the above-identified shortcomings.
It is an object of the present invention to provide a plasma processing system for etching a layer on a substrate comprising: a process chamber; a diagnostic system coupled to the process chamber and configured to measure at least one endpoint signal; and a controller coupled to the diagnostic system and configured to determine in-situ at least one of an etch rate and an etch rate uniformity of the etching from the endpoint signal and a thickness of the layer, wherein the thickness comprises at least one of a minimum thickness, a maximum thickness, a mean thickness, and a thickness range.
It is another object of the present invention to provide an in-situ method of determining an etch property for etching a layer on a substrate in a plasma processing system comprising: providing a thickness of the layer, wherein the thickness comprises at least one of a minimum thickness, a maximum thickness, a mean thickness, and a thickness range; etching the layer on the substrate; measuring at least one endpoint signal using a diagnostic system coupled to the plasma processing system, wherein the endpoint signal comprises an endpoint transition; and determining the etch rate from a ratio of the thickness to a difference between a time during the endpoint transition and a starting time of the etching.
These and other advantages of the invention will become more apparent and more readily appreciated from the following detailed description of the exemplary embodiments of the invention taken in conjunction with the accompanying drawings, where:
According to an embodiment of the present invention, a plasma processing system 1 is depicted in
According to the illustrated embodiment of the present invention depicted in
Substrate 25 can be, for example, transferred into and out of plasma processing chamber 10 through a slot valve (not shown) and chamber feed-through (not shown) via robotic substrate transfer system where it is received by substrate lift pins (not shown) housed within substrate holder 20 and mechanically translated by devices housed therein. Once substrate 25 is received from substrate transfer system, it is lowered to an upper surface of substrate holder 20.
Substrate 25 can be, for example, affixed to the substrate holder 20 via an electrostatic clamping system. Furthermore, substrate holder 20 can, for example, further include a cooling system including a re-circulating coolant flow that receives heat from substrate holder 20 and transfers heat to a heat exchanger system (not shown), or when heating, transfers heat from the heat exchanger system. Moreover, gas can, for example, be delivered to the back-side of substrate 25 via a backside gas system to improve the gas-gap thermal conductance between substrate 25 and substrate holder 20. Such a system can be utilized when temperature control of the substrate is required at elevated or reduced temperatures. In other embodiments, heating elements, such as resistive heating elements, or thermoelectric heaters/coolers can be included.
Plasma processing chamber 10 can, for example, further comprise a vertical translational device (not shown) surrounded by a bellows (not shown) coupled to the substrate holder 20 and the plasma processing chamber 10, and configured to seal the vertical translational device from the reduced pressure atmosphere in plasma processing chamber 10. Additionally, a bellows shield (not shown) can, for example, be coupled to the substrate holder 20 and configured to protect the bellows from the processing plasma. Substrate holder 20 can, for example, further provide a focus ring (not shown), a shield ring (not shown), and a baffle plate (not shown).
In the illustrated embodiment, shown in
Alternately, RF power is applied to the substrate holder electrode at multiple frequencies. Furthermore, impedance match network 50 serves to increase the transfer of RF power to plasma in plasma processing chamber 10 by minimizing the reflected power. Match network topologies (e.g. L-type, π-type, T-type, etc.) and automatic control methods are well known to those skilled in the art.
With continuing reference to
Vacuum pump system 30 can, for example, include a turbo-molecular vacuum pump (TMP) capable of a pumping speed up to 5000 liters per second (and greater) and a gate valve for throttling the chamber pressure. In conventional plasma processing devices utilized for dry plasma etch, a 1000 to 3000 liter per second TMP is generally employed. TMPs are useful for low pressure processing, typically less than 50 mTorr. At higher pressures, the TMP pumping speed falls off dramatically. For high pressure processing (i.e., greater than 100 mTorr), a mechanical booster pump and dry roughing pump can be used. Furthermore, a device for monitoring chamber pressure (not shown) can be coupled to the plasma processing chamber 10. The pressure measuring device can be, for example, a Type 628B Baratron absolute capacitance manometer commercially available from MKS Instruments, Inc. (Andover, Mass.).
Controller 14 comprises a microprocessor, memory, and a digital I/O port capable of generating control signals sufficient to communicate and activate inputs to plasma processing system 1 as well as monitor outputs from plasma processing system 1. Moreover, controller 14 can be coupled to and can exchange information with RF generator 40, impedance match network 50, the gas injection system (not shown), vacuum pump system 30, as well as the backside gas delivery system (not shown), the substrate/substrate holder temperature measurement system (not shown), and the electrostatic clamping system (not shown). For example, a program stored in the memory can be utilized to activate the inputs to the aforementioned components of plasma processing system 1 according to a stored process recipe. One example of controller 14 is a DELL PRECISION WORKSTATION 610™, available from Dell Corporation, Austin, Tex.
The diagnostic system 12 can include an optical diagnostic subsystem. The optical diagnostic subsystem can comprise a detector such as a (silicon) photodiode or a photomultiplier tube (PMT) for measuring the total light intensity emitted from the plasma. The diagnostic system 12 can further include an optical filter such as a narrow-band interference filter. In an alternate embodiment, the diagnostic system 12 can include at least one of a line CCD (charge coupled device), a CID (charge injection device) array, and a light dispersing device such as a grating or a prism. Additionally, diagnostic system 12 can include a monochromator (e.g., grating/detector system) for measuring light at a given wavelength, or a spectrometer (e.g., with a rotating grating) for measuring the light spectrum such as, for example, the device described in U.S. Pat. No. 5,888,337. Furthermore, diagnostic system 12 can also comprise a processor coupled to the optical diagnostic subsystem and to the controller 14 for controlling the operation of the optical diagnostic system.
For example, diagnostic system 12 can include a high resolution OES sensor from Peak Sensor Systems, or Verity Instruments, Inc. Such an OES sensor has a broad spectrum that spans the ultraviolet (UV), visible (VIS) and near infrared (NIR) light spectrums. The resolution is approximately 1.4 Angstroms, that is, the sensor is capable of collecting 5550 wavelengths from 240 to 1000 nm. The sensor is equipped with high sensitivity miniature fiber optic UV-VIS-NIR spectrometers which are, in turn, integrated with 2048 pixel linear CCD arrays.
The spectrometers receive light transmitted through single and bundled optical fibers, where the light output from the optical fibers is dispersed across the line CCD array using a fixed grating. Similar to the configuration described above, light emitting through an optical vacuum window is focused onto the input end of the optical fibers via a convex spherical lens. Three spectrometers, each specifically tuned for a given spectral range (UV, VIS and NIR), form a sensor for a process chamber. Each spectrometer includes an independent A/D converter. And lastly, depending upon the sensor utilization, a full emission spectrum can be recorded every 0.1 to 1.0 seconds.
Alternately, diagnostic system 12 can comprise an electrical diagnostic subsystem that can include at least one of a current and/or voltage probe for monitoring an electrical property of the plasma processing system 1, a power meter, and a spectrum analyzer. For example, plasma processing systems often employ RF power to form plasma, in which case, a RF transmission line, such as, for instance, a coaxial cable or structure, is employed to couple RF energy to the plasma through an electrical coupling element (i.e. inductive coil, electrode, etc.). Electrical measurements using, for example, a current-voltage probe, can be exercised anywhere within the electrical (RF) circuit, such as within a RF transmission line. Furthermore, the measurement of an electrical signal, such as a time trace of voltage or current, permits the transformation of the signal into frequency space using discrete Fourier series representation (assuming a periodic signal). Thereafter, the Fourier spectrum (or for a time varying signal, the frequency spectrum) can be monitored and analyzed to characterize the state of plasma processing system 1. An endpoint signal can be ascertained from a voltage signal, a current signal, an impedance signal, or a harmonic signal thereof. A voltage-current probe can be, for example, a device as described in detail in pending U.S. application Ser. No. 60/259,862 filed on Jan. 8, 2001, or in U.S. Pat. No. 5,467,013 issued to Sematech, Inc. on Nov. 14, 1995; each of which is incorporated herein by reference in its entirety.
In alternate embodiments, diagnostic system 12 can comprise a broadband RF antenna useful for measuring a radiated RF field external to plasma processing system 1. An endpoint signal can be ascertained from a radiated signal, or a harmonic signal thereof. A commercially available broadband RF antenna is a broadband antenna such as Antenna Research Model RAM-220 (0.1 MHz to 300 MHz). The use of a broadband RF antenna is described in greater detail in pending U.S. application No. 60/393,101 filed on Jul. 3, 2002, pending U.S. application No. 60/393,103 filed on Jul. 3, 2002, and pending U.S. application No. 60/393,105 filed on Jul. 3, 2002; each of which is incorporated herein by reference in their entirety.
In alternate embodiments, an endpoint signal can be ascertained from a diagnostic system 12 coupled to an impedance match network to monitor capacitor settings in the impedance match network. The impedance match network can be, for example, impedance match network 50 in
In the illustrated embodiment, shown in
In the illustrated embodiment, shown in
In the illustrated embodiment, shown in
Alternately, the plasma can be formed using electron cyclotron resonance (ECR). In yet another embodiment, the plasma is formed from the launching of a Helicon wave. In yet another embodiment, the plasma is formed from a propagating surface wave. Each plasma source described above is well known to those skilled in the art.
In the following discussion, an in-situ method of determining an etch rate and an etch rate uniformity for etching a layer on a substrate in plasma processing system 1 is presented using optical emission spectroscopy (OES) as an example. However, the methods discussed are not to be limited in scope by this exemplary presentation.
Referring again to
In an embodiment of the present invention, an etch rate for a layer of material comprising a thickness T can be determined from a ratio of the thickness T to the time duration between the start of the etch process (i.e. time t0=0 in the signal endpoint 100) and a time t during the endpoint transition 110. In this case,
where E is the etch rate.
In another embodiment of the present invention, an etch rate for a layer of material comprising a minimum thickness Tmin, a maximum thickness Tmax, and a mean thickness Tmean can be determined from the ratio of the minimum layer thickness to the time duration beginning with the start of the etch process (i.e. time t0=0 in the endpoint signal 100) to the start time 112 of the endpoint transition 110 (see
where E is the etch rate, t0 is the starting time of the etch process, and t112 is the starting time 112 of the endpoint transition 110.
In another embodiment of the present invention, an etch rate for a layer of material comprising a minimum thickness Tmin, a maximum thickness Tmax, and a mean thickness Tmean can be determined from the ratio of the maximum layer thickness to the time duration beginning with the start of the etch process (i.e. time t0=0 in the endpoint signal 100) to the end time 114 of the endpoint transition 110 (see
where E is the etch rate, t0 is the starting time of the etch process, and t114 is the end time 114 of the endpoint signal 110.
In another embodiment of the present invention, an etch rate for a layer of material comprising a minimum thickness Tmin, a maximum thickness Tmax, and a mean thickness Tmean can be determined from the ratio of the mean layer thickness to the time duration beginning with the start of the etch process (i.e. time t0=0 in the endpoint signal 100) to the inflection time 116 of the endpoint transition 110 corresponding to the inflection point in endpoint transition 110 or the maximum (in negative slope) of the first derivative 118 of the endpoint signal 100 (see
where E is the etch rate, t0 is the starting time of the etch process, and t116 is the inflection time 116 of the endpoint transition 110 as described above.
In another embodiment of the present invention, an etch rate uniformity for a layer of material comprising a minimum thickness Tmin, a maximum thickness Tmax, a mean thickness Tmean, and a thickness range ΔT can be determined from the maximum etch rate Emax, the minimum etch rate Emin, the maximum thickness, the thickness range, and the time span Δt (indicated as 120 in
where ΔE is the etch rate uniformity. Since EmaxEmin˜E2, equation (5) can be simplified as
In another embodiment of the present invention, an etch rate for a layer of material comprising a minimum thickness Tmin, a maximum thickness Tmax, and a mean thickness Tmean can be determined from two or more signals from diagnostic system 12, such as endpoint signals 100A and 100B shown in
where E is the etch rate, t0 is the starting time of the etch process, and t142 is the time corresponding to the negative slope maximum 142 in differential signal 140. Moreover, an etch rate uniformity can be determined from equation (6) as described above.
As described above, the endpoint signal, as depicted in
In step 230, at least one endpoint signal is measured using a diagnostic system coupled to a process chamber, wherein the process chamber is utilized to facilitate the process prescribed for the plasma processing system. The diagnostic system can comprise at least one of an optical diagnostic subsystem and an electrical diagnostic subsystem. For example, the optical diagnostic subsystem can comprise at least one of a detector, an optical filter, a grating, a prism, a monochromator, and a spectrometer. Additionally, for example, the electrical diagnostic subsystem can comprise at least one of a voltage probe, a current probe, a spectrum analyzer, an external RF antenna, a power meter, and a capacitor setting monitor. The at least one endpoint signal can comprise an endpoint transition as described above. Furthermore, the endpoint transition can comprise a starting time, an end time, and an inflection time. Additionally, for example, the at least one endpoint signal can comprise a spectral irradiance of light emitted from the plasma.
In step 240, an etch rate for the etching of the layer on the substrate in the plasma processing system is determined using the at least one endpoint signal and the thickness of the layer. For example, the etch rate can be determined from a ratio of the minimum thickness of the layer to the difference in time between the starting time of the endpoint transition and the starting time of the layer etching (see equation (2)). Alternately, the etch rate can be determined from a ratio of the maximum thickness of the layer to the difference in time between the end time of the endpoint transition and the starting time of the layer etching (see equation (3)). Alternately, the etch rate can be determined from a ratio of the mean thickness of the layer to the difference in time between the inflection time of the endpoint transition and the starting time of the layer etching (see equation (4)). Alternately, the at least one endpoint signal can comprise two endpoint signals, namely, a first endpoint signal and a second endpoint signal. A ratio signal can be determined from the first and second endpoint signal by performing a ratio of the two signals at each instant in time. The ratio signal can further comprise an endpoint transition, wherein the endpoint transition comprises a starting time, an end time, and an inflection time. Furthermore, the etch rate can be determined from the ratio signal using any one of the above described methods in equations (2) through (4), or (7).
The in-situ method described in flowchart 200 can further comprise step 250 wherein a time duration of the endpoint transition is determined. For example, the time duration of the endpoint transition can be determined from the first derivative of an endpoint signal as indicated by 120 in
In step 260, an etch rate uniformity is determined from the etch rate determined in step 240, the time duration of the endpoint transition determined in step 250, and the thickness range of the layer etched. For example, the etch rate uniformity can be determined utilizing equation (6).
Although only certain exemplary embodiments of this invention have been described in detail above, those skilled in the art will readily appreciate that many modifications are possible in the exemplary embodiments without materially departing from the novel teachings and advantages of this invention. Accordingly, all such modifications are intended to be included within the scope of this invention.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US4847792 *||May 4, 1987||Jul 11, 1989||Texas Instruments Incorporated||Process and apparatus for detecting aberrations in production process operations|
|US5094712 *||Oct 9, 1990||Mar 10, 1992||Micron Technology, Inc.||One chamber in-situ etch process for oxide and conductive material|
|US5198072 *||Jul 6, 1990||Mar 30, 1993||Vlsi Technology, Inc.||Method and apparatus for detecting imminent end-point when etching dielectric layers in a plasma etch system|
|US5200023 *||Aug 30, 1991||Apr 6, 1993||International Business Machines Corp.||Infrared thermographic method and apparatus for etch process monitoring and control|
|US5337144 *||May 5, 1992||Aug 9, 1994||Applied Materials, Inc.||Etch rate monitor using collimated light and method of using same|
|US5372673 *||Jan 25, 1993||Dec 13, 1994||Motorola, Inc.||Method for processing a layer of material while using insitu monitoring and control|
|US5445705 *||Jun 30, 1994||Aug 29, 1995||International Business Machines Corporation||Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process|
|US5450205 *||May 28, 1993||Sep 12, 1995||Massachusetts Institute Of Technology||Apparatus and method for real-time measurement of thin film layer thickness and changes thereof|
|US5467013||Dec 7, 1993||Nov 14, 1995||Sematech, Inc.||Radio frequency monitor for semiconductor process control|
|US5489361 *||Dec 13, 1994||Feb 6, 1996||International Business Machines Corporation||Measuring film etching uniformity during a chemical etching process|
|US5500073 *||May 8, 1995||Mar 19, 1996||International Business Machines Corporation||Real time measurement of etch rate during a chemical etching process|
|US5501766 *||Jun 30, 1994||Mar 26, 1996||International Business Machines Corporation||Minimizing overetch during a chemical etching process|
|US5503707 *||Sep 22, 1993||Apr 2, 1996||Texas Instruments Incorporated||Method and apparatus for process endpoint prediction based on actual thickness measurements|
|US5573624 *||Jun 30, 1994||Nov 12, 1996||International Business Machines Corporation||Chemical etch monitor for measuring film etching uniformity during a chemical etching process|
|US5582746 *||Jun 30, 1994||Dec 10, 1996||International Business Machines Corporation||Real time measurement of etch rate during a chemical etching process|
|US5658418 *||Sep 29, 1995||Aug 19, 1997||International Business Machines Corporation||Apparatus for monitoring the dry etching of a dielectric film to a given thickness in an integrated circuit|
|US5694207 *||Dec 9, 1996||Dec 2, 1997||Taiwan Semiconductor Manufacturing Company, Ltd.||Etch rate monitoring by optical emission spectroscopy|
|US5888337||May 17, 1996||Mar 30, 1999||Tokyo Electron Limited||Endpoint detector for plasma etching|
|US5928532 *||Nov 3, 1997||Jul 27, 1999||Tokyo Electron Limited||Method of detecting end point of plasma processing and apparatus for the same|
|US5972796 *||Dec 10, 1997||Oct 26, 1999||Texas Instruments Incorporated||In-situ barc and nitride etch process|
|US6054333 *||Oct 14, 1997||Apr 25, 2000||University Of Houston||Real time etch measurements and control using isotopes|
|US6081334 *||Apr 17, 1998||Jun 27, 2000||Applied Materials, Inc||Endpoint detection for semiconductor processes|
|US6104487 *||Dec 12, 1997||Aug 15, 2000||Texas Instruments Incorporated||Plasma etching with fast endpoint detector|
|US6129807 *||Oct 6, 1997||Oct 10, 2000||Applied Materials, Inc.||Apparatus for monitoring processing of a substrate|
|US6172756 *||Dec 11, 1998||Jan 9, 2001||Filmetrics, Inc.||Rapid and accurate end point detection in a noisy environment|
|US6197116 *||Aug 29, 1997||Mar 6, 2001||Fujitsu Limited||Plasma processing system|
|US6204922 *||Dec 11, 1998||Mar 20, 2001||Filmetrics, Inc.||Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample|
|US6238937 *||Jan 26, 2000||May 29, 2001||Advanced Micro Devices, Inc.||Determining endpoint in etching processes using principal components analysis of optical emission spectra with thresholding|
|US6379980 *||Jul 26, 2000||Apr 30, 2002||Advanced Micro Devices, Inc.||Method and apparatus for monitoring material removal tool performance using endpoint time removal rate determination|
|US6390019 *||Jun 11, 1998||May 21, 2002||Applied Materials, Inc.||Chamber having improved process monitoring window|
|US6406924 *||Apr 5, 1999||Jun 18, 2002||Applied Materials, Inc.||Endpoint detection in the fabrication of electronic devices|
|US6419846 *||Jan 26, 2000||Jul 16, 2002||Advanced Micro Devices, Inc.||Determining endpoint in etching processes using principal components analysis of optical emission spectra|
|US6450683||Apr 25, 2000||Sep 17, 2002||Winbond Electronics Corp.||Optical temperature measurement as an in situ monitor of etch rate|
|US6559942 *||Mar 8, 2001||May 6, 2003||Applied Materials Inc.||Monitoring substrate processing with optical emission and polarized reflected radiation|
|US6564114 *||Jan 26, 2000||May 13, 2003||Advanced Micro Devices, Inc.||Determining endpoint in etching processes using real-time principal components analysis of optical emission spectra|
|US6582618 *||Jan 26, 2000||Jun 24, 2003||Advanced Micro Devices, Inc.||Method of determining etch endpoint using principal components analysis of optical emission spectra|
|US6650426 *||Jul 12, 2000||Nov 18, 2003||Sc Technology, Inc.||Endpoint determination for recess etching to a precise depth|
|US6669810 *||Oct 14, 1998||Dec 30, 2003||Sumitomo Metal Industries, Ltd.||Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof|
|US6673199 *||Mar 7, 2001||Jan 6, 2004||Applied Materials, Inc.||Shaping a plasma with a magnetic field to control etch rate uniformity|
|US6675137 *||Jan 26, 2000||Jan 6, 2004||Advanced Micro Devices, Inc.||Method of data compression using principal components analysis|
|US6677246 *||Dec 6, 2001||Jan 13, 2004||Scientific Systems Research Ltd.||Endpoint detection in the etching of dielectric layers|
|US6712927 *||Jul 5, 2000||Mar 30, 2004||Applied Materials Inc.||Chamber having process monitoring window|
|US6745095 *||Oct 4, 2000||Jun 1, 2004||Applied Materials, Inc.||Detection of process endpoint through monitoring fluctuation of output data|
|US6805810 *||Mar 27, 2002||Oct 19, 2004||Sandia Corporation||Method & apparatus for monitoring plasma processing operations|
|US6824813 *||Apr 6, 2000||Nov 30, 2004||Applied Materials Inc||Substrate monitoring method and apparatus|
|US6855567 *||May 31, 2000||Feb 15, 2005||Lam Research Corporation||Etch endpoint detection|
|US6888639 *||Sep 24, 2001||May 3, 2005||Applied Materials, Inc.||In-situ film thickness measurement using spectral interference at grazing incidence|
|US6908846 *||Mar 27, 2003||Jun 21, 2005||Lam Research Corporation||Method and apparatus for detecting endpoint during plasma etching of thin films|
|US6919279 *||Oct 8, 2002||Jul 19, 2005||Novellus Systems, Inc.||Endpoint detection for high density plasma (HDP) processes|
|US6977184 *||Oct 31, 2001||Dec 20, 2005||Lam Research Corporation||Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring|
|US7297287 *||Mar 25, 2002||Nov 20, 2007||Tokyo Electron Limited||Method and apparatus for endpoint detection using partial least squares|
|US7297560 *||Oct 31, 2003||Nov 20, 2007||Tokyo Electron Limited||Method and apparatus for detecting endpoint|
|US7462335 *||Sep 30, 2002||Dec 9, 2008||Tokyo Electron Limited||Optical monitoring and control system and method for plasma reactors|
|US20020048019 *||Mar 8, 2001||Apr 25, 2002||Zhifeng Sui||Monitoring substrate processing with optical emission and polarized reflected radiation|
|US20020186381 *||Jul 19, 2002||Dec 12, 2002||Suchitra Subrahmanyan||Method and apparatus for detecting the thickness of copper oxide|
|US20030036282||Sep 13, 2002||Feb 20, 2003||Tatehito Usui||Etching end point judging device|
|US20030043383 *||Sep 6, 2001||Mar 6, 2003||Tatehito Usui||Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed|
|US20030119215 *||Dec 21, 2001||Jun 26, 2003||Petrucci Joseph Louis||Method and system for determining a performance of plasma etch equipment|
|US20030136663 *||Jun 6, 2002||Jul 24, 2003||Smith Michael Lane||Method and apparatus for monitoring plasma processing operations|
|US20040018127 *||Jun 11, 2003||Jan 29, 2004||Tokyo Electron Limited||Wafer bias drive for plasma source|
|US20040063328 *||Oct 1, 2002||Apr 1, 2004||Applied Materials, Inc.||Method of etching shaped features on a substrate|
|US20040080050 *||Mar 27, 2003||Apr 29, 2004||Lam Research Corporation||Method and apparats for detecting endpoint during plasma etching of thin films|
|US20040117054 *||Dec 13, 2002||Jun 17, 2004||Lam Research Corporation||Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection|
|US20040206621 *||Jan 16, 2004||Oct 21, 2004||Hongwen Li||Integrated equipment set for forming a low K dielectric interconnect on a substrate|
|US20050016947 *||Mar 25, 2002||Jan 27, 2005||David Fatke||Method and apparatus for endpoint detection using partial least squares|
|US20050062982 *||Nov 2, 2004||Mar 24, 2005||Tatehito Usui||Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed|
|US20050082482 *||Mar 17, 2003||Apr 21, 2005||Audunn Ludviksson||Process monitoring using infrared optical diagnostics|
|US20060035395 *||Aug 12, 2005||Feb 16, 2006||Venugopal Vijayakumar C||Process endpoint detection method using broadband reflectometry|
|US20060132798 *||Jan 27, 2006||Jun 22, 2006||Tatehito Usui||Method and apparatus for determining endpoint of semiconductor element fabricating process|
|US20060189006 *||Jan 27, 2006||Aug 24, 2006||Matsushita Electric Industrial Co., Ltd.||Method and apparatus for detecting end point|
|US20100055807 *||Mar 4, 2010||Axcelis Technologies, Inc.||Plasma ashing apparatus and endpoint detection process|
|USRE39145 *||Jun 26, 2003||Jun 27, 2006||Lam Research Corporation||Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source|
|JP2002170812A||Title not available|
|JP2002280368A||Title not available|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|WO2014062886A1 *||Oct 17, 2013||Apr 24, 2014||Tokyo Electron Limited||Plasma etching endpoint detection using multivariate analysis|
|U.S. Classification||216/60, 216/61|
|International Classification||H01J37/32, G01L21/30, C23F1/00|
|Cooperative Classification||H01J37/32935, H01J37/32963|
|European Classification||H01J37/32S4, H01J37/32S4F|
|May 24, 2005||AS||Assignment|
Owner name: TOKYO ELECTRON LIMITED, JAPAN
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:YUE, HONGYU;LAM, HIEU A.;REEL/FRAME:016595/0136
Effective date: 20050322
|Apr 15, 2015||FPAY||Fee payment|
Year of fee payment: 4