|Publication number||US8169041 B2|
|Application number||US 12/092,439|
|Publication date||May 1, 2012|
|Filing date||Nov 6, 2006|
|Priority date||Nov 10, 2005|
|Also published as||DE102005053765A1, US8432007, US20090001553, US20110186943, WO2007054070A1|
|Publication number||092439, 12092439, PCT/2006/1945, PCT/DE/2006/001945, PCT/DE/2006/01945, PCT/DE/6/001945, PCT/DE/6/01945, PCT/DE2006/001945, PCT/DE2006/01945, PCT/DE2006001945, PCT/DE200601945, PCT/DE6/001945, PCT/DE6/01945, PCT/DE6001945, PCT/DE601945, US 8169041 B2, US 8169041B2, US-B2-8169041, US8169041 B2, US8169041B2|
|Inventors||Wolfgang Pahl, Anton Leidl, Stefan Seitz, Hans Krueger, Alois Stelzl|
|Original Assignee||Epcos Ag|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (100), Non-Patent Citations (111), Referenced by (6), Classifications (15), Legal Events (2) |
|External Links: USPTO, USPTO Assignment, Espacenet|
MEMS package and method for the production thereof
US 8169041 B2
A micro electro-mechanical systems (MEMS) package is described herein. The package includes a carrier substrate having a top side, a MEMS chip mounted on the top side of the carrier substrate, and at least one chip component on or above the top side of the carrier substrate or embedded in the carrier substrate. The package also includes a thin metallic shielding layer covering the MEMS chip and the chip component and forming a seal with the top side of the carrier substrate.
1. A micro electro-mechanical systems (MEMS) package, comprising:
a carrier substrate having a top side,
a MEMS chip mounted on the top side of the carrier substrate, the MEMS chip having an active side facing the carrier substrate and a passive side facing away from the carrier substrate, the passive side including a recess formed in the MEMS chip;
a cover in contact with a portion of the passive side of the MEMS chip and covering the recess in the passive side of the MEMS chip to enclose a back volume of the MEMS chip;
at least one chip component on the top side of the carrier substrate beside the MEMS chip, and
a thin metallic shielding layer covering the MEMS chip and the at least one chip component and forming a seal with the top side of the carrier substrate,
wherein the MEMS chip and the at least one chip component are electrically connected to each other or with external contacts on the carrier substrate.
2. The MEMS package of claim 1, further comprising an enclosure between the metallic shielding layer and the MEMS chip.
3. The MEMS package of claim 2, wherein the enclosure comprises a laminate film applied over a large surface area above the MEMS chip and the at least one chip component, the laminate film forming a seal with the carrier substrate.
4. The MEMS package of claim 1, wherein the cover includes a recess facing the MEMS chip and encloses a cavity above the MEMS chip.
5. The MEMS package of claim 1, wherein the at least one chip component is on the MEMS chip under the shielding layer.
6. The MEMS package of claim 2, wherein the enclosure includes a perforation above the MEMS chip.
7. The MEMS package of claim 2, wherein the enclosure comprises a rigid cap on the carrier substrate and forms with the carrier substrate a cavity, wherein the MEMS chip is in the cavity and wherein the shielding layer is directly on the rigid cap and on the carrier substrate in an edge region around the rigid cap.
8. The MEMS package of claim 1
, wherein the MEMS chip includes an active side comprising MEMS structures, and a central recess in a passive side opposite the active side, the passive side facing toward the carrier substrate,
wherein a layer thickness of the MEMS chip is reduced in the central recess or the MEMS structures are exposed in the recess.
9. The MEMS package of claim 8, wherein the MEMS chip includes electrical via contacts, and the MEMS structures are electrically connected to terminal surfaces on the carrier substrate by the electrical via contacts.
10. The MEMS package of claim 8
the MEMS chip is bonded to the carrier substrate on the passive side, and
the active side includes electrical contact surfaces electrically connected by bonding wires to terminal surfaces on the carrier substrate.
11. The MEMS package of claim 8
the active side of the MEMS chip faces toward the carrier substrate, and corresponding electrical contact surfaces on the active side of the MEMS structures and terminal surfaces on the carrier substrate are facing each other and are electrically and mechanically connected.
12. The MEMS package of claim 1, wherein the chip component is under the MEMS chip on the top side of the carrier substrate, and is electrically connected to terminal surfaces on the carrier substrate.
13. The MEMS package of claim 1, wherein the chip component is under the MEMS chip and is electrically and mechanically connected to the MEMS chip.
14. The MEMS package of claim 11, further comprising a joint between the MEMS chip and the carrier substrate sealed by a joint seal.
15. The MEMS package of claim 1, wherein the shielding layer is on the MEMS chip tightly contacts the cover, side surfaces of the MEMS chip and the top side of the carrier substrate.
16. The MEMS package of claim 1, wherein: the MEMS chip and the at least one chip component are one next to the other and are electrically connected to terminal surfaces on the carrier substrate, the enclosure seals the MEMS chip and the chip component to the carrier substrate separately, and the shielding layer covers the MEMS chip and the chip component.
17. The MEMS package of claim 16
the active side of the MEMS chip is electrically and mechanically connected to the carrier substrate by one or more of bumps and electrically conductive adhesive,
the cover is on the passive side of the MEMS chip facing away from the top side of the carrier substrate,
the MEMS chip, the cover, and the at least one chip component are covered with the laminate film, and
the shielding layer is on an outward surface of the laminate film.
18. The MEMS package of claim 1
the MEMS chip comprises a microphone, a perforation is provided in one or more of the enclosure and the shielding layer, or the MEMS chip is above a sound opening in the carrier substrate, and
the MEMS package further comprises a closed back volume on a side of the MEMS chip opposite the sound opening or the perforation.
19. The MEMS package of claim 18
the MEMS chip and the at least one chip component are mounted one next to the other on the carrier substrate,
the cavity is formed in the carrier substrate under the at least one chip component, and
the cavity is connected to the closed back volume under the MEMS chip.
20. The MEMS package of claim 17, wherein the electrically conductive adhesive has an anisotropic conductivity perpendicular to an adhesive layer.
21. The MEMS package of claim 1, wherein the carrier substrate comprises a diffusion-resistant material and the shielding layer binds tightly to the diffusion-resistant material circumferentially.
CROSS REFERENCE TO RELATED APPLICATIONS
Pursuant to 35 USC §120, this application claims the benefit PCT/DE2006/001945 filed Nov. 6, 2006 which claims the benefit of German Patent Application No. 102005053765.0 filed Nov. 10, 2005. Each of these applications is incorporated by reference in its entirety.
There is an enormous pressure to miniaturize the electronic components of mobile communications devices. This applies especially for MEMS components (micro electro-mechanical systems), such as, e.g., microphones, which have a relatively high-profile design and thus represent limitations for the device design of mobile communications devices.
From the published US Patent Application No. 2005/0185812A1, a microphone housing is known in which a microphone constructed as a MEMS component is arranged together with a semiconductor chip on a base plate, and in which the MEMS package comprises a common cap with which the MEMS component is covered against the base plate. The base plate can have a sound entrance opening in its bottom side opposite the cap, so that the entire component can be soldered onto the printed circuit board reverse side, which faces away from the sound source. For this purpose, a corresponding hole must be provided in the printed circuit board. In another construction, the sound entrance opening can be provided in a conventional way on the top side in the cap, so that the component with the base plate can be applied onto the surface of the printed circuit board facing the sound source.
For mobile communications devices, additional problems result due to the small distance of the antenna from the electronic components, which are therefore exposed to electromagnetic noise that can negatively influence the functioning of the components.
The task of the present invention is to specify a MEMS package of smaller structural size which constitutes a secure enclosure for a MEMS component, which better shields electromagnetic interference, and at the same time is easy to produce.
The MEMS package according to the invention is built on a mechanically stable carrier substrate. A MEMS chip is mounted on its top side. Likewise, at least one chip component is arranged on or above the top side of the carrier substrate or embedded in this substrate. A metallic shielding layer covers the MEMS chip and the chip component and forms a seal with the top side of the carrier substrate in an annular, closed peripheral region. The MEMS chip and chip component have electrical contacts which are connected electrically to external contacts on a surface of the carrier substrate.
The shielding layer is a thin metallization layer which can be deposited directly onto the MEMS chip and/or the chip component. In addition, however, an enclosure can be provided at least between the MEMS chip and shielding layer. The shielding layer is preferably electrically connected at one or more positions to suitable electrically conductive structures of the carrier substrate. Such structures can be ground potential, additional shielding surfaces, or external connections.
A MEMS package is obtained which has only a minimal overall height. The shielding layer guarantees electromagnetic shielding, which allows the use of the MEMS package in an environment in which the irradiation of electromagnetic waves is to be taken into account. Such an environment can be, for example, the interior of a mobile radio terminal device.
The MEMS chip realizes an arbitrary sensor or actuator function and can be realized in the form of a structured thin-film construction on a base chip used as a carrier. As an alternative or in addition to the thin-film construction, the MEMS chip itself can be structured and can optionally even be monolithic for realizing the sensor or actuator function. This side of the MEMS chip is designated below as the active side. The MEMS chip has metallic contact surfaces by means of which it can be connected electrically. The contact surfaces can be arranged on the active side or on the opposite “passive” side of the base chip. In the latter case, the electrical connection of the contact surfaces to electrically conductive structures of the active side can be performed by means of a connection running through the base chip. This can be constructed as a via contact, that is, as a hole or borehole, which is filled with an electrically conductive material, and in particular, with metal. However, it is also possible to use as the base chip a semiconductor chip that is set to be electrically conductive in the region of the via contact.
The external contacts of the MEMS package are located on one surface of the carrier substrate, preferably on the surface opposite the MEMS chip. The external contacts are connected in an electrically conductive way to the terminal surfaces of the MEMS chip and/or to other circuit elements. Preferably, the MEMS chip is connected only indirectly to the external contacts by means of other circuit elements, such as, e.g., by means of the chip component.
The chip component is connected either directly to the carrier substrate, or to terminal surfaces provided on this substrate and these terminal surfaces are connected to the external contacts of the carrier substrate. However, it is also possible to connect the chip component to the MEMS chip electrically and to provide for both connected components a common connection to the terminal surfaces of the carrier substrate.
The carrier substrate can have electrical feedthroughs, which are similarly constructed as via contacts. The carrier substrate can have a one-layer or multi-layer construction. It can include ceramic or plastic material and in the interior it can have one or more metallization layers, which are separated from each other by electrically insulating layers but which are connected to each other by means of the mentioned feedthroughs. In this way, a circuitry structure can be realized in the carrier substrate and connected to the MEMS chip and/or the chip component. The circuitry structure can also include passive components, which are constructed from structured metallization layers and which realize capacitors, inductors, or resistors.
Preferably, the one or more chip components compose an integrated circuit which interacts with the function of the MEMS chip. For example, the integrated circuit can be a control, evaluation, or amplification circuit or some other circuit arrangement used for operating the MEMS chip.
If the MEMS chip is not suitable for direct coating with a metallic shielding layer or if an embedded cavity, e.g., an acoustically active volume, is to be realized specifically, then an enclosure is arranged between the shielding layer and the MEMS chip. The enclosure can form a seal with the top side of the carrier substrate and can completely enclose the MEMS chip between itself and the carrier substrate. Such a large surface area enclosure can be realized, for example, in the form of a laminate film. This can be applied in such a way that it lies directly on the surfaces of the MEMS chip and carrier substrate or leaves intermediate spaces in some positions.
The laminate film is preferably a one-layer or multi-layer finished film that is converted into a hardened state during or after application, which can be effected, for example, by means of lamination. The laminate film, however, can also be generated by film casting directly on the surface of the carrier substrate and MEMS chip. In this case, a later hardening of the plastic material is also effected. However, it is also possible to generate the enclosure in a film form by means of a layer generation process, for example, by casting or spraying or by means of dip coating.
The enclosure, however, does not have to form a seal with the carrier substrate and can lie on or be attached to the top side of the MEMS chip, for example, only in the form of a cover. In this case, the cover can also be a plastic layer or can be constructed from a thick plastic film. Preferably, however, the MEMS chip is covered with a mechanically stable and especially rigid cover, which has a thermal expansion coefficient adapted to the material of the MEMS chip or the base chip. From this standpoint, materials such as glass, quartz, or semiconductor layers are suitable.
Such a cover can be adhered, bonded, soldered, or connected by means of bumps.
For certain functions of the MEMS chip it is necessary to provide above the MEMS chip an adequately sized recess, which is used for forming a back-side or reference volume or for exposing structures lying deeper in the MEMS chip. For this purpose it is possible to provide, in the enclosure formed as a cover, a recess that encloses together with the MEMS chip a cavity facing toward the MEMS chip.
In another construction, for enclosure of the MEMS chip the chip component is used as the cover, which lies on and is connected to the MEMS chip. The connection can include an electrical and a mechanical connection, wherein a flip-chip arrangement is preferred which realizes both connections in one step or with the same structure. This arrangement has the advantage that a simple electrical connection between the chip component and MEMS chip can be produced, that the MEMS chip is protected by the chip component, and that the chip component used as a cover allows the direct application of the shielding layer. Thus, overall an extremely space-saving arrangement is achieved, which is especially preferred with respect to the miniaturization of components.
The enclosure, however, can also be constructed as a cap. This has a contact surface for a bottom layer only in a peripheral edge region and rises therebetween above the contact level, so that sitting on flat bottom layers it can enclose underneath it a cavity. The cap is made from a rigid, electrically non-conductive material, for example, plastic. It is set on the carrier substrate and can be attached there, for example, by means of bonding or surface fusing. The MEMS chip is arranged in the cavity formed under the self-supporting cap.
It is also possible to arrange both the MEMS chip and also the chip component under the enclosure formed as a cap or in some other way. Furthermore, it is also possible to provide an enclosure only for the MEMS chip and to arrange the chip component next to it on the carrier substrate, but to provide both with a common shielding layer.
For various sensor functions of the MEMS chip, it is necessary that this be in direct contact with an outside atmosphere, especially when the MEMS chip is constructed as a pressure sensor or as a microphone. For this purpose, an opening through the shielding layer and the enclosure is provided above the MEMS chip, so that the MEMS chip is exposed to the outside from this side. The subsequent production of the opening is simplified if the enclosure does not contact the MEMS chip directly at least in a preferably central region, for example, it has a recess in the bottom side or itself has a cap-like shape and is seated on the MEMS chip or the carrier substrate while enclosing a cavity. However, it is also possible to provide the necessary opening in the carrier substrate underneath the MEMS chip.
If the enclosure is made from an electrically insulating material, and in particular, from a close lying film or layer, then a metallization structure, which is connected in an electrically conductive way either to the MEMS chip or to the chip component or to two components arranged one next to the other through contact holes formed in the first enclosure layer, can be realized on a first enclosure layer. Above the metallization structure, a second enclosure layer is deposited as an electrically insulating layer. The shielding layer is deposited above this second enclosure layer. With this metallization layer, connection to the carrier substance can be realized from the MEMS chip and/or the chip component, and/or wiring can be realized between the two chips. In this case it is sufficient to attach components already electrically contacted by means of the metallization structure onto the carrier substrate by just mechanical means, for example, by adhesion bonding.
The MEMS chip can be attached, and in particular, bonded by an appropriate connection means onto the carrier substrate with its passive side that is opposite the active side. If the MEMS chip has a via contact running up to the active side with the active MEMS structures, then the connection means are made electrically conductive. It is possible, for example, to use an electrically anisotropic conductive adhesive, which guarantees electrical conductivity only transverse to the adhesive layer. Such anisotropic conductive adhesive has the advantage that it can be deposited over a large surface area, wherein a plurality of electrical connections can be simultaneously produced between corresponding contact surfaces on the MEMS chip and terminal surfaces on the carrier substrate, without their being short-circuited by the adhesive layer covering all of the contact surfaces.
In addition, the anisotropic conductive adhesive has the advantage that the separating joint between the carrier substrate and MEMS chip can be completely closed off. This is especially advantageous if the production of the enclosure and/or the metallic shielding layer can be realized only on a closed surface or if the bottom side of the MEMS chip has to be protected for a corresponding process of applying the enclosure or shielding layer, or if a cavity is to be left under the enclosure. This is especially important if MEMS structures located on the bottom side of the MEMS chip are exposed, and an appropriate method for producing the enclosure or shielding layer includes the use of a liquid phase.
However, the MEMS chip can also be connected to the carrier substrate by means of bonding wires. This can be advantageously combined with a rigid enclosure, which protects the MEMS chip without negatively affecting the bonding wire connection.
The MEMS chip and chip component are preferably mounted on the carrier substrate using flip-chip technology or one above the other, wherein the surface with the electrical contacts faces toward the carrier substrate and electrical and mechanical connections are produced between contact and terminal surfaces corresponding to each other and opposite each other in the mounted state, for example, by means of bump connections, solder connections, or electrically conductive adhesives.
The chip component can have an essentially smaller layer thickness than the MEMS chip. This allows the chip component to be arranged under the MEMS chip, that is, between the MEMS chip and carrier substrate. There it can be connected electrically and mechanically to the top side of the carrier substrate. It is also possible to arrange the chip component under the MEMS chip and to form an electrical and mechanical connection to the MEMS chip.
For a flip-chip arrangement of the MEMS chip by means of non-sealing connections, an additional joint seal can be provided. This can be, for example, an underfiller, which seals the joint peripherally from the outside after placement of the MEMS chip.
It is also possible to provide on the top side of the carrier substrate or on the corresponding side of the MEMS chip a frame-like structure whose top side represents an annular closed terminal surface for the MEMS chip or for the carrier substrate. The frame structure can be, for example, a solder frame, which also allows it to produce a solder connection between the carrier substrate and MEMS chip. However, the frame structure can also be made from a material that can be applied structured in some other way or structured at a later time, for example, one made from plastic, a structured plastic film, and in particular, from a structured resist.
However, it is also possible to form the frame structure integrated into the material of the carrier substrate or the MEMS chip. The corresponding electrical connection or contact surfaces are then set back relative to the level of the top edge of the frame, so that when the corresponding part contacts the frame structure, there is still space between the MEMS chip and the carrier substrate for the corresponding connection means, in particular, for the adhesive layer, solder connection, or bumps.
The MEMS chip and chip component can be arranged one next to the other on the carrier substrate and can be covered with a common large surface area enclosure, in particular, a laminate film. Preferably, the arrangement is made so that the laminate film encloses the MEMS chip and the one or more chip components separately against the top side of the carrier substrate. The shielding layer is the applied over a large surface area above the enclosure and preferably forms a seal with the top side of the carrier substrate. Preferably, the MEMS chip is provided with a cover arranged under the enclosure, which covers either the sensitive MEMS structures on the active side or spans an optional upward-facing recess in the MEMS chip.
Even more advantageous is to use the chip component as the cover and to use at least one first laminate film as the enclosure which covers the MEMS chip provided with the chip component as the cover, and forms a seal all-around with the substrate. In this first enclosure layer, contact holes can be provided in which contact surfaces there exposed are connected to a metallization structure applied onto the first enclosure layer. By means of this metallization structure, the chip component can be connected electrically to terminal surfaces on the top side of the carrier substrate. The MEMS chip can be connected electrically and mechanically directly to the carrier substrate by means of an electrically conductive connection. In this case it is possible to bond the chip component as a cover on the surface of the MEMS chip that faces away from the carrier substrate, so that the contacts of the chip component point upward. However, it is also possible in addition to provide a direct connection between the chip connection and MEMS chip.
Preferably, however, the electrical connection is realized on the layer of the carrier substrate, for example, by conductor tracks provided on its surface or by a metallization and wiring layer buried in the interior of the carrier substrate or on the bottom side of the carrier substrate.
The MEMS chip can be constructed as a microphone in which an opening is provided in the enclosure and/or shielding layer or in which the MEMS chip is arranged above a sound opening in the carrier substrate. In addition, the MEMS package can have on the side opposite the sound opening or the perforation a sufficiently tightly closed back volume that represents a reference pressure for the MEMS chip and allows the measurement of a pressure difference relative to this reference pressure. This is necessary for applications as a pressure sensor or microphone.
The sound opening through which a MEMS chip constructed as a microphone or pressure sensor is connected to the outside environment can be formed as an opening in the carrier substrate, or as a perforation in the enclosure or shielding layer.
The back volume or reference volume is then formed on the side of the MEMS chip opposite the sound opening. On the passive side the back volume can be made available by a recess in the MEMS chip, and covered or closed accordingly.
If the passive side of the MEMS chip faces the sound opening, then the back-side volume is made available from the enclosure or the carrier substrate.
This can be realized in the form of a cover formed as a cap and sitting on the MEMS chip, or can be realized in the form of a cap sitting on the carrier substrate.
If the active side is facing the carrier substrate with the sound opening, the back volume is provided, for example, in a recess in the carrier substrate underneath the MEMS chip.
DESCRIPTION OF THE DRAWINGS
In the following, the MEMS package according to the invention and also suitable methods for its production will be explained in more detail with reference to embodiments and the associated figures. The figures are constructed purely schematically and not true to scale, so that neither absolute nor relative dimensional information can be taken from the figures. Shown in detail are:
FIG. 1, a MEMS package, in which the MEMS chip and chip component are arranged under a cap and a metallic shielding layer and are contacted by means of bonding wires,
FIG. 2, an arrangement in which, in contrast to FIG. 1, the MEMS chip is contacted electrically by means of a flip-chip arrangement,
FIG. 3, an arrangement in which, in comparison with FIG. 2, the cap is replaced by a close-lying enclosure layer and the chip component has a glob-top encapsulation,
FIG. 4, a MEMS package in which, in contrast to FIG. 3, the chip component also has a flip-chip arrangement and the MEMS chip is covered with a cover,
FIG. 5, an arrangement in which the MEMS chip applied in a flip-chip arrangement also has a joint seal and in which the enclosure layer is eliminated,
FIG. 6, an arrangement in which the chip component is attached to the carrier substrate between the MEMS chip and the carrier substrate,
FIG. 7, an arrangement in which the chip component is arranged between the MEMS chip and carrier substrate and is attached to the former,
FIG. 8, an arrangement in which the chip component lies on the through-contacted MEMS chip and is also covered with an enclosure having a recess,
FIG. 9, an arrangement with the chip component lying on the MEMS chip, which are covered with a laminate film,
FIG. 10, an arrangement similar to FIG. 8, in which, however, a perforation is provided in the cover, enclosure, and shielding layer,
FIG. 11, an arrangement in which the chip component is arranged under the MEMS chip on the carrier substrate in a recess of the MEMS chip, and in which a perforation is provided in the cover, enclosure, and shielding layer above the MEMS chip,
FIG. 12, an arrangement in which the MEMS chip and chip component are arranged one next to the other above a cavity in the carrier substrate, and wherein both cavities are connected to each other,
FIG. 13, an arrangement in which the chip component is arranged next to the MEMS chip and is contacted electrically by means of a metallization structure,
FIG. 14, an arrangement in which the MEMS chip is covered with the chip component and the chip component is connected in an electrically conductive way to the carrier substrate by means of a metallization structure, and
FIG. 15, an arrangement in which a molded part with an additional recess is arranged between the MEMS chip and chip component.
FIG. 1 shows a simple embodiment of the MEMS package, in which the MEMS chip MC and chip component CB are mounted one next to the other on the top side of the carrier substrate TS and are attached there, for example, by means of adhesive. The electrical contacting of the two components to the carrier substrate is realized with bonding wires BD. The enclosure AB is made from a cap sitting on the carrier substrate, which encloses underneath a cavity HR. The cap can be adhesively bonded, for example, on the carrier substrate TS and is made, for example, from a prefabricated plastic part. The shielding layer SL is applied on the cap and the surface of the carrier substrate with a thin-film method and is optionally reinforced with wet-chemical or galvanic methods. For example, a two-step process is suitable in which initially a metallic adhesive layer—for example, made from titanium, nickel, chromium, tungsten, or copper—is sputtered and then reinforced with copper or nickel with a galvanic or electroless method from solution.
Suitable layer thicknesses for fulfilling the shielding function then lie in the range between 10 and 100 μm. Preferably, the carrier substrate TS has a terminal surface connected to ground that seals the shielding layer and thus grounds the layer. The cavity HR under the enclosure AB formed as a cap is used as a back volume for the function of the MEMS chip. The MEMS chip MC has, on the passive side facing toward the carrier substrate, a recess AN in which the MEMS chip is thinned until the MEMS structures of the active side are exposed. Underneath the recess, an opening OE formed as a perforation is provided in the carrier substrate, so that the (passive) bottom side of the MEMS chip is connected in the region of the recess AN to an ambient atmosphere or an ambient pressure.
Not shown in the figure are external contacts arranged on the bottom side of the carrier substrate, by means of which the MEMS package can be mounted on a printed circuit board or another circuit environment. Naturally, the printed circuit board then also has a corresponding perforation, in order to guarantee, after assembly of the package, a connection to the surrounding atmosphere. However, it is also possible to provide external contacts on the top side of the carrier substrate and then to countersink the cap in a recess or opening of the printed circuit board and then to mount the MEMS chip head first.
The MEMS chip MC is designed, for example, as a microphone, the chip component CB, for example, as an amplifying component for the measurement signals generated by the MEMS chip.
As a carrier substrate TS, typical printed circuit board substrates are suitable in a multi-layer technology on a ceramic (HTCC—high temperature cofired ceramics, LTCC—low temperature cofired ceramics) or organic (epoxy, phenol, polyimide, bismaleinimide triazine, cyanate, ester, cyanate ester, PTFE polytetrafluroethylene) base, optionally with inorganic filler materials (quartz or ceramic particles, glass fibers, glass film) or also with organic fiber reinforcement (e.g., aramide). Also suitable are high-temperature thermoplastics (e.g., PEI polyetherimide, PAEK polyaryl ether ketone, PSU polysulfone, PPS polyphenylene sulfide, PAI polyamidimide, PA polyamide, polyphthalamide, polybutylene terephthalate, or others) as the material for the carrier substrate TS, especially those in MID processing (molded interconnect device). Passive or active components can be embedded in the carrier substrate TS. In the case of a MEMS chip constructed as a microphone, these are in particular amplifiers or AD converters, and also devices protecting against EMI (electromagnetic interference) and ESD (electro-static discharge).
FIG. 2 shows another MEMS package, in which, in contrast to FIG. 1, the MEMS chip MC is attached in a flip-chip arrangement, e.g., by means of bumps BU, onto the carrier substrate TS. For this purpose, the MEMS chip is inclined vertically relative to FIG. 1, so that now the active side of the MEMS chip faces toward the surface of the carrier substrate. The electrical and mechanical connection can be realized by means of bumps or electrically conductive adhesive. If the adhesive does not sufficiently seal the back volume under the enclosure AB formed as a cap, so that the reference pressure provided there cannot be maintained long enough, then as shown in FIG. 2 a sealing frame DR (see figure), or alternatively an underfiller or some other joint seal, is provided so that the edge of the MEMS chip is sealed peripherally against the carrier substrate TS. The sealing frame can also be an adhesive applied after soldering of the MEMS chip MC. An anisotropic conductive adhesive can replace the illustrated bumps BU and can simultaneously realize a seal. Compared with FIG. 1, the back volume here is further enlarged.
FIG. 3 shows an arrangement in which the MEMS chip MC and chip component CB are placed as in FIG. 2. Unlike there, here the chip component CB is covered, but with a directly applied protective encapsulation, for example, a glob-top mass LG. An enclosure layer, for example, a laminated laminate film, is applied as another enclosure AB both above the MEMS chip MC and also above the chip component CB provided with the protective enclosure LG. This fits tightly against the MEMS chip MC and can, as shown, span the recess AN on the (passive) bottom side of the MEMS chip MC. The shielding layer SL is in turn applied as a metallic layer on the surface of the enclosure layer, and forms an overall seal with the carrier substrate TS.
Due to the reduced back volume relative to FIGS. 1 and 2, if a back volume is actually required for the MEMS chip MC then this is selected to be sufficiently large. For this purpose, the recess AN is either enlarged or the thickness of the MEMS chip is increased until a sufficiently large back volume is obtained. For suitable processing control, especially if the enclosure layer tightly seals the back volume on the MEMS chip, then the sealing frame DR can be eliminated here.
FIG. 4 shows a construction for a MEMS package in which the chip component CB is also placed in a flip-chip arrangement next to the MEMS chip MC on the carrier substrate TS. Because the electrical contacts of the chip component CB are protected in the intermediate space between the chip component and carrier substrate, here no additional enclosure of the chip component is required as in FIG. 3. The enclosure AB formed as an enclosure layer can lie directly on the reverse side of the chip component.
In another construction, a cover DL is placed above the MEMS chip MC. This simplifies the application of the enclosure layer, especially the lamination of the laminate film, in that it covers the recess on the top side of the MEMS chip MC and in this way encloses the back volume. For the cover DL a glass or plastic film, or alternatively, an appropriately thinned semiconductor layer can be used. A sufficient thickness is obtained at ca. 100 μm. Preferably, the MEMS chip is already provided at the wafer level with the cover, in which a correspondingly large surface area cover layer or a corresponding cover wafer is connected to the wafer in which the MEMS chip MC is advantageously produced. The connection of the MEMS wafer to the cover wafer can be effected, for example, by means of wafer bonding. Adhesive is also possible.
FIG. 5 shows an arrangement in which the enclosure layer is eliminated. The MEMS chip is covered only with a cover DL, which seals the back volume in the recess AN. If the MEMS chip MC is not attached with an electrically anisotropic conductive adhesive and thus already sealed, then the joint between the MEMS chip and carrier substrate TS is also sealed with a joint seal FD, for example, a sealing frame or an underfiller. This arrangement now allows a shielding layer SL to be applied directly onto the cover, the side surfaces of the MEMS chip and the surface of the carrier substrate, without having to take into account a negative effect on the MEMS function.
For depositing the shielding layer for the arrangement according to FIG. 5, processes of deposition from metal solutions can also be used, because a corresponding seal is bestowed on the MEMS chip. Here, the sound opening OE in the carrier substrate needs only to be temporarily closed, or one must proceed such that the sound opening is not exposed to the liquid. The chip component CB is preferably adhesively bonded to an anisotropic conductive adhesive, so that also here no additional seal is necessary. Not shown but also possible is to seal the chip component with a joint seal against the carrier substrate, in order to protect the contacts before the process of applying the shielding layer SL.
FIG. 6 shows a space-saving construction of a MEMS package in which the chip component CB is attached directly onto the carrier substrate TS not next to, but rather under the MEMS chip MC. In this way, the chip component CB can cover the opening OE in the carrier substrate as shown, so that the MEMS chip MC can nevertheless be in direct contact with the ambient atmosphere outside of the package and can receive a corresponding pressure. This construction is optimum with respect to the minimum required carrier substrate surface.
As another feature that can be combined independently with other constructions, here the MEMS chip MC is provided with a cover DL which has a cover recess above the recess AN of the MEMS chip itself, or is constructed as a cap sitting on the MEMS chip. The cover recess increases the back-side volume. The enclosure AB covers the MEMS chip or the cover and together with a shielding layer SL deposited above simultaneously guarantees sealing of the MEMS chip against the carrier substrate. In this case it is also possible to eliminate the enclosure layer and to optionally provide a joint seal on the MEMS chip bottom side.
With a slight modification relative to FIG. 6, FIG. 7 shows a chip component CB similarly arranged under the MEMS chip MC, but connected to its bottom side. Here the chip component is placed so that the bottom side of the MEMS chip contacts the outside atmosphere. The remaining seal can be realized as shown in one of FIGS. 4 to 6, or as in FIG. 7.
For simplifying the method, the chip component CB can be already put in place on the wafer level on a MEMS chip wafer in which the MEMS chip is formed, before the individual MEMS chips are separated. Here it is possible to apply the chip component CB on an auxiliary carrier in a suitable pattern, so that the application of the chip component can be performed in parallel and simultaneously by means of the auxiliary carrier in the same way for all of the MEMS chips on the wafer.
FIG. 8 shows another carrier substrate surface-area-saving construction of a MEMS package, in which the chip component CB is placed on the (passive) top side of the MEMS chip MC, preferably in a flip-chip arrangement, which allows a simultaneous electrical connection of the chip component to the MEMS chip. For this purpose, the MEMS chip is provided, as shown, with a via contact DK which produces an electrical connection to the active side of the MEMS chip. The MEMS structures on the active side are in turn connected by means of corresponding conductive connections to terminal surfaces (not shown in the figure). An arbitrary number of via contacts and an optionally even larger number of contact surfaces are provided on the bottom side of the MEMS chip, which correspond to the required connections for the MEMS chip and the chip component CB. However, it is also possible to combine or divide connections, wherein the number of via contacts and connections increases or decreases accordingly.
If the chip component CB is not sufficiently mechanically stable, it can also be covered with a cap which sits on the MEMS chip and acts as a cover DL. The cap form can also be realized by a cover recess of corresponding size on the bottom side of the cover. The enclosure layer AS and shielding layer SL expand the arrangement. If necessary, the enclosure layer can also be eliminated.
FIG. 9 shows another construction for a MEMS package in which the chip component CB represents the cover for the MEMS chip MC, which is sufficiently stable so that an enclosure layer can be deposited or generated directly above as an enclosure AB without stability problems, and above this a shielding layer SL can be deposited or generated. The chip component is here preferably already connected at the wafer level to the MEMS wafer in which the individual MEMS chips are structured. For this purpose, the chip component is preferably coextensive with the MEMS chip, so that the two wafers can be connected to each other directly since they have the same pattern in the separation. However, it can be necessary here to realize electrical connections on the top side of the chip component by means of via contacts through the chip component (as shown in FIG. 9). Placement of the chip component in a flip-chip process on the (active) top side of the MEMS chip (not shown in FIG. 9) can form a direct electrical connection to corresponding connections of the MEMS chip, so that the via contacts through the chip component are then not necessary. The connection can be realized by means of solder or advantageously with anisotropic conductive adhesive.
FIG. 10 shows an arrangement in which the MEMS chip MC is connected to the carrier substrate TS via its base chip or its passive side, in comparison with the previous arrangements shown in FIGS. 2 to 9. This means that the back-side volume guaranteed by the recess AN in the base chip is now sealed off by the carrier substrate TS. The contact of the MEMS chip MC with the surrounding atmosphere must then be realized by means of a perforation DB in the cover DL, enclosure AB, and shielding layer SL. If the enclosure AB has sufficient stability, the cover DL can be eliminated and the cavity can be guaranteed, e.g., via a sacrificial layer on the MEMS chip which can be removed again after application of the enclosure AB and shielding layer and also after the opening of the perforation DB. The perforation DB can be generated in both cases after completion of the enclosure AB and after application of the enclosure layer and the shielding layer SL, for example, by drilling, in particular, by laser drilling. Larger or several smaller perforations can be provided.
FIG. 11 shows an arrangement which similarly encloses the back-side volume between the MEMS chip and carrier substrate in the region of the recess AN. The volume is sufficient so that the chip component CB has room in the volume and can be connected to the carrier substrate TS under the MEMS chip in the region of the recess, for example, in a flip-chip arrangement by means of electrically conductive adhesive, bumps, or other bonding connection. Here, a connection of the top side of the MEMS chip MC to the surrounding atmosphere must be guaranteed by means of a perforation DB.
Because the back-side volume is limited to the chip size of the MEMS chip MC and is possibly too small according to the arrangement according to FIGS. 10 and 11, it can be enlarged by additional cavities VK in the carrier substrate TS. FIG. 12 also shows a construction in which another cavity is additionally provided under the chip component CB, this being connected to the cavity VK under the MEMS chip MC. The back-side volume is further enlarged without increasing the structural height or the surface area of the MEMS package.
FIG. 13 shows a construction in which a metallization structure MS is arranged above a first enclosure layer AS1 and a second enclosure layer AS2 is arranged above this structure. The metallization structure connects electrically to contact surfaces of the chip component CB and terminal surfaces of the carrier substrate TS by means of contact holes KB in the first enclosure layer AS1 and thus represents an electrical connection structure. Therefore the chip component CB can be adhesively bonded onto the carrier substrate with the reverse side.
In FIG. 14, similar to FIG. 9, the MEMS chip MC is covered with the bonded chip component CB as a cover. The electrical connection of the chip component to the terminal surfaces of the carrier substrate TS is also realized here by means of a metallization structure MS, as shown in FIG. 13, which is connected to the contact surfaces of the MEMS chip MC by means of contact holes KB. The MEMS chip makes direct contact with the carrier substrate or its contact surfaces.
In none of the described embodiments is the back volume of the MEMS chip limited to the shown form (funnel-like opening), which is produced, e.g., by a defined etching method in single crystals, such as, e.g., silicon. Instead, other forms of the recess (vertical walls) can be more advantageous for reducing the MEMS chip. On the other hand, however, the chip-specific back-side volume formed by a recess could become too small, which would degrade the sensitivity of the microphone. One aid is already shown in FIG. 6, in which the enclosure AB has an additional recess.
If the chip component CB is to be used as a chip enclosure for the MEMS chip MC and in this way an additional back-side volume is to be created, the following solution is shown in FIG. 15. It has proven especially advantageous when the MEMS chip and chip component are to be already joined at the wafer level, even though the chip component is smaller. In this case, in a preliminary step, the (smaller) chip component is set with its connection side on an auxiliary carrier (e.g., an adhesive film), that is, at the spacing of the (larger) MEMS chip. In order to achieve a matched thermal expansion coefficient, this arrangement is then coated with a filled polymer filler FM, e.g., in a casting, pressing, or laminating process. In this way, a new wafer is obtained in which the chip components are now arranged fitting the counterpart. In this processing step an additional cavity HR can be pressed into the molded material FM in a simple way. For placement and bonding of the new wafer, the additional cavity is arranged above the MEMS chip MC and optionally forms, together with its recess AN, the back-side volume.
In a modified construction, an intermediate position with an additional cavity can also be formed by a separate molded part.
In addition, other combinations of the described details are also possible in modification of the shown constructions.
All of the embodiments are also especially suitable for arrays made from two or more MEMS chips formed as microphones. In this way directional characteristics can be set, for example, for reducing ambient noise. The back-side volumes are here allocated individually to each MEMS chip. In contrast, the electronic circuitry can combine several of these volumes.
The shielding layer SL on the top side of the carrier substrate on which the MEMS chip and possibly other components are located is of essential significance for shielding the sensitive internal signal processing relative to external interference fields. This is especially relevant for use in mobile telephony, where the component is often arranged only a few centimeters from the antenna. The processing sequence discussed above, lamination-sputtering-electroplating, is only one possibility for producing this coating with good conductivity. In a few embodiments, e.g., the lamination process can be eliminated (cf. FIG. 5). It is also possible to produce a corresponding layer through dipping, casting, or spraying instead of lamination. For the metallization of plastic surfaces, a series of PVD, CVD, wet-chemical, and galvanic methods (or combinations of these) is known. For a structured metallization structure MS (see FIGS. 13, 14, 15) for the purpose of circuitry, their photolithographic structuring or a selective metallization is provided, e.g., laser-activated deposition or direct writing of the metallization structure with a jet printing method.
All of the packaging variants described above with the example of a MEMS microphone or shown schematically in the figures are also suitable, in principle, for any other electronic components, especially for the enclosure of other MEMS chips including amplification, matching, or evaluation electronics. Typical examples are mechanical resonators and filters, pyrosensors, spectrometers, image converters in the visible or infrared spectral range, pressure sensors, gas sensors, turbidity sensors, loudspeakers, motion detectors, acceleration or gyro sensors, RFID chips, switches, tunable high-frequency components (“varactors”), fuel cells, thermoelectric generators, and many others.
Naturally, the sound opening can be eliminated. Then, with a suitable carrier substrate material, if necessary a hermetic and non-diffusion construction is possible or can be replaced by a window for other waves or radiation, or by a media inlet. The back side volume is then also obsolete in many cases.
|Cited Patent||Filing date||Publication date||Applicant||Title|
|US2105010||Feb 25, 1933||Jan 11, 1938||Brush Dev Co||Piezoelectric device|
|US3447217||Jan 27, 1965||Jun 3, 1969||Hitachi Ltd||Method of producing ceramic piezoelectric vibrator|
|US3587322||Jun 17, 1969||Jun 28, 1971||Simmonds Precision Products||Pressure transducer mounting|
|US3726002||Aug 27, 1971||Apr 10, 1973||Ibm||Process for forming a multi-layer glass-metal module adaptable for integral mounting to a dissimilar refractory substrate|
|US3735211||Jun 21, 1971||May 22, 1973||Fairchild Camera Instr Co||Semiconductor package containing a dual epoxy and metal seal between a cover and a substrate, and method for forming said seal|
|US3980917||May 6, 1975||Sep 14, 1976||Sony Corporation||Photo-electrode structure|
|US4127840||Feb 22, 1977||Nov 28, 1978||Conrac Corporation||Solid state force transducer|
|US4222277||Aug 13, 1979||Sep 16, 1980||Kulite Semiconductor Products, Inc.||Media compatible pressure transducer|
|US4277814||Sep 4, 1979||Jul 7, 1981||Ford Motor Company||Semiconductor variable capacitance pressure transducer assembly|
|US4314226||Jan 4, 1980||Feb 2, 1982||Nissan Motor Company, Limited||Pressure sensor|
|US4424419||Oct 19, 1981||Jan 3, 1984||Northern Telecom Limited||Electret microphone shield|
|US4454440||Feb 29, 1980||Jun 12, 1984||United Technologies Corporation||Surface acoustic wave (SAW) pressure sensor structure|
|US4456796||Mar 18, 1982||Jun 26, 1984||Hosiden Electronics Co., Ltd.||Unidirectional electret microphone|
|US4504703||Aug 16, 1984||Mar 12, 1985||Asulab S.A.||Electro-acoustic transducer|
|US4533795||Jul 7, 1983||Aug 6, 1985||American Telephone And Telegraph||Integrated electroacoustic transducer|
|US4545440||Apr 7, 1983||Oct 8, 1985||Treadway John E||Attachment for pneumatic hammers for punching holes of varying size|
|US4558184||Jan 20, 1984||Dec 10, 1985||At&T Bell Laboratories||Integrated capacitive transducer|
|US4628740||Oct 9, 1985||Dec 16, 1986||Yokogawa Hokushin Electric Corporation||Pressure sensor|
|US4641054||Jun 25, 1985||Feb 3, 1987||Nippon Ceramic Company, Limited||Piezoelectric electro-acoustic transducer|
|US4691363||Dec 11, 1985||Sep 1, 1987||American Telephone & Telegraph Company, At&T Information Systems Inc.||Transducer device|
|US4737742||Dec 15, 1986||Apr 12, 1988||Alps Electric Co., Ltd.||Unit carrying surface acoustic wave devices|
|US4776019||May 13, 1987||Oct 4, 1988||Horiba, Ltd.||Diaphragm for use in condenser microphone type detector|
|US4816125||Aug 19, 1988||Mar 28, 1989||The Regents Of The University Of California||IC processed piezoelectric microphone|
|US4817168||Mar 17, 1987||Mar 28, 1989||Akg Akustische U. Kino-Gerate Gesellschaft M.B.H.||Directional microphone|
|US4825335||Mar 14, 1988||Apr 25, 1989||Endevco Corporation||Differential capacitive transducer and method of making|
|US4866683||May 24, 1988||Sep 12, 1989||Honeywell, Inc.||Integrated acoustic receiver or projector|
|US4908805||Oct 27, 1988||Mar 13, 1990||Microtel B.V.||Electroacoustic transducer of the so-called "electret" type, and a method of making such a transducer|
|US4910840||Jul 26, 1989||Mar 27, 1990||Microtel, B.V.||Electroacoustic transducer of the so-called "electret" type, and a method of making such a transducer|
|US4984268||Nov 21, 1988||Jan 8, 1991||At&T Bell Laboratories||Telephone handset construction|
|US5059848||Aug 20, 1990||Oct 22, 1991||The United States Of America As Represented By The Secretary Of The Army||Low-cost saw packaging technique|
|US5091051||Jan 25, 1991||Feb 25, 1992||Raytheon Company||Saw device method|
|US5101543||Jan 30, 1991||Apr 7, 1992||Gentex Corporation||Method of making a variable capacitor microphone|
|US5146435||Dec 4, 1989||Sep 8, 1992||The Charles Stark Draper Laboratory, Inc.||Acoustic transducer|
|US5151763||Dec 21, 1990||Sep 29, 1992||Robert Bosch Gmbh||Acceleration and vibration sensor and method of making the same|
|US5153379||Oct 9, 1990||Oct 6, 1992||Motorola, Inc.||Shielded low-profile electronic component assembly|
|US5179015||Jul 23, 1990||Jan 12, 1993||New England Biolabs, Inc.||Heterospecific modification as a means to clone restriction genes|
|US5184107||Jan 24, 1992||Feb 2, 1993||Honeywell, Inc.||Piezoresistive pressure transducer with a conductive elastomeric seal|
|US5216490||Aug 3, 1990||Jun 1, 1993||Charles Stark Draper Laboratory, Inc.||Bridge electrodes for microelectromechanical devices|
|US5257547||Nov 26, 1991||Nov 2, 1993||Honeywell Inc.||Amplified pressure transducer|
|US5357807||Oct 5, 1992||Oct 25, 1994||Wisconsin Alumni Research Foundation||Micromachined differential pressure transducers|
|US5394011||Jun 11, 1992||Feb 28, 1995||Iwaki Electronics Co. Ltd.||Package structure for semiconductor devices and method of manufacturing the same|
|US5408731||Nov 5, 1993||Apr 25, 1995||Csem Centre Suisse D'electronique Et De Microtechnique S.A. - Rechere Et Developpement||Process for the manufacture of integrated capacitive transducers|
|US5449909||Oct 25, 1993||Sep 12, 1995||California Institute Of Technology||Tunnel effect wave energy detection|
|US5452268||Aug 12, 1994||Sep 19, 1995||The Charles Stark Draper Laboratory, Inc.||Acoustic transducer with improved low frequency response|
|US5459368||Jul 22, 1994||Oct 17, 1995||Matsushita Electric Industrial Co., Ltd.||Surface acoustic wave device mounted module|
|US5465008||Oct 8, 1993||Nov 7, 1995||Stratedge Corporation||Ceramic microelectronics package|
|US5477008||Mar 19, 1993||Dec 19, 1995||Olin Corporation||Polymer plug for electronic packages|
|US5490220||May 5, 1994||Feb 6, 1996||Knowles Electronics, Inc.||Solid state condenser and microphone devices|
|US5506919||Mar 27, 1995||Apr 9, 1996||Eastman Kodak Company||Conductive membrane optical modulator|
|US5531787||Jan 25, 1993||Jul 2, 1996||Lesinski; S. George||Implantable auditory system with micromachined microsensor and microactuator|
|US5545912||Oct 27, 1994||Aug 13, 1996||Motorola, Inc.||Electronic device enclosure including a conductive cap and substrate|
|US5592391||Jun 7, 1995||Jan 7, 1997||International Business Machines Corporation||Faraday cage for a printed circuit card|
|US5593926||Oct 7, 1994||Jan 14, 1997||Sumitomo Electric Industries, Ltd.||Method of manufacturing semiconductor device|
|US5650685||Sep 25, 1995||Jul 22, 1997||The United States Of America As Represented By The Secretary Of The Army||Microcircuit package with integrated acoustic isolator|
|US5659195||Jun 8, 1995||Aug 19, 1997||The Regents Of The University Of California||CMOS integrated microsensor with a precision measurement circuit|
|US5712523||Jun 28, 1995||Jan 27, 1998||Murata Manufacturing Co., Ltd.||Surface acoustic wave device|
|US5739585||Jul 29, 1996||Apr 14, 1998||Micron Technology, Inc.||Single piece package for semiconductor die|
|US5740261||Nov 21, 1996||Apr 14, 1998||Knowles Electronics, Inc.||Miniature silicon condenser microphone|
|US5748758||Jan 25, 1996||May 5, 1998||Menasco, Jr.; Lawrence C.||Acoustic audio transducer with aerogel diaphragm|
|US5821665||May 8, 1996||Oct 13, 1998||Matsushita Electric Industrial Co., Ltd.||Surface acoustic wave device and method of manufacture|
|US5831262||Jun 27, 1997||Nov 3, 1998||Lucent Technologies Inc.||Article comprising an optical fiber attached to a micromechanical device|
|US5838551||Aug 1, 1996||Nov 17, 1998||Northern Telecom Limited||Electronic package carrying an electronic component and assembly of mother board and electronic package|
|US5852320||Aug 15, 1996||Dec 22, 1998||Mitsubishi Denki Kabushiki Kaisha||Semiconductor sensor with protective cap covering exposed conductive through-holes|
|US5870482||Feb 25, 1997||Feb 9, 1999||Knowles Electronics, Inc.||Miniature silicon condenser microphone|
|US5872397||Dec 17, 1996||Feb 16, 1999||International Business Machines Corporation||Semiconductor device package including a thick integrated circuit chip stack|
|US5886876||Dec 5, 1996||Mar 23, 1999||Oki Electric Industry Co., Ltd.||Surface-mounted semiconductor package and its manufacturing method|
|US5889872||Jul 2, 1996||Mar 30, 1999||Motorola, Inc.||Capacitive microphone and method therefor|
|US5901046||Dec 10, 1997||May 4, 1999||Denso Corporation||Surface mount type package unit and method for manufacturing the same|
|US5923995||Apr 18, 1997||Jul 13, 1999||National Semiconductor Corporation||Methods and apparatuses for singulation of microelectromechanical systems|
|US5939968||Sep 15, 1998||Aug 17, 1999||Littelfuse, Inc.||Electrical apparatus for overcurrent protection of electrical circuits|
|US5990418||Jul 29, 1997||Nov 23, 1999||International Business Machines Corporation||Hermetic CBGA/CCGA structure with thermal paste cooling|
|US5999821||Jan 29, 1997||Dec 7, 1999||Motorola, Inc.||Radiotelephone having a user interface module|
|US6012335||Sep 17, 1997||Jan 11, 2000||National Semiconductor Corporation||High sensitivity micro-machined pressure sensors and acoustic transducers|
|US6052464||May 29, 1998||Apr 18, 2000||Motorola, Inc.||Telephone set having a microphone for receiving or an earpiece for generating an acoustic signal via a keypad|
|US6057222||Jun 22, 1998||May 2, 2000||Siemens Aktiengesellschaft||Method for the production of flip-chip mounting-ready contacts of electrical components|
|US6075867||Jun 21, 1996||Jun 13, 2000||Microtronic A/S||Micromechanical microphone|
|US6078245||Dec 17, 1998||Jun 20, 2000||Littelfuse, Inc.||Containment of tin diffusion bar|
|US6108184||Nov 13, 1998||Aug 22, 2000||Littlefuse, Inc.||Surface mountable electrical device comprising a voltage variable material|
|US6118881||May 13, 1997||Sep 12, 2000||Lucent Technologies Inc.||Reduction of flow-induced microphone noise|
|US6136175||Jun 22, 1998||Oct 24, 2000||Siemens Aktiengesellschaft||Method of producing an electronic component, in particular a surface acoustic wave component|
|US6136419||May 26, 1999||Oct 24, 2000||International Business Machines Corporation||Ceramic substrate having a sealed layer|
|US6150753||Dec 15, 1997||Nov 21, 2000||Cae Blackstone||Ultrasonic transducer assembly having a cobalt-base alloy housing|
|US6157546||Mar 26, 1999||Dec 5, 2000||Ericsson Inc.||Shielding apparatus for electronic devices|
|US6163071||Nov 27, 1996||Dec 19, 2000||Hitachi, Ltd.||BGA type semiconductor device and electronic equipment using the same|
|US6178249||Jun 17, 1999||Jan 23, 2001||Nokia Mobile Phones Limited||Attachment of a micromechanical microphone|
|US6182342||Apr 2, 1999||Feb 6, 2001||Andersen Laboratories, Inc.||Method of encapsulating a saw device|
|US6187249||Oct 4, 1996||Feb 13, 2001||Richard Laurance Lewellin||Manufacture of bodies using rice hulls|
|US6191928||Feb 23, 1999||Feb 20, 2001||Littelfuse, Inc.||Surface-mountable device for protection against electrostatic damage to electronic components|
|US6242842||Jun 22, 1998||Jun 5, 2001||Siemens Matsushita Components Gmbh & Co. Kg||Electrical component, in particular saw component operating with surface acoustic waves, and a method for its production|
|US6282072||Feb 23, 1999||Aug 28, 2001||Littelfuse, Inc.||Electrical devices having a polymer PTC array|
|US6310420||Jun 22, 1998||Oct 30, 2001||Siemens Aktiengesellschaft||Electronic component in particular an saw component operating with surface acoustic waves and a method for its production|
|US6324907||Nov 29, 1999||Dec 4, 2001||Microtronic A/S||Flexible substrate transducer assembly|
|US6398943||Dec 22, 1998||Jun 4, 2002||Forschungszentrum Julich Gmbh||Process for producing a porous layer by an electrochemical etching process|
|US6400065||Mar 30, 1999||Jun 4, 2002||Measurement Specialties, Inc.||Omni-directional ultrasonic transducer apparatus and staking method|
|US6413408||Jun 19, 1999||Jul 2, 2002||Forschungszentrum Jülieh GmbH||Method for the production of a porous layer|
|US6433412||Mar 8, 2001||Aug 13, 2002||Hitachi, Ltd.||Semiconductor device and a method of manufacturing the same|
|US6437449||Apr 6, 2001||Aug 20, 2002||Amkor Technology, Inc.||Making semiconductor devices having stacked dies with biased back surfaces|
|US6439869||Aug 16, 2000||Aug 27, 2002||Micron Technology, Inc.||Apparatus for molding semiconductor components|
|US6449828||Feb 28, 2001||Sep 17, 2002||Siemens Matsushita Components Gmbh & Co. Kg||Method of producing a surface acoustic wave component|
|US20040046245 *||Sep 10, 2002||Mar 11, 2004||Minervini Anthony D.||Microelectromechanical system package with environmental and interference shield|
|1||"Acoustic Applications of Pressure Transducers," National Semiconductor Corp., Pressure Transducer Handbook, pp. 12-1 to 12-5 (1977).|
|2||"Configurations, Packaging and Environment," National Semiconductor Corp., Pressure Transducer Handbook, pp. 4-2 to 4-5 (1977).|
|3||"Nano 50 Awards announced," [online] [Retrieved on Jan. 17, 2011]; Retrieved from Foresight Institute the Internet URL: http://www.foresight.org/nanodot/?p=1990; 6 pages.|
|4||"Small Times Magazine Best of Small Tech Awards Recognize Micro and Nano Technologies Affecting Today's World," [online] [Retrieved on Jan. 17, 2011]; Retrieved from nano techwire.com the Internet URL: http://www.nanotechwire.com/news.asp?nid=539; 4 pages.|
|5||Action and Response History in U.S. Appl. No. 10/523,875.|
|6||Action and Response History in U.S. Appl. No. 11/573,610.|
|7||Action and Response History in U.S. Appl. No. 11/578,854.|
|8||Action and Response History in U.S. Appl. No. 11/816,960.|
|9||Action and Response History in U.S. Appl. No. 11/816,964.|
|10||Action and Response History in U.S. Appl. No. 11/816,969.|
|11||Action and Response History in U.S. Appl. No. 12/091,529.|
|12||Action and Response History in U.S. Appl. No. 12/092,423.|
|13||Action and Response History in U.S. Appl. No. 13/075,936.|
|14||Arnold et al., "A directional acoustic array using silicon micromachined piezoresistive microphonesa)," J. Acoust. Soc. Am 113(1):289-298 (2003).|
|15||Arnold et al., "Mems-Based Acoustic Array Technology", 40th AIAA Aerospace Sciences Meeting and Exhibit, (Jan. 2002).|
|16||Arnold, David P., "A MEMS-Based Directional Acoustic Array for Aeroacoustic Measurements", Master's Thesis, Univ. of Florida (2001).|
|17||Barton et al., "Optimisation of the Coating of a Fiber Optical Sensor Embedded in a Corss-ply GFRP Laminate" Composites: Part A 33 (2002) pp. 27-34.|
|18||Bay J. et al "Design of a Silicon Microphone with Differential Read-out of a Sealed Double Parallel-Plate Capacitor" Int. Conf. Eurosensors, Jun. 25, 1995, pp. 700-703, XP010305041.|
|19||Becker, K. et al. "MEMS Packaging -Techological Solutions for a Si-Microphone", Fraunhofer Inst. for Reliability and Micro Integration, Berlin; pp. 405-406, (Mar. 2004).|
|20||Becker, K. et al. "MEMS Packaging —Techological Solutions for a Si-Microphone", Fraunhofer Inst. for Reliability and Micro Integration, Berlin; pp. 405-406, (Mar. 2004).|
|21||Bergqvist et al., "A Silicon Condenser Microphone Using Bond and Etch-Back Technology", Sensors and Actuators A, vol. 45, pp. 115-124 (1994).|
|22||Bever et al., "BICMOS Compatible Silicon Microphone Packaged as Surface Mount Device", Sensors Expo (1999).|
|23||Bouchard et al., "Dynamic Times for MEMS Microphones: MEMS Microphone Market & Supplier Analysis 2006-2013," iSuppli Corporation (2009) 4 pages.|
|24||Electronic Materials handbook, p. 483 (Fig. 1), ASM Int'l., (1989).|
|25||English translation of Written Opinion for PCT/DE2006/001945 Nov. 6, 2006.|
|26||English translation of Written Opinion for PCT/DE2006/001945.|
|27||Gale, Bruce K., "MEMS Packaging," Microsystems Principles pp. 1-8 (Oct. 2001).|
|28||Giasolli, Robert, "MEMS Packaging Introduction," pp. 1-11 (Nov. 2000).|
|29||Gilleo, "MEMS/MOEMS Packaging: Concepts, Designs, Materials, and Processes," MEMS and MOEMS Packaging Challenges and Strategies, The McGraw-Hill Companies, Inc., Ch. 3:84-102 (2005) 21 pages.|
|30||Gilleo, Ken, ed., Excerpt from Area Array Packaging Handbook, (2002).|
|31||Hannenmann et al., eds., Semiconductor Packaging: A Multidisciplinary Approach (1994).|
|32||Harper, Chas. et al., Electronic Packaging, Microelectronics and Interconnection Dictionary, pp. 139, 190-191 (1993).|
|33||Harper, Chas., ed., Electronic Packaging and Interconnection Handbook, 3rd Ed., McGraw-Hill, pp. 7.34 to 7.38 (2000).|
|34||Hayes et al., "Micro-jet printing of polymers for electronics manufacturing" IEEE; pp. 168-173, XP 002342861 (1998).|
|35||Hayes et al., "Printing systems for MEMS packaging" vol. 4558, 2001, pp. 206-214, XP 002342860.|
|36||Henning et al., "Microfluidic MEMS for Semiconductor Processing," IEEE Trans. on Components, Packaging and Manufacturing Technology, Pt. B, 21(4):329-337 (1998).|
|37||Hsieh, W. H. et al "A Micromachined Thin-film Teflon Electret Microphone" Dept. of Electrical Engineering, California Inst. of Technology ; vol. 1 P: 2B2.02 IEEE, 1997.|
|38||Hsu, "Mems Packaging: Fundamentals of MEMS packaging," INSPEC, The Institution of Electrical Engineers, pp. 17-19 (2004) 5 pages.|
|39||Imai, Nobuomi, "A New Piezoelectric Microphone with Divided Electrodes and its Applications"J. Acoust. Soc. Jpn. (E) 11,6 (1990) pp. 327-333.|
|40||International Preliminary Report of Patentability in Application No. PCT/EP2006/001116, dated Sep. 11, 2007 (incl. Written Opinion).|
|41||International Preliminary Report on Patentability and Written Opinion for PCT/EP2006/001120, dated Sep. 11, 2007.|
|42||International Preliminary Report on Patentability and Written Opinion for PCT/EP2006/001121, dated Sep. 11, 2007.|
|43||International Preliminary Report on Patentability in Application No. PCT/DE2006/001736, dated Apr. 29, 2008.|
|44||International Preliminary Report on Patentability in Application No. PCT/DE2006/001946, dated Jun. 11, 2008.|
|45||International Preliminary Report on Patentability in Application No. PCT/EP05/004309, dated Nov. 29, 2006.|
|46||International Search Report and Written Opinion in Application No. PCT/DE2006/001946, dated Feb. 22, 2007.|
|47||International Search Report and Written Opinion in Application No. PCT/EP03/06596, dated Jan. 20, 2004.|
|48||International Search Report and Written Opinion in Application No. PCT/EP05/004309, dated Sep. 13, 2005.|
|49||International Search Report and Written Opinion in Application No. PCT/EP2005/008373, dated Nov. 8, 2005.|
|50||International Search Report and Written Opinion in Appplication No. PCT/DE2006/001736, dated Mar. 12, 2007.|
|51||International Search Report from corresponding PCT Application No. PCT/DE2006/001945, mailed Mar. 28, 2007, 6 pages.|
|52||International Search Report in Application No. PCT/EP2006/001116, dated Aug. 31, 2006.|
|53||International Search Report in Application No. PCT/EP2006/001120, dated Oct. 26, 2006.|
|54||International Search Report in Application No. PCT/EP2006/001121, dated Jul. 7, 2006.|
|55||JEDEC Standard, "Terms, Definitions, and Letter Symbols for Microelectronic Devices", JEDEC Solid State Technology Association, Electronic Industries Alliance, JESD99B 2007.|
|56||Kress et al., "Integrated Silicon Pressure Sensor for Automotive Application with Electronic Trimming," SAE International, SAE Technical Paper Series 950533 (1995) 9 pages.|
|57||Lau, John H., Ed., Ball Grid Array Technology, McGraw Hill, Inc., ISBN 0-07-036608-X, [PAGES?] (Pub. 1995).|
|58||Lukes M. "Silicon Condenser Microphone: Electroacoustic Model and Simulation" Czech Tech. University in Prague, Faculty of Electrical Engineering, Sep. 26, 2001, pp. 57-66.|
|59||Luthra, Mukluk, "Process challenges and solutions for embedding Chip-On-Board into mainstream SMT assembly", pp. 426-433, Proc. Of the 4th Int'l. Symposium on Electronic Materials and Packaging (Dec. 2002).|
|60||Machine Translation of German Publication No. DE10303263A1, published Aug. 2004.|
|61||Maluf, "An Introduction to Microelectromechanical Systems Engineering; The Box: Packaging for MEMS," Artech House MEMS library, Ch. 6:201-203 (2000) 5 pages.|
|62||Neumann J. J. et al "A Fully-integrated CMOS-MEMS Audio Microphone" 12th Intl Conf. on Solid State Sensors, Actuators and Microsystems, Boston, Jun. 8-12, 2003, pp. 230-233.|
|63||Niu M-N et al "Piezoeclectric Biomorph Microphone Built on Micromachined Parylene Diaphtagm" J. of Microelectrochemical Systems, vol. 12, No. 6, Dec. 2003; pp. 892-898, XP001200226, ISSN 1057-7157.|
|64||Notification of reasons for Refusal in Japanese Patent Application No. 2007-556514, dated Jul. 13, 2011.|
|65||Notification of reasons for Refusal in Japanese Patent Application No. 2007-556515, dated Jun. 23, 2011.|
|66||Notification of reasons for Refusal in Japanese Patent Application No. 2007-556516, dated Sep. 22, 2011.|
|67||Notification of reasons for Refusal in Japanese Patent Application No. 2008-539239, dated Sep. 22, 2011.|
|68||Oda et al., "New Nanostructured Film Making Method Using Ultra Fine Particles"; pp. 21-26.|
|69||O'Neal, Chad et al., Challenges in the Packaging of MEMS, IEEE Int'l Symposium on Advanced Packaging Materials (1999).|
|70||Pecht, Michael, ed., Handbook of Electronic Package Design, pp. 1-5, Fig. 1.1 (1991).|
|71||Petersen et al., "Silicon Accelerometer Family; Manufactured for Automotive Applications," pp. 217-222 (1992).|
|72||Premachandran et al., "Si-based Microphone Testing Methodology and Noise Reduction," Proceedings of SPIE 4019:588-592 (2000).|
|73||Prosecution History in Re-Exam U.S. Appl. No. 90/009,739 (RE of US 7,242,089).|
|74||Prosecution History in Re-Exam U.S. Appl. No. 90/009,740 (RE of US 6,781,231).|
|75||Prosecution History in Re-Exam U.S. Appl. No. 95/000,509 (RE of US 6,781,231).|
|76||Prosecution History in Re-Exam U.S. Appl. No. 95/000,513 (RE of US 7,242,089).|
|77||Prosecution History in Re-Exam U.S. Appl. No. 95/000,515 (RE of US 7,242,089).|
|78||Ramesham, Rajeshuni et al., "Challenges in Interconnection and Packaging of Microelectromechanical Systems (MEMS)", Electronic Components and Technology Conference (2000).|
|79||Schweber and Clark, "And the statuette goes to . . .," [online] [Retrieved on Jan. 17, 2011]; Retrieved from the Internet URL: http//www.edn.com/article/print/470437-And-the-statuette-goes-to-.php; 6 pages.|
|80||Schweber and Clark, "And the statuette goes to . . .," [online] [Retrieved on Jan. 17, 2011]; Retrieved from the Internet URL: http//www.edn.com/article/print/470437-And—the—statuette—goes—to—.php; 6 pages.|
|81||Selmeier et al., "Recent Advances in Saw Packaging", IEEE Ultrasonics Symposium; 2001; pp. 283-292.|
|82||State Intellectual Property Office, P.R. China, Chinese Office Action in CH Patent Application No. 2008-539238, mailed Nov. 11, 2011, 6 pages.|
|83||Torkkeli et al., "Capacitive microphone with low-stress polysilicon membrane and high-stress polysilicon backplate," Sensors and Actuators 85:116-123 (2000).|
|84||Torkkeli et al., "Capacitive Silicon Microphone", Physica Scripta., vol. T79, pp. 275-278 (1999).|
|85||Torkkeli et al., "Capacitive Silicon Microphone," Physica Scripta T79:275-278 (1999), (Published at least by May 14, 1992).|
|86||Tummala et al. "Fundamentals of Microsystems Packaging," the McGraw-Hill Companies, Inc., Ch. 14:560-561 (2001) 4pages.|
|87||U.S. Appl. No. 09/886,654, filed Jun. 21, 2001, Minervini.|
|88||U.S. Appl. No. 09/886,854, filed Jun. 21, 2001, Minervini.|
|89||U.S. Appl. No. 10/921,747, filed Aug. 19, 2004, Minervini.|
|90||U.S. Appl. No. 11/112,043, filed Apr. 22, 2005, Minervini.|
|91||U.S. Appl. No. 11/276,025, filed Feb. 10, 2006, Minervini.|
|92||U.S. Appl. No. 11/538,056, filed Oct. 3, 2006, Minervini.|
|93||U.S. Appl. No. 11/741,881, filed Apr. 30, 2007, Minervini.|
|94||U.S. Appl. No. 11/741,884, filed Apr. 30, 2007, Minervini.|
|95||U.S. Appl. No. 60/253,543, filed Nov. 28, 2000, Minervini.|
|96||U.S. Appl. No. 90/009,739, filed May 5, 2010, Minervini.|
|97||U.S. Appl. No. 90/009,740, filed May 5, 2010, Minervini.|
|98||U.S. Appl. No. 90/010,984, Minervini.|
|99||U.S. Appl. No. 90/010,985, filed May 6, 2010, Minervini.|
|100||U.S. Appl. No. 90/011,058, filed Jun. 23, 2010, Minervini.|
|101||U.S. Appl. No. 95,001,363, filed Jun. 30, 2010, Minervini.|
|102||U.S. Appl. No. 95,001,364, filed Jun. 30, 2010, Minervini.|
|103||U.S. Appl. No. 95/000,509, filed Oct. 7, 2009, Minervini.|
|104||U.S. Appl. No. 95/000,513, filed Dec. 14, 2009, Minervini.|
|105||U.S. Appl. No. 95/000,515, filed. Nov. 4, 2009, Minervini.|
|106||U.S. Appl. No. 95/001,251, filed Nov. 24, 2009, Minervini.|
|107||U.S. Appl. No. 95/001,365, filed Jun. 30, 2010, Minervini.|
|108||Van der Donk et al "Amplitude-modulated Electromechanical Feedback System for Silicon Condenser Microphones"J. Micromech. Microeng. 2 (1992) 211-214, XP020069302.|
|109||van Heeren, et al., "Overview of MEMS Process Technologies for high Volume Electronics", 17 pgs. (Pub. Date: 2005 or later).|
|110||Wikipedia, "Flip Chip", [online] Retrieved from the Internet: <URL: http://en.wikipedia.org/wiki/Flip—chip>, [retrieved on Nov. 15, 2011].|
|111||Zhao Y. et al "MEMS-Based Piezoelectric Microphone for Biomedical Application" MEMS Sensors and Actuators Lab (MSAL), Dept. of Electrical and Computer Engineering, The Inst. for Systems Research, U. of Maryland.|
|Citing Patent||Filing date||Publication date||Applicant||Title|
|US8254619 *||Aug 13, 2010||Aug 28, 2012||Lingsen Precision Industries Ltd.||Microelectromechanical microphone carrier module|
|US9040335 *||Sep 17, 2013||May 26, 2015||Freescale Semiconductor, Inc.||Side vented pressure sensor device|
|US9051174 *||Jul 6, 2009||Jun 9, 2015||Epcos Ag||Method for encapsulating an MEMS component|
|US20110180885 *||Jul 6, 2009||Jul 28, 2011||Epcos Ag||Method for encapsulating an mems component|
|US20150076630 *||Sep 17, 2013||Mar 19, 2015||Boon Yew Low||Side vented pressure sensor device|
|DE102014100464A1 *||Jan 16, 2014||Jul 16, 2015||Epcos Ag||Multi-MEMS-Modul|
| || |
|International Classification||B81C99/00, H01L29/84|
|Cooperative Classification||H01L2924/1461, H01L2224/48227, H01L2224/48091, H01L2224/73265, H04R19/005, B81B2201/0257, B81B7/0064, H04R1/04, H01L2924/3025, H01L2924/07811|
|European Classification||B81B7/00P10, H04R1/04|
|Jun 18, 2008||AS||Assignment|
Owner name: EPCOS AG, GERMANY
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAHL, WOLFGANG;LEIDL, ANTON;SEITZ, STEFAN;AND OTHERS;REEL/FRAME:021115/0962;SIGNING DATES FROM 20080513 TO 20080527
Owner name: EPCOS AG, GERMANY
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAHL, WOLFGANG;LEIDL, ANTON;SEITZ, STEFAN;AND OTHERS;SIGNING DATES FROM 20080513 TO 20080527;REEL/FRAME:021115/0962
|Jun 26, 2012||CC||Certificate of correction|