|Publication number||US8177993 B2|
|Application number||US 11/556,696|
|Publication date||May 15, 2012|
|Filing date||Nov 5, 2006|
|Priority date||Nov 5, 2006|
|Also published as||US20080105653, US20120255586|
|Publication number||11556696, 556696, US 8177993 B2, US 8177993B2, US-B2-8177993, US8177993 B2, US8177993B2|
|Inventors||Boon Meng Seah, Bei Chao Zhang, Raymond Joy, Shao Beng Law, John Sudijono, Liang Choo Hsia|
|Original Assignee||Globalfoundries Singapore Pte Ltd|
|Export Citation||BiBTeX, EndNote, RefMan|
|Patent Citations (30), Referenced by (4), Classifications (10), Legal Events (3)|
|External Links: USPTO, USPTO Assignment, Espacenet|
1) Field of the Invention
This invention relates generally to devices and methods for etching and cleaning semiconductor structures and more particularly to apparatuses and methods for etching and cleaning semiconductor structures, such as wafers.
2) Description of the Prior Art
Current practice use tremendous amount of chemicals & water for wet etching & cleaning of wafers. It is desirable to develop methods and tools to reduce chemical and water usage while improving the etching and cleaning of wafer.
The importance of overcoming the various deficiencies noted above is evidenced by the extensive technological development directed to the subject, as documented by the relevant patent and technical literature. The closest and apparently more relevant technical developments in the patent literature can be gleaned by considering the following.
Some non-limiting example embodiments of the present invention provide a structure and a method of cleaning and/or etching a substrate which may be characterized as follows.
In a first embodiment, of an apparatus for etching and/or cleaning a substrate comprises:
An aspect of the first embodiment, is a method of etching and cleaning substrate comprising the steps of:
providing the cleaning apparatus of the first embodiment;
A second example embodiment comprises an apparatus having capillary jet nozzles for cleaning a substrate that comprises:
An aspect of the second embodiment, further comprises: the nozzles are comprised of capillary jet nozzles.
An aspect of the second embodiment, further comprises: the nozzles are capillary jet nozzles having an opening with a diameter smaller than or about equal to 0.1 micron.
An aspect of the second embodiment is a method of cleaning a substrate comprising the steps of:
The above and below advantages and features are of representative embodiments only, and are not exhaustive and/or exclusive. They are presented only to assist in understanding the invention. It should be understood that they are not representative of all the inventions defined by the claims, to be considered limitations on the invention as defined by the claims, or limitations on equivalents to the claims. For instance, some of these advantages may be mutually contradictory, in that they cannot be simultaneously present in a single embodiment. Similarly, some advantages are applicable to one aspect of the invention, and inapplicable to others. Furthermore, certain aspects of the claimed invention have not been discussed herein. However, no inference should be drawn regarding those discussed herein relative to those not discussed herein other than for purposes of space and reducing repetition. Thus, this summary of features and advantages should not be considered dispositive in determining equivalence. Additional features and advantages of the invention will become apparent in the following description, from the drawings, and from the claims.
The features and advantages of an apparatus and method according to example embodiments of the present invention and further details in accordance with the present invention will be more clearly understood from the following description taken in conjunction with the accompanying drawings in which like reference numerals designate similar or corresponding elements, regions and portions and in which:
Below are descriptions of non-limiting example embodiments. The example embodiments do not limit the inventions defined by the claims.
A. Overview of Apparatus
The first example embodiment comprises a double manifold tool that may have a first manifold to etch/clean substrates and a second manifold to dry wafers.
The first manifold 24 (also called a blade) is attached to or connected to a first tubular shaft 40 or arm 40. The second manifold 28 can be connected to a second shaft 32 or arm 32. The first and second shafts can be connected to each other or can be merged into a common shaft behind the blades.
The substrate 10 can be a semiconductor substrate or wafer or any suitable structure at any stage of fabrication. This example embodiment is applicable to all stages of the process where cleaning or removal of particles/residues is required. The substrate (e.g., or wafer) can have overlaying layers such as insulating and conductive layers.
B. First Manifold
The bottom of the first manifold 24 (facing the substrate) preferably has a plurality of nozzles for dispensing chemicals onto the substrate.
The first manifold 24 can be attached to a first tubular shaft 40 that is connected to a chemical source 42. The first manifold (blade) 24 preferably has a width at least as wide as the substrate 10.
The first manifold 24 preferably has an elongated shape and has a plurality of spaced nozzles 50 on its underside. The manifold can have an elongated tubular shape. The manifold can have a length at least 4 or 6 or 8 times it's width.
The number of nozzles, rows and configuration can be optimized to improve the cleaning. The nozzles in the first and second manifolds can be comprised of capillary jet nozzles or capillary tubes. The capillary jet nozzles can have an opening diameter of about 0.1 micron or less.
C. Second Manifold
The second manifold 28 is preferably used to blow dry or vacuum dry the substrate.
The second manifold (blade) 28 can be attached to a vacuum source 33 (negative pressure) or to a dry air source 44 (positive pressure).
In an aspect of the process, simultaneously some of the nozzles can be blowing a gas onto the substrate and some of the nozzles can be sucking gas and liquid off the substrate.
When using the suction effect, the position of drying blade 28 is preferably kept close to the boundary layer of the liquid. With the application of suction, liquid will be drawn away from substrate surface.
The second manifold 28 can be connected to a second (double) tubular shaft 34 32 that can be connected to the vacuum source 33. The double tubular shaft is preferably comprised of an outer tube 32 and an inner tube 34. Other configurations are possible as the second tubular shaft can be made in other configurations such as the tube 32 being along side tube 34.
The first and second arms 40 and 32 34 can be connected to keep the manifolds 24 28 spaced apart. Other supports for the first and second arms are possible.
The second manifold (blade) preferably has a width at least as wide as the substrate 10.
D. Configuration of 1st and 2nd Manifolds
The first manifold (blade) 24 and the second manifold (blade) 28 are preferably spaced and preferably approximately parallel. The first and the second manifold (blades) are spaced from and approximately parallel to the transporting means 20.
The first and the second manifold (blade) are spaced from and approximately parallel to direction 21 of substrate travel on the track or transporting means 20.
The first manifold (blade) 24 and the second manifold (blade) 28 are spaced from each other a first distance.
The first shaft 40 and the second shaft 32/34 can be can be connected to each other.
E. Liquid Source
The liquid (e.g., chemical) source 42 is adapted to contain and handle chemicals comprising H20, DHF, SC1 (H2O+NH4OH+H2O2), and SC2 (H2O+HCl+H2O2), or any other chemicals used for etching and/or cleaning. The liquid source can supply more than one liquid and can supply different liquids at different times (or passes).
A sensor 25 can be used to determine the position of the semiconductor structure 10.
The sensor can be an optical or proximity type of sensor. The purpose is to detect the location of the wafer that will be placed correctly on the chuck or track 20.
The sensor can be mounted or located near or on the manifold or under the manifold. The sensor can be used to position the wafer and to prevent the blades from hitting the wafers.
In a first example method embodiment, the 1st example device embodiment is used in a method to clean and dry substrates.
The example method can be described as follows.
A. First Pass/Step—Clean/Etch Step
In a first pass, we pass the first manifold (blade) 24 and second manifold (blade) 28 (nozzle tube devices) over the substrate 10 from a first end to a second end of the substrate 10. We flow liquids (e.g., chemicals) thru the first manifold (blade) 24 and first liquid nozzles 50 onto the substrate 10. As the second manifold passes over the substrate, the second manifold removes the chemicals and other contaminants from the substrate with a vacuum through the second manifold (blade) 28 and second drying nozzles 60. Preferably both the first and second blades pass over the entire substrate surface.
In the first (forward) pass/step (and all other passes or steps), either the substrate moves and the blades are stationary, or the manifolds are stationary and the substrate moves. The wafer can be moved on the transportation means 20. Alternatively, both the substrate and the manifolds can move. When we state that the manifold moves relative to the wafer or wafer transporter, it is understood that either the manifold or the wafer/wafer transporter moves or both.
B. Optional Back-Up Step
In an optional (back-up) step, we pass the first and second blades 24 28 over the substrate from the second end to the first end of the substrate 10.
C. Second Pass/Step—Rinse/Dry Step
In a second (forward) pass step, we pass the first and second blades 24 28 over the substrate from a first end to a second end. We flow second liquid (e.g., water) from the liquid source through the first manifold (blade) 24 and first liquid nozzles 50 onto the substrate 10. We remove the liquid (expelled by the first nozzles) from the substrate by using a vacuum or a gas blown through the second manifold (blade) 28 and second nozzles 60.
The second example device embodiment is a wafer cleaning tool that has a first wafer scrubber manifold with capillary jet nozzles on the bottom.
The rotation means can comprise the following. A substrate chuck 216 can be vacuum activated and is mounted on a rotatable spindle 217. The spindle 217 can be operatively connected to an electric motor. A speed controller is operatively connected to the motor for rotating the spindle at a selected variable speed.
A. Wafer Scrubber Manifold has CJ Nozzles
A tubular 222 or circular 223 manifold (blade) preferably has a central passageway(s) in communication with spaced-apart capillary jet (CJ) nozzles 226 on the bottom of the blade 222. The manifold/blade can be placed just above the wafer/substrate.
B. Capillary Jet Nozzles
Very dense capillary jet (CJ) nozzles 226 on the bottom of the shower head (manifold) 222 are spaced as densely as possible to cover the entire bottom surface or at least the area corresponding to the substrate to be cleaned.
The CJ nozzles preferably have an opening with a size less than 0.1 micron or about equal to 0.1 micron. The idea is that the jet coming out of a 0.1 micron opening is small/“sharp” enough to dislodge similar sized particles on each area of the surface of the substrate.
The pressure of the liquid should be strong enough to dislodge particle/residues.
The (manifold) shower head 222 223 is preferably kept as close as possible to the wafer (close to the boundary layer) for maximum effect.
The tubular capillary jet device 222 is configured to orient the capillary nozzles to direct the jet stream of liquid to the surface of the substrate at an angle of incidence with respect to the surface of the wafer of not more than about 10 degrees.
The capillary jet nozzles preferably point in an approximately vertical direction (within +/−10 degrees of vertical) to the surface of the substrate.
There are preferably at least 1 or more rows of CJ nozzles 226. The nozzles can also have other orientations. The exact number or row and nozzles should be optimized for the particular process.
For the round (circular or cylindrical) manifold in
An arm is connected (directly or indirectly) to or attached to the tubular manifold. Indirectly connected means that another object(s) can be connected to the manifold and to the arm. For example, referring to
The arm can have arm supports 231.
In operation the manifold can be moved back and forth across the wafer or the wafer is moved relative to the manifold.
D. Liquid Source
The liquid source 236 is connected to the manifold. The liquid source can supply water or a chemical and, most preferably, supplies water.
The liquid source 236 and the capillary jet nozzles are adapted to inject the water jet steam.
A liquid (e.g., water) source 236 is connected to a retractable arm 230 that communicates with the capillary jet nozzles to produce a jet stream of liquid 240.
E. Retraction Means
The retraction means that moves the manifold to pass over the wafer can be comprised of a motor mechanism. The retraction means can be connected to the arm 230.
In a second example method embodiment, the 2nd example device embodiment (
The example method can be described as follows.
We provide the equipment described above for the second device embodiment.
A. Rotate the Substrate Upon the Substrate Chuck
We rotate the substrate 210 upon the substrate chuck 216.
B. Direct a Stream of Liquid from the Capillary Jet Nozzles onto the Surface of the Substrate
We direct a stream of liquid 240 from the capillary jet nozzles 226 onto the surface of the substrate 210. Water or a liquid from the liquid source 236 passes through the arm 230, manifold 222 and CJ nozzles 226 onto the substrate.
C. Manifold Across the Entire Substrate
We move the retractable arm 230 and tubular capillary jet device 222 across the entire substrate 210 in a first direction and back in an opposite direction.
The stream of fluid 240 from the capillary jet nozzles 226 has a pressure on the substrate surface. The stream cleans the surface of the substrate.
The method can also comprise withdrawing the manifold so the manifold is not over the substrate. Then we can spin the substrate using the substrate chuck to dry the substrate.
D. Non-Limiting Example Embodiments
While the invention has been particularly shown and described with reference to the preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of the invention. It is intended to cover various modifications and similar arrangements and procedures, and the scope of the appended claims, therefore, should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements and procedures.
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|U.S. Classification||216/83, 216/92, 134/1.3|
|Cooperative Classification||H01L21/67028, H01L21/6708, H01L21/67051|
|European Classification||H01L21/67S2D4W4, H01L21/67S2D8W4, H01L21/67S2D4|
|Nov 5, 2006||AS||Assignment|
Owner name: CHARTERED SEMICONDUCTOR MANUFACTURING LTD, SINGAPO
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SEAH, BOON MENG;ZHANG, BEI CHAO;JOY, RAYMOND;AND OTHERS;REEL/FRAME:018481/0418;SIGNING DATES FROM 20061012 TO 20061026
Owner name: CHARTERED SEMICONDUCTOR MANUFACTURING LTD, SINGAPO
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SEAH, BOON MENG;ZHANG, BEI CHAO;JOY, RAYMOND;AND OTHERS;SIGNING DATES FROM 20061012 TO 20061026;REEL/FRAME:018481/0418
|Apr 10, 2012||AS||Assignment|
Owner name: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD., S
Free format text: CHANGE OF NAME;ASSIGNOR:CHARTERED SEMICONDUCTOR MANUFACTURING LTD.;REEL/FRAME:028024/0095
Effective date: 20100115
Owner name: GLOBALFOUNDRIES SINGAPORE PTE. LTD., SINGAPORE
Free format text: CHANGE OF NAME;ASSIGNOR:CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.;REEL/FRAME:028024/0097
Effective date: 20100115
|Oct 28, 2015||FPAY||Fee payment|
Year of fee payment: 4