High-loft nonwoven material
US D226048 S
Description (OCR text may contain errors)
United States Patent Oflicc Des. 226,048
Patented Jan. 16, 1973 HIGH-LOFT NONWOVEN MATERIAL Robert J. Stumpf, Appleton, and William J. Mattes and Herman G. Minshell, Neenah, Wis., assignors to Kimberly-Clark Corporation, Neenah, Wis.
Filed Oct. 5, 1970, Ser. No. 25,348
Term of patent 14 years Int. Cl. D505 U.S. Cl. D92-1 FIG. 1 is a top plan view of a high]0ft nonwoven material showing our new design, the repeat unit being marked with intersecting lines, the design being shown over a dark background for purposes of illustration; and
FIG. 2 is a fragmentary top plan view thereof in a vertically stretched condition.
The ornamental design for a high-loft nonwoven material, as shown and described.
References Cited UNITED STATES PATENTS D. 128,803 8/1941 Schiess D87-3 D. 217.211 4/1970 Rost D92l 3,l50,416 9/1964 Such l916l P LOIS S. LANIER, Primary Examiner