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Publication numberUSD275032 S
Publication typeGrant
Application numberUS 06/337,373
Publication dateAug 7, 1984
Filing dateJan 6, 1982
Publication number06337373, 337373, US D275032 S, US D275032S, US-S-D275032, USD275032 S, USD275032S
InventorsJoseph A. Maher, Jr., Arthur W. Zafiropoulo
Original AssigneeDrytek, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Plasma cassette etcher
US D275032 S
Abstract  available in
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  1. The ornamental design for a plasma cassette etcher, substantially as shown and described.

FIG. 1 is a front perspective view of a plasma cassette etcher showing our new design;

FIG. 2 is a front elevational view of the plasma cassette etcher shown in FIG. 1;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a left side elevational view thereof, looking toward the left side thereof as it is shown in FIGS. 1 and 2; and

FIG. 7 is a right side elevational view thereof, looking toward the right side thereof as it is shown in FIGS. 1 and 2.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US6773683Jan 8, 2002Aug 10, 2004Uvtech Systems, Inc.Photocatalytic reactor system for treating flue effluents
US7270724Dec 13, 2000Sep 18, 2007Uvtech Systems, Inc.Scanning plasma reactor
U.S. ClassificationD24/234