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Publication numberUSD349586 S
Publication typeGrant
Application numberUS 07/478,783
Publication dateAug 9, 1994
Filing dateFeb 7, 1990
Publication number07478783, 478783, US D349586 S, US D349586S, US-S-D349586, USD349586 S, USD349586S
InventorsPatrick M. Handke
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask
US D349586 S
Images(2)
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Claims(1)
  1. The ornamental design for a mask, as shown and described.
Description

FIG. 1 is a top and side perspective view of a mask showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a front elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof;

FIG. 8 is a top and side perspective view of a second embodiment of the mask; and,

FIG. 9 is a top and rear perspective view of FIG. 8.

The bottom of the second embodiment being the same as the first embodiment shown in FIG. 3.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US6412488May 12, 1999Jul 2, 2002Respironics, Inc.Low contact nasal mask and system using same
US6467483Jul 28, 1999Oct 22, 2002Respironics, Inc.Respiratory mask
US6651663May 25, 2001Nov 25, 2003Respironics, Inc.Nasal mask and system using same
US6729333Jun 3, 2002May 4, 2004Respironics, Inc.Low contact nasal mask and system using same
US6959710Nov 12, 2003Nov 1, 2005Respironics, Inc.Nasal mask and system using same
US7703457Sep 27, 2005Apr 27, 2010Respironics, IncNasal mask and system using same
Classifications
U.S. ClassificationD24/110.4, D24/162