Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUSD352779 S
Publication typeGrant
Application numberUS 29/010,915
Publication dateNov 22, 1994
Filing dateJul 22, 1993
Publication number010915, 29010915, US D352779 S, US D352779S, US-S-D352779, USD352779 S, USD352779S
InventorsDeanna E. Imbro, Massimo Imbro
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Diaper
US D352779 S
Abstract  available in
Images(4)
Previous page
Next page
Claims(1)
  1. The ornamental design for a diaper, as shown and described.
Description

FIG. 1 is a front elevational view of a diaper showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is an isometric view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US7851666 *May 30, 2003Dec 14, 2010Kimberly-Clark Worldwide, Inc.Components of articles including contrasting printed blocks
US7919668May 30, 2003Apr 5, 2011Kimberly-Clark Worldwide, Inc.Components of articles including continuous detector materials
US20030229325 *May 30, 2003Dec 11, 2003Kimberly-Clark Worldwide, Inc.Components of articles including continuous detector materials
US20030233081 *May 30, 2003Dec 18, 2003Kimberly-Clark Worldwide, Inc.Components of articles including contrasting printed blocks
USD779655 *Apr 22, 2014Feb 21, 2017The Procter & Gamble CompanyAbsorbent article substrate with a pattern
Classifications
U.S. ClassificationD24/126, D24/124