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Publication numberUSD352911 S
Publication typeGrant
Application numberUS 29/004,587
Publication dateNov 29, 1994
Filing dateFeb 8, 1993
Priority dateNov 27, 1992
Publication number004587, 29004587, US D352911 S, US D352911S, US-S-D352911, USD352911 S, USD352911S
InventorsTakashi Yamamoto, Tomoyuki Miyata, Kazunori Hasimoto, Mitsuru Ohnuma, Toshihiko Wada, Seishiro Sato
Original AssigneeHitachi, Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Processing machine for electron beam lithography system
US D352911 S
Images(7)
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Claims(1)
  1. The ornamental design for a processing machine for electron beam lithography system, as shown and described.
Description

FIG. 1 is a front, top and right side elevational perspective view of a processing machine showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right elevational view thereof;

FIG. 4 is a left elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a front, top and right side elevational perspective view thereof in condition that a drawer on which a keyboard and a mouse pad is disposed.

Classifications
U.S. ClassificationD10/75, D10/46