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Publication numberUSD389238 S
Publication typeGrant
Application numberUS 29/065,363
Publication dateJan 13, 1998
Filing dateJan 24, 1997
Publication number065363, 29065363, US D389238 S, US D389238S, US-S-D389238, USD389238 S, USD389238S
InventorsKarl Dallas Kirk, III, James T. Collins, III, Jose L. Correa
Original AssigneeHealthscan Products, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Inhaler mask
US D389238 S
Abstract  available in
Images(9)
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Claims(1)
  1. The ornamental design for an inhaler mask, as shown and described.
Description

FIG. 1 is a left front perspective view of a first embodiment of our design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a front elevation view thereof;

FIG. 4 is a right side elevation view thereof, the left side elevation view being a mirror image thereof;

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a rear elevation view thereof; and

FIG. 7 is a sectional view thereof, taken along line 7--7 of FIG. 3;

FIG. 8 is a front left side perspective view of a second embodiment of our design;

FIG. 9 is a top plan view thereof;

FIG. 10 is a front elevation view thereof;

FIG. 11 is a right side elevation view thereof, the left side elevation view being a mirror image thereof;

FIG. 12 is a bottom plan view thereof;

FIG. 13 is a rear elevation view thereof; and

FIG. 14 is a section elevation view, taken along line 14--14 in FIG. 10;

FIG. 15 is a front perspective view of a third embodiment of our design;

FIG. 16 is a top plan view thereof;

FIG. 17 is a front elevation view thereof;

FIG. 18 is a right side elevation view thereof, the left side elevation view being a mirror image thereof;

FIG. 19 is a bottom plan view thereof;

FIG. 20 is a rear elevation view thereof; and,

FIG. 21 is a section elevation view, taken along line 21--21 of FIG. 17.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US6412488May 12, 1999Jul 2, 2002Respironics, Inc.Low contact nasal mask and system using same
US6467483Jul 28, 1999Oct 22, 2002Respironics, Inc.Respiratory mask
US6729333Jun 3, 2002May 4, 2004Respironics, Inc.Low contact nasal mask and system using same
US6959710Nov 12, 2003Nov 1, 2005Respironics, Inc.Nasal mask and system using same
US7703457Sep 27, 2005Apr 27, 2010Respironics, IncNasal mask and system using same
Classifications
U.S. ClassificationD24/110.4