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Publication numberUSD400674 S
Publication typeGrant
Application numberUS 29/053,299
Publication dateNov 3, 1998
Filing dateApr 19, 1996
Priority dateOct 30, 1995
Publication number053299, 29053299, US D400674 S, US D400674S, US-S-D400674, USD400674 S, USD400674S
InventorsMasuo Miura
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask for maintaining warmth in nasal and lacrimal areas
US D400674 S
Abstract  available in
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  1. The ornamental design for a mask for maintaining warmth in nasal and lacrimal areas, as shown and described.

FIG. 1 is a front elevation view of a mask for maintaining warmth in nasal and lacrimal areas showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a right side elevation view thereof; and,

FIG. 7 is a perspective view thereof, the person shown in broken lines is for illustrative purposes only and forms no part of the claimed design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD666776 *Jun 3, 2010Sep 4, 2012Kyu-Sung ShimHygiene mask
U.S. ClassificationD24/110.1