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Publication numberUSD404016 S
Publication typeGrant
Application numberUS 29/074,282
Publication dateJan 12, 1999
Filing dateJul 24, 1997
Priority dateJan 31, 1997
Publication number074282, 29074282, US D404016 S, US D404016S, US-S-D404016, USD404016 S, USD404016S
InventorsKatsutoshi Ishii
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Heat retaining tube for use in a semiconductor wafer heat processing apparatus
US D404016 S
Abstract  available in
Images(3)
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Claims(1)
  1. I claim the ornamental design for heat retaining tube for use in a semiconductor wafer heat processing apparatus, as shown and described.
Description

FIG. 1 a perspective view of a heat retaining tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2 a top plan view thereof;

FIG. 3 a front elevational view thereof;

FIG. 4 a cross sectional view taken along line IV--IV in FIG. 3;

FIG. 5 a cross sectional view taken along line V--V in FIG. 3;

FIG. 6 a rear elevational view thereof;

FIG. 7 a left side view thereof, the right side view being a mirror image of the left view; and,

FIG. 8 a bottom plan view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20100282695 *Nov 5, 2009Nov 11, 2010Mark SandiferHigh strength camfer on quartzware
Classifications
U.S. ClassificationD13/182