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Publication numberUSD405428 S
Publication typeGrant
Application numberUS 29/074,285
Publication dateFeb 9, 1999
Filing dateJul 24, 1997
Priority dateJan 31, 1997
Publication number074285, 29074285, US D405428 S, US D405428S, US-S-D405428, USD405428 S, USD405428S
InventorsKatsutoshi Ishii
Original AssigneeTokyo Electron Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Heat retaining tube for use in a semiconductor wafer heat processing apparatus
US D405428 S
Abstract  available in
Images(4)
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Claims(1)
  1. I claim the ornamental design for a heat retaining tube for use in a semiconductor wafer heat processing apparatus, as shown and described.
Description

FIG. 1: a perspective view of a heat retaining tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2: a top plan view thereof;

FIG. 3: a front elevational view thereof;

FIG. 4: a cross sectional view thereof taken along line IV--IV in FIG. 3;

FIG. 5: a cross sectional view thereof taken along line V--V in FIG. 3;

FIG. 6: a left side view thereof;

FIG. 7: a right side view thereof;

FIG. 8: a bottom plan view thereof; and,

FIG. 9: a rear elevational view thereof.

Classifications
U.S. ClassificationD13/182