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Publication numberUSD405430 S
Publication typeGrant
Application numberUS 29/074,301
Publication dateFeb 9, 1999
Filing dateJul 24, 1997
Priority dateJan 31, 1997
Publication number074301, 29074301, US D405430 S, US D405430S, US-S-D405430, USD405430 S, USD405430S
InventorsNoriaki Matsushima
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Inner tube for use in a semiconductor wafer heat processing apparatus
US D405430 S
Abstract  available in
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  1. I claim the ornamental design for inner tube for use in a semiconductor wafer heat processing apparatus, as shown and described.

FIG. 1: a perspective view of a inner tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2: a front elevational view thereof, the rear elevational view, the right side view and the left side view are identical with the front view;

FIG. 3: a top plan view thereof;

FIG. 4: a bottom plan view thereof; and,

FIG. 5: a cross sectional view thereof taken along line V-V in FIG. 3.

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U.S. ClassificationD13/182