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Publication numberUSD407073 S
Publication typeGrant
Application numberUS 29/081,237
Publication dateMar 23, 1999
Filing dateDec 24, 1997
Publication number081237, 29081237, US D407073 S, US D407073S, US-S-D407073, USD407073 S, USD407073S
InventorsVincent E. Burkhart, Allen Flanigan, Steven Sansoni
Original AssigneeApplied Materials, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Electrostatic chuck with improved spacing and charge migration reduction mask
US D407073 S
Images(2)
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Claims(1)
  1. The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown herein.
Description

FIG. 1 is a top view of the electrostatic chuck having the improved spacing and charge migration reduction mask;

FIG. 2 is an elevation view of the electrostatic chuck when looking up along the y-axis in FIG. 1, the view when looking down along the y-axis being a mirror image of FIG. 2;

FIG. 2A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 2;

FIG. 3 is a bottom view of the electrostatic chuck;

FIG. 4 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1;

FIG. 4A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 4;

FIG. 5 is an elevation view of the electrostatic chuck when looking to the left along the x-axis in FIG. 1 and; and,

FIG. 5A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 5.

Classifications
U.S. ClassificationD13/199