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Publication numberUSD420023 S
Publication typeGrant
Application numberUS 29/098,986
Publication dateFeb 1, 2000
Filing dateJan 9, 1999
Publication number098986, 29098986, US D420023 S, US D420023S, US-S-D420023, USD420023 S, USD420023S
InventorsAllen Flanigan, Steven Sansoni, Vincent E. Burkhart
Original AssigneeApplied Materials, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Electrostatic chuck with improved spacing mask and workpiece detection device
US D420023 S
Abstract  available in
Images(2)
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Claims(1)
  1. The ornamental design for an electrostatic chuck with improved spacing mask and workpiece detection device, as shown.
Description

FIG. 1 is a top view of the electrostatic chuck with the improved spacing mask and workpiece detection device;

FIG. 2 is an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;

FIG. 3 is a detailed view of part of the electrostatic chuck seen in FIG. 2;

FIG. 4 is a bottom view of the electrostatic chuck;

FIG. 5 is an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;

FIG. 6 is an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1; and,

FIG. 7 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1.

Classifications
U.S. ClassificationD15/140