Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.


  1. Advanced Patent Search
Publication numberUSD426710 S
Publication typeGrant
Application numberUS 29/101,527
Publication dateJun 20, 2000
Filing dateMar 4, 1999
Publication number101527, 29101527, US D426710 S, US D426710S, US-S-D426710, USD426710 S, USD426710S
InventorsUrsula Sattler-Cohen
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Repeating pattern for an embossed wipe or similar article
US D426710 S
Abstract  available in
Previous page
Next page
  1. The ornamental design for a repeating pattern for an embossed wipe or similar article, as shown and described.

The single FIGURE is a top plan view of a repeating pattern for an embossed wipe or similar article showing my new design. The broken lines in the drawing define the boundaries of the claimed design, as well as the portion of the wipe or similar article to which the pattern is applied. It is understood that the claimed pattern repeats uniformly thoughout the length and width of the wipe or similar article. The broken lines form no part of the claim.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD742122 *Feb 21, 2014Nov 3, 2015Nice-Pak Products, Inc.Nonwoven fabric having a surface pattern
U.S. ClassificationD05/53, D05/20, D05/27