USD440582S1 - Sputtering chamber coil - Google Patents
Sputtering chamber coil Download PDFInfo
- Publication number
- USD440582S1 USD440582S1 US29/090,631 US9063198F USD440582S US D440582 S1 USD440582 S1 US D440582S1 US 9063198 F US9063198 F US 9063198F US D440582 S USD440582 S US D440582S
- Authority
- US
- United States
- Prior art keywords
- sputtering chamber
- chamber coil
- coil
- sputtering
- ornamental design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a front elevational view;
FIG. 2 is a top view;
FIG. 3 is a right side elevational view;
FIG. 4 is a bottom view; and,
FIG. 5 is a rear elevational view of our sputtering chamber coil.
The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.
Claims (1)
- The ornamental design for sputtering chamber coil, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/090,631 USD440582S1 (en) | 1998-03-16 | 1998-07-13 | Sputtering chamber coil |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3969598 | 1998-03-16 | ||
US29/090,631 USD440582S1 (en) | 1998-03-16 | 1998-07-13 | Sputtering chamber coil |
Publications (1)
Publication Number | Publication Date |
---|---|
USD440582S1 true USD440582S1 (en) | 2001-04-17 |
Family
ID=21906880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/090,631 Expired - Lifetime USD440582S1 (en) | 1998-03-16 | 1998-07-13 | Sputtering chamber coil |
Country Status (1)
Country | Link |
---|---|
US (1) | USD440582S1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6660134B1 (en) * | 1998-07-10 | 2003-12-09 | Applied Materials, Inc. | Feedthrough overlap coil |
-
1998
- 1998-07-13 US US29/090,631 patent/USD440582S1/en not_active Expired - Lifetime
Non-Patent Citations (19)
Title |
---|
Applied Materials, Inc., Exhibit A, Dated prior to Jul. 13, 1998, the filing date of the present application.(Exhibit A is a drawing of a prior art coil design which is prior to the design of the present application). |
J. Hopwood et al., "Mechanisms for Highly Ionized Magnetron Sputtering," J. Appl. Phys., vol. 78, pp. 758-765, 1995. |
N. Jiwari et al., "Helicon wave plasma reactor employing single-loop antenna," J. of Vac. Sci. Technol., A 12(4), pp. 1322-1327, Jul./Aug. 1994. |
S.M. Rossnagel et al., "Magnetron Sputter Deposition with High Levels of Metal Ionization," Appl. Phys. Lett., vol. 63, pp. 3285-3287, 1993. |
S.M. Rossnagel, "Directional and Ionized Sputter Deposition for Microelectronics Applications," Proc. of 3rd ISSP (Tokyo), pp. 253-260, 1995. |
Search report in PCT/US98/10058 issued Nov. 4, 1998. |
U.S. application No. 08/559,345 filed Nov. 15, 1995. |
U.S. application No. 08/730,722 filed Oct. 8, 1996. |
U.S. application No. 08/856,335, filed May 14, 1997. |
U.S. application No. 08/857,719, filed May 16, 1997. |
U.S. application No. 08/857,944, filed May 16, 1997. |
U.S. application No. 09/039,695, filed Mar. 16, 1998. |
U.S. application No. 09/049,276 filed Mar. 27, 1998. |
U.S. application No. 09/064,355, filed Apr. 22, 1998. |
U.S. application No. 09/113,577, filed Jul. 10, 1998. |
U.S. application No. 29/090,618, filed Jul. 13, 1998. |
U.S. application No. 29/109,870. |
U.S. application No. 29/109,892. |
U.S. application No. 29/109,893. |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6660134B1 (en) * | 1998-07-10 | 2003-12-09 | Applied Materials, Inc. | Feedthrough overlap coil |
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