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Publication numberUSD446506 S1
Publication typeGrant
Application numberUS 29/114,735
Publication dateAug 14, 2001
Filing dateNov 30, 1999
Priority dateNov 30, 1999
Publication number114735, 29114735, US D446506 S1, US D446506S1, US-S1-D446506, USD446506 S1, USD446506S1
InventorsAvi Tepman
Original AssigneeApplied Materials, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Monolith processing system platform
US D446506 S1
Images(6)
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Claims(1)
  1. The ornamental design for a monolith processing system platform.
Description

FIG. 1 is a top perspective view of a monolith processing system platform of the present invention;

FIG. 2 is a perspective view showing substantially the top of a monolith processing system platform of the present invention;

FIG. 3 is a perspective view showing substantially one side of a monolith processing system platform of the present invention;

FIG. 4 is a perspective view showing substantially another side of a monolith processing system platform of the present invention;

FIG. 5 is a perspective view showing substantially the back end of a monolith processing system platform of the present invention; and

FIG. 6 is a perspective view showing substantially the front end of a monolith processing system platform of the present invention; and,

FIG. 7 is a perspective view showing substantially the bottom of a monolith processing system platform of the present invention.

Classifications
U.S. ClassificationD13/182