Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.

Patents

  1. Advanced Patent Search
Publication numberUSD453402 S1
Publication typeGrant
Application numberUS 29/099,072
Publication dateFeb 5, 2002
Filing dateJan 12, 1999
Priority dateAug 22, 1990
Publication number099072, 29099072, US D453402 S1, US D453402S1, US-S1-D453402, USD453402 S1, USD453402S1
InventorsShigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
Original AssigneeHitachi, Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Vacuum processing equipment configuration
US D453402 S1
Images(6)
Previous page
Next page
Claims(1)
  1. The ornamental design for a vacuum processing equipment configuration, as shown and described.
Description

FIG. 1 is front, top and left side perspective view of cassettes storage eguipment in relation to a conveyor equipped robot and load and unload chambers showing our new design;

FIG. 2 is a top plan view;

FIG. 3 is a front side elevational view;

FIG. 4 is a right side elevational view;

FIG. 5 is a rear side elevational view;

FIG. 6 is a left side elevational view;

FIG. 7 is a bottom plan view; and,

FIG. 8 is a right side elevational view along line 8—8 of FIG. 2.

The details shown in broken lines in all views is for illustrative purposes only and form no part of the claimed design.

Non-Patent Citations
Reference
1R.P.H. Chang, "Multipurpose plasma reactor for materials research and processing", J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 278-280.
2Semiconductor Equipment Association of Japan, "Semiconductor News", vol. 4, pp. 38-43, Apr. 10, 1987 (w/translation).
3Semiconductor Equipment Association of Japan, Terminological Dictionary of Semiconductor Equipment), front, table, p. 183, back, Nov. 20, 1987.
Classifications
U.S. ClassificationD32/1