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Publication numberUSD470551 S1
Publication typeGrant
Application numberUS 29/108,927
Publication dateFeb 18, 2003
Filing dateAug 6, 1999
Priority dateAug 6, 1999
Publication number108927, 29108927, US D470551 S1, US D470551S1, US-S1-D470551, USD470551 S1, USD470551S1
InventorsChi-Chin Lin
Original AssigneeChi-Chin Lin
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask
US D470551 S1
Images(5)
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Claims(1)
  1. The ornamental design for a mask, as shown and described.
Description

FIG. 1 is a perspective view of a mask showing my new design;

FIG. 2 is a side elevation as seen from the right side of FIG. 1;

FIG. 3 is a side elevation as seen from the left side of FIG. 1;

FIG. 4 is a front elevation thereof;

FIG. 5 is a rear elevation thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Non-Patent Citations
Reference
1Hong Kong Toys, vol. 1, 1995, p. 211, item #161, masks.
Classifications
U.S. ClassificationD21/660, D21/622