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Publication numberUSD495150 S1
Publication typeGrant
Application numberUS 29/194,419
Publication dateAug 31, 2004
Filing dateNov 24, 2003
Priority dateNov 24, 2003
Publication number194419, 29194419, US D495150 S1, US D495150S1, US-S1-D495150, USD495150 S1, USD495150S1
InventorsGary Hennel, Nick Carter
Original AssigneePolymer Group, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Apertured continuous filament fabric
US D495150 S1
Images(2)
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Claims(1)
  1. The ornamental design for an apertured continuous filament fabric, substantially as shown and described.
Description

The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being a mirror image.

Classifications
U.S. ClassificationD05/47