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Publication numberUSD496795 S1
Publication typeGrant
Application numberUS 29/194,390
Publication dateOct 5, 2004
Filing dateNov 24, 2003
Priority dateNov 24, 2003
Publication number194390, 29194390, US D496795 S1, US D496795S1, US-S1-D496795, USD496795 S1, USD496795S1
InventorsGary Hennel, Nick Carter
Original AssigneePolymer Group, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Apertured continuous filament fabric
US D496795 S1
Abstract  available in
Images(2)
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Claims(1)
  1. The ornamental design for an apertured continuous filament fabric, substantially as shown and described.
Description

The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being identical.

Classifications
U.S. ClassificationD05/47