Search Images Maps Play YouTube News Gmail Drive More »
Sign in
Screen reader users: click this link for accessible mode. Accessible mode has the same essential features but works better with your reader.


  1. Advanced Patent Search
Publication numberUSD501091 S1
Publication typeGrant
Application numberUS 29/198,963
Publication dateJan 25, 2005
Filing dateFeb 6, 2004
Priority dateFeb 6, 2004
Publication number198963, 29198963, US D501091 S1, US D501091S1, US-S1-D501091, USD501091 S1, USD501091S1
InventorsWyman D. McGahee
Original AssigneeWyman D. McGahee
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Camouflage pattern applied to material
US D501091 S1
Abstract  available in
Previous page
Next page
  1. The ornamental design for a camouflage pattern applied to material, as shown and described.

The sole FIGURE is a top plan view of a camouflage pattern applied to material showing my new design.

The broken line border about the outer perimeter is indicative of indeterminate size and shape and depicts the material to which the camouflage pattern is applied and is not part of the design. The vertical and horizontal sinusoidal shaped white lines, which are not part of the claimed design, indicate that the design continues indeterminately in both length and width.

It is to be understood that the pattern as well as the scale of the repeat unit may be varied.

The varying patterns of grey tones, dots, and solid black are understood to represent contrast.

The bottom surface is plain and unadorned.

U.S. ClassificationD05/62