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Publication numberUSD502325 S1
Publication typeGrant
Application numberUS 29/194,442
Publication dateMar 1, 2005
Filing dateNov 24, 2003
Priority dateNov 24, 2003
Publication number194442, 29194442, US D502325 S1, US D502325S1, US-S1-D502325, USD502325 S1, USD502325S1
InventorsGary Hennel, Nick Carter
Original AssigneePolymer Group, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Apertured continuous filament fabric
US D502325 S1
Abstract  available in
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  1. The ornamental design for an apertured continuous filament fabric, substantially as shown and described.

The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being identical.

U.S. ClassificationD05/47