|Publication number||USD502325 S1|
|Application number||US 29/194,442|
|Publication date||Mar 1, 2005|
|Filing date||Nov 24, 2003|
|Priority date||Nov 24, 2003|
|Publication number||194442, 29194442, US D502325 S1, US D502325S1, US-S1-D502325, USD502325 S1, USD502325S1|
|Inventors||Gary Hennel, Nick Carter|
|Original Assignee||Polymer Group, Inc.|
|Export Citation||BiBTeX, EndNote, RefMan|
|Classifications (1) |
|External Links: USPTO, USPTO Assignment, Espacenet|
Apertured continuous filament fabric
US D502325 S1
The ornamental design for an apertured continuous filament fabric, substantially as shown and described.
The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being identical.