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Publication numberUSD512227 S1
Publication typeGrant
Application numberUS 29/214,359
Publication dateDec 6, 2005
Filing dateSep 29, 2004
Priority dateSep 29, 2004
Publication number214359, 29214359, US D512227 S1, US D512227S1, US-S1-D512227, USD512227 S1, USD512227S1
InventorsNick M. Carter
Original AssigneePolymer Group, Inc.
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Apertured, continuous filament fabric
US D512227 S1
Abstract  available in
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  1. The ornamental design for an apertured, continuous filament fabric, as shown and described.

The sole FIGURE is a fragmentary, elevational view of one face of an apertured, continuous filament fabric showing my new design.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD734063 *Jun 3, 2014Jul 14, 2015Marilynn EvertForehead yoga mat
U.S. ClassificationD05/47