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Publication numberUSD518605 S1
Publication typeGrant
Application numberUS 29/213,445
Publication dateApr 4, 2006
Filing dateSep 20, 2004
Priority dateSep 20, 2004
Publication number213445, 29213445, US D518605 S1, US D518605S1, US-S1-D518605, USD518605 S1, USD518605S1
InventorsChun-Nan Chen
Original AssigneeChun-Nan Chen
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask
US D518605 S1
Abstract  available in
Images(5)
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Claims(1)
  1. The ornamental design for a mask, as shown and described.
Description

FIG. 1 is a perspective view of a mask showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US8011026Sep 6, 2011Kee Action Sports I LlcFace mask and goggle system
US8549672Sep 2, 2011Oct 8, 2013Kee Action Sports I LlcFace mask and goggle system
US20070050896 *May 19, 2006Mar 8, 2007National Paintball Supply, Inc.Face mask and goggle system
USD668000Sep 25, 20123M Innovative Properties CompanyHead harness
Classifications
U.S. ClassificationD29/108