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Publication numberUSD521464 S1
Publication typeGrant
Application numberUS 29/204,406
Publication dateMay 23, 2006
Filing dateApr 29, 2004
Priority dateNov 4, 2003
Publication number204406, 29204406, US D521464 S1, US D521464S1, US-S1-D521464, USD521464 S1, USD521464S1
InventorsKatsutoshi Ishii, Hiroyuki Matsuura
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Process tube for semiconductor device manufacturing apparatus
US D521464 S1
Abstract  available in
Images(11)
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Claims(1)
  1. The ornamental design for a process tube for semiconductor device manufacturing apparatus, as shown and described.
Description

FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;

FIG. 2 is a front view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top view thereof;

FIG. 6 is a bottom view thereof;

FIG. 7 is a sectional view along line 7—7 shown in FIG. 5;

FIG. 8 is a sectional view along line 8—8 shown in FIG. 7;

FIG. 9 is a sectional view along line 9—9 shown in FIG. 5;

FIG. 10 is a sectional view along line 10—10 shown in FIG. 5; and,

FIG. 11 is a sectional view along line 11—11 shown in FIG. 5.

A rear view is not shown as the rear view is a mirror image of the front view shown in FIG. 2.

Classifications
U.S. ClassificationD13/182