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Publication numberUSD521465 S1
Publication typeGrant
Application numberUS 29/204,408
Publication dateMay 23, 2006
Filing dateApr 29, 2004
Priority dateNov 4, 2003
Publication number204408, 29204408, US D521465 S1, US D521465S1, US-S1-D521465, USD521465 S1, USD521465S1
InventorsKatsutoshi Ishii, Hiroyuki Matsuura
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Process tube for semiconductor device manufacturing apparatus
US D521465 S1
Images(10)
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Claims(1)
  1. The ornamental design for a process tube for semiconductor device manufacturing apparatus, as shown and described.
Description

FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a sectional view along line 88 shown in FIG. 6;

FIG. 9 is a sectional view along line 99 shown in FIG. 6;

FIG. 10 is a sectional view along line 1010 shown in FIG. 6; and,

FIG. 11 is a sectional view along line 1111 shown in FIG. 2.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US20110278164 *Aug 22, 2010Nov 17, 2011Hon Hai Precision Industry Co., Ltd.Sputtering device
Classifications
U.S. ClassificationD13/182