|Publication number||USD522720 S1|
|Application number||US 29/214,688|
|Publication date||Jun 13, 2006|
|Filing date||Oct 8, 2004|
|Priority date||Oct 8, 2004|
|Publication number||214688, 29214688, US D522720 S1, US D522720S1, US-S1-D522720, USD522720 S1, USD522720S1|
|Inventors||Cherryll A. LeBlanc|
|Original Assignee||Leblanc Cherryll A|
|Export Citation||BiBTeX, EndNote, RefMan|
|Referenced by (1), Classifications (2) |
|External Links: USPTO, USPTO Assignment, Espacenet|
US D522720 S1
The ornamental design for a hat, as shown and described.
FIG. 1 is an enlarged perspective view of a hat showing my new design;
FIG. 2 is a top view thereof;
FIG. 3 is a bottom view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a front elevational view thereof; and,
FIG. 7 is a rear elevational view thereof.
The broken lines showing in each of the Figures represent stitching that forms a part of the claimed design.
|Citing Patent||Filing date||Publication date||Applicant||Title|
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