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Publication numberUSD546354 S1
Publication typeGrant
Application numberUS 29/237,008
Publication dateJul 10, 2007
Filing dateAug 26, 2005
Priority dateJul 15, 2005
Publication number237008, 29237008, US D546354 S1, US D546354S1, US-S1-D546354, USD546354 S1, USD546354S1
InventorsHideki Kihara, Minoru Soraoka, Yuzo Ohirabaru, Nobuo Nagayasu
Original AssigneeHitachi High-Technologies Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Semiconductor manufacturing apparatus
US D546354 S1
Abstract  available in
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  1. The ornamental design for a semiconductor manufacturing apparatus, as shown.

FIG. 1 is a front, top and left side perspective view of semiconductor manufacturing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof; and,

FIG. 7 is a rear elevational view thereof.

U.S. ClassificationD15/199