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Publication numberUSD555837 S1
Publication typeGrant
Application numberUS 29/266,393
Publication dateNov 20, 2007
Filing dateSep 20, 2006
Priority dateSep 20, 2006
Publication number266393, 29266393, US D555837 S1, US D555837S1, US-S1-D555837, USD555837 S1, USD555837S1
InventorsChun-Nan Chen
Original AssigneeChun-Nan Chen
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask
US D555837 S1
Abstract  available in
Images(8)
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Claims(1)
  1. The ornamental design for a mask, as shown and described.
Description

FIG. 1 is a perspective view of a mask showing my design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
USD746437 *May 22, 2014Dec 29, 20153M Innovative Properties CompanyRespirator mask having a communication grille
USD801589 *Apr 21, 2014Oct 31, 2017Gi Sportz Direct LlcProtective mask
Classifications
U.S. ClassificationD29/110