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Publication numberUSD557226 S1
Publication typeGrant
Application numberUS 29/236,981
Publication dateDec 11, 2007
Filing dateAug 25, 2005
Priority dateAug 25, 2005
Publication number236981, 29236981, US D557226 S1, US D557226S1, US-S1-D557226, USD557226 S1, USD557226S1
InventorsTakeo Uchino, Hiroyuki Shichida, Masakazu Isozaki, Tsunehiko Tsubone, Akitaka Makino
Original AssigneeHitachi High-Technologies Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Electrode cover for a plasma processing apparatus
US D557226 S1
Abstract  available in
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  1. The ornamental design for electrode cover for a plasma processing apparatus, as shown.

FIG. 1 is a front, top and right side perspective view of electrode cover for a plasma processing apparatus showing our new design;

FIG. 2 is a rear, bottom and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a bottom plan elevational view thereof.

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U.S. ClassificationD13/182