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Publication numberUSD557425 S1
Publication typeGrant
Application numberUS 29/236,933
Publication dateDec 11, 2007
Filing dateAug 25, 2005
Priority dateAug 25, 2005
Publication number236933, 29236933, US D557425 S1, US D557425S1, US-S1-D557425, USD557425 S1, USD557425S1
InventorsTsutomu Nakamura, Susumu Tauchi, Akitaka Makino
Original AssigneeHitachi High-Technologies Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Cover ring for a plasma processing apparatus
US D557425 S1
Abstract  available in
Images(5)
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Claims(1)
  1. We claim the ornamental design for cover ring for a plasma processing apparatus, as shown.
Description

FIG. 1 is a front, top and right side perspective view of cover ring for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a rear elevational view thereof; and,

FIG. 7 is a bottom plan elevational view thereof.

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Classifications
U.S. ClassificationD24/232