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Publication numberUSD559063 S1
Publication typeGrant
Application numberUS 29/213,405
Publication dateJan 8, 2008
Filing dateSep 17, 2004
Priority dateMar 17, 2004
Also published asUSD581237
Publication number213405, 29213405, US D559063 S1, US D559063S1, US-S1-D559063, USD559063 S1, USD559063S1
InventorsTakahiro Okamoto, Hiroshi Shiho
Original AssigneeJsr Corporation
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Polishing pad
US D559063 S1
Abstract  available in
Images(8)
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Claims(1)
  1. The ornamental design for a polishing pad, as shown and described.
Description

FIG. 1 is a top plan view of the polishing pad;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front elevational view thereof, the left side elevational view, the right side elevational view, and the rear elevational view being a mirror image of the front view shown;

FIG. 4 is an enlarged, partial view thereof taken at coordinates 44 in FIG. 1;

FIG. 5 is a greatly enlarged, partial view thereof taken at coordinates 55 in FIG. 1;

FIG. 6 is a cross-sectional view thereof taken along line 66 in FIG. 5;

FIG. 7 is a further enlargement of the cross-sectional view of part 7 shown in FIG. 6;

FIG. 8 is a greatly enlarged, partial view taken at coordinates 85 in FIG. 1;

FIG. 9 is a cross-sectional view taken along line 99 in FIG. 8;

FIG. 10 is a further enlargement of the cross-sectional view of part 10 of FIG. 9;

FIG. 11 is a further enlargement of the cross-sectional view of part 11 in FIG. 10; and,

FIG. 12 is a further enlargement of the cross-sectional view of part 12 in FIG. 11.

Classifications
U.S. ClassificationD08/70