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Publication numberUSD564462 S1
Publication typeGrant
Application numberUS 29/260,830
Publication dateMar 18, 2008
Filing dateJun 2, 2006
Priority dateDec 27, 2005
Publication number260830, 29260830, US D564462 S1, US D564462S1, US-S1-D564462, USD564462 S1, USD564462S1
InventorsKatsutoshi Ishii, Hiroyuki Matsuura
Original AssigneeTokyo Electron Limited
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
RF electrode for a process tube of semiconductor manufacturing apparatus
US D564462 S1
Abstract  available in
Images(6)
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Claims(1)
  1. The ornamental design for a RF electrode for a process tube of semiconductor manufacturing apparatus, as shown and described.
Description

FIG. 1 is a front view of a RF electrode for a process tube of semiconductor manufacturing apparatus showing our new design;

FIG. 2 is a back view thereof;

FIG. 3 is a plan view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is an enlarged sectional view taken along with line VI—VI of FIG. 1;

FIG. 7 is an enlarged sectional view taken along with line VII—VII of FIG. 1;

FIG. 8 is a perspective view as seen from the front side thereof;

FIG. 9 is a reference drawing showing a state of use of a RF electrode; and,

FIG. 10 is a reference drawing showing a state of use of a RF electrode.

Referenced by
Citing PatentFiling datePublication dateApplicantTitle
US9816184Mar 20, 2012Nov 14, 2017Veeco Instruments Inc.Keyed wafer carrier
USD744967Aug 11, 2014Dec 8, 2015Veeco Instruments Inc.Spindle key
USD748591 *Jan 14, 2015Feb 2, 2016Veeco Instruments Inc.Keyed spindle
Classifications
U.S. ClassificationD13/182