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Publication numberUSD569969 S1
Publication typeGrant
Application numberUS 29/270,290
Publication dateMay 27, 2008
Filing dateDec 20, 2006
Priority dateDec 20, 2006
Publication number270290, 29270290, US D569969 S1, US D569969S1, US-S1-D569969, USD569969 S1, USD569969S1
InventorsJing-Jyr Lin
Original AssigneeJing-Jyr Lin
Export CitationBiBTeX, EndNote, RefMan
External Links: USPTO, USPTO Assignment, Espacenet
Mask
US D569969 S1
Abstract  available in
Images(8)
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Claims(1)
  1. The ornamental design for a mask, as shown.
Description

FIG. 1 is a perspective view of the mask;

FIG. 2 is a front view of the mask;

FIG. 3 is a back view of the mask;

FIG. 4 is a left side view of the mask;

FIG. 5 is a right side view of the mask;

FIG. 6 is a top view of the mask; and,

FIG. 7 is a bottom view of the mask.

Classifications
U.S. ClassificationD24/110.1, D24/110.4